CN202306139U - 3-PSR-V parallel connection mechanism for regulating immersion unit - Google Patents

3-PSR-V parallel connection mechanism for regulating immersion unit Download PDF

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Publication number
CN202306139U
CN202306139U CN2011203706653U CN201120370665U CN202306139U CN 202306139 U CN202306139 U CN 202306139U CN 2011203706653 U CN2011203706653 U CN 2011203706653U CN 201120370665 U CN201120370665 U CN 201120370665U CN 202306139 U CN202306139 U CN 202306139U
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China
Prior art keywords
platform
motion platform
pair
rod
moving sets
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Withdrawn - After Issue
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CN2011203706653U
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Chinese (zh)
Inventor
傅新
邵杰杰
王楚男
陈文昱
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Zhejiang University ZJU
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Zhejiang University ZJU
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Abstract

The utility model discloses a 3-PSR-V parallel connection mechanism for regulating an immersion unit. In the parallel mechanism, a fixed platform and a moving platform are connected through three identical branched chains, and each branched chain comprises a moving pair, a spherical pair and a rotating pair sequentially from the moving platform to the fixed platform, wherein each spherical pair and each rotating pair are connected by a connecting rod, and the axes of three connecting rods are located in a same plane. The three moving pairs are driving pairs and are connected with the fixed platform respectively through a sliding rail fixedly connected with one side of the fixed platform. The axes of the three sliding rails are vertical to the fixed platform and are uniformly distributed along a circumference taking the center of the fixed platform as a circle center, and the axes of the three rotating pairs are vertical to the moving platform and are uniformly distributed along a circumference taking the center of the moving platform as a circle center. The 3-PSR-V parallel connection mechanism disclosed by the utility model can be used in occasions to which parallel connection mechanisms with fewer degrees of freedom are applicable, can also be used in immersion type photoetching to carry out position and orientation regulation on the immersion unit arranged on the moving platform, and is particularly suitable for occasions with demanding requirements on installation space.

