CN103279013A - Three-freedom-degree precise regulating device based on ball location - Google Patents
Three-freedom-degree precise regulating device based on ball location Download PDFInfo
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- CN103279013A CN103279013A CN201310186972XA CN201310186972A CN103279013A CN 103279013 A CN103279013 A CN 103279013A CN 201310186972X A CN201310186972X A CN 201310186972XA CN 201310186972 A CN201310186972 A CN 201310186972A CN 103279013 A CN103279013 A CN 103279013A
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Abstract
The invention discloses a three-freedom-degree precise regulating device based on ball location. The device is installed between a main frame and an immersing unit of an immersed photo-etching machine; a mounting substrate and a connecting plate of the device are connected in parallel by three groups of same moving branched chains; each group of moving branched chain orderly consists of a linear moving pair, a ball fixing block, a ball and two guiding cylinders from the mounting substrate to the connecting plate; and two pre-tightening springs are respectively arranged at two sides of each group of moving branched chain. The three-freedom-degree precise regulating device disclosed by the invention is used for realizing installation and fixation of the immersing unit of the immersed photo-etching machine and precise regulation of a spatial posture of the immersing unit and realizing submicron-grade precise location of the immersing unit; the pre-tightening force of the pre-tightening springs ensures reliable contact between the ball and each guiding cylinder, so that the problems of existence of clearances and the creeping of the traditional moving pair in a micro-displacement range are solved; the structure connected in parallel enhances the rigidity of the system; and by the use of a modularized design, the three-freedom-degree precise regulating device can be used for three-freedom-degree precise regulation in places besides the immersed photo-etching machine.
Description
Technical field
The present invention relates to the three-freedom degree precision regulating device, especially relate to a kind of three-freedom degree precision regulating device based on the ball location.
Background technology
Litho machine plays crucial effects as the core equipment of making VLSI (very large scale integrated circuit) in IC is integrated.Since litho machine was born, people made great efforts to improve the photoetching resolution of litho machine always.Yet after resolution was crossed over 45nm, deep UV (ultraviolet light) (DUV) dry lithography had reached physics limit.Immersion lithography has become the mainstream technology that breaks through 45 nm nodes, and is significant to improving photoetching resolution.
In immersed photoetching machine, require in the end to fill between a slice projection objective and silicon chip one deck immersion flow field.Immersion flow field is produced by the submergence unit, and in order to prevent that immersion flow field from leaking, require slit between submergence unit and the silicon chip at 0.1mm between the 0.3mm, simultaneously there is strict depth of parallelism requirement in this slit; And in the immersed photoetching machine course of work, can a series of operation be arranged to the submergence unit, after these operations, still require the immersion flow field slit between submergence unit and silicon chip to meet the demands.This just need have a kind of accurate pose regulating device to regulate the pose of submergence unit to satisfy the requirement of immersed photoetching machine.
In addition, litho machine is the integrated equipment of a kind of mechanism height, in limited space, optical system and the corresponding match mechanism of complexity to be grouped together, so its each parts are had strict installing space restriction, so for the pose governor motion of submergence unit, the requirements of installation space harshness.
Pose governor motion commonly used now has a lot, divides substantially by physical construction to be divided into tandem, parallel and hybrid three classes.Parallel pose governor motion than other two kinds of governor motions the rigidity height is arranged, work space is little, load capacity is strong, inertia is little, error homogenising, low cost and other advantages.But traditional pose adjustment structure in parallel adopts the secondary side chain of forming parallel institution of conventional motion, and such governor motion has three shortcomings, that is: the secondary institute of conventional motion takes up space greatly, and there is the gap in kinematic pair, and there is creeping phenomenon in mechanism in the micrometric displacement scope.
Summary of the invention
In order to realize the minute adjustment of submergence unit pose in the immersed photoetching machine, the object of the present invention is to provide a kind of three-freedom degree precision regulating device based on the ball location, have advantages such as little, the no gap of installing space, no low speed jerking motion, realize web joint [TZ, RX, RY] minute adjustment of Three Degree Of Freedom, degree of freedom TZ represents along the translation of installation base plate center pit axis Z-direction, degree of freedom RX and RY represent the rotation around X and Y-axis respectively, wherein X-axis is perpendicular to the Z axle, and Y-axis is perpendicular to X-axis and Z axle.
