CN103972332B - 一种p型氮化镓材料空穴激活的方法 - Google Patents
一种p型氮化镓材料空穴激活的方法 Download PDFInfo
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- CN103972332B CN103972332B CN201310039136.9A CN201310039136A CN103972332B CN 103972332 B CN103972332 B CN 103972332B CN 201310039136 A CN201310039136 A CN 201310039136A CN 103972332 B CN103972332 B CN 103972332B
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- gallium nitride
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- 229910002601 GaN Inorganic materials 0.000 title claims abstract description 145
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 title claims abstract description 122
- 238000000034 method Methods 0.000 title claims abstract description 56
- 239000000463 material Substances 0.000 title claims abstract description 44
- 239000008246 gaseous mixture Substances 0.000 claims abstract description 22
- 230000004913 activation Effects 0.000 claims abstract description 16
- 239000011777 magnesium Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 14
- 238000002360 preparation method Methods 0.000 claims description 10
- 229910002704 AlGaN Inorganic materials 0.000 claims description 9
- 239000012159 carrier gas Substances 0.000 claims description 8
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims description 8
- 239000002019 doping agent Substances 0.000 claims description 7
- MHYQBXJRURFKIN-UHFFFAOYSA-N C1(C=CC=C1)[Mg] Chemical compound C1(C=CC=C1)[Mg] MHYQBXJRURFKIN-UHFFFAOYSA-N 0.000 claims description 6
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052594 sapphire Inorganic materials 0.000 claims description 3
- 239000010980 sapphire Substances 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000012545 processing Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 59
- 210000004027 cell Anatomy 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 6
- 239000011701 zinc Substances 0.000 description 4
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 210000004666 bacterial spore Anatomy 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000344 low-energy electron-beam lithography Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
- H01L33/007—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound comprising nitride compounds
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/38—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/403—AIII-nitrides
- C30B29/406—Gallium nitride
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201310039136.9A CN103972332B (zh) | 2013-01-31 | 2013-01-31 | 一种p型氮化镓材料空穴激活的方法 |
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CN201310039136.9A CN103972332B (zh) | 2013-01-31 | 2013-01-31 | 一种p型氮化镓材料空穴激活的方法 |
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CN103972332A CN103972332A (zh) | 2014-08-06 |
CN103972332B true CN103972332B (zh) | 2016-09-07 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105513951B (zh) * | 2015-12-25 | 2018-06-19 | 中国科学院半导体研究所 | 低电阻率p型氮化镓材料及其制备方法 |
CN106299070B (zh) * | 2016-09-30 | 2018-12-04 | 安徽三安光电有限公司 | 一种发光二极管外延层及其制备方法 |
CN109518278B (zh) * | 2018-11-12 | 2020-12-08 | 厦门大学 | 一种富氮气氛增强氮化硼薄膜p型导电掺杂的方法 |
CN109904066B (zh) * | 2019-01-24 | 2021-10-01 | 华灿光电(浙江)有限公司 | GaN基发光二极管外延片的制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1255291A2 (en) * | 2001-04-30 | 2002-11-06 | LumiLeds Lighting U.S., LLC | Forming low resistivity P-type gallium nitride |
CN101471408A (zh) * | 2007-12-28 | 2009-07-01 | 北京大学 | 镁掺杂氮化镓基材料和发光二极管p型氮化镓的激活方法 |
CN101740690A (zh) * | 2009-12-02 | 2010-06-16 | 中国科学院半导体研究所 | 一种提高镁在ⅲ-ⅴ族氮化物中激活效率的方法 |
CN102769078A (zh) * | 2012-07-13 | 2012-11-07 | 合肥彩虹蓝光科技有限公司 | 高生长速率的P型GaN结构LED制造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003178987A (ja) * | 2001-12-13 | 2003-06-27 | Hitachi Cable Ltd | 窒化物系化合物半導体の製造方法及び窒化物系化合物半導体ウェハ並びに窒化物系化合物半導体デバイス |
JP2007194493A (ja) * | 2006-01-20 | 2007-08-02 | Rohm Co Ltd | 窒化物系半導体素子の製造方法 |
-
2013
- 2013-01-31 CN CN201310039136.9A patent/CN103972332B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1255291A2 (en) * | 2001-04-30 | 2002-11-06 | LumiLeds Lighting U.S., LLC | Forming low resistivity P-type gallium nitride |
CN101471408A (zh) * | 2007-12-28 | 2009-07-01 | 北京大学 | 镁掺杂氮化镓基材料和发光二极管p型氮化镓的激活方法 |
CN101740690A (zh) * | 2009-12-02 | 2010-06-16 | 中国科学院半导体研究所 | 一种提高镁在ⅲ-ⅴ族氮化物中激活效率的方法 |
CN102769078A (zh) * | 2012-07-13 | 2012-11-07 | 合肥彩虹蓝光科技有限公司 | 高生长速率的P型GaN结构LED制造方法 |
Non-Patent Citations (1)
Title |
---|
p型氮化镓不同掺杂方法研究;邢艳辉等;《功能材料》;20071231;第38卷(第7期);第1123-1124页 * |
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Effective date of registration: 20201009 Address after: 241000 No.3 Lingyuan Road, Jiujiang District, Wuhu City, Anhui Province Patentee after: Zhang Yukai Address before: 261061 No. 9, Golden Road, hi tech Zone, Shandong, Weifang Patentee before: SHANDONG INSPUR HUAGUANG OPTOELECTRONICS Co.,Ltd. |
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Effective date of registration: 20230419 Address after: 454100 South side of Jixiang Road West Section, Yuecun Street Office, Wen County, Jiaozuo City, Henan Province Patentee after: HENAN HAIZHIDE HIGH-TECH ENVIRONMENTAL PROTECTION TECHNOLOGY CO.,LTD. Address before: 241000 No.3, Lingyuan Road, Jiujiang District, Wuhu City, Anhui Province Patentee before: Zhang Yukai |
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