CN107942622B - Three-degree-of-freedom precise adjustment parallel mechanism based on double flexible pairs - Google Patents
Three-degree-of-freedom precise adjustment parallel mechanism based on double flexible pairs Download PDFInfo
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- CN107942622B CN107942622B CN201711337382.7A CN201711337382A CN107942622B CN 107942622 B CN107942622 B CN 107942622B CN 201711337382 A CN201711337382 A CN 201711337382A CN 107942622 B CN107942622 B CN 107942622B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
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Abstract
The invention relates to a three-degree-of-freedom precise adjustment parallel mechanism based on a double flexible pair. The invention comprises three groups of moving branched chains which are connected in parallel and have the same structure, wherein the three groups of moving branched chains are unevenly distributed at three extending ends of the immersion unit by taking the central hole of the immersion unit as the center circumference. Each group of movement branched chains comprises a linear movement assembly, a double-flexible auxiliary connecting rod assembly, a mechanical anti-collision assembly, a Z-displacement measuring assembly and a gravity compensation assembly. The invention is used for realizing the installation and fixation of the immersion unit of the immersion lithography machine and the adjustment of the space pose, and realizing the submicron positioning of the immersion unit; the double flexible pair is adopted, the structure is simple and compact, and the friction-free and lubrication-free advantages are realized; the whole parallel mechanism is high in rigidity, quick in response and large in adjustment range, and is assembled by adopting a modularized design, so that the three-degree-of-freedom precise adjustment device can be used for three-degree-of-freedom precise adjustment in other occasions except for an immersion lithography machine.
Description
Technical Field
The invention relates to a three-degree-of-freedom precise adjustment parallel mechanism, in particular to a three-degree-of-freedom precise adjustment parallel mechanism based on a double flexible pair.
Background
Immersion lithography is a core device for very large scale integrated circuit fabrication. Unlike conventional litho-machines, immersion litho-machines add a layer of liquid between the projection objective and the silicon wafer, known as an immersion flow field. This increases the refractive index and thus achieves a higher resolution. Immersion lithography is the only practical technology currently in use on integrated circuit production lines below 45 nm.
The immersion flow field is generated by the immersion unit, and in order to prevent leakage of the immersion flow field, a gap between the immersion unit and the silicon wafer is required to be within 1mm, and meanwhile, strict parallelism requirements are met for the gap. In addition, in the working process of the immersion lithography machine, the exposure heating effect can cause the non-uniform change of the refractive index of the liquid, tiny bubbles can be generated in the release reaction of the photoresist, chemical substances on the surface of the photoresist can be diffused in the liquid, and the exposure quality can be affected to different degrees. To ensure imaging quality, methods of rapidly renewing the immersion liquid are now employed to carry away these disadvantages. However, fast flowing liquids necessarily cause flow field fluctuations within the immersion unit, and the flowing liquids are susceptible to external disturbances, resulting in variations and fluctuations in parameters such as speed, temperature and pressure, which are very detrimental to lithography. Therefore, the immersion unit is required to reduce the influence of external interference on the stable flow of the liquid, and the displacement and positioning accuracy are required to be within +/-0.1 um. At the same time, complex optical systems and corresponding mating mechanisms are combined together in a limited space, so that strict installation space restrictions are imposed on each component thereof. In summary, in order to meet the requirements of an immersion lithography machine, the following requirements are set for a pose adjusting device of an immersion unit: 1) The space size is small; 2) The adjustable range of the pose is large; 3) The rigidity is high; 4) And the positioning precision is high.
At present, the immersion lithography machine mainly adopts a 3-PSR-V parallel mechanism to realize pose adjustment and meet the requirements. In the 3-PSR-V, 3 means that the parallel mechanism has three motion branched chains, PSR means that each motion branched chain consists of a linear motion pair P, a ball pair S and a revolute pair R respectively, V means that the rotation axis of the revolute pair R is perpendicular to a motion plane, and the structure is different from a common 3-PSR parallel mechanism, and the revolute pair R in the common 3-PSR parallel mechanism is in the same plane with the motion plane. The 3-PSR-V structure has higher rigidity and high precision, and in addition, all actuators of the parallel mechanism can be fixed on a base point, so that the mass of a movable block is reduced, and compared with a serial mechanism, the 3-PSR-V structure has better bearing capacity, simple structure, small inertia, good dynamic characteristic and easy realization of high-speed movement. The installation space required by the common 3-PSR parallel mechanism in the axial direction is not required, so that the space occupied by the mechanism in the axial direction is greatly reduced; a larger adjusting range than other three-degree-of-freedom parallel mechanisms can be obtained in the same radial space; the three revolute pairs R and the movable platform are on the same plane, so that the integrated design of the revolute pairs R and the movement plane through the flexible pair is facilitated.
