CN103703537B - 扫描电子显微镜及扫描透过电子显微镜 - Google Patents

扫描电子显微镜及扫描透过电子显微镜 Download PDF

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Publication number
CN103703537B
CN103703537B CN201280035812.9A CN201280035812A CN103703537B CN 103703537 B CN103703537 B CN 103703537B CN 201280035812 A CN201280035812 A CN 201280035812A CN 103703537 B CN103703537 B CN 103703537B
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sample
image
electron
electron microscope
depth
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CN103703537A (zh
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稻田博实
中村邦康
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Hitachi Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0455—Diaphragms with variable aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H01J2237/225—Displaying image using synthesised colours
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/226—Image reconstruction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2611—Stereoscopic measurements and/or imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201280035812.9A 2011-07-20 2012-07-19 扫描电子显微镜及扫描透过电子显微镜 Expired - Fee Related CN103703537B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011158548A JP5712074B2 (ja) 2011-07-20 2011-07-20 走査透過電子顕微鏡
JP2011-158548 2011-07-20
PCT/JP2012/068369 WO2013012041A1 (ja) 2011-07-20 2012-07-19 走査電子顕微鏡及び走査透過電子顕微鏡

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CN103703537A CN103703537A (zh) 2014-04-02
CN103703537B true CN103703537B (zh) 2015-06-17

