CN102854751A - Focusing adjustment leveling mechanism of photolithographic machine and leveling mechanism of photolithographic machine - Google Patents

Focusing adjustment leveling mechanism of photolithographic machine and leveling mechanism of photolithographic machine Download PDF

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Publication number
CN102854751A
CN102854751A CN2011101822781A CN201110182278A CN102854751A CN 102854751 A CN102854751 A CN 102854751A CN 2011101822781 A CN2011101822781 A CN 2011101822781A CN 201110182278 A CN201110182278 A CN 201110182278A CN 102854751 A CN102854751 A CN 102854751A
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plummer
piezoelectric ceramic
base
ceramic actuator
bulb
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CN102854751B (en
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王大志
何凯
杜如虚
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Shenzhen Institute of Advanced Technology of CAS
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Shenzhen Institute of Advanced Technology of CAS
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Abstract

The invention relates to a focusing adjustment leveling mechanism of photolithographic machine, including: a base; piezoelectric ceramic driver assemblies, including fixedly connected piezoelectric ceramic driver and ball head bearings, the number of the piezoelectric ceramic driver assemblies is three, the piezoelectric ceramic driver is fixed on the base, the three piezoelectric ceramic driver assemblies are configured in a manner of right triangle; a load-bearing stage assembly including a load-bearing stage, the load-bearing stage assembly is set with an arc-shaped groove for holding a first ball head bearing, a strip-shaped for holding a second ball head bearing and a plane boss for holding a third ball head bearing; a tension spring assembly connected with the base and the load-bearing stage for realizing force sealing of the load-bearing stage and the base. The invention has specific position under natural placement state; under the action of driving, the invention has specific movement, thus solving the problem of restricting shortage of existing focusing adjustment leveling mechanism. By adopting kinematic structure, the invention eliminates the redundant degree of freedom in vertical direction of three-point support type leveling mechanism, improves rigidity and stability of the mechanism.

