CN103747918A - 抛光垫 - Google Patents

抛光垫 Download PDF

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Publication number
CN103747918A
CN103747918A CN201280041433.0A CN201280041433A CN103747918A CN 103747918 A CN103747918 A CN 103747918A CN 201280041433 A CN201280041433 A CN 201280041433A CN 103747918 A CN103747918 A CN 103747918A
Authority
CN
China
Prior art keywords
polishing
light
polishing pad
buffer layer
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201280041433.0A
Other languages
English (en)
Chinese (zh)
Inventor
木村毅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tire Corp
Original Assignee
Toyo Tire and Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tire and Rubber Co Ltd filed Critical Toyo Tire and Rubber Co Ltd
Publication of CN103747918A publication Critical patent/CN103747918A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CN201280041433.0A 2011-09-01 2012-08-24 抛光垫 Pending CN103747918A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-190859 2011-09-01
JP2011190859A JP5732354B2 (ja) 2011-09-01 2011-09-01 研磨パッド
PCT/JP2012/071472 WO2013031692A1 (ja) 2011-09-01 2012-08-24 研磨パッド

Publications (1)

Publication Number Publication Date
CN103747918A true CN103747918A (zh) 2014-04-23

Family

ID=47756182

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280041433.0A Pending CN103747918A (zh) 2011-09-01 2012-08-24 抛光垫

Country Status (6)

Country Link
US (1) US9156126B2 (enExample)
JP (1) JP5732354B2 (enExample)
KR (1) KR101633745B1 (enExample)
CN (1) CN103747918A (enExample)
TW (1) TWI480942B (enExample)
WO (1) WO2013031692A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107471088A (zh) * 2016-06-08 2017-12-15 智胜科技股份有限公司 研磨垫及研磨方法
CN109202693A (zh) * 2017-10-16 2019-01-15 Skc株式会社 防泄漏抛光垫及其制造方法
CN111183003A (zh) * 2017-08-07 2020-05-19 Skc株式会社 经表面处理的研磨垫窗口及包含该窗口的研磨垫

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8961266B2 (en) 2013-03-15 2015-02-24 Applied Materials, Inc. Polishing pad with secondary window seal
JP7525271B2 (ja) * 2020-03-03 2024-07-30 富士紡ホールディングス株式会社 研磨パッド及び研磨パッドの製造方法
US11633830B2 (en) * 2020-06-24 2023-04-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. CMP polishing pad with uniform window
KR102488101B1 (ko) * 2021-05-04 2023-01-12 에스케이엔펄스 주식회사 연마 패드, 연마 패드의 제조 방법 및 이를 이용한 반도체 소자의 제조 방법
US20230059394A1 (en) * 2021-07-02 2023-02-23 Skc Solmics Co., Ltd. Polishing pad and method for manufacturing semiconductor device using the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040082287A1 (en) * 2002-10-28 2004-04-29 Applied Materials, Inc. Polishing pad with window
JP2004327779A (ja) * 2003-04-25 2004-11-18 Toray Ind Inc 研磨パッド、研磨装置及び半導体デバイスの製造方法
CN1569398A (zh) * 2003-04-22 2005-01-26 Jsr株式会社 抛光垫及抛光半导体晶片的方法
CN1622289A (zh) * 2003-11-25 2005-06-01 Cmp罗姆和哈斯电子材料控股公司 具有高透光窗口的抛光垫
CN101242931A (zh) * 2005-08-22 2008-08-13 应用材料股份有限公司 基于光谱的监测化学机械研磨的装置及方法
US7621798B1 (en) * 2006-03-07 2009-11-24 Applied Materials, Inc. Reducing polishing pad deformation

