CN103418615A - 轧制铜箔 - Google Patents
轧制铜箔 Download PDFInfo
- Publication number
- CN103418615A CN103418615A CN2012103600198A CN201210360019A CN103418615A CN 103418615 A CN103418615 A CN 103418615A CN 2012103600198 A CN2012103600198 A CN 2012103600198A CN 201210360019 A CN201210360019 A CN 201210360019A CN 103418615 A CN103418615 A CN 103418615A
- Authority
- CN
- China
- Prior art keywords
- face
- copper foil
- rolled copper
- diffraction
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 246
- 239000011889 copper foil Substances 0.000 title claims abstract description 171
- 238000000034 method Methods 0.000 claims abstract description 137
- 239000013078 crystal Substances 0.000 claims description 103
- 239000010949 copper Substances 0.000 claims description 75
- 229910052802 copper Inorganic materials 0.000 claims description 74
- 238000000137 annealing Methods 0.000 claims description 66
- 238000005097 cold rolling Methods 0.000 claims description 63
- 230000008569 process Effects 0.000 claims description 61
- 238000001953 recrystallisation Methods 0.000 claims description 54
- 238000002441 X-ray diffraction Methods 0.000 claims description 25
- 230000008859 change Effects 0.000 claims description 15
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 description 73
- 230000000052 comparative effect Effects 0.000 description 66
- 238000005096 rolling process Methods 0.000 description 45
- 238000005452 bending Methods 0.000 description 24
- 230000006835 compression Effects 0.000 description 22
- 238000007906 compression Methods 0.000 description 22
- 238000004519 manufacturing process Methods 0.000 description 17
- 238000012545 processing Methods 0.000 description 17
- 238000012360 testing method Methods 0.000 description 16
- 239000000047 product Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- 230000007935 neutral effect Effects 0.000 description 10
- 238000003556 assay Methods 0.000 description 8
- 239000007767 bonding agent Substances 0.000 description 8
- 238000002425 crystallisation Methods 0.000 description 7
- 230000008025 crystallization Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000009616 inductively coupled plasma Methods 0.000 description 6
- 238000011835 investigation Methods 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 238000003490 calendering Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000005098 hot rolling Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 241000353097 Molva molva Species 0.000 description 1
- 241000405414 Rehmannia Species 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 210000002469 basement membrane Anatomy 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005088 metallography Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000005945 translocation Effects 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/40—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling foils which present special problems, e.g. because of thinness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
- B21B2003/005—Copper or its alloys
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B2261/00—Product parameters
- B21B2261/02—Transverse dimensions
- B21B2261/04—Thickness, gauge
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012113854A JP5201432B1 (ja) | 2012-05-17 | 2012-05-17 | 圧延銅箔 |
JP2012-113854 | 2012-05-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN103418615A true CN103418615A (zh) | 2013-12-04 |
Family