Description

Photo-etching machine focusing levelling gear and litho machine levelling gear
[technical field]
The present invention relates to field of precision instruments, particularly relate to a kind of photo-etching machine focusing levelling gear and litho machine levelling gear.
[background technology]
Litho machine is as the core driving force that promotes the integrated circuit development, and the development of integrated circuit has proposed more and more higher requirement to litho machine resolution.But along with the raising of litho machine resolution, the depth of focus of photo-etching machine objective lens is acceleration shortening trend, if actual focal does not reach the depth of focus tolerance limit that photoetching process requires, will have a strong impact on the yield rate of exposure lines quality and integrated circuit.Depth of focus has become and has hindered light projection lithography technology to the key factor of high resolving power development more.In order to take full advantage of the limited depth of focus of optical system, when exposure, need to focus and leveling to silicon chip.Therefore, accurate, efficient focusing and leveling mechanism is very great to the meaning of light projection lithography.
At present, the bikini focusing and leveling mechanism that uses in litho machine mainly is divided into two kinds, and a kind of is flexible hinge chain type supported at three point focusing and leveling mechanism, and another kind is screw type supported at three point focusing and leveling mechanism.Flexible hinge chain type supported at three point focusing and leveling mechanism includes three piezoelectric ceramic actuators that are equilateral triangle configuration, and an end and the base of one of them driver are connected, and the other end and plummer are connected by flexible hinge and base and plummer.This focusing and leveling mechanism has one around the rotational freedom of vertical direction under state of nature, mechanism is in the underconstrained state; But under the input state, mechanism has two degree of freedom, the driving of mechanism input number is less than number of degrees of freedom,, mechanism is in and owes to determine motion state.Because around the existence of vertical direction rotational freedom, this makes mechanism greatly reduce in the rigidity of this direction, be easy to cause plummer to tilt the poor stability of mechanism; In the leveling process, be easy to relatively rotate in this direction, thereby leveling work is brought uncertainty, cause the leveling speed of convergence low, reduced leveling efficient, and be unfavorable for the maintenance of silicon chip leveling precision.Simultaneously, the design of flexible hinge structure and control complexity in the mechanism, the processing and manufacturing cost is high.Screw type supported at three point focusing and leveling mechanism includes three groups of motors/leading screw supporting construction, and is the equilateral triangle configuration.Mechanism freedom and about beam analysis show: there is equally underconstrained in this levelling gear and owes to determine motion problems, the poor stability of mechanism.In the leveling process, plummer might occur to cause the leveling speed of convergence low around the rotation of vertical direction or the translation on the plane, has reduced leveling efficient.Simultaneously, this mechanism only can realize leveling, can not focus, and needs to adopt separately parallelogram flexible hinge structure to focus, and this has increased the size of mechanism at vertical direction greatly, and complex structure is compact not.
[summary of the invention]
Based on this, be necessary to provide a kind of Complete Bind, have Kinematic determination, low processing cost and satisfy the photo-etching machine focusing levelling gear of Real-time Focusing leveling requirement.
A kind of photo-etching machine focusing levelling gear comprises: base; The piezoelectric ceramic actuator assembly, comprise the piezoelectric ceramic actuator and the bulb supporting that are fixedly connected with, the quantity of described piezoelectric ceramic actuator assembly is three, and described piezoelectric ceramic actuator is fixed on the described base, three rectangular triangular arrangement of described piezoelectric ceramic actuator assembly; The plummer assembly, comprise plummer, described plummer assembly offers for the deep-slotted chip breaker of accommodating the first bulb supporting, is used for the strip slot of accommodating the second bulb supporting and is used for the plane boss that accommodating the 3rd bulb supports, and deep-slotted chip breaker, strip slot and the rectangular triangular arrangement of plane boss; Tension spring component is fixedly connected with plummer with described base, is used for realizing the force-closed of plummer and base.
Preferably, described right-angle triangle is isosceles right triangle, and the right angle is the corresponding angle of described deep-slotted chip breaker.
Preferably, described deep-slotted chip breaker is taper hole or circular hole, and the cross section of described strip slot is V-arrangement or circular arc, and the groove of strip slot arranges the plane boss and is used for accommodating described the 3rd bulb to identical with the right-angle side direction at its place on the described plummer.
Preferably, described tension spring component comprises interconnective extension spring and rod assembly, the quantity of described rod assembly is two and is arranged at respectively an end of extension spring, described rod assembly comprises bearing seat, oscillating bearing and thread, described oscillating bearing is located in the bearing seat, connect described oscillating bearing and thread, described bearing seat is provided with opening, described thread is connected with described extension spring from described opening projecting shaft bearing, the first rod assembly in the described rod assembly is fixedly connected with base, and the second rod assembly is fixedly connected with plummer.