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6454630B1 (en) 1999-09-14 2002-09-24 Applied Materials, Inc. Rotatable platen having a transparent window for a chemical mechanical polishing apparatus and method of making the same
US6524164B1 (en) 1999-09-14 2003-02-25 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
DE60011798T2 (de) 1999-09-29 2005-11-10 Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington Schleifkissen
US20020137431A1 (en) * 2001-03-23 2002-09-26 Labunsky Michael A. Methods and apparatus for polishing and planarization
DE60228784D1 (de) * 2001-04-25 2008-10-23 Jsr Corp Lichtduchlässiges Polierkissen für eine Halbleiterschleife
JP4131632B2 (ja) 2001-06-15 2008-08-13 株式会社荏原製作所 ポリッシング装置及び研磨パッド
JP2004327974A (ja) * 2003-04-09 2004-11-18 Jsr Corp 研磨パッド、その製造法と製造用金型および半導体ウエハの研磨方法
JP2004343090A (ja) * 2003-04-22 2004-12-02 Jsr Corp 研磨パッドおよび半導体ウェハの研磨方法
KR100532440B1 (ko) * 2003-06-05 2005-11-30 삼성전자주식회사 윈도로의 유체의 침투를 막는 실링 장벽부를 가지는 화학기계적 연마 장비에 사용되는 연마 패드
US7018581B2 (en) * 2004-06-10 2006-03-28 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of forming a polishing pad with reduced stress window
US7520968B2 (en) * 2004-10-05 2009-04-21 Applied Materials, Inc. Conductive pad design modification for better wafer-pad contact
JP5146927B2 (ja) 2006-10-18 2013-02-20 東洋ゴム工業株式会社 長尺研磨パッドの製造方法
JP2008226911A (ja) * 2007-03-08 2008-09-25 Jsr Corp 化学機械研磨用パッド、化学機械研磨用積層体パッド、および化学機械研磨方法
JP5274798B2 (ja) * 2007-08-20 2013-08-28 東洋ゴム工業株式会社 研磨パッド及びその製造方法
US8083570B2 (en) 2008-10-17 2011-12-27 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad having sealed window

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040082287A1 (en) * 2002-10-28 2004-04-29 Applied Materials, Inc. Polishing pad with window
CN1569398A (zh) * 2003-04-22 2005-01-26 Jsr株式会社 抛光垫及抛光半导体晶片的方法
JP2004327779A (ja) * 2003-04-25 2004-11-18 Toray Ind Inc 研磨パッド、研磨装置及び半導体デバイスの製造方法
CN1622289A (zh) * 2003-11-25 2005-06-01 Cmp罗姆和哈斯电子材料控股公司 具有高透光窗口的抛光垫
CN101242931A (zh) * 2005-08-22 2008-08-13 应用材料股份有限公司 基于光谱的监测化学机械研磨的装置及方法
US7621798B1 (en) * 2006-03-07 2009-11-24 Applied Materials, Inc. Reducing polishing pad deformation

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107471088A (zh) * 2016-06-08 2017-12-15 智胜科技股份有限公司 研磨垫及研磨方法
CN107471088B (zh) * 2016-06-08 2020-07-03 智胜科技股份有限公司 研磨垫及研磨方法
CN111183003A (zh) * 2017-08-07 2020-05-19 Skc株式会社 经表面处理的研磨垫窗口及包含该窗口的研磨垫
CN109202693A (zh) * 2017-10-16 2019-01-15 Skc株式会社 防泄漏抛光垫及其制造方法
CN109202693B (zh) * 2017-10-16 2021-10-12 Skc索密思株式会社 防泄漏抛光垫及其制造方法

Also Published As

Publication number Publication date
US9156126B2 (en) 2015-10-13
TWI480942B (zh) 2015-04-11
TW201330078A (zh) 2013-07-16
WO2013031692A1 (ja) 2013-03-07
US20140213151A1 (en) 2014-07-31
JP5732354B2 (ja) 2015-06-10
JP2013052459A (ja) 2013-03-21
KR101633745B1 (ko) 2016-06-27
KR20140051441A (ko) 2014-04-30

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SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20140423