CN110658688A - Workpiece table system and photoetching equipment - Google Patents
Workpiece table system and photoetching equipment Download PDFInfo
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- CN110658688A CN110658688A CN201810714722.1A CN201810714722A CN110658688A CN 110658688 A CN110658688 A CN 110658688A CN 201810714722 A CN201810714722 A CN 201810714722A CN 110658688 A CN110658688 A CN 110658688A
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- base
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- assembly
- gravity compensation
- balance mass
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Abstract
The invention discloses a workpiece table system and a photoetching device, wherein the workpiece table system comprises a basic frame, a base, a motion assembly, a balance mass assembly, a gravity compensation device and a transmission device; the base is fixed on the basic frame; the motion assembly is used for providing driving force for the motion of the object stage; the balance mass component is movably arranged on the base frame; the stator part of the moving assembly is fixed on the balance mass assembly, the rotor part drives the object carrying table to move relative to the stator part, and the reverse acting force drives the balance mass assembly to move in the opposite direction; the gravity compensation device is positioned between the base frame and the base and is used for performing vertical gravity compensation on the load on the base; the balance mass component drives the gravity compensation device to synchronously move in the same direction as the objective table through the transmission device. According to the invention, on the premise of not increasing the thickness of the base, the balance mass is used for driving the gravity compensation device to perform real-time gravity compensation on the load on the base, so that the deformation of the base caused by the motion of the load is reduced or even eliminated.
Description
Technical Field
The embodiment of the invention relates to the technical field of semiconductor manufacturing equipment, in particular to a workpiece table system and photoetching equipment.
Background
A lithographic apparatus is a device that images a mask pattern exposed onto a silicon wafer, primarily for the manufacture of Integrated Circuits (ICs) or other microdevices. What plays a very important role in lithography devices is the workpiece stage system, which is used to carry silicon wafers and perform precise movements to meet lithography requirements in step and scan lithography machines. In the lithography equipment, the workpiece stage is responsible for the precise movement of the silicon wafer, and a coarse and fine positioning mode is generally adopted, namely a long-stroke coarse moving stage realizes long-distance coarse positioning, and a micro moving stage realizes nano-scale precise positioning. The micro-motion platform is used for bearing the silicon chip, and the silicon chip is enabled to finish the tasks of alignment, leveling and focusing through the six-degree-of-freedom precise adjustment and positioning in the horizontal direction and the vertical direction.
Fig. 1 is a schematic diagram showing a longitudinal cross-sectional structure of a workpiece stage in the X-axis direction in the prior art, fig. 2 is a schematic diagram showing a longitudinal cross-sectional structure of the workpiece stage in the Y-axis direction in fig. 1, and referring to fig. 1 and fig. 2, the weight of an X-axis assembly 10, a Y-axis assembly 20 and an object stage 30 of the workpiece stage is all supported on a base 50 through an air-float support rail 40, and the Y-direction long-stroke movement of the Y-axis assembly 20 drives the whole X-axis assembly 10 and the object stage 30 to move together along the Y. In this way, the load generated by the X-axis assembly 10, the Y-axis assembly 20 and the stage 30 on the base 50 may cause the surface shape of the base 50 to change, which may further cause the surface shape of the air-floatation support rail 40 of the Y-axis assembly 20 to change, thereby affecting the motion accuracy of the stroke assembly and finally affecting the exposure accuracy. In addition, the surface shape of the air supporting guide rail 40 is well formed when the air supporting guide rail is loaded at a fixed position, and if the air supporting guide rail is seriously deformed, the air supporting guide rail is blocked, so that the equipment fails and cannot normally run. The surface shape change of the base 50 caused by the load position change can be reduced only by improving the rigidity of the base, and if the load and the stroke are large, the base 50 needs to have enough rigidity, namely enough thickness, to ensure the air floatation performance. However, with the advance of the technology, the weight and the operation speed of the stroke assembly are increased accordingly, and the simple increase of the thickness of the base 50 cannot meet the requirement of the exposure precision, and the design difficulty of the workpiece stage is also increased.
Therefore, it is desirable to consider how the deformation of the base 50 caused by the movement of the load can be more effectively reduced or even eliminated without increasing the thickness of the base 50.
Disclosure of Invention
The invention provides a workpiece stage system and a photoetching device, which are used for compensating a load generated by a base by a stroke assembly on the base in real time, reducing or even eliminating base deformation caused by load movement, further ensuring exposure precision and reducing the failure probability of the device.