Preferably, described oscillating bearing is a kind of in thrust articulated bearing, angular contact articulated bearing and the bulb spherical plain bearing rod end.
Above-mentioned photo-etching machine focusing levelling gear, under natural laying state, 6 degree of freedom of focusing and leveling mechanism plummer are by Complete Bind, and plummer has definite position, has solved thus the underconstrained problem of existing focusing and leveling mechanism.Under the driving of piezoelectric ceramic actuator assembly, the input number of focusing and leveling mechanism equals the mechanism freedom number, and mechanism has definite motion, and what solved thus existing focusing and leveling mechanism owes to determine motion problems.By adopting kinematic structure, eliminated the redundant degree of freedom of Three-points supporting type levelling gear vertical direction, avoided this degree of freedom to destroy the problem of silicon chip leveling precision, and improved rigidity and the stability of mechanism, it is little to have deformed element, the characteristics that environmental suitability is strong; Simultaneously, cancel the flexible hinge structure of levelling gear by the kinematics interface, greatly simplified the Design and manufacture of system, reduced cost.
A kind of photo-etching machine focusing levelling gear also is provided.
A kind of photo-etching machine focusing levelling gear comprises: base; The piezoelectric ceramic actuator assembly, comprise the piezoelectric ceramic actuator and the bulb supporting that are fixedly connected with, the quantity of described piezoelectric ceramic actuator assembly is three, and described piezoelectric ceramic actuator is fixed on the described base, three rectangular triangular arrangement of described piezoelectric ceramic actuator assembly; The plummer assembly comprises plummer, and described plummer assembly offers the strip slot that is respectively applied to accommodating three bulbs supporting; Tension spring component is fixedly connected with plummer with described base, is used for realizing the force-closed of plummer and base.
Preferably, the cross section of described strip slot is V-arrangement or circular arc, and the groove of strip slot that is positioned at right-angle side is to identical with the right-angle side direction at its place.
A kind of litho machine levelling gear also is provided.
A kind of litho machine levelling gear comprises: base; The piezoelectric ceramic actuator assembly comprises the piezoelectric ceramic actuator and the bulb supporting that are fixedly connected with, and the quantity of described piezoelectric ceramic actuator assembly is two, and described piezoelectric ceramic actuator is fixed on the described base; Bulb pole comprises pole and the bulb that is fixed in described pole one end, and described pole is fixedly connected with described base; Described two piezoelectric ceramic actuator assemblies and the rectangular triangular arrangement of bulb pole; The plummer assembly, comprise plummer, described plummer assembly is provided with deep-slotted chip breaker for accommodating described bulb, be used for the strip slot of accommodating the first bulb supporting and be used for the platform boss of accommodating the second bulb supporting, and deep-slotted chip breaker, strip slot and the rectangular triangular arrangement of plane boss; Tension spring component is fixedly connected with plummer with described base, is used for realizing the force-closed of plummer and base.
Preferably, described triangle is isosceles right triangle, and the right angle is the corresponding angle of described deep-slotted chip breaker.
Preferably, described deep-slotted chip breaker is taper hole or circular hole, and the cross section of described strip slot is V-arrangement or circular arc, and the groove of strip slot is to identical with the right-angle side direction at its place.
[description of drawings]
Fig. 1 is the structural representation of focusing and leveling mechanism among the embodiment;
Fig. 2 is the left view of the focusing and leveling mechanism in embodiment illustrated in fig. 1;
Fig. 3 is the structural representation of base among the embodiment;
Fig. 4 is the structural representation of piezoelectric ceramic actuator assembly among the embodiment;
Fig. 5 is the structural representation of the bulb pole of piezoelectric ceramic actuator assembly among the embodiment;
Fig. 6 is the structural representation of plummer assembly among the embodiment;
Fig. 7 is the structural representation of plummer among the embodiment;
Fig. 8 is the phantom view of tension spring component.
[embodiment]
For the object of the invention, feature and advantage can more be become apparent, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.
Fig. 1 is the structural representation of focusing and leveling mechanism among the embodiment, Fig. 2 is the left view of the focusing and leveling mechanism in embodiment illustrated in fig. 1, focusing and leveling mechanism 100 comprises base 10, piezoelectric ceramic actuator assembly 20, plummer assembly 30 and tension spring component 40, wherein piezoelectric ceramic actuator assembly 20 is connected with base 10, tension spring component 40 is connected with plummer assembly 30 and base 10 respectively, to realize the force-closed of plummer assembly 30 and base 10.
Fig. 3 is the structural representation of base among the embodiment, be provided with three through holes on the base 10, as shown, be respectively through hole 11, through hole 12 and through hole 13, in the present embodiment, three through holes are the isosceles right triangle configuration, and wherein through hole 11 is corresponding hole, right angle, and piezoelectric ceramic actuator assembly 20 is connected by these three through holes and base 10 respectively.