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US (1) US8878130B2 (enExample)
JP (1) JP5712074B2 (enExample)
CN (1) CN103703537B (enExample)
DE (1) DE112012002668B4 (enExample)
WO (1) WO2013012041A1 (enExample)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5712074B2 (ja) * 2011-07-20 2015-05-07 株式会社日立ハイテクノロジーズ 走査透過電子顕微鏡
US8704176B2 (en) * 2011-08-10 2014-04-22 Fei Company Charged particle microscope providing depth-resolved imagery
EP2584584A1 (en) * 2011-10-19 2013-04-24 FEI Company Method for adjusting a STEM equipped with an aberration corrector
EP2872966A1 (en) * 2012-07-12 2015-05-20 Dual Aperture International Co. Ltd. Gesture-based user interface
GB201302624D0 (en) 2013-02-14 2013-04-03 Univ Antwerpen High-resolution amplitude contrast imaging
WO2014192361A1 (ja) * 2013-05-30 2014-12-04 株式会社 日立ハイテクノロジーズ 荷電粒子線装置、試料観察方法
WO2015181981A1 (ja) * 2014-05-30 2015-12-03 富士通株式会社 電子顕微鏡による分析方法及び電子顕微鏡
JP6190768B2 (ja) * 2014-07-02 2017-08-30 株式会社日立ハイテクノロジーズ 電子顕微鏡装置およびそれを用いた撮像方法
CN104091745B (zh) * 2014-07-18 2016-06-01 镇江乐华电子科技有限公司 一种集成tem荧光屏和stem探测器的一体化结构
DE112014006916B4 (de) 2014-10-09 2021-01-28 Hitachi High-Tech Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung sowie Elektronenmikroskop
US20160123905A1 (en) * 2014-11-04 2016-05-05 Macronix International Co., Ltd. Inspection of inconsistencies in and on semiconductor devices and structures
JP6177817B2 (ja) 2015-01-30 2017-08-09 松定プレシジョン株式会社 荷電粒子線装置及び走査電子顕微鏡
WO2016149676A1 (en) * 2015-03-18 2016-09-22 Battelle Memorial Institute Electron beam masks for compressive sensors
US10170274B2 (en) 2015-03-18 2019-01-01 Battelle Memorial Institute TEM phase contrast imaging with image plane phase grating
US9625398B1 (en) 2016-01-11 2017-04-18 International Business Machines Corporation Cross sectional depth composition generation utilizing scanning electron microscopy
JP6677519B2 (ja) * 2016-02-03 2020-04-08 日本電子株式会社 電子顕微鏡および収差測定方法
WO2017189212A1 (en) 2016-04-29 2017-11-02 Battelle Memorial Institute Compressive scanning spectroscopy
US10133854B2 (en) 2016-05-12 2018-11-20 International Business Machines Corporation Compositional three-dimensional surface plots
JP6680359B2 (ja) 2016-06-29 2020-04-15 株式会社オートネットワーク技術研究所 端子モジュール及びコネクタ
CN106645250B (zh) * 2016-11-21 2024-04-26 宁波聚瑞精密仪器有限公司 一种具备光学成像功能的扫描透射电子显微镜
US10090131B2 (en) * 2016-12-07 2018-10-02 Kla-Tencor Corporation Method and system for aberration correction in an electron beam system
CN106876235B (zh) * 2017-02-21 2019-01-01 顾士平 质子显微镜、波谱仪、能谱仪、微纳加工平台
JP6805945B2 (ja) * 2017-04-12 2020-12-23 富士通株式会社 分析方法及び分析装置
US10295677B2 (en) 2017-05-08 2019-05-21 Battelle Memorial Institute Systems and methods for data storage and retrieval
US10904425B2 (en) * 2017-11-06 2021-01-26 Canon Kabushiki Kaisha Image processing apparatus, control method therefor, and storage medium for evaluating a focusing state of image data
EP3480586B1 (en) * 2017-11-06 2021-02-24 Bruker Nano GmbH X-ray fluorescence spectrometer
EP3550585B1 (en) * 2018-04-05 2021-06-23 FEI Company Studying dynamic specimens in a transmission charged particle microscope
JP2019185972A (ja) * 2018-04-06 2019-10-24 株式会社日立ハイテクノロジーズ 走査電子顕微鏡システム及びパターンの深さ計測方法
US10714309B1 (en) * 2019-04-04 2020-07-14 Fei Company Using images from secondary microscope detectors to automatically generate labeled images from primary microscope detectors
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US11460419B2 (en) 2020-03-30 2022-10-04 Fei Company Electron diffraction holography
US11264202B2 (en) * 2020-05-18 2022-03-01 Applied Materials Israel Ltd. Generating three dimensional information regarding structural elements of a specimen
EP3929962A1 (en) * 2020-06-25 2021-12-29 FEI Company Method of imaging a specimen using a transmission charged particle microscope
EP4369376A1 (en) * 2022-06-24 2024-05-15 FEI Company Improved transmission electron microscopy
KR20240069301A (ko) * 2022-11-11 2024-05-20 삼성전자주식회사 깊이 정보 추정 방법 및 장치
CN119985586B (zh) * 2025-04-11 2025-07-25 宁波伯锐锶电子束科技有限公司 一种生物样品的扫描图像获取方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004214060A (ja) * 2003-01-06 2004-07-29 Hitachi High-Technologies Corp 走査電子顕微鏡及びそれを用いた試料観察方法
JP2005108567A (ja) * 2003-09-29 2005-04-21 Hitachi High-Technologies Corp 電子顕微鏡による試料観察方法
JP2006003235A (ja) * 2004-06-17 2006-01-05 Topcon Corp 電子線システムと電子線システム用基準試料
CN101025402A (zh) * 2006-02-17 2007-08-29 株式会社日立高新技术 扫描型电子显微镜装置以及使用它的摄影方法
JP2008084643A (ja) * 2006-09-27 2008-04-10 Fujitsu Ltd 電子顕微鏡及び立体観察方法
JP2008139085A (ja) * 2006-11-30 2008-06-19 Hitachi High-Technologies Corp パターン寸法計測方法及び走査型透過荷電粒子顕微鏡
JP2008270056A (ja) * 2007-04-24 2008-11-06 National Institute For Materials Science 走査型透過電子顕微鏡
CN101572207A (zh) * 2008-04-30 2009-11-04 以色列商·应用材料以色列公司 带电粒子束的图案无变化聚焦
JP2011022059A (ja) * 2009-07-17 2011-02-03 Fujitsu Ltd 荷電粒子顕微鏡及び解析方法
CN101996839A (zh) * 2009-07-24 2011-03-30 卡尔蔡司Nts有限责任公司 粒子束装置、光阑组件及在粒子束装置中改变束流的方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0521033A (ja) * 1991-07-16 1993-01-29 Fujitsu Ltd 荷電ビーム装置
JPH05299048A (ja) 1992-04-24 1993-11-12 Hitachi Ltd 電子線装置および走査電子顕微鏡
US6538249B1 (en) * 1999-07-09 2003-03-25 Hitachi, Ltd. Image-formation apparatus using charged particle beams under various focus conditions
US20020170887A1 (en) * 2001-03-01 2002-11-21 Konica Corporation Optical element producing method, base material drawing method and base material drawing apparatus
JP2004335320A (ja) * 2003-05-09 2004-11-25 Hitachi High-Technologies Corp 荷電粒子線装置
US7067808B2 (en) 2003-10-14 2006-06-27 Topcon Corporation Electron beam system and electron beam measuring and observing method
JP4262649B2 (ja) 2004-08-06 2009-05-13 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡装置およびこれを用いた三次元画像表示方法
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
JP4445893B2 (ja) * 2005-04-06 2010-04-07 株式会社日立ハイテクノロジーズ 走査形電子顕微鏡
US7888640B2 (en) * 2007-06-18 2011-02-15 Hitachi High-Technologies Corporation Scanning electron microscope and method of imaging an object by using the scanning electron microscope
JP5438937B2 (ja) * 2008-09-05 2014-03-12 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
JP5712074B2 (ja) * 2011-07-20 2015-05-07 株式会社日立ハイテクノロジーズ 走査透過電子顕微鏡

