TW202001442A - Workpiece table system and photolithography device - Google Patents
Workpiece table system and photolithography device Download PDFInfo
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- TW202001442A TW202001442A TW108122987A TW108122987A TW202001442A TW 202001442 A TW202001442 A TW 202001442A TW 108122987 A TW108122987 A TW 108122987A TW 108122987 A TW108122987 A TW 108122987A TW 202001442 A TW202001442 A TW 202001442A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Abstract
Description
本發明實施例係關於半導體製造裝備技術領域,例如關於一種工件台系統及光刻設備。 The embodiments of the present invention relate to the technical field of semiconductor manufacturing equipment, for example, to a workpiece table system and lithography equipment.
光刻裝置是一種將光罩圖案曝光成像到矽片上的設備,主要用於積體電路(IC)或其它微型器件的製造。在光刻裝置中起非常重要作用的是工件台系統,在步進及掃描光刻機中,工件台用於承載矽片並進行精確運動來滿足光刻需要。在光刻設備中,工件台負責矽片的精密運動,一般採用粗微定位方式,即長行程的粗動台實現長距粗定位,而微動台則實現奈米級的精確定位。微動台的作用是承載矽片,藉由水平向及垂向的六自由度精確調整及定位使矽片完成對準及調平調焦作業任務。 A lithography device is a device that exposes and images a photomask pattern onto a silicon wafer, and is mainly used for manufacturing integrated circuits (ICs) or other micro devices. The worktable system plays a very important role in the lithography device. In the stepping and scanning lithography machine, the worktable is used to carry silicon wafers and perform precise movement to meet the needs of lithography. In the lithography equipment, the workpiece table is responsible for the precise movement of the silicon wafer. Generally, the coarse and fine positioning method is used, that is, the long-stroke coarse moving table realizes long-distance coarse positioning, and the fine moving table realizes nanometer-level precise positioning. The function of the micro-motion table is to carry the silicon wafer. Through the horizontal and vertical six degrees of freedom precise adjustment and positioning, the silicon wafer can complete the alignment and leveling and focusing tasks.
圖1是相關技術工件台在X軸方向的縱向剖面結構示意圖,圖2是圖1在Y軸方向的縱向剖面結構示意圖,參考圖1及圖2,工件台的X軸組件10、Y軸組件20及載物台30的重量全部藉由氣浮支撐導軌40支撐在底座50上,Y軸組件20的Y向長行程運動,帶動整個X軸組件10與載物台30一起沿Y向運動。如此,X軸組件10、Y軸組件20及載物台30對底座50產生的負載會導致底座50面型的變化,進而引 起Y軸組件20的氣浮支撐導軌40面型的變化,進而影響行程組件的運動精度,最終影響曝光精度。此外,氣浮支撐導軌40的面型是負載在固定位置時做好的,如果變形嚴重則會導致氣浮卡死,導致設備出現故障無法正常運行。而負載位置變化引起的底座50面型變化只能藉由提高底座的剛度才能減小,如果負載及行程較大,為保證氣浮性能,底座50需要有足夠的剛度,即足夠的厚度。然而隨著技術的進步,行程組件的重量及運行速度會相應增加,單純的增加底座50的厚度已無法滿足曝光精度的要求,同時也增加工件台的設計難度。 1 is a schematic diagram of a longitudinal cross-sectional structure of a related-art workpiece table in the X-axis direction, and FIG. 2 is a schematic diagram of a longitudinal cross-sectional structure of FIG. 1 in the Y-axis direction. Referring to FIGS. 1 and 2, the
因此,必須考慮在不增加底座50厚度的前提下,如何能更有效地減小甚至消除負載運動引起的底座50的變形。 Therefore, it is necessary to consider how to more effectively reduce or even eliminate the deformation of the
本說明書提供一種工件台系統及光刻設備,用於對底座上的行程組件對底座產生的負載進行即時補償,減小甚至消除負載運動導致的底座變形,進而保證曝光精度,降低設備的故障機率。 This specification provides a workpiece table system and lithography equipment for real-time compensation of the load generated by the travel component on the base to reduce or even eliminate the deformation of the base caused by the load movement, thereby ensuring exposure accuracy and reducing the probability of equipment failure .