Piezoelectric ceramic actuator assembly 20 comprises bulb supporting and piezoelectric ceramic actuator, wherein the bulb supporting is connected with piezoelectric ceramic actuator, the quantity of piezoelectric ceramic actuator assembly 20 is three, Fig. 4 is the structural representation of piezoelectric ceramic actuator assembly among the embodiment, and piezoelectric ceramic actuator assembly 20 comprises the piezoelectric ceramic actuator 22 and bulb supporting 21 that is fixedly connected with.The structure of three piezoelectric ceramic actuator assemblies is identical, and the structural drawing of two other piezoelectric ceramic actuator assembly does not provide herein.In the present embodiment, three piezoelectric ceramic actuator assemblies 20 are the isosceles right triangle configuration, wherein the through hole 11 on the first piezoelectric ceramic actuator and the base is connected, through hole 12 on the second piezoelectric ceramic actuator and the base is connected, and the through hole 13 on the 3rd piezoelectric ceramic actuator and the base is connected.
Fig. 6 is the structural representation of plummer assembly among the embodiment, plummer assembly 30 comprises plummer 31, plummer assembly 30 offers for the deep-slotted chip breaker 32 of accommodating the first bulb supporting with for strip slot 33, the three bulbs supporting of accommodating the second bulb supporting and is located on the plane boss 34 of plummer 31.In the present embodiment, deep-slotted chip breaker 32 is taper hole, and strip slot 33 is V-shaped groove.In other embodiments, deep-slotted chip breaker 32 can replace with circular hole, and strip slot 33 is replaceable to be arc groove.
Fig. 7 is the structural representation of plummer among the embodiment, is provided with three through holes on the plummer 31, is respectively through hole 311, through hole 312 and through hole 313, and three through holes are the isosceles right triangle configuration in the present embodiment, and wherein the right angle is corresponding is through hole 311.Plummer assembly 30 comprises that the first contact platform, the second contact platform contact platform with the 3rd.Be fixed on the plummer 31 by threaded fastener again behind three contact platform embeddings through hole separately.In the present embodiment, be to offer deep-slotted chip breaker 32 at the first contact platform, offer strip slot 33 at the second contact platform, and the groove of strip slot 33 is to along the right-angle side direction.
The supporting of the first bulb of piezoelectric ceramic actuator assembly 20 respectively with plummer assembly 30 on the taper hole of deep-slotted chip breaker 32 to consist of ball-taper hole secondary, the supporting of the second bulb contacts with the groove face of strip slot 33 and consists of ball-V-shaped groove kinematic pair, the supporting of the 3rd bulb contacts with the table top of plane boss 34 and forms ball-planar contact pair, under natural laying state, 6 degree of freedom of the plummer 31 of focusing and leveling mechanism, namely 3 rotational freedoms and 3 translational degree of freedom are by Complete Bind, plummer 31 has definite position, has solved thus the underconstrained problem of existing focusing and leveling mechanism.Under the driving of piezoelectric ceramic actuator assembly 20, the input number of focusing and leveling mechanism equals the mechanism freedom number, and mechanism has and determines motion, and what solved thus existing focusing and leveling mechanism owes to determine motion problems.
Fig. 8 is the phantom view of tension spring component.Tension spring component 40 comprises extension spring 41, lower thrust articulated bearing 42, step 43, upper thrust articulated bearing 44, top chock 45, upper thread 46 and lower thread 47.In other embodiments, thrust articulated bearing is replaceable is angular contact articulated bearing or bulb spherical plain bearing rod end.In the present embodiment, top chock 45 and the plummer 31 of tension spring component 40 are connected, and step 43 is connected with base 10, in order to realize the force-closed of plummer 31 and base 10.Extension spring 41 is arranged on the middle part of tension spring component, one end links to each other with upper thrust articulated bearing 44 by upper thread 46, the other end links to each other with lower thrust articulated bearing 42 by lower thread 47, and by upper thread 46 and lower thread 47 regulating spring pulling force, thereby adjusting is to the size of the confining force of plummer 31 and base 10.
Above-mentioned focusing and leveling mechanism 100, by adopting kinematic structure, eliminated the redundant degree of freedom of traditional levelling gear vertical direction, avoided this degree of freedom to destroy the problem of silicon chip leveling precision, and rigidity, stability and the leveling efficient of mechanism have been improved, it is little to have deformed element, the strong and characteristics of environmental suitability; Simultaneously, cancel traditional flexible hinge structure by the kinematics interface, greatly simplified the Design and manufacture of system, reduced cost.
A kind of levelling gear also is provided.The piezoelectric ceramic actuator assembly that is positioned at place, summit, right angle 20 of above-mentioned focusing and leveling mechanism 100 is adopted the replacement of bulb poles, and other structures are constant, namely obtain a kind of levelling gear.
The structural representation of bulb pole as shown in Figure 5, bulb pole 50 comprises pole 51 and is fixed in the bulb 54 of pole 50 1 ends.Bulb pole 50 contacts with the deep-slotted chip breaker 32 of plummer assembly 30 by bulb 54.Bulb pole 50 is connected with base 10 by the through hole 11 on the base 10.
Another kind of photo-etching machine focusing levelling gear also is provided, and the key distinction of itself and above-mentioned focusing and leveling mechanism 100 is deep-slotted chip breaker 32 and plane boss 34 are all replaced to strip slot 33.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.