In a first aspect, an embodiment of the present invention provides a workpiece stage system, where the workpiece stage system includes:
a base frame;
the base is fixed on the base frame and used for providing support for the movement of the object stage;
the motion assembly is used for providing driving force for the motion of the object stage;
the balance mass component is movably arranged on the basic frame; the moving assembly comprises a rotor part and a stator part, the stator part is fixed on the balance mass assembly, the rotor part is used for connecting an object carrying table, the rotor part drives the object carrying table to move relative to the stator part, and the counter acting force generated during movement drives the balance mass assembly to move in a direction opposite to the moving direction of the rotor part;
the gravity compensation device is positioned between the base frame and the base and is used for performing vertical gravity compensation on the load on the base;
and the transmission device is used for connecting the balance mass component and the gravity compensation device, and the balance mass component drives the gravity compensation device to synchronously and equidirectionally move with the objective table through the transmission device.
Optionally, the motion assembly includes a Y-axis assembly and an X-axis assembly, the Y-axis assembly includes a Y-axis stator portion and a Y-axis mover portion, and the X-axis assembly includes an X-axis stator portion and an X-axis mover portion; the objective table is arranged on the X-axis moving part to realize X-direction movement on the X-axis stator part, the X-axis stator part is connected with the Y-axis moving part to realize Y-direction movement on the Y-axis stator part, the Y-axis stator part is fixed on the balance mass component, and the X-axis stator part is supported on the base.
Optionally, the transmission device includes two sets of belt wheels and two transmission belts, and each set of belt wheel includes a first belt wheel and a second belt wheel which rotate coaxially; the two first belt wheels are connected through a first transmission belt, and the two second belt wheels are connected through a second transmission belt; the radius of the second belt wheel is larger than that of the first belt wheel, and the rotating angular speeds of the first belt wheel and the second belt wheel are equal; the balance mass component is connected with the first transmission belt through the adapter piece, and the gravity compensation device is connected with the second transmission belt through the adapter piece.
Optionally, radius R of the second pulley2And radius R of the first pulley1The ratio of (A) satisfies the following relationship:
wherein M is1The load on the base, namely the mass sum of the X-axis component, the Y-axis dynamic part and the objective table; m2To balance the mass of the mass assembly; m3Is the mass of the gravity compensation device; j is the moment of inertia of one set of pulleys.
Optionally, the gravity compensation device comprises an air cylinder, a push rod and a flexible hinge, the bottom of the air cylinder is connected with the base frame through an air floating cushion, the flexible hinge is located at the top of the push rod, and the top of the flexible hinge is an air floating surface.
Optionally, the gravity compensation device further comprises a pressure sensor and a proportional pressure regulating valve, wherein the pressure sensor is located inside the cylinder and used for detecting air pressure fluctuation inside the cylinder; the proportional pressure regulating valve is used for regulating the air pressure in the air cylinder according to the detected air pressure fluctuation in the air cylinder and maintaining the air pressure in the air cylinder to be constant.
Optionally, the cylinder block and the push rod material comprise aluminum alloy or stainless steel.
Optionally, the push rod is of a honeycomb structure.
Optionally, the X-axis stator part is supported on the base through an air-floatation support guide rail, and the X-axis stator part can move along the Y direction of the air-floatation support guide rail.
Optionally, the balance mass assembly is supported on the base frame by an air-bearing cushion.
Optionally, the workpiece stage system further includes a damping unit located at the bottom of the base frame.
In a second aspect, embodiments of the invention also provide a lithographic apparatus comprising a workpiece table system as described in any of the first aspects of the invention.
The workpiece table system provided by the embodiment of the invention utilizes the motion of the balance mass assembly on the premise of not increasing the thickness of the base, drives the gravity compensation device to synchronously move with the rotor part of the motion assembly through the transmission device, carries out real-time gravity compensation on the load on the base, reduces or even eliminates the deformation of the base caused by the motion of the load, further reduces or even eliminates the influence of the deformation of the base on the motion precision of the motion assembly, further ensures the exposure precision and reduces the fault probability of equipment.