第一方面,本發明實施例提供一種工件台系統,該工件台系統的特徵係其包含:基礎框架;底座,固定在基礎框架上,設置為為載物台運動提供支撐; 運動組件,設置為為載物台運動提供驅動力;平衡質量組件,可動地設置於基礎框架上;運動組件包含動子部分及定子部分,定子部分固定在平衡質量組件上,動子部分設置為連接載物台,並帶動載物台相對於定子部分運動,前述動子部分運動時產生的反向作用力驅動平衡質量組件發生與動子部分的運動方向相反的運動;重力補償裝置,位於基礎框架與底座之間,前述重力補償裝置設置為對底座上的負載進行垂向的重力補償;傳動裝置,設置為連接平衡質量組件與重力補償裝置,平衡質量組件設置為藉由傳動裝置驅動重力補償裝置發生與載物台同步同向運動。 In a first aspect, an embodiment of the present invention provides a workpiece table system. The characteristics of the workpiece table system include: a base frame; a base, fixed on the base frame, which is arranged to provide support for the movement of the stage; and a motion component, which is arranged as Provides driving force for the movement of the stage; the balanced mass component is movably arranged on the base frame; the movement component includes a mover part and a stator part, the stator part is fixed on the balanced mass component, and the mover part is set to connect the stage, And drive the stage relative to the stator part, the reverse force generated when the mover part moves drives the balanced mass component to move in the opposite direction of the mover part; the gravity compensation device is located between the base frame and the base , The aforementioned gravity compensation device is configured to perform vertical gravity compensation on the load on the base; the transmission device is configured to connect the balanced mass component and the gravity compensation device, and the balanced mass component is configured to drive the gravity compensation device to generate load with the transmission device The platform moves in the same direction.
在一些實施例中,運動組件包含Y軸組件及X軸組件,Y軸組件包含Y軸定子部分及Y軸動子部分,X軸組件包含X軸定子部分及X軸動子部分;載物台藉由設置在X軸動子部分上實現在X軸定子部分上的X向運動,X軸定子部分藉由連接Y軸動子部分實現在Y軸定子部分上的Y向運動,Y軸定子部分固定在平衡質量組件上,X軸定子部分支撐於底座上。 In some embodiments, the motion component includes a Y axis component and an X axis component, the Y axis component includes a Y axis stator portion and a Y axis mover portion, and the X axis component includes an X axis stator portion and an X axis mover portion; a stage The X-axis stator part realizes the X-direction movement on the X-axis stator part by being arranged on the X-axis mover part, and the Y-axis stator part realizes the Y-direction movement on the Y-axis stator part by connecting the Y-axis mover part. Fixed on the balanced mass assembly, the X-axis stator part is supported on the base.
在一些實施例中,傳動裝置包含兩組帶輪及兩個傳動帶,每組帶輪包含同軸旋轉的第一帶輪及第二帶輪;兩個第一帶輪藉由第一傳動帶連接,兩個第二帶輪藉由第二傳動帶連接;第二帶輪的半徑大於第一帶輪的半徑,第一帶輪與第二帶輪的轉動角速度相等;平衡質量組件藉由轉接件與第一傳動帶連接,重力補償裝置藉由轉接件與第二傳動帶連接。 In some embodiments, the transmission device includes two sets of pulleys and two transmission belts, and each set of pulleys includes a coaxially rotating first pulley and a second pulley; the two first pulleys are connected by a first transmission belt, two The second pulley is connected by a second transmission belt; the radius of the second pulley is greater than the radius of the first pulley, the rotational angular velocity of the first pulley and the second pulley is equal; the balance mass component is connected to the A transmission belt is connected, and the gravity compensation device is connected to the second transmission belt through an adapter.