ID=48712996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2012103600198A Pending CN103418615A (zh) | 2012-05-17 | 2012-09-24 | 轧制铜箔 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5201432B1 (ja) |
KR (1) | KR101989853B1 (ja) |
CN (1) | CN103418615A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109392242A (zh) * | 2017-08-03 | 2019-02-26 | 捷客斯金属株式会社 | 柔韧印刷基板用铜箔、使用了该铜箔的覆铜层叠体、柔韧印刷基板和电子设备 |
CN115279929A (zh) * | 2020-03-06 | 2022-11-01 | 三菱综合材料株式会社 | 纯铜板、铜-陶瓷接合体、绝缘电路基板 |
US12035469B2 (en) | 2020-03-06 | 2024-07-09 | Mitsubishi Materials Corporation | Pure copper plate, copper/ceramic bonded body, and insulated circuit board |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112788886B (zh) * | 2020-06-23 | 2023-06-02 | 北京可利尔福科技有限公司 | 摄像模组 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000256765A (ja) * | 1999-03-08 | 2000-09-19 | Nippon Mining & Metals Co Ltd | 屈曲性に優れるフレキシブルプリント回路基板用圧延銅箔およびその製造方法 |
JP2001262296A (ja) * | 2000-03-17 | 2001-09-26 | Nippon Mining & Metals Co Ltd | 圧延銅箔およびその製造方法 |
CN1743481A (zh) * | 2004-08-30 | 2006-03-08 | 同和矿业株式会社 | 铜合金及其制造方法 |
CN101481760A (zh) * | 2008-01-08 | 2009-07-15 | 日立电线株式会社 | 轧制铜箔及其制造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW432124B (en) * | 1996-05-13 | 2001-05-01 | Mitsui Mining & Amp Smelting C | Electrolytic copper foil with high post heat tensile strength and its manufacturing method |
JP3009383B2 (ja) | 1998-03-31 | 2000-02-14 | 日鉱金属株式会社 | 圧延銅箔およびその製造方法 |
JP3856616B2 (ja) | 2000-03-06 | 2006-12-13 | 日鉱金属株式会社 | 圧延銅箔及びその製造方法 |
JP4833692B2 (ja) * | 2006-03-06 | 2011-12-07 | 古河電気工業株式会社 | 銅箔、銅箔の製造方法および前記銅箔を用いた積層回路基板 |
JP4285526B2 (ja) | 2006-10-26 | 2009-06-24 | 日立電線株式会社 | 圧延銅箔およびその製造方法 |
JP4215093B2 (ja) * | 2006-10-26 | 2009-01-28 | 日立電線株式会社 | 圧延銅箔およびその製造方法 |
JP5390852B2 (ja) * | 2008-12-24 | 2014-01-15 | 株式会社Shカッパープロダクツ | 圧延銅箔 |
JP2010150597A (ja) * | 2008-12-25 | 2010-07-08 | Hitachi Cable Ltd | 圧延銅箔 |
JP5345974B2 (ja) * | 2010-06-01 | 2013-11-20 | Jx日鉱日石金属株式会社 | 圧延銅合金箔、並びにこれを用いた負極集電体、負極板及び二次電池 |
JP5625188B2 (ja) * | 2010-06-29 | 2014-11-19 | 三井住友金属鉱山伸銅株式会社 | 圧延銅箔およびその製造方法 |
JP5685869B2 (ja) * | 2010-09-14 | 2015-03-18 | 三菱マテリアル株式会社 | 太陽電池パネルのインターコネクター用銅圧延箔及びその製造方法 |
-
2012
- 2012-05-17 JP JP2012113854A patent/JP5201432B1/ja active Active
- 2012-08-17 KR KR1020120089956A patent/KR101989853B1/ko active IP Right Grant
- 2012-09-24 CN CN2012103600198A patent/CN103418615A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000256765A (ja) * | 1999-03-08 | 2000-09-19 | Nippon Mining & Metals Co Ltd | 屈曲性に優れるフレキシブルプリント回路基板用圧延銅箔およびその製造方法 |
JP2001262296A (ja) * | 2000-03-17 | 2001-09-26 | Nippon Mining & Metals Co Ltd | 圧延銅箔およびその製造方法 |
CN1743481A (zh) * | 2004-08-30 | 2006-03-08 | 同和矿业株式会社 | 铜合金及其制造方法 |
CN101481760A (zh) * | 2008-01-08 | 2009-07-15 | 日立电线株式会社 | 轧制铜箔及其制造方法 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109392242A (zh) * | 2017-08-03 | 2019-02-26 | 捷客斯金属株式会社 | 柔韧印刷基板用铜箔、使用了该铜箔的覆铜层叠体、柔韧印刷基板和电子设备 |
CN109392242B (zh) * | 2017-08-03 | 2021-03-23 | 捷客斯金属株式会社 | 柔韧印刷基板用铜箔、使用了该铜箔的覆铜层叠体、柔韧印刷基板和电子设备 |
CN115279929A (zh) * | 2020-03-06 | 2022-11-01 | 三菱综合材料株式会社 | 纯铜板、铜-陶瓷接合体、绝缘电路基板 |
US12035469B2 (en) | 2020-03-06 | 2024-07-09 | Mitsubishi Materials Corporation | Pure copper plate, copper/ceramic bonded body, and insulated circuit board |
Also Published As
Publication number | Publication date |
---|---|
JP5201432B1 (ja) | 2013-06-05 |
JP2013241631A (ja) | 2013-12-05 |
KR20130129054A (ko) | 2013-11-27 |
KR101989853B1 (ko) | 2019-06-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20131204 |
|
WD01 | Invention patent application deemed withdrawn after publication |