Drawings
FIG. 1 is a schematic diagram of a longitudinal cross-sectional structure of a prior art workpiece stage in the X-axis direction;
FIG. 2 is a schematic longitudinal sectional view of FIG. 1 in the Y-axis direction;
FIG. 3 is a schematic diagram of a longitudinal cross-sectional view of a workpiece stage system in an embodiment of the invention in the X-axis direction;
FIG. 4 is a schematic longitudinal sectional view of FIG. 3 in the Y-axis direction;
FIG. 5 is a schematic structural view of a transmission in an embodiment of the present invention;
FIG. 6 is a schematic structural diagram of a gravity compensation device according to an embodiment of the present invention;
fig. 7 is a schematic structural diagram of an air pressure control system of the gravity compensation device according to the embodiment of the invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
An embodiment of the present invention provides a workpiece stage system, fig. 3 is a schematic longitudinal sectional structure view of the workpiece stage system in an X-axis direction in an embodiment of the present invention, fig. 4 is a schematic longitudinal sectional structure view of fig. 3 in a Y-axis direction, and referring to fig. 3 and fig. 4, the workpiece stage system includes: a base frame 100, a base 200, a motion assembly, a stage 500, a balance mass assembly 600, a gravity compensation device 700, and a transmission device (not shown).
Wherein, the base 200 is fixed on the base frame 100 by a support, and a certain distance exists between the bottom surface of the base 200 and the upper surface of the base frame 100. The motion assembly comprises an X-axis assembly 300 and a Y-axis assembly 400, the X-axis assembly 300 comprises an X-axis stator part 301 and an X-axis moving part 302, the Y-axis assembly 400 comprises a Y-axis stator part 401 and a Y-axis moving part 402, the object stage 500 realizes X-direction motion on the X-axis stator part 301 by being arranged on the X-axis moving part 302, the X-axis stator part 301 realizes Y-direction motion on the Y-axis stator part 401 by being connected with the Y-axis moving part 402, and the X-axis stator part 301 is supported on the base 200 through air flotation. The Y-axis stator portion 401 is formed on the balance mass assembly 600, and optionally, the Y-axis stator portion 401 is provided with a guide rail groove, the Y-axis mover portion 402 is connected with the guide rail groove through an air bearing, and the Y-axis mover portion 402 moves in the guide rail groove along the Y direction, thereby driving the X-axis stator portion 301 to move along the Y direction. The balance mass assembly 600 is movably disposed on the base frame 100, and preferably, the balance mass assembly 600 is air-floated on the base frame 100. When the Y-axis mover portion 402 is accelerated, the generated counter force drives the balance mass assembly 600 to generate a counter motion opposite to the moving direction of the Y-axis mover portion 402, thereby balancing the counter force generated when the Y-axis mover portion 402 is accelerated in the Y-direction. The gravity compensation device 700 is disposed between the base frame 100 and the base 200 corresponding to the X-axis mover portion 301, and the gravity compensation device 700 is connected to the balance mass assembly 600 through a transmission. When the balance mass assembly 600 moves, the gravity compensation device 700 and the X-axis dynamic part 301 are driven by the transmission device to synchronously move in the same direction, the gravity compensation device 700 performs vertical gravity compensation on loads on the base 200 (including loads generated by the X-axis assembly 300, the Y-axis dynamic part 402 and the objective table 500 on the base 200), so that the deformation of the base 200 caused by the load movement can be reduced or even eliminated, the influence of the deformation of the base 200 on the movement precision of the X-axis dynamic part 301 is reduced or even eliminated, the exposure precision is ensured, the fault probability of the equipment is reduced, and the adverse effects of high space requirement, high cost and the like caused by the deformation of the base 200 due to the increase of the rigidity and the thickness of the base are avoided.
It should be noted that, since the load generated on the base 200 by the long-stroke motion of the motion assembly has a great influence on the change of the surface shape of the base 200, in this embodiment and the following embodiments, the gravity compensation device 700 synchronously moves along the Y direction and the object stage 500 in the same direction, and performs vertical gravity compensation on the load on the base 200 as an example, the solution of the present invention is described. In fact, the gravity compensation device 700 can also move synchronously and in the same direction (including the X direction and the Y direction) with the object stage 500, and the detailed description of the invention is omitted here.
The workpiece table system provided by the embodiment of the invention utilizes the motion of the balance mass component on the premise of not increasing the thickness of the base, drives the gravity compensation device and the objective table to synchronously move through the transmission device, performs real-time gravity compensation on the load on the base, reduces or even eliminates the deformation of the base caused by the motion of the load, further reduces or even eliminates the influence of the deformation of the base on the motion precision of the motion component, further ensures the exposure precision and reduces the fault probability of equipment.