在一些實施例中,第二帶輪的半徑R2與第一帶輪的半徑R1的比值滿足如下關係:
其中,M1為底座上的負載,即X軸組件、Y軸動子部分及載物台的質量和;M2為平衡質量組件的質量;M3為重力補償裝置的質量;J為前述兩組帶輪中的一組帶輪的轉動慣量。 Among them, M 1 is the load on the base, that is, the mass of the X-axis component, the Y-axis mover part and the stage; M 2 is the mass of the balanced mass component; M 3 is the mass of the gravity compensation device; J is the aforementioned two The moment of inertia of a group of pulleys in the group of pulleys.
在一些實施例中,重力補償裝置包含氣缸、推桿及柔性鉸鏈,氣缸底部藉由第一氣浮墊與基礎框架連接,柔性鉸鏈位於推桿頂部,前述柔性鉸鏈的頂部為氣浮面,前述氣浮面與前述底座的底面氣浮接觸。 In some embodiments, the gravity compensation device includes a cylinder, a push rod, and a flexible hinge. The bottom of the cylinder is connected to the base frame through a first air float pad. The flexible hinge is located on the top of the push rod. The top of the flexible hinge is an air float surface. The floating surface is in air floating contact with the bottom surface of the aforementioned base.
在一些實施例中,重力補償裝置進一步包含壓力感測器及比例調壓閥,壓力感測器位於氣缸內部,且設置為檢測前述氣缸內部的氣壓波動;比例調壓閥設置為根據檢測到的前述氣缸內部的氣壓波動,調整前述氣缸內的氣壓,維持氣缸內氣壓恒定。 In some embodiments, the gravity compensation device further includes a pressure sensor and a proportional pressure regulating valve, the pressure sensor is located inside the cylinder, and is configured to detect the air pressure fluctuation inside the cylinder; the proportional pressure regulating valve is set to The air pressure inside the cylinder fluctuates to adjust the air pressure in the cylinder to maintain a constant air pressure in the cylinder.
在一些實施例中,前述氣缸缸體及前述推桿材料包含鋁合金或不銹鋼。 In some embodiments, the cylinder block and the push rod material include aluminum alloy or stainless steel.
在一些實施例中,推桿為蜂窩狀結構。 In some embodiments, the push rod has a honeycomb structure.
在一些實施例中,X軸定子部分藉由氣浮支撐導軌支撐於底座上,X軸定子部分可沿氣浮支撐導軌運動。 In some embodiments, the X-axis stator part is supported on the base by the air-float support rail, and the X-axis stator part can move along the air-float support rail.
在一些實施例中,平衡質量組件藉由第二氣浮墊支撐於基礎框架上。 In some embodiments, the balanced mass component is supported on the base frame by the second air float cushion.
在一些實施例中,該工件台系統進一步包含減震單元,前述減震單元位於基礎框架底部;前述減震單元包含多個減震器,多個前述減震器均勻分布在前述基礎 框架底部。 In some embodiments, the workpiece table system further includes a shock absorbing unit, the aforementioned shock absorbing unit is located at the bottom of the base frame; the aforementioned shock absorbing unit includes a plurality of shock absorbers, and the plurality of shock absorbers are evenly distributed at the bottom of the base frame.
第二方面,本發明實施例亦提供一種光刻設備,其特徵係其包含載物台,以及如本發明第一方面任意所述的工件台系統。 In a second aspect, an embodiment of the present invention also provides a lithographic apparatus, which is characterized in that it includes a stage and a workpiece stage system according to any one of the first aspects of the present invention.
