CN103946006A - 层压方法及层压装置 - Google Patents

层压方法及层压装置 Download PDF

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Publication number
CN103946006A
CN103946006A CN201280057213.7A CN201280057213A CN103946006A CN 103946006 A CN103946006 A CN 103946006A CN 201280057213 A CN201280057213 A CN 201280057213A CN 103946006 A CN103946006 A CN 103946006A
Authority
CN
China
Prior art keywords
vacuum
lower chambers
machined object
laminating method
laminater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201280057213.7A
Other languages
English (en)
Chinese (zh)
Inventor
笠原昌人
榊原活之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nisshinbo Mechatronics Inc
Original Assignee
Nisshinbo Mechatronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nisshinbo Mechatronics Inc filed Critical Nisshinbo Mechatronics Inc
Publication of CN103946006A publication Critical patent/CN103946006A/zh
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/10Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
    • B32B37/1009Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure using vacuum and fluid pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B30PRESSES
    • B30BPRESSES IN GENERAL
    • B30B5/00Presses characterised by the use of pressing means other than those mentioned in the preceding groups
    • B30B5/02Presses characterised by the use of pressing means other than those mentioned in the preceding groups wherein the pressing means is in the form of a flexible element, e.g. diaphragm, urged by fluid pressure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/048Encapsulation of modules
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/12Photovoltaic modules
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67109Apparatus for thermal treatment mainly by convection
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
CN201280057213.7A 2011-09-29 2012-08-09 层压方法及层压装置 Pending CN103946006A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-213625 2011-09-29
JP2011213625A JP5781412B2 (ja) 2011-09-29 2011-09-29 ラミネート方法
PCT/JP2012/070781 WO2013046979A1 (ja) 2011-09-29 2012-08-09 ラミネート方法及びラミネート装置

Publications (1)

Publication Number Publication Date
CN103946006A true CN103946006A (zh) 2014-07-23

Family

ID=47995030

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280057213.7A Pending CN103946006A (zh) 2011-09-29 2012-08-09 层压方法及层压装置

Country Status (5)

Country Link
JP (1) JP5781412B2 (ja)
KR (1) KR20140070635A (ja)
CN (1) CN103946006A (ja)
TW (1) TW201345725A (ja)
WO (1) WO2013046979A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104827742A (zh) * 2014-09-10 2015-08-12 安阳高新区生产力促进中心 一种光伏组件层压机及层压工艺
CN107283988A (zh) * 2016-03-30 2017-10-24 上海渤明机电设备有限公司 一种太阳能电池层压工艺及层压阶段下腔充气系统
CN107399140A (zh) * 2017-08-17 2017-11-28 衡水英利新能源有限公司 一种太阳能光伏组件的层压方法及层压机
CN107833942A (zh) * 2017-11-24 2018-03-23 河北羿珩科技有限责任公司 多功能层压机及其使用方法
CN109904267A (zh) * 2019-04-12 2019-06-18 徐圣最 一种真空层压机的层压结构

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015037135A1 (ja) * 2013-09-13 2015-03-19 株式会社エヌ・ピー・シー 曲面モジュールの積層化装置および積層化方法
JP6403159B2 (ja) * 2015-02-26 2018-10-10 株式会社日立プラントメカニクス フィルムの真空ラミネート装置
CN105415858B (zh) * 2015-12-28 2017-09-29 合肥晶澳太阳能科技有限公司 一种具有报警提示功能的光伏组件用层压机
WO2020121036A1 (en) 2018-12-13 2020-06-18 Arcelormittal Lamination device and process thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0755080A2 (en) * 1995-07-19 1997-01-22 Canon Kabushiki Kaisha A semiconductor device and a process for the production thereof
CN1507077A (zh) * 2002-12-13 2004-06-23 ������������ʽ���� 太阳能电池组件的制造方法
US20050056363A1 (en) * 2003-09-16 2005-03-17 Canon Kabushiki Kaisha Thermal contact-bonding method and thermal contact-bonding apparatus
JP4023961B2 (ja) * 1999-09-27 2007-12-19 日清紡績株式会社 太陽電池におけるラミネート方法及びそのラミネート装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6389327A (ja) * 1986-10-02 1988-04-20 Stanley Electric Co Ltd 熱圧着装置
JP3890206B2 (ja) * 2001-05-22 2007-03-07 日清紡績株式会社 ラミネート装置におけるダイヤフラムの取付方法とこの方法を用いたラミネート装置
JP2008047765A (ja) * 2006-08-18 2008-02-28 Npc Inc ラミネート装置
JP5448728B2 (ja) * 2008-11-26 2014-03-19 京セラ株式会社 太陽電池モジュールのラミネータ及びこれにより製造された太陽電池モジュール
JP2011135068A (ja) * 2009-11-26 2011-07-07 Kyocera Corp 太陽電池モジュールの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0755080A2 (en) * 1995-07-19 1997-01-22 Canon Kabushiki Kaisha A semiconductor device and a process for the production thereof
JP4023961B2 (ja) * 1999-09-27 2007-12-19 日清紡績株式会社 太陽電池におけるラミネート方法及びそのラミネート装置
CN1507077A (zh) * 2002-12-13 2004-06-23 ������������ʽ���� 太阳能电池组件的制造方法
US20050056363A1 (en) * 2003-09-16 2005-03-17 Canon Kabushiki Kaisha Thermal contact-bonding method and thermal contact-bonding apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104827742A (zh) * 2014-09-10 2015-08-12 安阳高新区生产力促进中心 一种光伏组件层压机及层压工艺
CN107283988A (zh) * 2016-03-30 2017-10-24 上海渤明机电设备有限公司 一种太阳能电池层压工艺及层压阶段下腔充气系统
CN107399140A (zh) * 2017-08-17 2017-11-28 衡水英利新能源有限公司 一种太阳能光伏组件的层压方法及层压机
CN107833942A (zh) * 2017-11-24 2018-03-23 河北羿珩科技有限责任公司 多功能层压机及其使用方法
CN107833942B (zh) * 2017-11-24 2024-01-23 河北羿珩科技有限责任公司 多功能层压机及其使用方法
CN109904267A (zh) * 2019-04-12 2019-06-18 徐圣最 一种真空层压机的层压结构

Also Published As

Publication number Publication date
JP2013071387A (ja) 2013-04-22
WO2013046979A1 (ja) 2013-04-04
TW201345725A (zh) 2013-11-16
JP5781412B2 (ja) 2015-09-24
KR20140070635A (ko) 2014-06-10

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Effective date of abandoning: 20170517