In the invention, a revolute pair R and a ball pair S in the 3-PSR-V parallel mechanism use a flexible pair, and a linear motion pair P uses a double linear guide rail to ensure that the flexible pair and a motion plane are integrally designed. The flexible pair is a novel mechanism for transmitting or converting motion, force or energy by utilizing elastic deformation of materials, compared with the traditional rigid mechanism, the flexible pair eliminates idle stroke and mechanical friction of a transmission mechanism and has a plurality of advantages: 1. the integrated design and processing can simplify the structure, reduce the volume and the mass and avoid assembly; 2. no gap and friction, can realize high-precision movement; 3. wear is avoided, and the service life is prolonged; 4. lubrication is avoided, and pollution is avoided; 5. structural rigidity can be increased. The flexible pair is adopted as the flexible mechanism of the kinematic pair, the displacement of the tail end of the flexible pair is obtained by the deformation transmission of the flexible pair, and the movement space of the mechanism is relatively narrow because the deformation amount of the flexible pair is extremely limited, so that the characteristic can be utilized in an immersion lithography machine.
The parallel pose adjusting mechanism based on the flexible pair is an expansion of a micro-operation system of the flexible pair, has the advantages of being special for the flexible pair, has higher rigidity and higher fatigue resistance, and has the advantages of high rigidity, high bearing capacity, high response speed, small working space, no friction, no gap, no lubrication and the like, and the use of the parallel pose adjusting mechanism based on the flexible pair in an immersion lithography machine brings new development for the immersion lithography machine.
Disclosure of Invention
The invention aims to provide a three-degree-of-freedom precise adjustment parallel mechanism based on a double flexible pair.
The invention is arranged between a main frame of an immersion lithography machine and an immersion unit, and comprises three groups of moving branched chains which are connected in parallel and have the same structure, wherein the three groups of moving branched chains are unevenly distributed at three extending ends of the immersion unit by taking a central hole of the immersion unit as a center circumference. Each group of movement branched chains comprises a linear movement assembly, a double-flexible auxiliary connecting rod assembly, a mechanical anti-collision assembly, a Z-displacement measuring assembly and a gravity compensation assembly.
The linear motion assembly comprises a linear motion block mounting plate, a driving mechanism and a double-guide rail assembly. The linear motion assembly, the mechanical anti-collision assembly, the Z-displacement measuring assembly and the gravity compensation assembly are all arranged on one side of the linear motion block mounting plate, and the other side of the linear motion block mounting plate is mounted on the lower end face of the main frame of the immersion lithography machine in a threaded fit manner. The double-guide rail assembly comprises a sliding rail, a sliding rail mounting platform, a sliding rail mounting fastener, a sliding block, a U-shaped sliding block mounting plate, a driving block connecting plate, a rolling pin mounting groove and a first double-flexible auxiliary connecting rod mounting threaded hole; the slide rail and the slide rail mounting platform are vertically fixed on the linear motion block mounting plate by the slide rail mounting fastener. The two parallel sliding rails are respectively fixed on the step platforms at the left side and the right side of the sliding rail mounting platform, sliding rail mounting fasteners are mounted at the two sides of the two sliding rails, and the sliding rails are guaranteed to be mounted reliably in the horizontal direction without gaps through lateral set screws; the slide rail installation fastener is provided with an installation groove. The sliding block is in sliding connection with the sliding rail, and the U-shaped sliding block mounting plate is mounted on the sliding block through a screw; the two side surfaces of the inner wall of the U-shaped slide block mounting plate just respectively clamp the left side surfaces and the right side surfaces of the two slide blocks; one side of the lower surface of the driving block connecting plate is attached to the upper end face of the U-shaped sliding block mounting plate through screws, and two ends of the upper edge and the lower edge of the connecting side of the U-shaped sliding block mounting plate after being connected with the driving block connecting plate are arranged in mounting grooves formed in the sliding rail mounting fasteners. The driving block connecting plate is arranged above the driving mechanism and is parallel to the linear motion block mounting plate, and the driving block connecting plate is connected with the driving mechanism. The upper surface of the driving block connecting plate far away from the U-shaped sliding block mounting plate side is provided with a first double-flexible auxiliary connecting rod mounting threaded hole. Needle roller mounting grooves are formed in two sides of the driving block connecting plate, perpendicular to the mounting side of the U-shaped sliding block mounting plate.
