CN103774237B - 热处理装置 - Google Patents
热处理装置 Download PDFInfo
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- CN103774237B CN103774237B CN201410058339.7A CN201410058339A CN103774237B CN 103774237 B CN103774237 B CN 103774237B CN 201410058339 A CN201410058339 A CN 201410058339A CN 103774237 B CN103774237 B CN 103774237B
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CN201410058339.7A CN103774237B (zh) | 2014-02-20 | 2014-02-20 | 热处理装置 |
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CN201410058339.7A CN103774237B (zh) | 2014-02-20 | 2014-02-20 | 热处理装置 |
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CN103774237A CN103774237A (zh) | 2014-05-07 |
CN103774237B true CN103774237B (zh) | 2016-09-07 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105807370A (zh) * | 2016-03-23 | 2016-07-27 | 哈尔滨工程大学 | 一种用于多芯光纤熔融的双m形电加热装置 |
CN106340487A (zh) * | 2016-10-21 | 2017-01-18 | 北京鼎泰芯源科技发展有限公司 | 用于晶圆退火的载片盘、退火装置及晶圆退火方法 |
CN107740191A (zh) * | 2017-12-01 | 2018-02-27 | 浙江海洋大学 | 一种热处理装置 |
Citations (9)
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CN1937862A (zh) * | 2006-10-18 | 2007-03-28 | 威林(宁波)节能科技有限公司 | 用于塑胶加工设备的低压加热方法及装置 |
CN101526306A (zh) * | 2008-12-31 | 2009-09-09 | 北京七星华创电子股份有限公司 | 300mm立式氧化炉双壁反应管 |
JP2009238810A (ja) * | 2008-03-26 | 2009-10-15 | Koyo Thermo System Kk | 縦型熱処理装置及び熱処理方法 |
CN201382677Y (zh) * | 2008-12-31 | 2010-01-13 | 北京七星华创电子股份有限公司 | 300mm立式氧化炉双壁反应管 |
JP2011228524A (ja) * | 2010-04-21 | 2011-11-10 | Mitsui Eng & Shipbuild Co Ltd | 半導体熱処理装置および半導体熱処理方法 |
CN202193876U (zh) * | 2011-07-25 | 2012-04-18 | 合肥景坤新能源有限公司 | 单晶体炉的炉体散热装置 |
CN102881615A (zh) * | 2011-07-14 | 2013-01-16 | 北京七星华创电子股份有限公司 | 半导体晶片热处理设备及方法 |
CN103290483A (zh) * | 2013-06-06 | 2013-09-11 | 北京七星华创电子股份有限公司 | 一种硅片热处理反应管及硅片热处理方法 |
KR20140017025A (ko) * | 2012-06-22 | 2014-02-11 | (주) 예스티 | 단열 성능이 향상된 가압 열처리장치 |
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Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1937862A (zh) * | 2006-10-18 | 2007-03-28 | 威林(宁波)节能科技有限公司 | 用于塑胶加工设备的低压加热方法及装置 |
JP2009238810A (ja) * | 2008-03-26 | 2009-10-15 | Koyo Thermo System Kk | 縦型熱処理装置及び熱処理方法 |
CN101526306A (zh) * | 2008-12-31 | 2009-09-09 | 北京七星华创电子股份有限公司 | 300mm立式氧化炉双壁反应管 |
CN201382677Y (zh) * | 2008-12-31 | 2010-01-13 | 北京七星华创电子股份有限公司 | 300mm立式氧化炉双壁反应管 |
JP2011228524A (ja) * | 2010-04-21 | 2011-11-10 | Mitsui Eng & Shipbuild Co Ltd | 半導体熱処理装置および半導体熱処理方法 |
CN102881615A (zh) * | 2011-07-14 | 2013-01-16 | 北京七星华创电子股份有限公司 | 半导体晶片热处理设备及方法 |
CN202193876U (zh) * | 2011-07-25 | 2012-04-18 | 合肥景坤新能源有限公司 | 单晶体炉的炉体散热装置 |
KR20140017025A (ko) * | 2012-06-22 | 2014-02-11 | (주) 예스티 | 단열 성능이 향상된 가압 열처리장치 |
CN103290483A (zh) * | 2013-06-06 | 2013-09-11 | 北京七星华创电子股份有限公司 | 一种硅片热处理反应管及硅片热处理方法 |
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Address after: 100015 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee after: North China Science and technology group Limited by Share Ltd. Address before: 100016 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: BEIJING SEVENSTAR ELECTRONIC Co.,Ltd. |
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CP03 | Change of name, title or address | ||
TR01 | Transfer of patent right |
Effective date of registration: 20180807 Address after: 100176 8 Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: North Beijing Huachuang Electronics Equipment Co.,Ltd. Address before: 100015 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: North China Science and technology group Limited by Share Ltd. |
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TR01 | Transfer of patent right | ||
CI03 | Correction of invention patent |
Correction item: Patentee|Address Correct: BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd.|100176 No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone False: North Beijing Huachuang Electronics Equipment Co. Ltd.|100176 No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone Number: 34-02 Volume: 34 |
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CI03 | Correction of invention patent |