The technical solution used in the present invention is as follows:
Three-freedom degree precision regulating device based on the ball location is installed between immersed photoetching machine main frame and the litho machine submergence unit, three-freedom degree precision regulating device based on the ball location is installed on the main frame by the installation base plate mounting hole, and litho machine submergence unit is installed on the web joint by submergence unit mounting hole; Link to each other with parallel way by three groups of identical movement branched chain of structure between installation base plate and the web joint; Wherein:
Every group of movement branched chain: comprise rectilinear motion pair, ball fixed block, ball and two guide cylinder; The secondary fixed part of rectilinear motion is installed in the mounting groove bottom surface that becomes circle distribution on the installation base plate; The ball fixed block is installed below rectilinear motion secondary motion parts; Ball is embedded in the ball locating piece, and ball and two guide cylinder that are parallel to each other are tangent, and ball can roll along the determined gathering sill of guide cylinder; Guide cylinder is embedded in the both sides in the guide cylinder groove;
Every group of movement branched chain both sides a preloading spring is arranged respectively, fix a Spring hanging rod respectively at installation base plate spring mounting hole and web joint spring mounting hole position, the preloading spring two ends hang on the corresponding Spring hanging rod; The preloading spring pretightning force guarantees that ball contacts with guide cylinder;
Three guide cylinder groove center lines on the described web joint are not parallel each other.
Every group of movement branched chain cathetus kinematic pair moving component drives lower edge installation base plate center pit axis Z-direction motion in the external world; Ball jacking web joint corresponding position under the driving of rectilinear motion secondary motion parts moves along Z-direction, is accompanied by ball therewith along the rolling of guide cylinder groove; Every group of movement branched chain can self-movement.
The beneficial effect that the present invention has is:
1. determine a plane at 3, the position of three balls cooperates three gathering sills that are not parallel to each other namely to locate the pose of having determined web joint among the present invention, and web joint links to each other with the submergence unit, so namely located the pose of submergence unit like this; The motion of three groups of movement branched chain changes the position of three balls, has so just realized the minute adjustment of submergence unit [TZ, RX, RY] Three Degree Of Freedom, can realize the submicron order precision positioning of submergence unit.
2. ball and guide cylinder remain contact condition among the present invention under the effect of preloading spring pretightning force, have solved the problem that has the gap between kinematic pair like this; Simultaneously ball in motion process with guide cylinder between for point contacts, and can roll the problem such as creep that has solved like this that mechanism exists in the micrometric displacement scope relatively.
3. the present invention adopts parallel-connection structure, makes the three-freedom degree precision regulating device based on the ball location have higher stiffness and outstanding dynamic property.
4. the cooperation of ball and guide cylinder has realized being equivalent to the motor function of traditional line kinematic pair and ball pair among the present invention, simplified the structure of pose regulating device greatly, dwindled the bulk of device, can satisfy litho machine to the strictness restriction of size, simple structure also makes the three-freedom degree precision regulating device based on the ball location be easy to make, and cost is low.
5. the present invention adopts modular mentality of designing, and whole three-freedom degree precision regulating device based on the ball location is had a style of one's own, and regulates except the pose that is used for immersed photoetching machine submergence unit, can be used for having other pose of identical requirement to regulate occasion.
Description of drawings
Fig. 1 is the rough schematic view of the present invention present position in immersed photoetching machine.
Fig. 2 is three-dimensional view of the present invention.
Fig. 3 is explosive view of the present invention.
Fig. 4 is the semisectional view that the present invention analyses and observe along a movement branched chain.
Among the figure: S1, the immersed photoetching machine optical system, S2, based on the three-freedom degree precision regulating device of ball location, S3, litho machine submergence unit, 1, the immersed photoetching machine main frame, 2, immersion flow field, 3, silicon chip, 4, installation base plate, 4A, mounting groove, 4B, the installation base plate spring mounting hole, 4C, the installation base plate center pit, 4D, the installation base plate mounting hole, 5, the rectilinear motion pair, 5A, rectilinear motion secondary motion parts, 5B, the secondary fixed part of rectilinear motion, 6, the ball fixed block, 7, ball, 8, guide cylinder, 9, web joint, 9A guide cylinder groove, 9B, the web joint spring mounting hole, 9C, submergence unit mounting hole, 10, preloading spring, 11, Spring hanging rod.