The double-flexible auxiliary connecting rod assembly comprises a double-flexible auxiliary connecting rod, a double-flexible auxiliary connecting rod connecting screw, a double-flexible auxiliary connecting rod connecting plate and a double-flexible auxiliary connecting rod connecting plate mounting screw. The double-flexible auxiliary connecting rod is a double-flexible auxiliary mechanism comprising a flexible R auxiliary 5R and a flexible S auxiliary. The double-flexible auxiliary connecting rod connecting screw on the auxiliary side of the flexible R is used for mounting the double-flexible auxiliary connecting rod on the double-flexible auxiliary connecting rod connecting plate, and then the double-flexible auxiliary connecting rod connecting plate is connected with the extending end of the immersed unit through the double-flexible auxiliary connecting rod connecting plate mounting screw.
The mechanical anti-collision assembly comprises a hollow square pad installation block, a square pad, an impact block, a cylindrical anti-collision pad and an anti-collision pad installation groove, wherein the hollow square pad installation block is arranged at the top end between two sliding rails on the side of a sliding rail installation platform installation sliding rail, the upper end surface of the square pad installation block is leveled with the sliding rail installation platform, the square pad is installed on the lower bottom surface of the square pad installation block, the impact block is installed on the inner side of a U-shaped sliding block installation plate, and the cylindrical anti-collision pad is installed in the anti-collision pad installation groove processed on the linear motion block installation plate.
The Z-displacement measuring assembly comprises an encoder, an L-shaped encoder mounting plate and a grating ruler; the encoder is installed on the vertical side of L shape encoder mounting panel through horizontal set screw, and L shape encoder mounting panel passes through the screw to be installed on the rectilinear motion piece mounting panel, and the grating chi is installed in the side of U-shaped slider mounting panel.
The gravity compensation component comprises a movable joint bolt, a spring and a rolling pin; the movable joint bolt is arranged between the driving block connecting plate and the linear motion block mounting plate and on two sides of the driving mechanism, the movable joint bolt is arranged on the linear motion block mounting plate through threads, the rolling pin is embedded into a rolling pin mounting groove machined on the driving block connecting plate from the upper surface of the driving block connecting plate, a lower shackle of the spring is connected with a bolt head of the movable joint bolt, the lower shackle is sleeved on the rolling pin, the tensioning effect on the driving block connecting plate is achieved, and the movable joint bolt is used for balancing the gravity effect of the immersing unit when the mechanism is in a normal state.
The driving mechanism in the linear motion assembly is a voice coil motor or a fine adjustment screw pair; the voice coil motor comprises a voice coil motor stator and a voice coil motor rotor, and the voice coil motor rotor is connected with the driving block connecting plate through screws; the fine adjustment screw pair comprises a fine adjustment screw, a screw sleeve and a fine adjustment screw pair mounting plate, and the screw sleeve is in interference fit with a mounting hole on the fine adjustment screw pair mounting plate.
And lubrication is arranged between the sliding block and the sliding rail.
The characteristic parameter of the flexible R pair is that the radius R1 of the flexible R pair incision is equal to 6mm, the characteristic parameter of the flexible S pair 5S is that the radius R2 of the flexible S pair incision is equal to 6.5mm, the distance L1 between the flexible R pair and the flexible S pair center is equal to 30mm, and the length L2 of the double-flexible pair connecting rod is equal to 44mm.
The square pad installation block is hollow.
Preferably, the grating ruler is a patch type grating ruler.
