CN103817600B - 一种双面抛光用抛光布的修整工艺 - Google Patents
一种双面抛光用抛光布的修整工艺 Download PDFInfo
- Publication number
- CN103817600B CN103817600B CN201210465591.0A CN201210465591A CN103817600B CN 103817600 B CN103817600 B CN 103817600B CN 201210465591 A CN201210465591 A CN 201210465591A CN 103817600 B CN103817600 B CN 103817600B
- Authority
- CN
- China
- Prior art keywords
- polishing
- skive
- polishing cloth
- trim process
- twin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
Abstract
Description
压力 | 下盘转速 | 上盘转速 | 边缘轮转速 | 太阳轮转速 | 修整时间 |
240kg | 15转/分钟 | 5转/分钟 | 5转/分钟 | -5转/分钟 | 15分钟 |
位置 | 边缘点1 | 1/2半径点1 | 中心点1 | 中心点2 | 1/2半径点2 | 边缘点2 |
测试结果 | <15微米 | ≈15微米 | 15~20微米 | 15~20微米 | ≈15微米 | <15微米 |
压力 | 下盘转速 | 上盘转速 | 边缘轮转速 | 太阳轮转速 | 修整时间 |
240kg | 15转/分钟 | 5转/分钟 | 5转/分钟 | 15转/分钟 | 15分钟 |
位置 | 边缘点1 | 1/2半径点1 | 中心点1 | 中心点2 | 1/2半径点2 | 边缘点2 |
测试结果 | 15~20微米 | ≈15微米 | <15微米 | <15微米 | ≈15微米 | 15~20微米 |
步骤 | 压力 | 下盘转速 | 上盘转速 | 边缘轮转速 | 太阳轮转速 | 修整时间 |
1 | 240kg | 15转/分钟 | 5转/分钟 | 5转/分钟 | -5转/分钟 | 7.5分钟 |
2 | 240kg | 15转/分钟 | 5转/分钟 | 5转/分钟 | 0转/分钟 | 5秒 |
3 | 240kg | 15转/分钟 | 5转/分钟 | 5转/分钟 | 5转/分钟 | 5秒 |
4 | 240kg | 15转/分钟 | 5转/分钟 | 5转/分钟 | 15转/分钟 | 7.5分钟 |
位置 | 边缘点1 | 1/2半径点1 | 中心点1 | 中心点2 | 1/2半径点2 | 边缘点2 |
测试结果 | <15微米 | <15微米 | <15微米 | <15微米 | <15微米 | <15微米 |
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210465591.0A CN103817600B (zh) | 2012-11-16 | 2012-11-16 | 一种双面抛光用抛光布的修整工艺 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210465591.0A CN103817600B (zh) | 2012-11-16 | 2012-11-16 | 一种双面抛光用抛光布的修整工艺 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103817600A CN103817600A (zh) | 2014-05-28 |
CN103817600B true CN103817600B (zh) | 2016-05-18 |
Family
ID=50753040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210465591.0A Active CN103817600B (zh) | 2012-11-16 | 2012-11-16 | 一种双面抛光用抛光布的修整工艺 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103817600B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106141894A (zh) * | 2015-04-23 | 2016-11-23 | 中芯国际集成电路制造(上海)有限公司 | 研磨垫整理方法及研磨机台 |
CN107030607A (zh) * | 2016-03-21 | 2017-08-11 | 浙江森永光电设备有限公司 | 抛光机中抛光皮的修复方法 |
CN106312818A (zh) * | 2016-09-23 | 2017-01-11 | 江苏吉星新材料有限公司 | 一种研磨用陶瓷盘的修整方法 |
CN111318964B (zh) * | 2018-12-13 | 2021-06-22 | 有研半导体材料有限公司 | 一种延长抛光布使用寿命的处理方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08168953A (ja) * | 1994-12-16 | 1996-07-02 | Ebara Corp | ドレッシング装置 |
JPH10550A (ja) * | 1996-06-11 | 1998-01-06 | Toshiba Mach Co Ltd | 研磨布ドレッシング方法およびその装置 |
JPH10217102A (ja) * | 1997-01-30 | 1998-08-18 | Toshiba Mach Co Ltd | 研磨布のドレッシング方法およびその装置 |
JP3052896B2 (ja) * | 1997-06-13 | 2000-06-19 | 日本電気株式会社 | 研磨布表面のドレス治具及びその製造方法 |
JP2000153446A (ja) * | 1998-11-19 | 2000-06-06 | Seiko Epson Corp | 研磨布作用面の調整方法 |
JP2001030156A (ja) * | 1999-07-23 | 2001-02-06 | Toshiba Corp | ドレッシング装置、研磨装置および研磨方法 |