Description

A kind of 3-PSR-V parallel institution that is used for the adjusting of submergence unit
Technical field
The utility model relates to a kind of 3-freedom parallel mechanism, especially relates to a kind of 3-PSR-V parallel institution that the submergence unit is regulated that is used for.
Background technology
When immersion lithographic apparatus makes public, the submergence unit will be installed on the silicon chip top, and in the process that wafer-supporting platform drive silicon chip scans, keep immersion flow field.In order to guarantee the quality of making public, must guarantee the stable homogeneous of immersion flow field.Need control the distance of submergence unit lower surface and silicon chip upper surface during submergence unit operate as normal, and keeping parallelism or in the certain angle scope, therefore needing a mechanism can automatically adjust to the spatial attitude and the position of submergence unit.
Existing 3-freedom parallel mechanism also can be accomplished this function, but has following shortcoming:
(1) existing 3-PRS, the contrary relatively complicacy of separating of 3-freedom parallel mechanism kinematicss such as 3-RPS.
(2) existing 3-PRS, 3-freedom parallel mechanisms such as 3-RPS, when existing certain range of movement to require, under the prerequisite that does not increase mechanism complexity, axially installation dimension is excessive.
(3) existing 3-PSP 3-freedom parallel mechanism, when existing certain range of movement to require, under the prerequisite that does not increase mechanism complexity, radially installation dimension is excessive.
For immersed photoetching machine, should be reduced to minimum to the influence of whole litho machine the installation of submergence unit.Under the prerequisite that satisfies the range of adjustment demand, the regulating device of submergence unit should have less installation dimension.
Summary of the invention
The purpose of the utility model is to provide a kind of 3-PSR-V parallel institution that the submergence unit is regulated that is used for, and can carry out the pose adjustment to the submergence unit that is installed on the motion platform, and kinematics is contrary separates simply the 3-freedom parallel mechanism that installing space is little.The utility model also is applicable to the occasion that general 3-freedom parallel mechanism is used.
The technical scheme that the utility model adopts is:
The utility model comprises stationary platform, motion platform and a chain array; Prop up chain array and comprise first side chain, second side chain and the 3rd side chain; Wherein:
1) first side chain: comprise first slide rail, first moving sets, first spherical pair, the first connecting rod and first revolute pair; First slide rail is vertically mounted on the stationary platform; First moving sets is installed in first slide rail; The first moving sets medial surface is installed first spherical pair, and an end of first connecting rod is connected with first spherical pair, and the other end of first connecting rod is connected with first revolute pair; The axis of first revolute pair is vertical with motion platform, and first revolute pair is installed in the circular arc ring groove of motion platform side;
2) second side chain: comprise second slide rail, second moving sets, second spherical pair, the second connecting rod and second revolute pair; Second slide rail is vertically mounted on the stationary platform; Second moving sets is installed in second slide rail; The second moving sets medial surface is installed second spherical pair, and an end of second connecting rod is connected with second spherical pair, and the other end of second connecting rod is connected with second revolute pair; The axis of second revolute pair is vertical with motion platform, and second revolute pair is installed in the circular arc ring groove of motion platform side;
2) the 3rd side chain: comprise the 3rd slide rail, three moving sets, the 3rd spherical pair, third connecting rod and the 3rd revolute pair; The 3rd slide rail is vertically mounted on the stationary platform; Three moving sets is installed in the 3rd slide rail; The three moving sets medial surface is installed the 3rd spherical pair, and an end of third connecting rod is connected with the 3rd spherical pair, and the other end of third connecting rod is connected with the 3rd revolute pair; The axis of the 3rd revolute pair is vertical with motion platform, and the 3rd revolute pair is installed in the circular arc ring groove of motion platform side;
Described three slide rails on the stationary platform along being to be uniformly distributed with on the circumference in the center of circle with the stationary platform center; The axis of described three revolute pairs on motion platform along being to be uniformly distributed with in the circular arc ring groove in the center of circle with the motion platform center.