According to the invention, the three groups of moving branched chains move up and down to drive the corresponding extending ends of the immersed unit to be positioned at different positions in the Z direction, and a plane is determined by three points, so that after the movement of the three groups of moving branched chains is stopped, the space pose of the immersed unit can be determined, and the submicron precision positioning of the immersed unit can be realized. The three-degree-of-freedom parallel mechanism based on the double flexible pairs is formed by adopting a parallel structure and directly driving the voice coil motor or the fine adjustment screw pair, wherein the kinematic pair is the flexible pair, and the three-degree-of-freedom parallel mechanism has the characteristics of high rigidity and quick response. The driving source can alternatively select a voice coil motor or a fine adjustment screw pair, and the perpendicularity of the output displacement of the driving source is ensured through double guide rails, and the linear motion assembly structure has universality for the installation of the two driving sources. The flexible R pair and the flexible S pair are used for replacing the traditional kinematic pair, so that the structure is simple and compact, and the installation space is reduced; the device has the advantages of no friction and no need of lubrication, so that pollution of a traditional kinematic pair to an immersed unit is avoided; the high-rigidity mechanism has the advantage of high rigidity, and ensures the reliability of the mechanism. The gravity balance assembly is used for balancing the gravity of the immersion unit, so that the requirement on the power of a driving source is reduced, and for a voice coil motor, the input current is reduced, and the heating is reduced. The three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pairs is not functionally coupled with other devices in the immersion lithography machine by adopting a modularized design thought, and can be used for adjusting the pose of an immersion unit in the immersion lithography machine and other pose adjustment occasions with the same requirements.
Drawings
FIG. 1 is a simplified schematic diagram of the location of the present invention in an immersion lithography machine;
FIG. 2 is a perspective view of the overall structure of the present invention;
FIG. 3 is a perspective view of an inverted structure of a moving branched chain divided by a double flexible auxiliary connecting rod assembly using a voice coil motor;
FIG. 4 is an inverted exploded view of a kinematic chain divided by a double flexible secondary connecting rod assembly employing a fine threaded pair;
FIG. 5 is a schematic illustration of the dual flexible secondary link assembly of FIG. 2;
FIG. 6 is a schematic structural view of a dual flexible secondary link;
fig. 7 is a schematic view of an inverted structure of a mechanical bumper assembly.
Detailed Description
The invention is further described below with reference to the drawings and examples.
As shown in fig. 1, a three-degree-of-freedom precise adjustment parallel mechanism S2 based on a double flexible pair is installed between a main frame 1 of an immersion lithography machine and an immersion unit S3, an optical system S1 of the immersion lithography machine penetrates through the main frame 1 of the immersion lithography machine, the three-degree-of-freedom precise adjustment parallel mechanism S2 based on the double flexible pair and the immersion unit S3, and exposure is performed on a silicon wafer 3 at the lowest position through an immersion flow field 2. The main frame 1 of the immersion lithography machine is connected with the immersion unit S3 in parallel through three groups of moving branched chains with the same structure as shown in fig. 2, the three groups of moving branched chains are unevenly distributed around the center hole of the immersion unit, and the distribution angles of the three groups of moving branched chains are determined according to three extending ends of the immersion unit.
The three-degree-of-freedom precise adjustment parallel mechanism S2 comprises three groups of moving branched chains with the same structure, and each group of moving branched chains comprises a linear movement assembly 4, a double-flexible auxiliary connecting rod assembly 5, a mechanical anti-collision assembly 6, a Z-displacement measuring assembly 7 and a gravity compensation assembly 8.
The linear motion assembly 4 comprises a linear motion block mounting plate 4A, a driving mechanism and a double-guide rail assembly 4D. The linear motion assembly 4, the mechanical anti-collision assembly 6, the Z-displacement measuring assembly 7 and the gravity compensation assembly 8 are all arranged on one side of the linear motion block mounting plate 4A, and the other side of the linear motion block mounting plate 4A is in fit installation with the lower end face of the main frame 1 of the immersion lithography machine through threads.
As shown in fig. 3 and 4, the driving mechanism in the linear motion assembly 4 is a voice coil motor 4B or a fine adjustment screw pair 4C; the voice coil motor 4B comprises a voice coil motor stator 4B1 and a voice coil motor rotor 4B2, and the voice coil motor rotor 4B2 is connected with a driving block connecting plate 4D6 through screws; the fine adjustment screw pair 4C comprises a fine adjustment screw 4C1, a screw sleeve 4C2 and a fine adjustment screw pair mounting plate 4C3, and the screw sleeve 4C2 is in interference fit with a mounting hole on the fine adjustment screw pair mounting plate 4C 3; the two driving mechanisms are alternatively fixedly mounted on the linear motion block mounting plate 4A.
