CN103794633B - 一种阵列基板及其制作方法、显示装置 - Google Patents

一种阵列基板及其制作方法、显示装置 Download PDF

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Publication number
CN103794633B
CN103794633B CN201410039802.3A CN201410039802A CN103794633B CN 103794633 B CN103794633 B CN 103794633B CN 201410039802 A CN201410039802 A CN 201410039802A CN 103794633 B CN103794633 B CN 103794633B
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grid
drain electrode
film transistor
source electrode
layer
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Chinese (zh)
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CN103794633A (zh
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牛菁
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to CN201410039802.3A priority Critical patent/CN103794633B/zh
Priority to US14/420,854 priority patent/US9484396B2/en
Priority to PCT/CN2014/075495 priority patent/WO2015109667A1/fr
Publication of CN103794633A publication Critical patent/CN103794633A/zh
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259Multistep manufacturing methods
    • H01L27/1288Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/121Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CN201410039802.3A 2014-01-27 2014-01-27 一种阵列基板及其制作方法、显示装置 Active CN103794633B (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201410039802.3A CN103794633B (zh) 2014-01-27 2014-01-27 一种阵列基板及其制作方法、显示装置
US14/420,854 US9484396B2 (en) 2014-01-27 2014-04-16 Array substrate, method for manufacturing the same, display device and electronic product
PCT/CN2014/075495 WO2015109667A1 (fr) 2014-01-27 2014-04-16 Substrat de réseau et son procédé de fabrication, dispositif d'affichage et produit électronique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410039802.3A CN103794633B (zh) 2014-01-27 2014-01-27 一种阵列基板及其制作方法、显示装置

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CN103794633A CN103794633A (zh) 2014-05-14
CN103794633B true CN103794633B (zh) 2016-06-15

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CN (1) CN103794633B (fr)
WO (1) WO2015109667A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104576655B (zh) * 2014-12-01 2017-07-18 深圳市华星光电技术有限公司 一种coa基板及其制作方法
CN106057825A (zh) * 2016-08-03 2016-10-26 深圳市华星光电技术有限公司 Oled显示装置的阵列基板及其制造方法
CN107121859B (zh) * 2017-06-07 2020-01-03 深圳市华星光电半导体显示技术有限公司 阵列基板及其制造方法、显示面板
CN109148480B (zh) * 2018-08-21 2021-03-16 武汉华星光电半导体显示技术有限公司 阵列基板
CN113113462B (zh) * 2021-04-14 2023-08-11 武汉京东方光电科技有限公司 显示面板及显示装置
CN114335015A (zh) * 2021-12-28 2022-04-12 Tcl华星光电技术有限公司 显示装置及显示装置的制备方法
CN114784024A (zh) * 2022-05-19 2022-07-22 广州华星光电半导体显示技术有限公司 显示面板及显示面板的制备方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101958339A (zh) * 2009-07-15 2011-01-26 三星移动显示器株式会社 有机发光显示装置及其制造方法
CN101997025A (zh) * 2009-08-25 2011-03-30 三星移动显示器株式会社 有机发光二极管显示器及其制造方法
CN102013432A (zh) * 2009-09-03 2011-04-13 三星移动显示器株式会社 有机发光二极管显示器及其制造方法
CN102466937A (zh) * 2010-10-29 2012-05-23 北京京东方光电科技有限公司 Tft-lcd、驱动器件及其制造方法
CN102884633A (zh) * 2010-05-13 2013-01-16 夏普株式会社 电路基板和显示装置
CN203707135U (zh) * 2014-01-27 2014-07-09 京东方科技集团股份有限公司 一种阵列基板及显示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100603361B1 (ko) * 2004-08-05 2006-07-20 삼성에스디아이 주식회사 평판 디스플레이 장치
US8647919B2 (en) * 2010-09-13 2014-02-11 Semiconductor Energy Laboratory Co., Ltd. Light-emitting display device and method for manufacturing the same
CN102629621B (zh) * 2012-01-09 2015-08-12 京东方科技集团股份有限公司 一种电路、阵列基板及制作方法、显示器

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101958339A (zh) * 2009-07-15 2011-01-26 三星移动显示器株式会社 有机发光显示装置及其制造方法
CN101997025A (zh) * 2009-08-25 2011-03-30 三星移动显示器株式会社 有机发光二极管显示器及其制造方法
CN102013432A (zh) * 2009-09-03 2011-04-13 三星移动显示器株式会社 有机发光二极管显示器及其制造方法
CN102884633A (zh) * 2010-05-13 2013-01-16 夏普株式会社 电路基板和显示装置
CN102466937A (zh) * 2010-10-29 2012-05-23 北京京东方光电科技有限公司 Tft-lcd、驱动器件及其制造方法
CN203707135U (zh) * 2014-01-27 2014-07-09 京东方科技集团股份有限公司 一种阵列基板及显示装置

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CN103794633A (zh) 2014-05-14
WO2015109667A1 (fr) 2015-07-30

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