Fig. 5 is a schematic structural view of a transmission in an embodiment of the present invention, and alternatively, referring to fig. 5, the transmission includes two sets of pulleys, each set including a first pulley 801 and a second pulley 802 that rotate coaxially. The first pulley 801 of the two sets of pulleys is connected by a first belt and the second pulley 802 of the two sets of pulleys is connected by a second belt. The radius of the second pulley 802 is larger than that of the first pulley 801, and the rotational angular velocities of the first pulley 801 and the second pulley 802 are equal. The balancing mass assembly 600 is connected to the first drive belt via an adapter (not shown), and the gravity compensation device 700 is connected to the second drive belt via an adapter (not shown). When the Y-axis actuator portion 402 moves along the Y direction, the generated reverse acting force drives the balance mass assembly 600 to generate a motion opposite to the motion direction of the Y-axis actuator portion 402, the balance mass assembly 600 drives the first transmission belt to move, the first transmission belt drives the two sets of pulleys to rotate, and further drives the gravity compensation device 700 on the second transmission belt to move synchronously with the X-axis stator portion 301, and the gravity compensation device 700 performs vertical gravity compensation on the load on the base 200 (including the X-axis assembly 300, the actuator portion 402 of the Y-axis assembly 400, and the load generated by the stage 500 on the base 200).
Optionally, the radius R of the secondary pulley 8022And radius R of the first pulley 8011Has a ratio ofThe following relationships:
wherein M is1Is the load on the base 200, i.e., the sum of the masses of the X-axis assembly 300, Y-axis mover portion 402, and stage 500; m2To balance the mass of the mass assembly 600; m3The mass of gravity compensation device 700; j is the moment of inertia of one set of pulleys, J is related only to the mass and radius of two pulleys in the set, and the pulley mass is a known quantity.
Specifically, the total system energy of the transmission device is as follows:
wherein ω is the rotational angular velocity of the pulley;
converting the total system energy E of the transmission to M2Equivalent mass M of2' to obtain M2Equivalent mass M of2’。
According to law of conservation of momentum M1V1＝2’V2
If necessary, guarantee M1And M3The speeds are the same, then the radius R of the second pulley 802 is2And radius R of the first pulley 8011The ratio of (A) satisfies the following relationship:
wherein M is1、M2、M3J is a known quantity related only to the mass and radius of two pulleys in the set of pulleys, the pulley mass being a known quantity. Thus, the radius R of one of the pulleys (e.g., the first pulley 801) can be selected as desired1According to the aboveR is1And R2Calculating R2Of (c) is used.
It should be noted that the transmission device shown in fig. 5 is only an exemplary illustration of an embodiment of the present invention, and in other embodiments of the present invention, the transmission device may also be in other forms, which is not limited in this respect as long as it is ensured that the balance mass assembly drives the gravity compensation device through the transmission device to move synchronously with the mover portion of the Y-axis assembly.
Fig. 6 is a schematic structural diagram of the gravity compensation device in the embodiment of the present invention, referring to fig. 6, optionally, the gravity compensation device 700 includes an air cylinder 701, a push rod 702, and a flexible hinge 703, the bottom of the air cylinder 701 is connected to the base frame 100 through an air floating pad, the flexible hinge 703 is located at the top of the push rod 702, and the top of the flexible hinge 703 is an air floating surface and in air floating contact with the bottom surface of the base 200. In this embodiment, the flexible hinge 703 is a flexible hinge block that can be twisted along Rx, Ry, Rz for accommodating the face shape change of the base 200. In this way, the gravity compensation device 700 can move synchronously with the X-axis stator portion 301 in the Y direction between the base frame 100 and the base 200 by the driving device. In addition, it should be noted that the flexible hinge 703 may also be a standard spherical hinge, and the working principle thereof is not described herein again.
Specifically, the air pressure of the air cylinder 701 and the diameter of the push rod 702 can be designed according to different loads, so that the gravity compensation effect is realized. When the piston diameter of the gravity compensator is 100mm and the air pressure is 5bar, the generated thrust is 3925N, and 392.5Kg of load can be supported.