The double-guide-rail assembly 4D comprises a sliding rail 4D1, a sliding rail mounting platform 4D2, a sliding rail mounting fastener 4D3, a sliding block 4D4, a U-shaped sliding block mounting plate 4D5, a driving block connecting plate 4D6, a needle roller mounting groove 4D7 and a first double-flexible auxiliary connecting rod mounting threaded hole 4D8; the slide rail 4D1 and the slide rail mounting platform 4D2 are vertically fixed on the linear motion block mounting plate 4A through slide rail mounting fasteners 4D 3. Two parallel sliding rails 4D1 are respectively fixed on the step platforms at the left side and the right side of the sliding rail mounting platform 4D2, sliding rail mounting fasteners 4D3 are mounted at two sides of the two sliding rails 4D1, and the sliding rails 4D1 are guaranteed to be reliably and seamlessly mounted in the horizontal direction through lateral set screws; the slide rail mounting fastener 4D3 is provided with a mounting groove. The sliding block 4D4 is in sliding connection with the sliding rail 4D1, lubrication and small friction are arranged between the sliding block 4D4 and the sliding rail 4D1, the U-shaped sliding block mounting plate 4D5 is mounted on the sliding block 4D4 through a screw, and the left side face and the right side face of the two sliding blocks 4D4 are just clamped by the two side faces of the inner wall of the U-shaped sliding block mounting plate 4D5 respectively; one side of the lower surface of the driving block connecting plate 4D6 is attached to the upper end face of the U-shaped sliding block mounting plate 4D5 through screws, and the two ends of the upper side and the lower side of the U-shaped sliding block mounting plate 4D5 connected with the driving block connecting plate 4D6 are arranged in mounting grooves formed in the sliding rail mounting fasteners 4D 3. The driving block connecting plate 4D6 is disposed above the driving mechanism in parallel with the linear motion block mounting plate 4A. The side upper surface of the driving block connecting plate 4D6 far away from the U-shaped sliding block mounting plate 4D5 is provided with a first double-flexible auxiliary connecting rod mounting threaded hole 4D8. The two sides of the installation side of the driving block connecting plate 4D6 vertical to the U-shaped sliding block installing plate 4D5 are provided with needle roller installing grooves 4D7.
As shown in fig. 5 and 6, the double flexible sub link assembly 5 includes a double flexible sub link 5A, a double flexible sub link connection screw 5B, a double flexible sub link connection plate 5C, and a double flexible sub link connection plate mounting screw 5D. The double-flexible auxiliary connecting rod 5A is a double-flexible auxiliary mechanism comprising a flexible R auxiliary 5R and a flexible S auxiliary 5S, wherein the characteristic parameter of the flexible R auxiliary 5R is that the radius R1 of a flexible R auxiliary notch is equal to 6mm, the characteristic parameter of the flexible S auxiliary 5S is that the radius R2 of a flexible S auxiliary notch is equal to 6.5mm, the distance L1 between the flexible R auxiliary and the flexible S auxiliary center is equal to 30mm, and the length L2 of the double-flexible auxiliary connecting rod is equal to 44mm. The two flexible auxiliary connecting rod connecting screws 5B on the side of the flexible R auxiliary 5R are used for installing the two flexible auxiliary connecting rods 5A on the two flexible auxiliary connecting rod connecting plates 5C through the two flexible auxiliary connecting rod installing screw holes 5E on the side of the flexible S auxiliary 5S and the first two flexible auxiliary connecting rod installing screw holes 4D8 on the driving block connecting plate 4D6, and then the two flexible auxiliary connecting rod connecting plates 5C are connected with the extending end of the immersed unit S3 through the two flexible auxiliary connecting rod installing screws 5D.
The three-degree-of-freedom precise adjustment parallel mechanism S2 is mounted on the main frame 1 of the immersion lithography machine through a linear motion block mounting plate 4A, and is connected to three extending ends of the immersion unit S3 through a double flexible auxiliary connecting rod connecting plate mounting screw 5D in a double flexible auxiliary connecting rod assembly 5. The double flexible secondary linkage assembly 5 is used to connect the linear motion assembly 4 and the submerged unit S3.
As shown in fig. 7, the mechanical anti-collision assembly 6 includes a hollow square pad mounting block 6A, a square pad 6B, an impact block 6C, a cylindrical anti-collision pad 6D, and an anti-collision pad mounting groove 6E, wherein the hollow square pad mounting block 6A is disposed at the top end between two slide rails on the slide rail mounting platform 4D2 mounting slide rail side, the upper end surface of the square pad mounting block 6A is flat with the slide rail mounting platform 4D2, and the square pad 6B is mounted under the condition of normal mounting due to the hollow structure, the impact block 6C is mounted on the inner side of the U-shaped slide block mounting plate 4D5, and the cylindrical anti-collision pad 6D is mounted in the anti-collision pad mounting groove 6E processed on the linear motion block mounting plate 4A.
