CN103748483A - 包含百叶窗的背景减少系统 - Google Patents

包含百叶窗的背景减少系统 Download PDF

Info

Publication number
CN103748483A
CN103748483A CN201280039957.6A CN201280039957A CN103748483A CN 103748483 A CN103748483 A CN 103748483A CN 201280039957 A CN201280039957 A CN 201280039957A CN 103748483 A CN103748483 A CN 103748483A
Authority
CN
China
Prior art keywords
charged particles
angle
incidence
background reduction
louver structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201280039957.6A
Other languages
English (en)
Chinese (zh)
Inventor
迈赫兰·纳赛尔-古德西
克里斯多夫·西尔斯
罗伯特·海恩斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of CN103748483A publication Critical patent/CN103748483A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2511—Auger spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2516—Secondary particles mass or energy spectrometry

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201280039957.6A 2011-06-30 2012-06-07 包含百叶窗的背景减少系统 Pending CN103748483A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/174,020 2011-06-30
US13/174,020 US8633457B2 (en) 2011-06-30 2011-06-30 Background reduction system including louver
PCT/US2012/041343 WO2013002993A1 (en) 2011-06-30 2012-06-07 Background reduction system including louver

Publications (1)

Publication Number Publication Date
CN103748483A true CN103748483A (zh) 2014-04-23

Family

ID=47389602

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280039957.6A Pending CN103748483A (zh) 2011-06-30 2012-06-07 包含百叶窗的背景减少系统

Country Status (6)

Country Link
US (1) US8633457B2 (https=)
EP (1) EP2726906A4 (https=)
JP (1) JP6026527B2 (https=)
CN (1) CN103748483A (https=)
TW (1) TW201301333A (https=)
WO (1) WO2013002993A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2682978B1 (en) * 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Contamination reduction electrode for particle detector
US9082580B2 (en) 2013-09-23 2015-07-14 Kla-Tencor Corporation Notched magnetic lens for improved sample access in an SEM

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU693487A1 (ru) * 1978-01-16 1979-10-25 Предприятие П/Я В-2502 Счетчик гейгера-мюллера с экраном
CN86108035A (zh) * 1985-12-04 1987-09-16 动能技术公司 探测和定位中性粒子的设备及其应用
SU1814427A1 (ru) * 1988-11-23 1995-04-20 Физико-технический институт им.А.Ф.Иоффе Электростатический спектрометр для энергетического и углового анализа заряженных частиц
US20080240535A1 (en) * 2004-09-09 2008-10-02 Massachusetts Institute Of Technology Systems And Methods For Multi-Modal Imaging
US7692156B1 (en) * 2006-08-23 2010-04-06 Radiation Monitoring Devices, Inc. Beam-oriented pixellated scintillators for radiation imaging

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135388A (https=) * 1974-09-20 1976-03-25 Hitachi Ltd
JPH10256136A (ja) * 1997-03-14 1998-09-25 Nikon Corp 荷電ビーム露光装置
JP3603779B2 (ja) * 2000-11-01 2004-12-22 株式会社日立製作所 電子検出装置，荷電粒子ビーム装置，半導体集積回路装置、および半導体集積回路装置の加工，観察，検査方法
US7476876B2 (en) * 2005-12-21 2009-01-13 Axcelis Technologies, Inc. Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
US8304751B2 (en) * 2008-05-12 2012-11-06 Mitsubishi Electric Corporation Charged particle beam irradiation apparatus
EP2454749A4 (en) * 2009-07-17 2013-09-04 Kla Tencor Corp ENERGY ANALYZER OF CHARGED PARTICLES

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU693487A1 (ru) * 1978-01-16 1979-10-25 Предприятие П/Я В-2502 Счетчик гейгера-мюллера с экраном
CN86108035A (zh) * 1985-12-04 1987-09-16 动能技术公司 探测和定位中性粒子的设备及其应用
SU1814427A1 (ru) * 1988-11-23 1995-04-20 Физико-технический институт им.А.Ф.Иоффе Электростатический спектрометр для энергетического и углового анализа заряженных частиц
US20080240535A1 (en) * 2004-09-09 2008-10-02 Massachusetts Institute Of Technology Systems And Methods For Multi-Modal Imaging
US7692156B1 (en) * 2006-08-23 2010-04-06 Radiation Monitoring Devices, Inc. Beam-oriented pixellated scintillators for radiation imaging

Also Published As

Publication number Publication date
EP2726906A1 (en) 2014-05-07
TW201301333A (zh) 2013-01-01
US20130001417A1 (en) 2013-01-03
EP2726906A4 (en) 2015-07-01
JP2014521192A (ja) 2014-08-25
WO2013002993A1 (en) 2013-01-03
JP6026527B2 (ja) 2016-11-16
US8633457B2 (en) 2014-01-21

Similar Documents

Publication Publication Date Title
US11467103B2 (en) X-ray analyzer
US8629395B2 (en) Charged particle beam apparatus
US9666323B2 (en) Radiolucent window, radiation detector and radiation detection apparatus
JP6757036B2 (ja) 静電レンズ、並びに、該レンズとコリメータを用いた平行ビーム発生装置及び平行ビーム収束装置
US20080056442A1 (en) X-ray analysis apparatus
CN111353259B (zh) 一种金属二次电子发射系数计算方法
CN106996941B (zh) 一种x射线荧光分析装置及其分析检测方法
PL417083A1 (pl) Aparat do spektroskopii fotoelektronów twardego promieniowania rentgenowskiego
JP2009507328A (ja) リフレクトロン
JPWO2017126089A1 (ja) 阻止電位型エネルギー分析器
CN103748483A (zh) 包含百叶窗的背景减少系统
CN103808747A (zh) 一种测量全元素的x射线谱仪
WO2016047538A1 (ja) エネルギー弁別電子検出器及びそれを用いた走査電子顕微鏡
JP7042971B2 (ja) ホルダおよび荷電粒子線装置
CN101093201B (zh) 荧光x射线分析设备
US8586923B1 (en) Low-voltage transmission electron microscopy
JP5545577B2 (ja) 電極部材、電子エネルギー分析器、光電子エネルギー分析器、及び温度測定装置
JP5492173B2 (ja) 回折ｘ線検出方法およびｘ線回折装置
JP5695589B2 (ja) Ｘ線強度補正方法およびｘ線回折装置
KR102231035B1 (ko) 지연 에너지 분석기
CN109143313B (zh) 一种电子能量甄别器
CN111727489A (zh) 动量分辨光电子能谱仪及用于动量分辨光电子能谱的方法
JP5110562B2 (ja) 蛍光ｘ線分析法
CN106872502A (zh) 一种带光束调整的edxrf检测装置
Ploykrachang et al. Production of quasimonochromatic X-ray microbeams using MeV-protons and a polycapillary X-ray half lens

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20140423