CN103975436B - 制造无源光学器件和包含该无源光学器件的装置的方法 - Google Patents
制造无源光学器件和包含该无源光学器件的装置的方法 Download PDFInfo
- Publication number
- CN103975436B CN103975436B CN201280045590.9A CN201280045590A CN103975436B CN 103975436 B CN103975436 B CN 103975436B CN 201280045590 A CN201280045590 A CN 201280045590A CN 103975436 B CN103975436 B CN 103975436B
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- optical
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00278—Lenticular sheets
- B29D11/00307—Producing lens wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00365—Production of microlenses
- B29D11/00375—Production of microlenses by moulding lenses in holes through a substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00932—Combined cutting and grinding thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0085—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras employing wafer level optics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/16—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits
- H01L25/167—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2063/00—Use of EP, i.e. epoxy resins or derivatives thereof, as moulding material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/804—Containers or encapsulations
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Optical Elements Other Than Lenses (AREA)
- Light Receiving Elements (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
- Led Device Packages (AREA)
- Optical Integrated Circuits (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161509357P | 2011-07-19 | 2011-07-19 | |
| US61/509357 | 2011-07-19 | ||
| PCT/CH2012/000160 WO2013010285A1 (en) | 2011-07-19 | 2012-07-10 | Method for manufacturing passive optical components, and devices comprising the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103975436A CN103975436A (zh) | 2014-08-06 |
| CN103975436B true CN103975436B (zh) | 2019-05-10 |
Family
ID=46639253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201280045590.9A Active CN103975436B (zh) | 2011-07-19 | 2012-07-10 | 制造无源光学器件和包含该无源光学器件的装置的方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (4) | US8767303B2 (enExample) |
| EP (1) | EP2735029B1 (enExample) |
| JP (2) | JP2014521992A (enExample) |
| KR (1) | KR101966478B1 (enExample) |
| CN (1) | CN103975436B (enExample) |
| SG (1) | SG10201605834YA (enExample) |
| TW (3) | TWI647824B (enExample) |
| WO (1) | WO2013010285A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG191817A1 (en) * | 2011-07-19 | 2013-08-30 | Heptagon Micro Optics Pte Ltd | Opto -electronic modules and methods of manufacturing the same |
| EP2742529B1 (en) * | 2011-08-10 | 2020-11-11 | Heptagon Micro Optics Pte. Ltd. | Opto-electronic module and method for manufacturing the same |
| EP3396716B1 (en) | 2012-08-20 | 2020-10-14 | Heptagon Micro Optics Pte. Ltd. | Fabrication of optics wafer |
| EP2827368B1 (en) | 2013-07-19 | 2019-06-05 | ams AG | Package for an optical sensor, optical sensor arrangement and method of producing a package for an optical sensor |
| WO2015016772A1 (en) | 2013-07-31 | 2015-02-05 | Heptagon Micro Optics Pte. Ltd. | Micro-optical orientation sensor and related methods |
| NL2011843C2 (en) | 2013-11-26 | 2015-05-27 | Anteryon Wafer Optics B V | A method for manufacturing an optical assembly. |
| US9711552B2 (en) * | 2014-08-19 | 2017-07-18 | Heptagon Micro Optics Pte. Ltd. | Optoelectronic modules having a silicon substrate, and fabrication methods for such modules |
| US9829614B2 (en) | 2015-02-02 | 2017-11-28 | Synaptics Incorporated | Optical sensor using collimator |
| US20160307881A1 (en) * | 2015-04-20 | 2016-10-20 | Advanced Semiconductor Engineering, Inc. | Optical sensor module and method for manufacturing the same |