The Z-displacement measuring assembly 7 comprises an encoder 7A, L-shaped encoder mounting plate 7B and a patch-type grating ruler 7C; the encoder 7A is mounted on the vertical side of the L-shaped encoder mounting plate 7B by a horizontal fixing screw, the L-shaped encoder mounting plate 7B is mounted on the linear motion block mounting plate 4A by a screw, and the patch type grating ruler 7C is mounted on the side of the U-shaped slider mounting plate 4D5 by a paste manner.
The gravity compensation component 8 comprises a movable joint bolt 8A, a spring 8B and a needle roller 8C; the movable joint bolt 8A is arranged between the driving block connecting plate 4D6 and the linear motion block mounting plate 4A and on two sides of the driving source voice coil motor 4B or the fine adjustment screw pair 4C, the movable joint bolt 8A is arranged on the linear motion block mounting plate 4A through threads, the rolling needle 8C is embedded into a rolling needle mounting groove 4D7 processed on the driving block connecting plate 4D6 from the upper surface of the driving block connecting plate 4D6, a lower shackle of the spring 8B is connected with a bolt head of the movable joint bolt 8A, and the lower shackle is sleeved on the rolling needle 8C to realize the tensioning effect on the driving block connecting plate 4D6, and is used for balancing the gravity effect of the immersed unit S3 when the mechanism is in a normal state.
Each of the three groups of moving branched chains with the same structure can independently drive the extending end of the connected immersed unit S3; in each group of movement branched chains, the voice coil motor 4B or the fine adjustment screw thread pair 4C ensures Z-direction movement along the sliding rail 4D1 in the power-on or manual adjustment state, a driving block connecting plate 4D6 in the 4 is connected with a double-flexible auxiliary connecting rod 5A, flexible R auxiliary 5R and flexible S auxiliary 5S in the double-flexible auxiliary connecting rod 5A are elastically deformed, the extending end of an immersed unit S3 connected with the double-flexible auxiliary connecting rod is further driven to generate Z-direction movement, the immersed unit S3 generates displacement in three directions of Z, RX and RY, and the pose adjustment of the immersed unit S3 is realized.
The specific implementation process of the invention is as follows:
the three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pairs is arranged between the main frame of the photoetching machine and the immersion unit, and comprises three groups of moving branched chains with the same structure which are unevenly distributed on the circumference taking the central hole of the immersion unit as the center. In each group of movement branched chains, a voice coil motor or a fine adjustment screw pair can be used as a driving mechanism (direct driving source) as required, and the driving mechanism drives a driving block connecting plate to move when outputting movement so as to drive a U-shaped sliding block mounting plate connected with a sliding block to move, and P pair movement is realized under the guarantee of a double-guide rail assembly; the double-flexible auxiliary connecting rod is utilized, the flexible S pair realizes the function of a flexible ball pair in the double-flexible pair, the radius of a notch of the flexible S pair is equal to 6.5mm, the flexible R pair realizes the function of a flexible rotating pair in the double-flexible pair, the radius of a notch of the flexible R pair is equal to 6.0mm, and the double-flexible pair serial mechanism with the flexible rotating pair and the flexible ball pair is generally realized. The double-flexible auxiliary mechanism has the characteristics of high precision, simple structure, small volume, no friction, no lubrication and no pollution. The flexible R pair has the characteristics of small transverse rotation rigidity and large longitudinal and axial rotation rigidity;
if the voice coil motor is used, the rotor of the voice coil motor outputs motion after power is applied; if the fine adjustment screw pair is used, the fine adjustment screw is manually adjusted to push the driving block connecting plate to move;
the gravity compensation component in the three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pairs is arranged on the linear motion block mounting plate through the movable joint bolts, the rolling pin is arranged on the driving block connecting plate, two shackles of the spring are respectively connected with the bolt heads of the movable joint bolts and the rolling pin, the driving block connecting plate is tensioned by utilizing the tension of the spring, and the gravity of the driving block connecting plate, the double flexible pair connecting rod component connected with the driving block connecting plate and the immersion unit is balanced, so that zero gravity driving of the three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pairs is realized, and the thrust requirement on a driving source is reduced;