JP2004098264A (ja) * | 2002-09-12 | 2004-04-02 | Shin Etsu Handotai Co Ltd | 研磨布のドレッシング方法及びワークの研磨方法 |
CN201211643Y (zh) * | 2007-09-29 | 2009-03-25 | 北京有色金属研究总院 | 一种新型的修布砂轮装置 |
CN201287294Y (zh) * | 2008-11-04 | 2009-08-12 | 北京有色金属研究总院 | 一种刷抛光大盘用的刷子 |
-
2012
- 2012-11-16 CN CN201210465591.0A patent/CN103817600B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN103817600A (zh) | 2014-05-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI523094B (zh) | Double-sided grinding method | |
CN101379599B (zh) | 晶片的单片式蚀刻方法 | |
CN100579723C (zh) | 激光玻璃机械化学抛光方法 | |
CN103817600B (zh) | 一种双面抛光用抛光布的修整工艺 | |
Chen et al. | Grinding marks on ultra-precision grinding spherical and aspheric surfaces | |
CN102528597B (zh) | 一种大直径硅片制造工艺 | |
CN101791779A (zh) | 半导体硅片制造工艺 | |
CN103240666A (zh) | 一种太阳能电池锗衬底片的研磨方法 | |
KR20110007087A (ko) | 워크의 양두 연삭 장치 및 워크의 양두 연삭 방법 | |
JP6443370B2 (ja) | 両面研磨装置用のキャリアの製造方法およびウェーハの両面研磨方法 | |
CN110394711A (zh) | 一种研磨装置、倒角加工装置及加工方法 | |
CN101656195A (zh) | 大直径硅片的制造方法 | |
CN110010458A (zh) | 控制半导体晶圆片表面形貌的方法和半导体晶片 | |
CN103231302A (zh) | 一种获取超光滑表面低亚表面损伤晶体的方法 | |
CN104842253A (zh) | 用于碳化硅晶体的光学级平面加工的抛光装置及加工方法 | |
CN103029026A (zh) | 一种超高清洗能力的单晶硅晶圆片清洗方法 | |
CN106736875B (zh) | 一种蓝宝石整流罩的加工方法 | |
CN105189045B (zh) | 工件的研磨装置 | |
CN101456150B (zh) | 化学机械抛光方法 | |
CN104493685A (zh) | 一种蓝宝石晶片加工方法 | |
CN101733697A (zh) | 一种硅片抛光方法 | |
US11325220B2 (en) | Double-side polishing method and double-side polishing apparatus | |
CN111062098B (zh) | 提高高速抛光表面材料去除均匀性的抛光垫形状设计方法 | |
CN105881215A (zh) | 一种修整抛光机盘面的方法 | |
CN207873865U (zh) | 一种镜片抛光设备 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
C53 | Correction of patent for invention or patent application | ||
CB02 | Change of applicant information |
Address after: 100088 Beijing city Xicheng District Xinjiekou Avenue No. 2 Applicant after: YOUYAN NEW MATERIAL CO., LTD. Address before: 100088 Beijing city Xicheng District Xinjiekou Avenue No. 2 Applicant before: GRINM Semiconductor Materials Co., Ltd. |
|
COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: GRINM SEMICONDUCTOR MATERIALS CO., LTD. TO: GRINM ADVANCED MATERIALS CO., LTD. |
|
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GRINM ADVANCED MATERIALS CO., LTD. Effective date: 20150611 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20150611 Address after: 101300 Beijing city Shunyi District Shuanghe Linhe Industrial Development Zone on the south side of the road Applicant after: You Yan Semi Materials Co., Ltd. Address before: 100088 Beijing city Xicheng District Xinjiekou Avenue No. 2 Applicant before: YOUYAN NEW MATERIAL CO., LTD. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee after: Youyan semiconductor silicon materials Co.,Ltd. Address before: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee before: GRINM SEMICONDUCTOR MATERIALS Co.,Ltd. |
|
CP01 | Change in the name or title of a patent holder |