Embodiment
Below in conjunction with drawings and Examples specific implementation process of the present invention is described.
As shown in Figure 1, immersed photoetching machine optical system S1 runs through immersed photoetching machine main frame 1, based on three-freedom degree precision regulating device S2 and the litho machine submergence cell S 3 of ball location, sees through 2 pairs of immersion flow fields and is in that the silicon chip 3 of below exposes; Three-freedom degree precision regulating device S2 based on the ball location is installed between immersed photoetching machine main frame 1 and the litho machine submergence cell S 3, three-freedom degree precision regulating device S2 based on the ball location is installed on the main frame 1 by installation base plate mounting hole 4D, and litho machine submergence cell S 3 is installed on the web joint 9 by submergence unit mounting hole 9C.
As Fig. 2,, shown in Figure 3, link to each other with parallel way by the identical movement branched chain of three groups of structures between installation base plate 4 and the web joint 9; Wherein:
Every group of movement branched chain: comprise rectilinear motion pair 5, ball fixed block 6, ball 7 and two guide cylinder 8; The secondary fixed part 5B of rectilinear motion is installed in the mounting groove 4A bottom surface that becomes circle distribution on the installation base plate 4; Ball fixed block 6 is installed below rectilinear motion secondary motion parts 5A; Ball 7 is embedded in the ball locating piece 6, and ball 7 and two guide cylinder that are parallel to each other 8 are tangent, and ball 7 can roll along guide cylinder 8 determined gathering sills; Guide cylinder 8 is embedded in the both sides in the guide cylinder groove 9A;
Every group of movement branched chain both sides a preloading spring 10 is arranged respectively, fix a Spring hanging rod 11 respectively at installation base plate spring mounting hole 4B and web joint spring mounting hole 9B position, preloading spring 10 two ends hang on the corresponding Spring hanging rod 11; Preloading spring 10 pretightning forces guarantee that ball 7 contacts with guide cylinder 8; Three guide cylinder groove 9A center lines on the described web joint 9 are not parallel each other.
As Fig. 1, Fig. 2 and shown in Figure 4, each movement branched chain rectilinear motion secondary motion parts 5A promotes ball 7 along the Z-direction rectilinear motion and is in diverse location in Z-direction among the present invention, not parallel each other at the guide cylinder 8 determined gathering sills of web joint 9 constraint balls 7 simultaneously, then three balls 7 get final product 3 definite planes, the pose of web joint 9 is determined in the location, the pose of further definite submergence cell S 3 that links to each other with web joint 9, realize that with this submergence cell S 3 is at [TZ, RX, RY] submicron order of Three Degree Of Freedom regulates.
Claims (3)
1. three-freedom degree precision regulating device based on ball location, it is characterized in that: the three-freedom degree precision regulating device (S2) based on the ball location is installed between immersed photoetching machine main frame (1) and the litho machine submergence unit (S3), three-freedom degree precision regulating device (S2) based on the ball location is installed on the main frame (1) by installation base plate mounting hole (4D), and litho machine submergence unit (S3) is installed on the web joint (9) by submergence unit mounting hole (9C); Link to each other with parallel way by three groups of identical movement branched chain of structure between installation base plate (4) and the web joint (9); Wherein:
Every group of movement branched chain: comprise rectilinear motion pair (5), ball fixed block (6), ball (7) and two guide cylinder (8); The secondary fixed part of rectilinear motion (5B) is installed in mounting groove (4A) bottom surface that becomes circle distribution on the installation base plate (4); In rectilinear motion secondary motion parts (5A) below ball fixed block (6) is installed; Ball (7) is embedded in the ball locating piece (6), and ball (7) is tangent with two guide cylinder that are parallel to each other (8), and ball (7) can roll along the determined gathering sill of guide cylinder (8); Guide cylinder (8) is embedded in the both sides in the guide cylinder groove (9A);
Every group of movement branched chain both sides a preloading spring (10) is arranged respectively, fix a Spring hanging rod (11) respectively at installation base plate spring mounting hole (4B) and web joint spring mounting hole (9B) position, preloading spring (10) two ends hang on the corresponding Spring hanging rod (11); Preloading spring (10) pretightning force guarantees that ball (7) contacts with guide cylinder (8).