when the driving source drives the driving block connecting plate to move, the driving block connecting plate collides with the cylindrical anti-collision pad to stop moving when moving to the upper limit, and the impact block arranged on the inner side of the U-shaped sliding block mounting plate collides with the square pad embedded in the hollow square pad mounting block to stop moving when moving to the lower limit, so that the immersion unit driven by the three-degree-of-freedom precise adjusting parallel mechanism based on the double flexible pair is prevented from colliding with an objective lens of an optical system of the immersion lithography machine and a silicon wafer; the patch type grating ruler arranged on the U-shaped sliding block mounting plate moves along with the U-shaped sliding block mounting plate, and the encoder measures the movement displacement of the patch type grating ruler and is used as feedback output, so that closed-loop control of the mechanism is realized;
the voice coil motor or the fine adjustment screw pair directly drives the driving block connecting plate to move along the normal direction of the immersed unit, and the flexible S pair and the flexible R pair on the double flexible auxiliary connecting rod connected with the driving block connecting plate realize the movement of the ball pair and the revolute pair; thereby driving the extending end of the immersion unit connected with the immersion unit to move. In the motion range, each group of motion branched chains can independently drive the extending end of the immersion unit to move, the extending end position of the immersion unit can be adjusted by three motion branched chains, the pose of the immersion unit is determined by a three-degree-of-freedom precise adjustment parallel mechanism based on a double-flexible pair according to a three-point determination principle, the precise adjustment of the immersion unit in [ Z, RX, RY ] can be realized by adjusting the motion of the three groups of motion branched chains, and the positioning precision of each group of motion branched chains can reach submicron level, so the whole device can realize the submicron pose adjustment of the immersion unit in [ Z, RX, RY ].
The foregoing detailed description is provided to illustrate the present invention and not to limit the invention, and any modifications and changes made to the present invention within the spirit of the present invention and the scope of the appended claims fall within the scope of the present invention.
Claims (6)
1. The three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pairs is arranged between a main frame of an immersion lithography machine and an immersion unit and comprises three groups of moving branched chains which are connected in parallel and have the same structure, wherein the three groups of moving branched chains are unevenly distributed at three extending ends of the immersion unit by taking a central hole of the immersion unit as a central circumference; the method is characterized in that: each group of movement branched chains comprises a linear movement assembly, a double-flexible auxiliary connecting rod assembly, a mechanical anti-collision assembly, a Z-displacement measuring assembly and a gravity compensation assembly;
the linear motion assembly comprises a linear motion block mounting plate, a driving mechanism and a double-guide rail assembly; the linear motion assembly, the mechanical anti-collision assembly, the Z-displacement measuring assembly and the gravity compensation assembly are all arranged on one side of the linear motion block mounting plate, and the other side of the linear motion block mounting plate is attached to the lower end face of the main frame of the immersion lithography machine through threads; the double-guide rail assembly comprises a sliding rail, a sliding rail mounting platform, a sliding rail mounting fastener, a sliding block, a U-shaped sliding block mounting plate, a driving block connecting plate, a rolling pin mounting groove and a first double-flexible auxiliary connecting rod mounting threaded hole; the slide rail and the slide rail mounting platform are vertically fixed on the linear motion block mounting plate by the slide rail mounting fastener; the two parallel sliding rails are respectively fixed on the step platforms at the left side and the right side of the sliding rail mounting platform, sliding rail mounting fasteners are mounted at the two sides of the two sliding rails, and the sliding rails are guaranteed to be mounted reliably in the horizontal direction without gaps through lateral set screws; the slide rail mounting fastener is provided with a mounting groove; the sliding block is in sliding connection with the sliding rail, and the U-shaped sliding block mounting plate is mounted on the sliding block through a screw; the two side surfaces of the inner wall of the U-shaped slide block mounting plate just respectively clamp the left side surfaces and the right side surfaces of the two slide blocks; one side of the lower surface of the driving block connecting plate is attached to the upper end surface of a U-shaped sliding block mounting plate through a screw, and two ends of the upper and lower sides of the connecting side of the U-shaped sliding block mounting plate after being connected with the driving block connecting plate are arranged in mounting grooves formed in the sliding rail mounting fasteners; the driving block connecting plate is arranged above the driving mechanism and is parallel to the linear motion block mounting plate, and the driving block connecting plate is connected with the driving mechanism; the upper surface of the side, far away from the U-shaped slider mounting plate, of the driving block connecting plate is provided with a first double-flexible auxiliary connecting rod mounting threaded hole; needle roller mounting grooves are formed in two sides of the driving block connecting plate, which are perpendicular to the mounting side of the U-shaped sliding block mounting plate;