Described three connecting rods are in same plane, and this plane is with the motion platform plane parallel or overlap.
When motion platform was parallel with stationary platform, the axis of described three connecting rods is the center line through motion platform not all; Tilt to extreme position and work as motion platform, when promptly the angle between motion platform and stationary platform reaches maximal value, will have the axis of a connecting rod and the center line of motion platform to intersect in described three connecting rods.
The largest motion scope of motion platform in the space determine by following three several parts jointly, the axis of promptly said three moving sets with respect to the axis of the length of the distance between the center line of stationary platform, said three connecting rods and said three revolute pairs with respect to the distance between the center line of motion platform.
Three link design become equal length, or are designed to length and can carry out corresponding adjusting according to the range of movement demand.The useful effect that the utlity model has is:
1, the utility model is simple in structure, and the mechanism joint is few, good reliability;
2, the utility model for kinematics contrary separate find the solution simple relatively;
3, the utility model can obtain different range of adjustment with length of connecting rod between the revolute pair through regulating spherical pair;
4, the utility model is in certain range of movement, under the prerequisite that does not increase mechanism complexity, simultaneously axially with radially all existing relatively 3-freedom parallel mechanism of installation dimension is little.
Description of drawings
Fig. 1 is that the axle that waits of the utility model is surveyed view.
Fig. 2 is the schematic diagram of mechanism of the utility model.
Vertical view when Fig. 3 is the utility model initial position.
The vertical view of motion platform when Fig. 4 is the utility model largest motion extreme position.
Among the figure: 1, stationary platform, 2, chain array, 2A, first side chain, 2B, second side chain, 2C, the 3rd side chain, 3A, first slide rail; 3B, second slide rail, 3C, the 3rd slide rail, 4A, first moving sets, 4B, second moving sets, 4C, three moving sets; 5A, first spherical pair, 5B, second spherical pair, 5C, the 3rd spherical pair, 6A, first connecting rod, 6B, second connecting rod; 6C, third connecting rod, 7A, first revolute pair, 7B, second revolute pair, 7C, the 3rd revolute pair, 8, motion platform.
Embodiment
Below in conjunction with accompanying drawing and embodiment the utility model is done further explanation.
Like Fig. 1~shown in Figure 4, the utility model comprises stationary platform 1, motion platform 8 and a chain array 2; Prop up chain array and comprise the first side chain 2A, the second side chain 2B and the 3rd side chain 2C; Wherein:
1) the first side chain 2A: comprise the first slide rail 3A, the first moving sets 4A, the first spherical pair 5A, the first connecting rod 6A and the first revolute pair 7A; The first slide rail 3A is vertically mounted on the stationary platform 1; The first moving sets 4A is installed in the first slide rail 3A; The first moving sets 4A medial surface is installed the first spherical pair 5A, and the end of first connecting rod 6A is connected with the first spherical pair 5A, and the other end of first connecting rod 6A is connected with the first revolute pair 7A; The axis of the first revolute pair 7A is vertical with motion platform 8, and the first revolute pair 7A is installed in the circular arc ring groove of motion platform 8 sides;
2) the second side chain 2B: comprise the second slide rail 3B, the second moving sets 4B, the second spherical pair 5B, the second connecting rod 6B and the second revolute pair 7B; The second slide rail 3B is vertically mounted on the stationary platform 1; The second moving sets 4B is installed in the second slide rail 3B; The second moving sets 4B medial surface is installed the second spherical pair 5B, and the end of second connecting rod 6B is connected with the second spherical pair 5B, and the other end of second connecting rod 6B is connected with the second revolute pair 7B; The axis of the second revolute pair 7B is vertical with motion platform 8, and the second revolute pair 7B is installed in the circular arc ring groove of motion platform 8 sides;