| WO2016208403A1 (ja) * | 2015-06-23 | 2016-12-29 | ソニー株式会社 | イメージセンサ、および電子機器 |
| JP2017022200A (ja) | 2015-07-08 | 2017-01-26 | ソニーセミコンダクタソリューションズ株式会社 | イメージセンサ、および電子機器 |
| WO2017062506A1 (en) * | 2015-10-07 | 2017-04-13 | Synaptics Incorporated | Image sensor structures for fingerprint sensing |
| KR101738883B1 (ko) * | 2016-01-06 | 2017-05-23 | 한국과학기술원 | 초박형 디지털 카메라 및 그 제조 방법 |
| JP6740628B2 (ja) * | 2016-02-12 | 2020-08-19 | 凸版印刷株式会社 | 固体撮像素子及びその製造方法 |
| WO2017155460A1 (en) * | 2016-03-08 | 2017-09-14 | Tnc Optics & Technologies Pte. Ltd. | A fabrication method of optical sensor cover having a lens |
| DE112020000917T5 (de) * | 2019-02-25 | 2021-11-04 | Ams Sensors Singapore Pte. Ltd. | Herstellung von optischen diffusoren und optische diffusoren |
| US10734184B1 (en) | 2019-06-21 | 2020-08-04 | Elbit Systems Of America, Llc | Wafer scale image intensifier |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4952026A (en) * | 1988-10-14 | 1990-08-28 | Corning Incorporated | Integral optical element and method |
| US20080290435A1 (en) * | 2007-05-21 | 2008-11-27 | Micron Technology, Inc. | Wafer level lens arrays for image sensor packages and the like, image sensor packages, and related methods |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3532038A (en) * | 1967-06-05 | 1970-10-06 | Ibm | Multi-lens devices for the fabrication of semiconductor devices |
| JPS5590909A (en) * | 1978-12-28 | 1980-07-10 | Canon Inc | Production of compound eye lens device |
| AU706101B2 (en) * | 1994-12-23 | 1999-06-10 | Digirad | Semiconductor gamma-ray camera and medical imaging system |
| EP1251365B1 (en) * | 2001-04-20 | 2004-02-25 | Matsushita Electric Industrial Co., Ltd. | Microlens array and method of its manufacturing |
| JP2003004909A (ja) * | 2001-04-20 | 2003-01-08 | Matsushita Electric Ind Co Ltd | マイクロレンズアレイの製造方法及びマイクロレンズアレイ |
| TW200506418A (en) * | 2003-07-01 | 2005-02-16 | Nippon Sheet Glass Co Ltd | Lens plate, its manufacturing method, and image transmitting apparatus |
| JP2005072662A (ja) * | 2003-08-25 | 2005-03-17 | Sharp Corp | 透光板および透光板の製造方法、並びに透光板を用いた画像入力装置 |
| EP1569276A1 (en) | 2004-02-27 | 2005-08-31 | Heptagon OY | Micro-optics on optoelectronics |
| US7399421B2 (en) * | 2005-08-02 | 2008-07-15 | International Business Machines Corporation | Injection molded microoptics |
| JP2007148297A (ja) * | 2005-11-30 | 2007-06-14 | Hitachi Maxell Ltd | バックライト用光学シート、バックライト及び表示装置 |
| KR100802199B1 (ko) * | 2006-05-25 | 2008-03-17 | 정경희 | 광모듈 및 그 제조방법 |
| EP1870936A1 (fr) * | 2006-06-19 | 2007-12-26 | STMicroelectronics (Rousset) SAS | Procédé de fabrication de lentilles, notamment pour imageur intégré |
| US8013289B2 (en) * | 2006-11-15 | 2011-09-06 | Ether Precision, Inc. | Lens array block for image capturing unit and methods of fabrication |
| CN101990711B (zh) * | 2007-11-27 | 2017-05-17 | 新加坡恒立私人有限公司 | 密封的透镜叠组 |
| TWI478808B (zh) * | 2007-12-19 | 2015-04-01 | Heptagon Micro Optics Pte Ltd | 製造光學元件的方法 |
| TWI505703B (zh) | 2007-12-19 | 2015-10-21 | 新加坡恒立私人有限公司 | 光學模組,晶圓等級的封裝及其製造方法 |
| US7920328B2 (en) * | 2008-02-28 | 2011-04-05 | Visera Technologies Company Limited | Lens module and a method for fabricating the same |
| JP5030828B2 (ja) * | 2008-03-18 | 2012-09-19 | 株式会社沖データ | レンズアレイ並びにそれを有するledヘッド、露光装置、画像形成装置及び読取装置 |
| JP4420141B2 (ja) * | 2008-04-28 | 2010-02-24 | コニカミノルタオプト株式会社 | ウエハレンズの製造方法及びウエハレンズ |
| JP4906798B2 (ja) * | 2008-07-01 | 2012-03-28 | 株式会社沖データ | レンズアレイ、ledヘッド、露光装置、画像形成装置及び読取装置 |
| JP4966931B2 (ja) * | 2008-08-26 | 2012-07-04 | シャープ株式会社 | 電子素子ウエハモジュールおよびその製造方法、電子素子モジュールおよびその製造方法、電子情報機器 |
| WO2010055801A1 (ja) | 2008-11-17 | 2010-05-20 | コニカミノルタオプト株式会社 | 光学素子の製造方法及び光学素子 |