本發明實施例提供的工件台系統在不增加底座厚度的前提下,利用平衡質量組件的運動,藉由傳動裝置驅動重力補償裝置與於運動組件的動子部分同步運動,對底座上的負載進行即時重力補償,減小甚至消除負載運動導致的底座變形,進而減少甚至消除底座變形對運動組件運動精度的影響,進而保證曝光精度,降低設備的故障機率。 The workpiece table system provided by the embodiment of the invention does not increase the thickness of the base, uses the movement of the balanced mass component, and drives the gravity compensation device to synchronize the movement of the mover part of the moving component by the transmission device to carry out the load on the base Instant gravity compensation reduces or even eliminates the deformation of the base caused by the load movement, thereby reducing or even eliminating the influence of the base deformation on the motion accuracy of the moving component, thereby ensuring the exposure accuracy and reducing the probability of equipment failure.
10‧‧‧X軸組件 10‧‧‧X axis assembly
100‧‧‧基礎框架 100‧‧‧Basic framework
1000‧‧‧第二氣浮墊 1000‧‧‧second air cushion
20‧‧‧Y軸組件 20‧‧‧Y axis assembly
200‧‧‧底座 200‧‧‧Base
30‧‧‧載物台 30‧‧‧stage
300‧‧‧X軸組件 300‧‧‧X axis assembly
301‧‧‧X軸定子部分 301‧‧‧X-axis stator part
302‧‧‧X軸動子部分 302‧‧‧X axis mover part
303‧‧‧氣浮支撐導軌 303‧‧‧Air float support rail
304‧‧‧滑塊 304‧‧‧slider
40‧‧‧氣浮支撐導軌 40‧‧‧Air float support rail
400‧‧‧Y軸組件 400‧‧‧Y axis assembly
401‧‧‧Y軸定子部分 401‧‧‧Y-axis stator part
402‧‧‧Y軸動子部分 402‧‧‧Y axis mover part
50‧‧‧底座 50‧‧‧Base
500‧‧‧載物台 500‧‧‧stage
600‧‧‧平衡質量組件 600‧‧‧Balanced quality components
700‧‧‧重力補償裝置 700‧‧‧Gravity compensation device
701‧‧‧氣缸 701‧‧‧ cylinder
702‧‧‧推桿 702‧‧‧Putter
7011‧‧‧第一氣浮墊 7011‧‧‧First air cushion
703‧‧‧柔性鉸鏈 703‧‧‧flexible hinge
7031‧‧‧氣浮面 7031‧‧‧Floating surface
704‧‧‧壓力感測器 704‧‧‧pressure sensor
801‧‧‧第一帶輪 801‧‧‧The first pulley
802‧‧‧第二帶輪 802‧‧‧The second pulley
90‧‧‧減震單元 90‧‧‧Shock absorption unit
900‧‧‧減震器 900‧‧‧Shock absorber
901‧‧‧第一傳動帶 901‧‧‧ First transmission belt
902‧‧‧第二傳動帶 902‧‧‧Second transmission belt
R1‧‧‧第一帶輪的半徑 R 1 ‧‧‧ radius of the first pulley
R2‧‧‧第二帶輪的半徑 R 2 ‧‧‧ radius of the second pulley
【圖1】是相關技術的工件台在X軸方向的縱向剖面結構示意圖。 [Figure 1] is a schematic diagram of a longitudinal cross-sectional structure of a related-art workpiece table in the X-axis direction.
【圖2】是圖1在Y軸方向的縱向剖面結構示意圖。 [FIG. 2] is a schematic diagram of the longitudinal cross-sectional structure of FIG. 1 in the Y-axis direction.
【圖3】是本發明實施例中的工件台系統在X軸方向的縱向剖面結構示意圖。 Fig. 3 is a schematic diagram of the longitudinal cross-sectional structure of the workpiece table system in the embodiment of the present invention in the X-axis direction.
【圖4】是圖3在Y軸方向的縱向剖面結構示意圖。 [FIG. 4] is a schematic diagram of the longitudinal cross-sectional structure of FIG. 3 in the Y-axis direction.
【圖5】是本發明實施例中的傳動裝置的結構示意圖。 [Figure 5] is a schematic structural diagram of a transmission device in an embodiment of the present invention.