2) the 3rd side chain 2C: comprise the 3rd slide rail 3C, three moving sets 4C, the 3rd spherical pair 5C, third connecting rod 6C and the 3rd revolute pair 7C; The 3rd slide rail 3C is vertically mounted on the stationary platform 1; Three moving sets 4C is installed in the 3rd slide rail 3C; Three moving sets 4C medial surface is installed the 3rd spherical pair 5C, and the end of third connecting rod 6C is connected with the 3rd spherical pair 5C, and the other end of third connecting rod 6C is connected with the 3rd revolute pair 7C; The axis of the 3rd revolute pair 7C is vertical with motion platform 8, and the 3rd revolute pair 7C is installed in the circular arc ring groove of motion platform (8) side;
Described three slide rail 3A, 3B, 3C on the stationary platform 1 along being to be uniformly distributed with on the circumference in the center of circle with the stationary platform center; The axis of described three revolute pair 4A, 4B, 4C on motion platform 8 along being to be uniformly distributed with in the circular arc ring groove in the center of circle with the motion platform center.
Described three connecting rod 6A, 6B, 6C are in same plane, and this plane is with motion platform 8 plane parallel or overlap.
When motion platform 8 and stationary platform 1 were parallel, the axis of described three connecting rod 6A, 6B, 6C is the center line through motion platform 8 all; And tilt to extreme position when motion platform 8, when promptly the angle of 1 of motion platform 8 and stationary platform reaches maximal value, will there be the center line of axis and motion platform 8 of a connecting rod crossing among described three connecting rod 6A, 6B, the 6C.
The largest motion scope of motion platform 8 in the space determine by following three several parts jointly, the axis of promptly said three moving sets 4A, 4B, 4C with respect to the axis of the length of the distance between the center line of stationary platform 1, said three connecting rod 6A, 6B, 6C and said three revolute pair 7A, 7B, 7C with respect to the distance between the center line of motion platform 8.
Three connecting rod 6A, 6B, 6C are designed to equal length, or are designed to length and can carry out corresponding adjusting according to the range of movement demand.
Like Fig. 1, shown in Figure 2, three moving sets 4A, 4B, 4C are driving, and type of drive can adopt ball-screw, linear electric motors and hydropneumatic cylinder isoline actuator.Three moving sets 4A, 4B, 4C are fixed together through modes such as bolt or welding with three spherical pair 5A, 5B, 5C respectively.Three spherical pair 5A, 5B, 5C adopt modes such as bolt or welding to be connected through three connecting rod 6A, 6B, 6C with three revolute pair 7A, 7B, 7C respectively.The axis of three slide rail 3A, 3B, 3C is all vertical with stationary platform 1 and be the circumference uniform distribution in the center of circle along the center with stationary platform 1.The axis of three revolute pair 7A, 7B, 7C is all vertical with motion platform 8 and along being the circumference uniform distribution in the center of circle with motion platform 8 centers.
As shown in Figure 3, when three moving sets 4A, 4B, 4C are identical to the distance of stationary platform 1, three spherical pair 5A, 5B, 5C, three revolute pair 7A, 7B, 7C, three connecting rod 6A, 6B, 6C and motion platforms 8 are all in same plane.At this moment, the axis of three connecting rod 6A, 6B, 6C does not all intersect with the center line of motion platform 8.
As shown in Figure 4, when three moving sets 4A, 4B, 4C are unequal with respect to the distance of fixed flat planar 1 under the driving of motor isoline actuator, motion platform 8 meeting run-off the straights, promptly the angle between motion platform 8 and the stationary platform 1 is non-vanishing.Through controlling spatial attitude and the position that three moving sets 4A, 4B, 4C can controlled motion platforms 8 with respect to the distance of fixed flat planar 1, also can be through controlling the movement velocity that three moving sets 4A, 4B, the 4C movement velocity the specific range time is come controlled motion platform 8.When motion platform 8 tilts to extreme position; Be that the angle of 1 of motion platform 8 and stationary platform is when reaching maximal value; To have the center line of axis and the motion platform 8 of a connecting rod to intersect among described three connecting rod 6A, 6B, the 6C, and 3 lines of first, second and third moving sets 4A, 4B, 4C are isosceles triangle.
When this mechanism is used for immersed photoetching machine; Can be fixed on the submergence unit of immersed photoetching machine on the moving platform of this parallel institution; Spatial pose through the adjustment moving platform; Can adjust submergence unit lower surface with respect to the depth of parallelism that is placed on the silicon chip upper surface, thereby be reduced to minimum to the influence of whole litho machine the installation of submergence unit.