Fig. 7 is a schematic structural diagram of a pneumatic control system of the gravity compensation device in the embodiment of the present invention, and referring to fig. 6 and 7, the gravity compensation device 700 further includes a pressure sensor 704 and a proportional pressure regulating valve 705. The pneumatic control system of the gravity compensation device further comprises a pneumatic control box 706 and a PID controller 707 (proportional-integral-derivative controller). The pneumatic control box 706 is used for conveying gas to the cylinder 701; a pressure sensor 704 is located inside the cylinder 701 for detecting air pressure fluctuations inside the cylinder 701; the PID controller 707 receives the air pressure fluctuation data detected by the pressure sensor 704, and sends control information to the proportional pressure regulating valve 705 according to the air pressure fluctuation data, and the proportional pressure regulating valve 705 controls the valve opening according to the control information, thereby adjusting the air pressure in the cylinder 701 and maintaining the air pressure in the cylinder 701 constant. Because the air pressure in the air cylinder 701 fluctuates when the gravity compensation device 700 moves in the Y direction, which causes the surface shape of the base to change, the air pressure control system using the gravity compensation device 700 detects the air pressure fluctuation in the air cylinder 701, and adjusts the air pressure in the air cylinder 701 in real time through the proportional pressure regulating valve, so as to maintain the air pressure in the air cylinder 701 constant, and further maintain the thrust (compensating the load on the base 200) of the push rod 702 constant.
Optionally, with continued reference to fig. 7, the pneumatic control system of the gravity compensation device further includes a silencer 708 and a feedforward control module 709. Wherein, the silencing device 708 is used for reducing the noise generated when the proportional pressure regulating valve 705 acts; the feedforward control module 709 is connected to the proportional pressure regulating valve 705, and is configured to measure a change in an amount of disturbance (e.g., a fluctuation of an output air pressure of the pneumatic control box 706), and directly overcome an influence of the amount of disturbance on control information output by the proportional pressure regulating valve 705 through calculation, so that the control information is not or less affected by the disturbance, and the air pressure in the cylinder 701 is ensured to be constant.
Optionally, the cylinder body of the air cylinder 701 and the push rod 702 are made of materials with high strength and rigidity, such as aluminum alloy and stainless steel.
Optionally, the push rod 702 may be designed to be lightweight without loss of vertical stiffness. In one embodiment, the push rod 702 is formed as a honeycomb structure using 3D printing techniques.
Optionally, with continued reference to fig. 3 and 4, the X-axis stator portion 301 is supported on the base 200 by a plurality of parallel air-bearing support rails 303, a slider 304 that is engaged with the air-bearing support rails 303 is disposed on a bottom surface of the X-axis stator portion 301, the air-bearing support rails 303 are connected to the slider 304 by air-bearing bearings, and the slider 304 can slide back and forth on the air-bearing support rails 303 to realize that the X-axis stator portion 301 moves along the Y direction. Alternatively, the X-axis mover portion 302 may be coupled to the X-axis stator portion 301 through an air bearing to effect movement in the X-direction.
Alternatively, with continued reference to fig. 3 and 4, the balance mass assembly 600 is supported on the base frame 100 by an air-bearing cushion. When the Y-axis mover portion 402 is accelerated in the Y-direction, the generated reverse force acts on the Y-axis stator portion 401, thereby driving the balance mass assembly 600 to generate a motion opposite to the Y-axis mover portion 402. The balance mass assembly 600 is used for balancing acting force generated when the Y-axis dynamic part 402 accelerates in the Y direction, so that the reverse acting force is prevented from directly acting on the base frame 100, and the displacement precision of the workpiece table system stroke assembly is improved.
Optionally, with continued reference to fig. 3 and 4, the workpiece stage system further includes a shock absorption unit, where the shock absorption unit includes a plurality of shock absorbers 900, and the shock absorbers are uniformly distributed at the bottom of the base frame 100 and are used to absorb energy of ground shock, so as to prevent the ground shock from affecting the base frame 100 and ensure exposure accuracy.
Embodiments of the present invention also provide a lithographic apparatus comprising a workpiece table system as provided in any of the above embodiments of the present invention.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (12)
1. A workpiece stage system, comprising:
a base frame;
the base is fixed on the base frame and used for providing support for the movement of the object stage;
the motion assembly is used for providing driving force for the motion of the object stage;
the balance mass component is movably arranged on the base frame; the moving assembly comprises a rotor part and a stator part, the stator part is fixed on the balance mass assembly, the rotor part is used for being connected with the object stage, the object stage is driven by the rotor part to move relative to the stator part, and the balance mass assembly is driven to move in a direction opposite to the moving direction of the rotor part by the reverse acting force generated during movement;
the gravity compensation device is positioned between the base frame and the base and is used for performing vertical gravity compensation on the load on the base;
and the transmission device is used for connecting the balance mass component and the gravity compensation device, and the balance mass component drives the gravity compensation device to synchronously move in the same direction as the objective table through the transmission device.