Claims (10)

1. a photo-etching machine focusing levelling gear is characterized in that, comprises
Base;
The piezoelectric ceramic actuator assembly, comprise the piezoelectric ceramic actuator and the bulb supporting that are fixedly connected with, the quantity of described piezoelectric ceramic actuator assembly is three, and described piezoelectric ceramic actuator is fixed on the described base, three rectangular triangular arrangement of described piezoelectric ceramic actuator assembly;
The plummer assembly, comprise plummer, described plummer assembly is provided with for the deep-slotted chip breaker of accommodating the first bulb supporting, is used for the strip slot of accommodating the second bulb supporting and is used for the plane boss that accommodating the 3rd bulb supports, and deep-slotted chip breaker, strip slot and the rectangular triangular arrangement of plane boss;
Tension spring component is fixedly connected with plummer with described base, is used for realizing the force-closed of plummer and base.
2. photo-etching machine focusing levelling gear according to claim 1 is characterized in that, described right-angle triangle is isosceles right triangle, and the right angle is the corresponding angle of described deep-slotted chip breaker.
3. photo-etching machine focusing levelling gear according to claim 1, it is characterized in that, described deep-slotted chip breaker is taper hole or circular hole, the cross section of described strip slot is V-arrangement or circular arc, and the groove of strip slot arranges the plane boss and is used for accommodating described the 3rd bulb to identical with the right-angle side direction at its place on the described plummer.
4. photo-etching machine focusing levelling gear according to claim 1, it is characterized in that, described tension spring component comprises interconnective extension spring and rod assembly, the quantity of described rod assembly is two and is arranged at respectively an end of extension spring, described rod assembly comprises bearing seat, oscillating bearing and thread, described oscillating bearing is located in the bearing seat, connect described oscillating bearing and thread, described bearing seat is provided with opening, described thread is connected with described extension spring from described opening projecting shaft bearing, the first rod assembly in the described rod assembly is fixedly connected with base, and the second rod assembly is fixedly connected with plummer.
5. photo-etching machine focusing levelling gear according to claim 4 is characterized in that, described oscillating bearing is a kind of in thrust articulated bearing, angular contact articulated bearing and the bulb spherical plain bearing rod end.
6. a photo-etching machine focusing levelling gear is characterized in that, comprising:
Base;
The piezoelectric ceramic actuator assembly, comprise the piezoelectric ceramic actuator and the bulb supporting that are fixedly connected with, the quantity of described piezoelectric ceramic actuator assembly is three, and described piezoelectric ceramic actuator is fixed on the described base, three rectangular triangular arrangement of described piezoelectric ceramic actuator assembly;
The plummer assembly comprises plummer, and described plummer assembly offers the strip slot that is respectively applied to accommodating three bulbs supporting;
Tension spring component is fixedly connected with plummer with described base, is used for realizing the force-closed of plummer and base.
7. a photo-etching machine focusing levelling gear according to claim 6 is characterized in that, the cross section of described strip slot is V-arrangement or circular arc.
8. a litho machine levelling gear is characterized in that, comprises
Base;