Claims (5)

1. one kind is used for the 3-PSR-V parallel institution that the submergence unit is regulated, and it is characterized in that: comprise stationary platform (1), motion platform (8) and a chain array (2); Prop up chain array and comprise first side chain (2A), second side chain (2B) and the 3rd side chain (2C); Wherein:
1) first side chain (2A): comprise first slide rail (3A), first moving sets (4A), first spherical pair (5A), first connecting rod (6A) and first revolute pair (7A); First slide rail (3A) is vertically mounted on the stationary platform (1); First moving sets (4A) is installed in first slide rail (3A); First moving sets (4A) medial surface is installed first spherical pair (5A), and an end of first connecting rod (6A) is connected with first spherical pair (5A), and the other end of first connecting rod (6A) is connected with first revolute pair (7A); The axis of first revolute pair (7A) is vertical with motion platform (8), and first revolute pair (7A) is installed in the circular arc ring groove of motion platform (8) side;
2) second side chain (2B): comprise second slide rail (3B), second moving sets (4B), second spherical pair (5B), second connecting rod (6B) and second revolute pair (7B); Second slide rail (3B) is vertically mounted on the stationary platform (1); Second moving sets (4B) is installed in second slide rail (3B); Second moving sets (4B) medial surface is installed second spherical pair (5B), and an end of second connecting rod (6B) is connected with second spherical pair (5B), and the other end of second connecting rod (6B) is connected with second revolute pair (7B); The axis of second revolute pair (7B) is vertical with motion platform (8), and second revolute pair (7B) is installed in the circular arc ring groove of motion platform (8) side;
2) the 3rd side chain (2C): comprise the 3rd slide rail (3C), three moving sets (4C), the 3rd spherical pair (5C), third connecting rod (6C) and the 3rd revolute pair (7C); The 3rd slide rail (3C) is vertically mounted on the stationary platform (1); Three moving sets (4C) is installed in the 3rd slide rail (3C); Three moving sets (4C) medial surface is installed the 3rd spherical pair (5C), and an end of third connecting rod (6C) is connected with the 3rd spherical pair (5C), and the other end of third connecting rod (6C) is connected with the 3rd revolute pair (7C); The axis of the 3rd revolute pair (7C) is vertical with motion platform (8), and the 3rd revolute pair (7C) is installed in the circular arc ring groove of motion platform (8) side;
Described three slide rails (3A, 3B, 3C) are gone up along being to be uniformly distributed with on the circumference in the center of circle with the stationary platform center in stationary platform (1); The axis of described three revolute pairs (4A, 4B, 4C) is gone up along being to be uniformly distributed with in the circular arc ring groove in the center of circle with the motion platform center at motion platform (8).
2. a kind of 3-PSR-V parallel institution that the submergence unit is regulated that is used for according to claim 1 is characterized in that: described three connecting rods (6A, 6B, 6C) are in same plane, and this plane is with motion platform (8) plane parallel or overlap.
3. a kind of 3-PSR-V parallel institution that the submergence unit is regulated that is used for according to claim 1; It is characterized in that: when motion platform (8) was parallel with stationary platform (1), the axis of described three connecting rods (6A, 6B, 6C) did not all pass through the center line of motion platform (8); Tilt to extreme position and work as motion platform (8), when promptly the angle between motion platform (8) and stationary platform (1) reaches maximal value, will have the axis of a connecting rod and the center line of motion platform (8) to intersect in described three connecting rods (6A, 6B, 6C).
4. a kind of 3-PSR-V parallel institution that the submergence unit is regulated that is used for according to claim 1; It is characterized in that: the largest motion scope of motion platform (8) in the space determine by following three several parts jointly, the axis of promptly said three moving sets (4A, 4B, 4C) with respect to the axis of the length of the distance between the center line of stationary platform (1), said three connecting rods (6A, 6B, 6C) and said three revolute pairs (7A, 7B, 7C) with respect to the distance between the center line of motion platform (8).
5. a kind of 3-PSR-V parallel institution that the submergence unit is regulated that is used for according to claim 1, it is characterized in that: three connecting rods (6A, 6B, 6C) are designed to equal length, or are designed to length and can carry out corresponding adjusting according to the range of movement demand.
CN2011203706653U 2011-09-28 2011-09-28 3-PSR-V parallel connection mechanism for regulating immersion unit Withdrawn - After Issue CN202306139U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011203706653U CN202306139U (en) 2011-09-28 2011-09-28 3-PSR-V parallel connection mechanism for regulating immersion unit

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Application Number Priority Date Filing Date Title
CN2011203706653U CN202306139U (en) 2011-09-28 2011-09-28 3-PSR-V parallel connection mechanism for regulating immersion unit

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102360165A (en) * 2011-09-28 2012-02-22 浙江大学 3-PSR-V parallel mechanism for adjusting immersion units
CN103809385A (en) * 2012-11-12 2014-05-21 川宝科技股份有限公司 Level angle adjusting mechanism and method for photomask structure of exposure machine
CN104070518A (en) * 2014-06-20 2014-10-01 浙江大学 Three freedom precision control apparatus based on eccentric structure

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102360165A (en) * 2011-09-28 2012-02-22 浙江大学 3-PSR-V parallel mechanism for adjusting immersion units
CN102360165B (en) * 2011-09-28 2013-06-26 浙江大学 3-PSR-V parallel mechanism for adjusting immersion units
CN103809385A (en) * 2012-11-12 2014-05-21 川宝科技股份有限公司 Level angle adjusting mechanism and method for photomask structure of exposure machine
CN104070518A (en) * 2014-06-20 2014-10-01 浙江大学 Three freedom precision control apparatus based on eccentric structure
CN104070518B (en) * 2014-06-20 2015-09-02 浙江大学 A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure

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AV01 Patent right actively abandoned

Granted publication date: 20120704

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