【圖6】是本發明實施例中重力補償裝置的結構示意圖。 [Fig. 6] is a schematic structural diagram of a gravity compensation device according to an embodiment of the present invention.
【圖7】是本發明實施例中重力補償裝置的氣壓控制系統的結構示意圖。 7 is a schematic structural diagram of the air pressure control system of the gravity compensation device in the embodiment of the present invention.
以下結合圖式及實施例對本說明書作進一步的詳細說明。可以理解的是,此處所描述的具體實施例僅僅用於解釋本說明書,而非對本說明書的限定。另外亦須說明的是,為了便於描述,圖式中僅示出與本說明書相關的部分而非全部結構。 The specification will be further described in detail below with reference to the drawings and examples. It can be understood that the specific embodiments described herein are only used to explain this specification, not to limit this specification. In addition, it should also be noted that, in order to facilitate description, the drawings only show parts but not all structures related to this specification.
本發明實施例提供一種工件台系統,圖3是本發明實施例中的工件台系統在X軸方向的縱向剖面結構示意圖,圖4是圖3在Y軸方向的縱向剖面結構示意圖,參考圖3及圖4,該工件台系統包含:基礎框架100、底座200、運動組件、載物台500、平衡質量組件600、重力補償裝置700及傳動裝置。 An embodiment of the present invention provides a workpiece table system. FIG. 3 is a schematic diagram of the longitudinal cross-sectional structure of the workpiece table system in the X-axis direction in the embodiment of the present invention. FIG. 4 is a schematic diagram of the longitudinal cross-sectional structure of FIG. 3 in the Y-axis direction. 4, the workpiece table system includes: a
其中,底座200藉由支撐件固定在基礎框架100上,底座200的底面與基礎框架100的上表面存在一定距離。運動組件包含X軸組件300及Y軸組件400,X軸組件300包含X軸定子部分301及X軸動子部分302,Y軸組件400包含Y軸定子部分401及Y軸動子部分402,載物台500藉由設置在X軸動子部分302上實現在X軸定子部分301上的X向(亦即,X方向)運動,X軸定子部分301藉由連接Y軸動子部分402實現在Y軸定子部分401上的Y向(亦即,Y方向)運動,X軸定子部分301藉由氣浮支撐於底座200上。Y軸定子部分401形成在平衡質量組件600上,可選的,Y軸定子部分401開設有導軌槽,Y軸動子部分402與導軌槽藉由氣浮軸承連接,Y軸動子部分402在導軌槽內沿Y方向運動,進而帶動X軸定子部分301沿Y方向運動。平衡質量組件600可 動地設置於基礎框架100上,可選的,平衡質量組件600氣浮支撐在基礎框架100上。當Y軸動子部分402加速運動時,產生的反向作用力驅動平衡質量組件600發生與Y軸動子部分402運動方向相反的反向運動,以此平衡Y軸動子部分402沿Y方向加速運動時產生的反向作用力。重力補償裝置700對應於X軸動子部分302設於基礎框架100與底座200之間,重力補償裝置700藉由傳動裝置與平衡質量組件600連接。當平衡質量組件600運動時,藉由傳動裝置驅動重力補償裝置700與X軸動子部分302同步同向運動,重力補償裝置700對底座200上的負載(包含X軸組件300、Y軸動子部分402及載物台500在底座200上產生的負載)進行垂向的重力補償,能夠減小甚至消除負載運動導致的底座200變形,進而減少甚至消除底座200變形對X軸動子部分302運動精度的影響,進而保證曝光精度,降低設備的故障機率,避免增加底座剛度及厚度以克服底座200變形所帶來的空間要求高、成本高等不利影響。 Wherein, the
須說明的是,由於運動組件的長行程運動在底座200上產生的負載對底座200面型的變化影響較大,故在本實施例及後續的實施例中,以重力補償裝置700沿Y方向與載物台500同步同向運動,對底座200上的負載進行垂向的重力補償為例,對本說明書的方案進行說明。事實上,重力補償裝置700也可以與載物台500同步同向運動(包含X方向及Y方向),在此,本說明書不再贅述。可理解的是,在本發明實施例中,前述X方向與前述Y方向呈夾角設置,前述X方向與前述Y方向可以垂直設置。前述X方向與前述Y方向可以均與垂直方向垂直。 It should be noted that, since the load generated by the long-stroke movement of the motion component on the