2. The workpiece stage system of claim 1, wherein the motion assembly comprises a Y-axis assembly comprising a Y-axis stator portion and a Y-axis mover portion, and an X-axis assembly comprising an X-axis stator portion and an X-axis mover portion; the object stage realizes X-direction movement on an X-axis stator part through being arranged on an X-axis mover part, the X-axis stator part realizes Y-direction movement on a Y-axis stator part through being connected with a Y-axis mover part, the Y-axis stator part is fixed on the balance mass assembly, and the X-axis stator part is supported on the base.
3. The workpiece table system of claim 2, wherein the transmission comprises two sets of pulleys and two belts, each set of pulleys comprising a first pulley and a second pulley that rotate coaxially; the two first belt wheels are connected through a first transmission belt, and the two second belt wheels are connected through a second transmission belt; the radius of the second belt wheel is larger than that of the first belt wheel, and the rotating angular speeds of the first belt wheel and the second belt wheel are equal; the balance mass component is connected with the first transmission belt through an adapter piece, and the gravity compensation device is connected with the second transmission belt through the adapter piece.
4. According toThe workpiece table system of claim 3, wherein the radius R of the second pulley is2And radius R of the first pulley1The ratio of (A) satisfies the following relationship:
wherein M is1The load on the base is the sum of the masses of the X-axis component, the Y-axis mover component and the object stage; m2To balance the mass of the mass assembly; m3Is the mass of the gravity compensation device; j is the moment of inertia of one set of pulleys.
5. The workpiece table system of claim 1, wherein the gravity compensation device comprises a cylinder, a push rod and a flexible hinge, the bottom of the cylinder is connected with the base frame through an air floating cushion, the flexible hinge is located at the top of the push rod, and the top of the flexible hinge is an air floating surface.
6. The workpiece stage system of claim 5, wherein the gravity compensation device further comprises a pressure sensor and a proportional pressure regulating valve, the pressure sensor being located inside the cylinder for detecting air pressure fluctuations inside the cylinder; the proportional pressure regulating valve is used for regulating the air pressure in the air cylinder according to the detected air pressure fluctuation in the air cylinder and maintaining the air pressure in the air cylinder to be constant.
7. The workpiece table system of claim 5, wherein the cylinder block and pushrod material comprises an aluminum alloy or stainless steel.
8. The workpiece stage system of claim 5, wherein the push rods are honeycomb-structured.
9. The workpiece stage system of claim 2, wherein the X-axis stator portion is supported on the base by air bearing rails, the X-axis stator portion being movable in a Y direction along the air bearing rails.
10. The workpiece table system of claim 1, wherein the counterbalance assembly is supported on the base frame by an air-bearing pad.
11. The workpiece table system of claim 1, further comprising a shock absorbing unit located at a bottom of the base frame.
12. A lithographic apparatus comprising a workpiece table system according to any of claims 1 to 11.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810714722.1A CN110658688B (en) | 2018-06-29 | 2018-06-29 | Workpiece table system and photoetching equipment |
| PCT/CN2019/093157 WO2020001513A1 (en) | 2018-06-29 | 2019-06-27 | Workpiece table system and photolithography device |
| TW108122987A TWI721475B (en) | 2018-06-29 | 2019-06-28 | Workpiece stage system and photoetching equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810714722.1A CN110658688B (en) | 2018-06-29 | 2018-06-29 | Workpiece table system and photoetching equipment |
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| CN110658688A true CN110658688A (en) | 2020-01-07 |
| CN110658688B CN110658688B (en) | 2020-12-15 |
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| CN201810714722.1A Active CN110658688B (en) | 2018-06-29 | 2018-06-29 | Workpiece table system and photoetching equipment |
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| CN (1) | CN110658688B (en) |
| TW (1) | TWI721475B (en) |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114123852A (en) * | 2022-01-25 | 2022-03-01 | 上海隐冠半导体技术有限公司 | Micro-motion platform and motion device |
| CN114253085A (en) * | 2020-09-23 | 2022-03-29 | 株式会社斯库林集团 | Drawing device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI806474B (en) * | 2021-04-01 | 2023-06-21 | 日商住友重機械工業股份有限公司 | Table device, exposure device, inspection device, and device manufacturing method |
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| CN114253085A (en) * | 2020-09-23 | 2022-03-29 | 株式会社斯库林集团 | Drawing device |
| CN114123852A (en) * | 2022-01-25 | 2022-03-01 | 上海隐冠半导体技术有限公司 | Micro-motion platform and motion device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI721475B (en) | 2021-03-11 |
| WO2020001513A1 (en) | 2020-01-02 |
| CN110658688B (en) | 2020-12-15 |
| TW202001442A (en) | 2020-01-01 |
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