The piezoelectric ceramic actuator assembly comprises the piezoelectric ceramic actuator and the bulb supporting that are fixedly connected with, and the quantity of described piezoelectric ceramic actuator assembly is two, and described piezoelectric ceramic actuator is fixed on the described base;
Bulb pole comprises pole and the bulb that is fixed in described pole one end, and described pole is fixedly connected with described base;
The plummer assembly comprises plummer, and described plummer assembly offers for the deep-slotted chip breaker of accommodating described bulb and is used for the strip slot that accommodating the first bulb supports, and described the second bulb supporting is located on the described plummer;
Tension spring component is fixedly connected with plummer with described base, is used for realizing the force-closed of plummer and base.
9. litho machine levelling gear according to claim 8 is characterized in that, described triangle is isosceles right triangle, and the right angle is angle corresponding to described bulb pole.
10. litho machine levelling gear according to claim 8 is characterized in that, described deep-slotted chip breaker is taper hole or circular hole, and the cross section of described strip slot is V-arrangement or circular arc, and the groove of strip slot is to identical with the right-angle side direction at its place.
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Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103279013A (en) * 2013-05-20 2013-09-04 浙江大学 Three-freedom-degree precise regulating device based on ball location
CN103465258A (en) * 2013-09-13 2013-12-25 浙江大学 Three-degree-of-freedom precision adjustment device based on flexible hinges
CN103885302A (en) * 2014-04-04 2014-06-25 中国科学院光电技术研究所 Force feedback precision supporting device for clamping optical element
CN105108742A (en) * 2015-10-20 2015-12-02 山东理工大学 Decoupled two-translation one-rotation parallel robot
CN106575086A (en) * 2014-08-01 2017-04-19 株式会社村田制作所 Direct exposure apparatus
CN106569397A (en) * 2016-11-12 2017-04-19 中国科学院长春光学精密机械与物理研究所 Positioning system and positioning method for object image surface
CN107665848A (en) * 2016-07-29 2018-02-06 上海微电子装备(集团)股份有限公司 One kind solution bonding levelling device and solution bonding method
CN107727087A (en) * 2017-10-24 2018-02-23 赛而乐电器有限公司 Marker with leveling structure
CN108224017A (en) * 2018-02-05 2018-06-29 上海海事大学 3 platform structures and its control method with level-regulating system
CN108897187A (en) * 2018-06-20 2018-11-27 苏州佳世达光电有限公司 Projector
CN110185902A (en) * 2019-07-02 2019-08-30 中国科学院青岛生物能源与过程研究所 Three axis levelling devices of one kind and its application
WO2019228500A1 (en) * 2018-05-31 2019-12-05 上海微电子装备(集团)股份有限公司 Adsorption carrying table and lithographic apparatus
CN112161936A (en) * 2020-09-29 2021-01-01 杭州海康威视数字技术股份有限公司 Optical inspection device for cigarette packets
CN112612182A (en) * 2020-12-09 2021-04-06 胡满 High-precision chip photoetching machine and production process
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101063810A (en) * 2007-05-29 2007-10-31 中国科学院光电技术研究所 Ultraviolet illumination micro-nano graph air pressure imprinting and photoetching dual-purpose copying device
WO2011009094A2 (en) * 2009-07-17 2011-01-20 Nanoink, Inc. Leveling devices and methods
CN102012646A (en) * 2010-10-20 2011-04-13 中国科学院光电技术研究所 Leveling system of photoetching machine
CN102043351A (en) * 2009-10-12 2011-05-04 上海微电子装备有限公司 Leveling and focusing mechanism and mask platform with same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101063810A (en) * 2007-05-29 2007-10-31 中国科学院光电技术研究所 Ultraviolet illumination micro-nano graph air pressure imprinting and photoetching dual-purpose copying device
WO2011009094A2 (en) * 2009-07-17 2011-01-20 Nanoink, Inc. Leveling devices and methods
CN102043351A (en) * 2009-10-12 2011-05-04 上海微电子装备有限公司 Leveling and focusing mechanism and mask platform with same
CN102012646A (en) * 2010-10-20 2011-04-13 中国科学院光电技术研究所 Leveling system of photoetching machine