本發明實施例提供的工件台系統在不增加底座厚度的前提 下,利用平衡質量組件的運動,藉由傳動裝置驅動重力補償裝置與載物台同步運動,對底座上的負載進行即時重力補償,減小甚至消除負載運動導致的底座變形,進而減少甚至消除底座變形對運動組件運動精度的影響,進而保證曝光精度,降低設備的故障機率。 The workpiece table system provided by the embodiment of the invention does not increase the thickness of the base, uses the motion of the balanced mass component, and drives the gravity compensation device to synchronize the movement with the carrier table by the transmission device to perform real-time gravity compensation on the load on the base. Reduce or even eliminate the deformation of the base caused by the load movement, thereby reducing or even eliminating the influence of the deformation of the base on the movement accuracy of the moving component, thereby ensuring the exposure accuracy, and reducing the probability of equipment failure.
圖5是本發明實施例中的傳動裝置的結構示意圖,可選的,參考圖5,傳動裝置包含兩組帶輪及兩個傳動帶,每組帶輪包含同軸旋轉的第一帶輪801及第二帶輪802。兩組帶輪中的第一帶輪801藉由第一傳動帶901連接,兩組帶輪中第二帶輪802藉由第二傳動帶902連接。第二帶輪802的半徑大於第一帶輪801的半徑,第一帶輪801與第二帶輪802的轉動角速度相等。平衡質量組件600藉由轉接件與第一傳動帶901連接,重力補償裝置700藉由轉接件與第二傳動帶902連接。當Y軸動子部分402沿Y方向運動時,產生的反向作用力驅動平衡質量組件600產生與Y軸動子部分402運動方向相反的運動,平衡質量組件600帶動第一傳動帶901運動,第一傳動帶901帶動兩組帶輪轉動,進而帶動第二傳動帶902上的重力補償裝置700與X軸定子部分301同步運動,重力補償裝置700對底座200上的負載(包含X軸組件300、Y軸組件400的動子部分402及載物台500在底座200上產生的負載)進行垂向的重力補償。 FIG. 5 is a schematic structural diagram of a transmission device in an embodiment of the present invention. Optionally, referring to FIG. 5, the transmission device includes two sets of pulleys and two transmission belts, and each set of pulleys includes a coaxially rotating
須說明的是,前述轉接件只需要起到連接作用即可,一般為剛性零件,前述轉接件具體可以為螺釘、螺栓等。 It should be noted that the aforementioned adapter only needs to play a connecting role, which is generally a rigid part, and the aforementioned adapter may specifically be a screw or a bolt.
可選的,第二帶輪802的半徑R2與第一帶輪801的半徑R1的比值滿足如下關係:
其中,M1為底座200上的負載,即前述X軸組件300、Y軸動子部分402及載物台500的質量和;M2為平衡質量組件600的質量;M3為重力補償裝置700的質量;J為前述兩組帶輪中的一組帶輪的轉動慣量,J只與該組帶輪中兩個帶輪的質量及半徑有關,帶輪質量為已知量。 Where, M 1 is the load on the
具體的,傳動裝置的系統總能量為:
其中,ω為帶輪的轉動角速度;將傳動裝置的系統總能量E折算到M2的當量質量M2 ’上,得到M2的當量質量M2 ’。 Where, [omega] is the angular velocity of rotation of the pulley; total energy E of the transmission system is converted to the equivalent mass of M 2 M 2 ', the equivalent weight to obtain M 2 M 2'.