the double-flexible auxiliary connecting rod assembly comprises a double-flexible auxiliary connecting rod, a double-flexible auxiliary connecting rod connecting screw, a double-flexible auxiliary connecting rod connecting plate and a double-flexible auxiliary connecting rod connecting plate mounting screw; the double flexible auxiliary connecting rod is a double flexible auxiliary mechanism comprising a flexible R auxiliary 5R and a flexible S auxiliary; the double-flexible auxiliary connecting rod connecting screw on the auxiliary side of the flexible R is used for mounting the double-flexible auxiliary connecting rod on the double-flexible auxiliary connecting rod connecting plate, and then the double-flexible auxiliary connecting rod connecting plate is connected with the extending end of the immersing unit through the double-flexible auxiliary connecting rod connecting plate mounting screw;
the mechanical anti-collision assembly comprises a hollow square pad installation block, a square pad, an impact block, a cylindrical anti-collision pad and an anti-collision pad installation groove, wherein the hollow square pad installation block is arranged at the top end between two sliding rails at the side of a sliding rail installation platform, the upper end surface of the square pad installation block is parallel to the sliding rail installation platform, the square pad is arranged on the lower bottom surface of the square pad installation block, the impact block is arranged on the inner side of a U-shaped sliding block installation plate, and the cylindrical anti-collision pad is arranged in the anti-collision pad installation groove processed on the linear motion block installation plate;
the Z-displacement measuring assembly comprises an encoder, an L-shaped encoder mounting plate and a grating ruler; the encoder is arranged on the vertical side surface of the L-shaped encoder mounting plate through a horizontal fixing screw, the L-shaped encoder mounting plate is arranged on the linear motion block mounting plate through a screw, and the grating ruler is arranged on the side surface of the U-shaped sliding block mounting plate;
the gravity compensation component comprises a movable joint bolt, a spring and a rolling pin; the movable joint bolt is arranged between the driving block connecting plate and the linear motion block mounting plate and on two sides of the driving mechanism, the movable joint bolt is arranged on the linear motion block mounting plate through threads, the rolling pin is embedded into a rolling pin mounting groove machined on the driving block connecting plate from the upper surface of the driving block connecting plate, a lower shackle of the spring is connected with a bolt head of the movable joint bolt, the lower shackle is sleeved on the rolling pin, the tensioning effect on the driving block connecting plate is achieved, and the movable joint bolt is used for balancing the gravity effect of the immersing unit when the mechanism is in a normal state.
2. The three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pair as claimed in claim 1, wherein: the driving mechanism in the linear motion assembly is a voice coil motor or a fine adjustment screw pair; the voice coil motor comprises a voice coil motor stator and a voice coil motor rotor, and the voice coil motor rotor is connected with the driving block connecting plate through screws; the fine adjustment screw pair comprises a fine adjustment screw, a screw sleeve and a fine adjustment screw pair mounting plate, and the screw sleeve is in interference fit with a mounting hole on the fine adjustment screw pair mounting plate.
3. The three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pair as claimed in claim 1, wherein: and lubrication is arranged between the sliding block and the sliding rail.
4. The three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pair as claimed in claim 1, wherein: the characteristic parameter of the flexible R pair is that the radius R1 of the flexible R pair incision is equal to 6mm, the characteristic parameter of the flexible S pair 5S is that the radius R2 of the flexible S pair incision is equal to 6.5mm, the distance L1 between the flexible R pair and the flexible S pair center is equal to 30mm, and the length L2 of the double-flexible pair connecting rod is equal to 44mm.
5. The three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pair as claimed in claim 1, wherein: the square pad installation block is hollow.
6. The three-degree-of-freedom precise adjustment parallel mechanism based on the double flexible pair as claimed in claim 1, wherein: the grating ruler adopts a patch type grating ruler.
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| CN108717223B (en) * | 2018-05-29 | 2020-07-14 | 上海交通大学 | Tensioning platform and thin film optical surface tensioning platform combined device |
| CN109938694B (en) * | 2019-01-31 | 2021-10-08 | 华中科技大学苏州脑空间信息研究院 | Multi-channel imaging system and image surface registration method |
| CN113126444B (en) * | 2019-12-31 | 2021-12-31 | 上海微电子装备（集团）股份有限公司 | Vertical supporting component, vertical supporting device and photoetching machine |
| CN113917798B (en) * | 2021-09-22 | 2022-10-14 | 哈尔滨工业大学 | Movement device for Z-axis direction macro movement of workbench |
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