| JP2010204632A (ja) | 2009-02-06 | 2010-09-16 | Fujifilm Corp | ウェハレベルレンズアレイの製造方法、ウェハレンズアレイ、レンズモジュール及び撮像ユニット |
| JP2010204635A (ja) * | 2009-02-06 | 2010-09-16 | Fujifilm Corp | レンズアレイ |
| WO2010139342A1 (en) * | 2009-06-02 | 2010-12-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. | Lens and method for manufacturing same |
| CN102023330A (zh) * | 2009-09-15 | 2011-04-20 | 鸿富锦精密工业(深圳)有限公司 | 遮光元件阵列、遮光元件阵列制造方法及镜头模组阵列 |
| JP2011097294A (ja) | 2009-10-28 | 2011-05-12 | Olympus Corp | 撮像装置および撮像装置の製造方法 |
| WO2011055654A1 (ja) * | 2009-11-05 | 2011-05-12 | コニカミノルタオプト株式会社 | 撮像装置及びこの撮像装置の製造方法 |
| JP2011104811A (ja) | 2009-11-13 | 2011-06-02 | Fujifilm Corp | マスタ型、マスタの作成方法及びマスタ |
| CN102652284B (zh) * | 2009-12-11 | 2014-10-08 | 富士胶片株式会社 | 黑色可固化组合物、遮光彩色滤光片、遮光膜及其制备方法,晶片级透镜,以及固态成像器件 |
| CN102130138B (zh) * | 2010-01-12 | 2013-01-02 | 中芯国际集成电路制造(上海)有限公司 | 图像传感器及其形成方法 |
| US7974023B1 (en) * | 2010-03-11 | 2011-07-05 | Himax Semiconductor, Inc. | Wafer level optical lens substrate, wafer level optical lens module and fabrication method thereof |
| TWM399313U (en) | 2010-07-30 | 2011-03-01 | Sigurd Microelectronics Corp | Proximity sensor package structure |
| SG11201400917VA (en) * | 2011-10-06 | 2014-07-30 | Heptagon Micro Optics Pte Ltd | Method for wafer-level manufacturing of objects and corresponding semi-finished products |
| JP2014190988A (ja) * | 2013-03-26 | 2014-10-06 | Fuji Xerox Co Ltd | レンズアレイ及びレンズアレイ製造方法 |
-
2012
- 2012-07-10 SG SG10201605834YA patent/SG10201605834YA/en unknown
- 2012-07-10 WO PCT/CH2012/000160 patent/WO2013010285A1/en not_active Ceased
- 2012-07-10 EP EP12743875.2A patent/EP2735029B1/en active Active
- 2012-07-10 CN CN201280045590.9A patent/CN103975436B/zh active Active
- 2012-07-10 KR KR1020147004151A patent/KR101966478B1/ko active Active
- 2012-07-10 JP JP2014520486A patent/JP2014521992A/ja active Pending
- 2012-07-17 TW TW106113502A patent/TWI647824B/zh active
- 2012-07-17 TW TW106126425A patent/TWI647825B/zh active
- 2012-07-17 TW TW101125645A patent/TWI635601B/zh active
- 2012-07-19 US US13/553,385 patent/US8767303B2/en active Active
-
2014
- 2014-05-28 US US14/288,755 patent/US9193120B2/en active Active
-
2015
- 2015-10-14 US US14/882,905 patent/US9610743B2/en active Active
-
2017
- 2017-02-24 US US15/441,515 patent/US10527762B2/en active Active
- 2017-03-07 JP JP2017042941A patent/JP6763807B2/ja active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4952026A (en) * | 1988-10-14 | 1990-08-28 | Corning Incorporated | Integral optical element and method |
| US20080290435A1 (en) * | 2007-05-21 | 2008-11-27 | Micron Technology, Inc. | Wafer level lens arrays for image sensor packages and the like, image sensor packages, and related methods |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI635601B (zh) | 2018-09-11 |
| US10527762B2 (en) | 2020-01-07 |
| US20140347747A1 (en) | 2014-11-27 |
| US8767303B2 (en) | 2014-07-01 |
| EP2735029A1 (en) | 2014-05-28 |
| EP2735029B1 (en) | 2022-12-21 |
| US9610743B2 (en) | 2017-04-04 |
| WO2013010285A1 (en) | 2013-01-24 |
| TWI647824B (zh) | 2019-01-11 |
| US20170235026A1 (en) | 2017-08-17 |
| US20130033767A1 (en) | 2013-02-07 |
| TWI647825B (zh) | 2019-01-11 |
| TW201310626A (zh) | 2013-03-01 |
| CN103975436A (zh) | 2014-08-06 |
| JP6763807B2 (ja) | 2020-09-30 |
| US9193120B2 (en) | 2015-11-24 |
| US20160031169A1 (en) | 2016-02-04 |
| TW201820597A (zh) | 2018-06-01 |
| JP2017167533A (ja) | 2017-09-21 |
| SG10201605834YA (en) | 2016-09-29 |
| JP2014521992A (ja) | 2014-08-28 |
| KR20140054081A (ko) | 2014-05-08 |
| KR101966478B1 (ko) | 2019-04-05 |
| TW201742238A (zh) | 2017-12-01 |
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