根據動量守恆定律M 1 V 1=M 2 ’V 2 According to the law of conservation of momentum M 1 V 1 = M 2 ' V 2
如需要保證M1與M3速度一致,則第二帶輪802的半徑R2與第一帶輪801的半徑R1的比值滿足如下關係:
其中,M1、M2、M3為已知量,J只與該組帶輪中兩個帶輪的質量及半徑有關,帶輪質量為已知量。因此,可以根據需要,選擇其中一個帶輪(例如第一帶輪801)的半徑R1的數值,再根據上述R1與R2的關係,計算出R2的半徑。 Among them, M 1 , M 2 , and M 3 are known quantities, and J is only related to the mass and radius of two pulleys in the set of pulleys, and the pulley mass is a known quantity. Thus, as needed, select one of the pulleys the radius value (e.g., a first pulley 801), R 1, and then according to the relationship between the R 1 and R 2, the radius R 2 is calculated.
須說明的是,圖5所示的傳動裝置僅僅是對本發明實施例 的一種示例性說明,在本發明其他實施例中,傳動裝置也可以是其他的形式,只要能夠保證平衡質量組件藉由傳動裝置驅動重力補償裝置與Y軸組件的動子部分同步運動即可。 It should be noted that the transmission device shown in FIG. 5 is only an exemplary description of the embodiment of the present invention. In other embodiments of the present invention, the transmission device may also be in other forms, as long as the balanced quality component can be guaranteed by transmission The device drives the gravity compensation device to move synchronously with the mover part of the Y-axis assembly.
圖6是本發明實施例中重力補償裝置的結構示意圖,參考圖6,可選的,重力補償裝置700包含氣缸701、推桿702及柔性鉸鏈703,氣缸701底部藉由第一氣浮墊7011與基礎框架100連接,柔性鉸鏈703位於推桿702頂部,柔性鉸鏈703的頂部為氣浮面7031,與底座200的底面氣浮接觸。其中,在該實施例中,柔性鉸鏈703為柔性鉸鏈塊,可沿Rx、Ry、Rz扭轉,用於適應底座200的面型變化。如此,重力補償裝置700可以在基礎框架100與底座200之間,在傳動裝置的帶動下,沿Y方向與X軸定子部分301同步運動。另外,須說明的是,前述柔性鉸鏈703也可以是標準球形鉸鏈,其工作原理在此不再贅述。 FIG. 6 is a schematic structural diagram of a gravity compensation device according to an embodiment of the present invention. Referring to FIG. 6, optionally, the
具體可以根據負載設計不同的氣缸701的氣壓及推桿702的直徑,實現重力補償效果。當重力補償器活塞直徑為100mm、氣壓為5bar時產生的推力為F=3925N,可以支撐392.5Kg的負載。 Specifically, the air pressure of the
圖7是本發明實施例中重力補償裝置的氣壓控制系統的結構示意圖,參考圖6及圖7,可選的,重力補償裝置700亦包含壓力感測器704及比例調壓閥705。重力補償裝置的氣壓控制系統亦包含氣控箱706及PID控制器707(比例-積分-微分控制器)。氣控箱706用於向氣缸701輸送氣體;壓力感測器704位於氣缸701內部,用於檢測氣缸701內部的氣壓波動;PID控制器707用於接收壓力感測器704檢測的氣壓波動數據,並根據氣壓波動數據向比例調壓閥705發送控制訊息,比例調壓閥 705根據該控制訊息控制閥門開度,進而調整氣缸701內的氣壓,維持氣缸701內氣壓恒定。由於重力補償裝置700在Y方向運動時,會導致氣缸701內氣壓波動,導致底座面型變化,採用此重力補償裝置700的氣壓控制系統檢測氣缸701內的氣壓波動,並藉由比例調壓閥即時調節氣缸701內的氣壓,維持氣缸701內氣壓恒定,進而維持推桿702推力(對底座200上的負載補償)恒定。 7 is a schematic structural diagram of an air pressure control system of a gravity compensation device according to an embodiment of the present invention. Referring to FIGS. 6 and 7, optionally, the