2. a kind of three-freedom degree precision regulating device based on ball location according to claim 1, it is characterized in that: three guide cylinder grooves (9A) center line on the described web joint (9) is not parallel each other.
3. a kind of three-freedom degree precision regulating device based on ball location according to claim 1, it is characterized in that: every group of movement branched chain cathetus kinematic pair moving component (5A) drives the motion of lower edge installation base plate center pit (4C) axis Z-direction in the external world; Ball (7) jacking web joint corresponding position under the driving of rectilinear motion secondary motion parts (5A) moves along Z-direction, is accompanied by ball (7) therewith along the rolling of guide cylinder groove; Every group of movement branched chain can self-movement.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310186972.XA CN103279013B (en) | 2013-05-20 | 2013-05-20 | Three-freedom-degree precise regulating device based on ball location |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310186972.XA CN103279013B (en) | 2013-05-20 | 2013-05-20 | Three-freedom-degree precise regulating device based on ball location |
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| CN103279013B CN103279013B (en) | 2014-12-10 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103465258A (en) * | 2013-09-13 | 2013-12-25 | 浙江大学 | Three-degree-of-freedom precision adjustment device based on flexible hinges |
| CN104070518A (en) * | 2014-06-20 | 2014-10-01 | 浙江大学 | Three freedom precision control apparatus based on eccentric structure |
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| US20030184724A1 (en) * | 2002-03-26 | 2003-10-02 | Kazuya Ono | Stage assembly including a damping assembly |
| US20060049698A1 (en) * | 2004-09-09 | 2006-03-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN101206409A (en) * | 2007-12-17 | 2008-06-25 | 上海微电子装备有限公司 | Balance mass orientation system for workpiece platform |
| US20090051893A1 (en) * | 2007-08-24 | 2009-02-26 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method |
| CN102360160A (en) * | 2011-07-29 | 2012-02-22 | 河北工业大学 | 2R1T three degree of freedom space flexible precision positioning platform |
| CN102360165A (en) * | 2011-09-28 | 2012-02-22 | 浙江大学 | 3-PSR-V parallel mechanism for adjusting immersion units |
| CN102854751A (en) * | 2011-06-30 | 2013-01-02 | 中国科学院深圳先进技术研究院 | Focusing adjustment leveling mechanism of photolithographic machine and leveling mechanism of photolithographic machine |
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2013
- 2013-05-20 CN CN201310186972.XA patent/CN103279013B/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030184724A1 (en) * | 2002-03-26 | 2003-10-02 | Kazuya Ono | Stage assembly including a damping assembly |
| US20060049698A1 (en) * | 2004-09-09 | 2006-03-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20090051893A1 (en) * | 2007-08-24 | 2009-02-26 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method |
| CN101206409A (en) * | 2007-12-17 | 2008-06-25 | 上海微电子装备有限公司 | Balance mass orientation system for workpiece platform |
| CN102854751A (en) * | 2011-06-30 | 2013-01-02 | 中国科学院深圳先进技术研究院 | Focusing adjustment leveling mechanism of photolithographic machine and leveling mechanism of photolithographic machine |
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| CN102360165A (en) * | 2011-09-28 | 2012-02-22 | 浙江大学 | 3-PSR-V parallel mechanism for adjusting immersion units |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103465258A (en) * | 2013-09-13 | 2013-12-25 | 浙江大学 | Three-degree-of-freedom precision adjustment device based on flexible hinges |
| CN103465258B (en) * | 2013-09-13 | 2015-08-26 | 浙江大学 | A kind of Three-degree-of-freeprecision precision adjustment device based on flexible hinge |
| CN104070518A (en) * | 2014-06-20 | 2014-10-01 | 浙江大学 | Three freedom precision control apparatus based on eccentric structure |
| CN104070518B (en) * | 2014-06-20 | 2015-09-02 | 浙江大学 | A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure |
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| CN103279013B (en) | 2014-12-10 |
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