CN103692370B - 制备有凹槽的化学机械抛光层的方法 - Google Patents

制备有凹槽的化学机械抛光层的方法 Download PDF

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Publication number
CN103692370B
CN103692370B CN201310451608.1A CN201310451608A CN103692370B CN 103692370 B CN103692370 B CN 103692370B CN 201310451608 A CN201310451608 A CN 201310451608A CN 103692370 B CN103692370 B CN 103692370B
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CN
China
Prior art keywords
mold cavity
area
annular
axis
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201310451608.1A
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English (en)
Chinese (zh)
Other versions
CN103692370A (zh
Inventor
J·J·亨道恩
K·瓦瓦拉
J·B·米勒
B·T·坎特尔
J·T·穆奈恩
K·麦克休
G·H·麦凯恩
D·A·赫特
R·A·布拉迪
C·A·杨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials Holding Inc
Original Assignee
ROHM AND HAAS ELECTRONIC MATER
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by ROHM AND HAAS ELECTRONIC MATER filed Critical ROHM AND HAAS ELECTRONIC MATER
Publication of CN103692370A publication Critical patent/CN103692370A/zh
Application granted granted Critical
Publication of CN103692370B publication Critical patent/CN103692370B/zh
Active legal-status Critical Current
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN201310451608.1A 2012-09-27 2013-09-27 制备有凹槽的化学机械抛光层的方法 Active CN103692370B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/628,364 2012-09-27
US13/628,364 US9034063B2 (en) 2012-09-27 2012-09-27 Method of manufacturing grooved chemical mechanical polishing layers

Publications (2)

Publication Number Publication Date
CN103692370A CN103692370A (zh) 2014-04-02
CN103692370B true CN103692370B (zh) 2016-08-17

Family

ID=50337486

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310451608.1A Active CN103692370B (zh) 2012-09-27 2013-09-27 制备有凹槽的化学机械抛光层的方法

Country Status (5)

Country Link
US (1) US9034063B2 (https=)
JP (1) JP6238664B2 (https=)
KR (1) KR102085640B1 (https=)
CN (1) CN103692370B (https=)
TW (1) TWI594840B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10722999B2 (en) * 2016-06-17 2020-07-28 Rohm And Haas Electronic Materials Cmp Holdings, Inc. High removal rate chemical mechanical polishing pads and methods of making
CN111318956A (zh) * 2018-12-13 2020-06-23 夏泰鑫半导体(青岛)有限公司 聚氨酯研磨垫及其制造方法、及化学机械研磨装置
CN116061102A (zh) * 2023-02-06 2023-05-05 上海芯谦集成电路有限公司 一种具有沟槽的抛光垫及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1864929A (zh) * 2004-05-20 2006-11-22 Jsr株式会社 化学机械抛光垫及化学机械抛光方法
CN1970232A (zh) * 2005-09-16 2007-05-30 Jsr株式会社 制造化学机械抛光垫的方法
CN1990183A (zh) * 2005-12-28 2007-07-04 Jsr株式会社 化学机械抛光垫和化学机械抛光方法
CN101134303A (zh) * 2006-08-30 2008-03-05 力晶半导体股份有限公司 抛光垫及其制造方法
CN101175603A (zh) * 2005-05-18 2008-05-07 东洋橡胶工业株式会社 抛光垫、其生产方法及使用其生产半导体器件的方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2981322B2 (ja) * 1991-10-28 1999-11-22 松下電工株式会社 天井収納装置
MY114512A (en) * 1992-08-19 2002-11-30 Rodel Inc Polymeric substrate with polymeric microelements
WO2000059680A1 (en) * 1999-03-30 2000-10-12 Nikon Corporation Polishing body, polisher, polishing method, and method for producing semiconductor device
GB0008553D0 (en) 2000-04-06 2000-05-24 Unilever Plc Process and apparatus for the production of a detergent bar
US6641471B1 (en) * 2000-09-19 2003-11-04 Rodel Holdings, Inc Polishing pad having an advantageous micro-texture and methods relating thereto
KR100877386B1 (ko) 2001-11-13 2009-01-07 도요 고무 고교 가부시키가이샤 연마 패드 및 그 제조 방법
US7073244B2 (en) 2002-09-20 2006-07-11 Lear Corporation Process for machining a flexible foam
TW592894B (en) * 2002-11-19 2004-06-21 Iv Technologies Co Ltd Method of fabricating a polishing pad
US7704125B2 (en) * 2003-03-24 2010-04-27 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
EP1466699A1 (en) * 2003-04-09 2004-10-13 JSR Corporation Abrasive pad, method and metal mold for manufacturing the same, and semiconductor wafer polishing method
US7037175B1 (en) * 2004-10-19 2006-05-02 Cabot Microelectronics Corporation Method of sharpening cutting edges
US7275928B2 (en) * 2004-11-23 2007-10-02 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Apparatus for forming a striation reduced chemical mechanical polishing pad
TWI385050B (zh) 2005-02-18 2013-02-11 Nexplanar Corp 用於ｃｍｐ之特製拋光墊及其製造方法及其用途
US7300340B1 (en) * 2006-08-30 2007-11-27 Rohm and Haas Electronics Materials CMP Holdings, Inc. CMP pad having overlaid constant area spiral grooves
US7234224B1 (en) * 2006-11-03 2007-06-26 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Curved grooving of polishing pads
JP5166172B2 (ja) * 2008-09-02 2013-03-21 富士紡ホールディングス株式会社 研磨パッドの製造方法
US8585790B2 (en) * 2009-04-23 2013-11-19 Applied Materials, Inc. Treatment of polishing pad window
TWI426981B (zh) * 2010-11-23 2014-02-21 Univ Nat Pingtung Sci & Tech 晶圓研磨盤構造及其製造方法
US8444727B2 (en) * 2011-08-16 2013-05-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of manufacturing chemical mechanical polishing layers
US8986585B2 (en) * 2012-03-22 2015-03-24 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of manufacturing chemical mechanical polishing layers having a window
US8709114B2 (en) * 2012-03-22 2014-04-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of manufacturing chemical mechanical polishing layers

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1864929A (zh) * 2004-05-20 2006-11-22 Jsr株式会社 化学机械抛光垫及化学机械抛光方法
CN101175603A (zh) * 2005-05-18 2008-05-07 东洋橡胶工业株式会社 抛光垫、其生产方法及使用其生产半导体器件的方法
CN1970232A (zh) * 2005-09-16 2007-05-30 Jsr株式会社 制造化学机械抛光垫的方法
CN1990183A (zh) * 2005-12-28 2007-07-04 Jsr株式会社 化学机械抛光垫和化学机械抛光方法
CN101134303A (zh) * 2006-08-30 2008-03-05 力晶半导体股份有限公司 抛光垫及其制造方法

Also Published As

Publication number Publication date
TWI594840B (zh) 2017-08-11
KR20140041360A (ko) 2014-04-04
US20140083018A1 (en) 2014-03-27
TW201433411A (zh) 2014-09-01
JP2014072527A (ja) 2014-04-21
KR102085640B1 (ko) 2020-03-06
US9034063B2 (en) 2015-05-19
JP6238664B2 (ja) 2017-11-29
CN103692370A (zh) 2014-04-02

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: Delaware, USA

Patentee after: DuPont Electronic Materials Holdings Co.,Ltd.

Country or region after: U.S.A.

Address before: Delaware, USA

Patentee before: ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, Inc.

Country or region before: U.S.A.