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103279013A (en) * 2013-05-20 2013-09-04 浙江大学 Three-freedom-degree precise regulating device based on ball location
CN103465258A (en) * 2013-09-13 2013-12-25 浙江大学 Three-degree-of-freedom precision adjustment device based on flexible hinges
CN103465258B (en) * 2013-09-13 2015-08-26 浙江大学 A kind of Three-degree-of-freeprecision precision adjustment device based on flexible hinge
CN103885302B (en) * 2014-04-04 2016-03-30 中国科学院光电技术研究所 Force feedback precision supporting device for clamping optical element
CN103885302A (en) * 2014-04-04 2014-06-25 中国科学院光电技术研究所 Force feedback precision supporting device for clamping optical element
CN106575086A (en) * 2014-08-01 2017-04-19 株式会社村田制作所 Direct exposure apparatus
CN105108742A (en) * 2015-10-20 2015-12-02 山东理工大学 Decoupled two-translation one-rotation parallel robot
CN105108742B (en) * 2015-10-20 2020-05-05 山东理工大学 Decoupling type two-translation one-rotation parallel robot
CN107665848A (en) * 2016-07-29 2018-02-06 上海微电子装备(集团)股份有限公司 One kind solution bonding levelling device and solution bonding method
US10971380B2 (en) 2016-07-29 2021-04-06 Shanghai Micro Electronics Equipment (Group) Co., Ltd. De-bonding leveling device and de-bonding method
CN107665848B (en) * 2016-07-29 2020-08-25 上海微电子装备(集团)股份有限公司 Debonding and leveling device and debonding method
CN106569397A (en) * 2016-11-12 2017-04-19 中国科学院长春光学精密机械与物理研究所 Positioning system and positioning method for object image surface
CN107727087B (en) * 2017-10-24 2019-12-06 赛而乐电器有限公司 Ink line instrument with leveling structure
CN107727087A (en) * 2017-10-24 2018-02-23 赛而乐电器有限公司 Marker with leveling structure
CN108224017A (en) * 2018-02-05 2018-06-29 上海海事大学 3 platform structures and its control method with level-regulating system
CN110554573A (en) * 2018-05-31 2019-12-10 上海微电子装备(集团)股份有限公司 adsorption stage and lithographic apparatus
WO2019228500A1 (en) * 2018-05-31 2019-12-05 上海微电子装备(集团)股份有限公司 Adsorption carrying table and lithographic apparatus
CN108897187A (en) * 2018-06-20 2018-11-27 苏州佳世达光电有限公司 Projector
CN110185902A (en) * 2019-07-02 2019-08-30 中国科学院青岛生物能源与过程研究所 Three axis levelling devices of one kind and its application
CN112161936A (en) * 2020-09-29 2021-01-01 杭州海康威视数字技术股份有限公司 Optical inspection device for cigarette packets
CN112161936B (en) * 2020-09-29 2024-05-24 杭州海康威视数字技术股份有限公司 Optical detection device for cigarette packets
CN112612182A (en) * 2020-12-09 2021-04-06 胡满 High-precision chip photoetching machine and production process
CN113547493A (en) * 2021-07-12 2021-10-26 浙江科技学院 Automatic leveling method for working platform

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CN102854751B (en) 2014-12-10

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Application publication date: 20130102

Assignee: Dongguan Hezhi Intelligent Technology Co.,Ltd.

Assignor: SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY CHINESE ACADEMY OF SCIENCES

Contract record no.: X2023980040928

Denomination of invention: Lithography machine focusing and leveling mechanism and lithography machine leveling mechanism

Granted publication date: 20141210

License type: Common License

Record date: 20230831

EE01 Entry into force of recordation of patent licensing contract