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004214060A (ja) * 2003-01-06 2004-07-29 Hitachi High-Technologies Corp 走査電子顕微鏡及びそれを用いた試料観察方法
JP2005108567A (ja) * 2003-09-29 2005-04-21 Hitachi High-Technologies Corp 電子顕微鏡による試料観察方法
JP2006003235A (ja) * 2004-06-17 2006-01-05 Topcon Corp 電子線システムと電子線システム用基準試料
CN101025402A (zh) * 2006-02-17 2007-08-29 株式会社日立高新技术 扫描型电子显微镜装置以及使用它的摄影方法
JP2008084643A (ja) * 2006-09-27 2008-04-10 Fujitsu Ltd 電子顕微鏡及び立体観察方法
JP2008139085A (ja) * 2006-11-30 2008-06-19 Hitachi High-Technologies Corp パターン寸法計測方法及び走査型透過荷電粒子顕微鏡
JP2008270056A (ja) * 2007-04-24 2008-11-06 National Institute For Materials Science 走査型透過電子顕微鏡
CN101572207A (zh) * 2008-04-30 2009-11-04 以色列商·应用材料以色列公司 带电粒子束的图案无变化聚焦
JP2011022059A (ja) * 2009-07-17 2011-02-03 Fujitsu Ltd 荷電粒子顕微鏡及び解析方法
CN101996839A (zh) * 2009-07-24 2011-03-30 卡尔蔡司Nts有限责任公司 粒子束装置、光阑组件及在粒子束装置中改变束流的方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
《Imaging single atoms using secondary electrons with an aberration-corrected electron microscope》;Y.Zhu 等;《NATURE MATERIALS》;20090920;第8卷;808-812 *

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WO2013012041A1 (ja) 2013-01-24
CN103703537A (zh) 2014-04-02
DE112012002668B4 (de) 2015-07-23
US8878130B2 (en) 2014-11-04
JP2013025967A (ja) 2013-02-04
JP5712074B2 (ja) 2015-05-07
US20140138542A1 (en) 2014-05-22
DE112012002668T5 (de) 2014-04-24

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