可選的,繼續參考圖7,重力補償裝置的氣壓控制系統亦包含消音裝置708及前饋控制模組709。其中消音裝置708用於降低比例調壓閥705動作時產生的噪音;前饋控制模組709與比例調壓閥705連接,用於測量干擾量(例如氣控箱706輸出氣壓的波動變化)的變化,並經計算,直接克服干擾量對比例調壓閥705輸出的控制訊息的影響,使控制訊息不受干擾或少受干擾的影響,進而保證氣缸701內氣壓恒定。 Optionally, with continued reference to FIG. 7, the air pressure control system of the gravity compensation device also includes a
可選的,氣缸701缸體及推桿702的材料包含鋁合金、不銹鋼等強度及剛度較大的材料。 Optionally, the materials of the
可選的,在不損失垂向剛度的前提下,可將推桿702做輕量化設計。在其中一個實施例中,推桿702採用3D列印技術,做成蜂窩狀結構。 Optionally, without loss of vertical rigidity, the
可選的,繼續參考圖3及圖4,X軸定子部分301藉由多條平行的氣浮支撐導軌303支撐於底座200上,X軸定子部分301的底面設有與氣浮支撐導軌303配合的滑塊304,氣浮支撐導軌303與滑塊304藉由氣浮軸承連接,滑塊304可以在氣浮支撐導軌303上來回滑動,實現X軸定子部分301沿Y方向運動。可選的,X軸動子部分302可以藉由氣 浮軸承與X軸定子部分301連接,以實現在X方向運動。 Optionally, with continued reference to FIGS. 3 and 4, the
可選的,繼續參考圖3及圖4,平衡質量組件600藉由第二氣浮墊1000支撐於基礎框架100上。當Y軸動子部分402在Y方向加速運動時,其產生的反向作用力作用在Y軸定子部分401上,進而帶動平衡質量組件600產生與Y軸動子部分402運動方向相反的運動。平衡質量組件600用於平衡Y軸動子部分402在Y方向加速運動時產生的作用力,避免該反向作用力直接作用在基礎框架100上,提高工件台系統行程組件的位移精度。 Optionally, with continued reference to FIGS. 3 and 4, the balanced
可選的,繼續參考圖3及圖4,該工件台系統亦包含減震單元90,減震單元90包含多個減震器900,均勻分布在基礎框架100底部,用於吸收地面震動的能量,避免地面震動影響基礎框架100,保證曝光精度。 Optionally, with continued reference to FIGS. 3 and 4, the workpiece table system also includes a
本發明實施例亦提供一種光刻設備,包含載物台,以及如本發明上述任意實施例提供的工件台系統。 An embodiment of the present invention also provides a lithographic apparatus, including a stage, and a workpiece stage system as provided in any of the above embodiments of the present invention.
100‧‧‧基礎框架 100‧‧‧Basic framework
1000‧‧‧第二氣浮墊 1000‧‧‧second air cushion
200‧‧‧底座 200‧‧‧Base
300‧‧‧X軸組件 300‧‧‧X axis assembly
301‧‧‧X軸定子部分 301‧‧‧X-axis stator part
302‧‧‧X軸動子部分 302‧‧‧X axis mover part
303‧‧‧氣浮支撐導軌 303‧‧‧Air float support rail
304‧‧‧滑塊 304‧‧‧slider
400‧‧‧Y軸組件 400‧‧‧Y axis assembly
401‧‧‧Y軸定子部分 401‧‧‧Y-axis stator part
402‧‧‧Y軸動子部分 402‧‧‧Y axis mover part
500‧‧‧載物台 500‧‧‧stage
600‧‧‧平衡質量組件 600‧‧‧Balanced quality components
700‧‧‧重力補償裝置 700‧‧‧Gravity compensation device
90‧‧‧減震單元 90‧‧‧Shock absorption unit
900‧‧‧減震器 900‧‧‧Shock absorber
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