CN103560143A - 一种汽车整流芯片及其整流基材的制备方法 - Google Patents
一种汽车整流芯片及其整流基材的制备方法 Download PDFInfo
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- CN103560143A CN103560143A CN201310530282.1A CN201310530282A CN103560143A CN 103560143 A CN103560143 A CN 103560143A CN 201310530282 A CN201310530282 A CN 201310530282A CN 103560143 A CN103560143 A CN 103560143A
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- 239000002253 acid Substances 0.000 claims description 9
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 7
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims description 6
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Rectifiers (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310530282.1A CN103560143B (zh) | 2013-10-31 | 2013-10-31 | 一种汽车整流芯片及其整流基材的制备方法 |
Applications Claiming Priority (1)
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CN201310530282.1A CN103560143B (zh) | 2013-10-31 | 2013-10-31 | 一种汽车整流芯片及其整流基材的制备方法 |
Publications (2)
Publication Number | Publication Date |
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CN103560143A true CN103560143A (zh) | 2014-02-05 |
CN103560143B CN103560143B (zh) | 2017-01-18 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104112661A (zh) * | 2014-07-03 | 2014-10-22 | 扬州虹扬科技发展有限公司 | 一种切割的工艺处理方法 |
CN107658346A (zh) * | 2017-10-26 | 2018-02-02 | 捷捷半导体有限公司 | 一种高结温雪崩二极管芯片组件及其制造方法 |
CN109817727A (zh) * | 2019-03-20 | 2019-05-28 | 山东省半导体研究所 | 带有圆形oj芯片的二极管及圆形oj芯片的碱洗工艺 |
CN114005733A (zh) * | 2021-10-19 | 2022-02-01 | 深圳辰达行电子有限公司 | 车规级整流芯片的制成方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3988765A (en) * | 1975-04-08 | 1976-10-26 | Rca Corporation | Multiple mesa semiconductor structure |
JP2010212316A (ja) * | 2009-03-09 | 2010-09-24 | Shindengen Electric Mfg Co Ltd | メサ型半導体装置の製造方法及びメサ型半導体装置 |
CN102244045A (zh) * | 2010-05-11 | 2011-11-16 | 扬州杰利半导体有限公司 | 一种二极管芯片及其加工工艺 |
CN203589038U (zh) * | 2013-10-31 | 2014-05-07 | 安徽安芯电子科技有限公司 | 一种汽车整流芯片 |
-
2013
- 2013-10-31 CN CN201310530282.1A patent/CN103560143B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3988765A (en) * | 1975-04-08 | 1976-10-26 | Rca Corporation | Multiple mesa semiconductor structure |
JP2010212316A (ja) * | 2009-03-09 | 2010-09-24 | Shindengen Electric Mfg Co Ltd | メサ型半導体装置の製造方法及びメサ型半導体装置 |
CN102244045A (zh) * | 2010-05-11 | 2011-11-16 | 扬州杰利半导体有限公司 | 一种二极管芯片及其加工工艺 |
CN203589038U (zh) * | 2013-10-31 | 2014-05-07 | 安徽安芯电子科技有限公司 | 一种汽车整流芯片 |
Non-Patent Citations (1)
Title |
---|
王中等: "单台面二极管晶圆红外激光划片工艺研究", 《中国激光》 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104112661A (zh) * | 2014-07-03 | 2014-10-22 | 扬州虹扬科技发展有限公司 | 一种切割的工艺处理方法 |
CN107658346A (zh) * | 2017-10-26 | 2018-02-02 | 捷捷半导体有限公司 | 一种高结温雪崩二极管芯片组件及其制造方法 |
CN109817727A (zh) * | 2019-03-20 | 2019-05-28 | 山东省半导体研究所 | 带有圆形oj芯片的二极管及圆形oj芯片的碱洗工艺 |
CN109817727B (zh) * | 2019-03-20 | 2024-04-30 | 山东省半导体研究所 | 带有圆形oj芯片的二极管及圆形oj芯片的碱洗工艺 |
CN114005733A (zh) * | 2021-10-19 | 2022-02-01 | 深圳辰达行电子有限公司 | 车规级整流芯片的制成方法 |
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Publication number | Publication date |
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CN103560143B (zh) | 2017-01-18 |
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Address after: Golden Road 247000 Anhui city in Chizhou Province Economic and Technological Development Zone No. 88 Chevalier Electronic Information Industrial Park No. 10 Patentee after: ANHUI ANXIN ELECTRONIC TECHNOLOGY CO.,LTD. Address before: Golden Road 247000 Anhui city in Chizhou Province Economic and Technological Development Zone No. 88 Chevalier Electronic Information Industrial Park No. 10 Patentee before: ANHUI ANXIN ELECTRONIC TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20231128 Address after: No. 26, Chuangyuan Middle Road, Weiyang Economic Development Zone, Yangzhou, Jiangsu 225008 Patentee after: YANGZHOU J & V SEMICONDUCTOR CO.,LTD. Address before: No. 10 Fu'an Electronic Information Industrial Park, No. 88 Jinguang Avenue, Economic and Technological Development Zone, Chizhou City, Anhui Province, 247000 Patentee before: ANHUI ANXIN ELECTRONIC TECHNOLOGY CO.,LTD. |