CN103400790B - Conveyer in wet-chemical cleaning equipment - Google Patents
Conveyer in wet-chemical cleaning equipment Download PDFInfo
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- CN103400790B CN103400790B CN201310354783.9A CN201310354783A CN103400790B CN 103400790 B CN103400790 B CN 103400790B CN 201310354783 A CN201310354783 A CN 201310354783A CN 103400790 B CN103400790 B CN 103400790B
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- support
- conveyer
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- cleaning equipment
- chemical cleaning
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Abstract
The invention provides the conveyer in a kind of wet-chemical cleaning equipment, comprising: transmit support, lowering or hoisting gear and rinse bath, wherein, described lowering or hoisting gear is arranged on the inside of rinse bath, and described transmission support is connected with lowering or hoisting gear. Conveyer in wet-chemical cleaning equipment of the present invention is adjusted position by lowering or hoisting gear, can move in the rinse bath of conveyer and automatically clean, and without manual cleaning, has improved the operating efficiency of equipment.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, particularly the biography in a kind of wet-chemical cleaning equipmentSend device.
Background technology
In semiconductor manufacture, cleaning is the technical process the most used, number of repetition is maximum.Wherein, wet-chemical cleaning technology is used widely in semiconductor manufacture, and its operation principle is to use respectivelyVarious impurity, the particle generation chemical reaction of planting chemical liquid and semiconductor device surface generate water-soluble thingMatter, then rinse with high purity water, remove successively the pollutant of semiconductor device surface. Wet-chemical cleaning equipmentComprise the conveyer of semiconductor devices, the semiconductor devices before cleaning is sent to cleaning by conveyerIn equipment, clean, after having cleaned, be sent to next operation by conveyer.
For avoiding semiconductor devices to clean front and back cross pollution, in conveyer, be provided with two transmission supports,Two not directly contacts of transmission support. Before semiconductor devices cleans, transmission support in conveyer withContact of semiconductor device carries out transmission work, another transmit support not with contact of semiconductor device. SemiconductorAfter device cleans, another in conveyer transmits support and contact of semiconductor device carries out transmission work,Now, with clean before contact of semiconductor device transmission support not with contact of semiconductor device.
Visible, before and after cleaning, conveyer is different from the position of contact of semiconductor device. Cleaning first half is ledPollutant on body device generally can not pollute the semiconductor devices after cleaning. But, along with wash numberIncrease, the pollutant remaining on conveyer can get more and more, and the transmission environment of semiconductor devices more and morePoor, still can be contaminated after semiconductor devices cleans,, cause product bad. For this reason, need regularly to shut down handThe moving conveyer that cleans. So, not only increase downtime, reduced the operating efficiency of equipment, also couldIncrease Facilities Engineer's workload.
Summary of the invention
The object of the present invention is to provide the conveyer in a kind of wet-chemical cleaning equipment, existing to solveWet-chemical cleaning equipment in conveyer need Manual-cleaning, affect the asking of operating efficiency of equipmentTopic.
For solving the problems of the technologies described above, the invention provides the conveyer in a kind of wet-chemical cleaning equipment,Conveyer in described wet-chemical cleaning equipment comprises:
Transmit support, lowering or hoisting gear and rinse bath;
Transmit support, lowering or hoisting gear and rinse bath;
Wherein, described lowering or hoisting gear is arranged on the inside of rinse bath, and described transmission support is connected with lowering or hoisting gear.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described transmission support comprisesThe first support and the second support;
Wherein, the first support is fixedly installed on and transmits on support, and the second support is movably arranged on and transmits on support.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described transmission support enters oneStep comprises the second support lifting device;
Wherein, the second support is connected with the second support lifting device.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described transmission support comprisesThe first support and the second support;
Wherein, the first support and the second support are all movably arranged on and transmit on support.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described transmission support enters oneStep comprises the first support lifting device and the second support lifting device;
Wherein, the first support is connected with the first support lifting device, the second support and the second support lifting deviceConnect.
Preferably, in the conveyer in described wet-chemical cleaning equipment, the shape of described cleaning flute profileShape is cube, and its rib is grown up in the full-size that transmits support.
Preferably, in the conveyer in described wet-chemical cleaning equipment, the cell wall of described rinse bathOn be provided with multiple nozzles, described multiple nozzles comprise multiple chemical liquid nozzles, multiple pure water nozzle and manyIndividual nitrogen nozzle.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described multiple chemical liquidsThe position of nozzle, multiple pure water nozzle and multiple nitrogen nozzles is all symmetrical.
In sum, the conveyer in wet-chemical cleaning equipment of the present invention is by lowering or hoisting gear adjusted positionPut, can move in the rinse bath of conveyer and automatically clean, without manual cleaning, improved and establishedStandby operating efficiency.
Brief description of the drawings
Structure when Fig. 1 is the conveyer work in a kind of wet-chemical cleaning equipment of the embodiment of the present inventionSchematic diagram;
Fig. 2 be the conveyer in a kind of wet-chemical cleaning equipment of the embodiment of the present invention while cleaning structure showIntention;
Fig. 3 be conveyer in a kind of wet-chemical cleaning equipment of the embodiment of the present invention with clean before halfThe structural representation of conductor device contact;
Fig. 4 be conveyer in a kind of wet-chemical cleaning equipment of the embodiment of the present invention with clean after halfThe structural representation of conductor device contact.
Detailed description of the invention
Transmission dress in wet-chemical cleaning equipment the present invention being proposed below in conjunction with the drawings and specific embodimentsPut and be described in further detail. According to the following describes and claims, advantages and features of the invention will be moreClear. It should be noted that, accompanying drawing all adopts the form of simplifying very much and all uses non-ratio accurately, only usesWith convenient, the object of the aid illustration embodiment of the present invention lucidly.
Please refer to Fig. 1, Figure 1 shows that the transmission dress in a kind of wet-chemical cleaning equipment of the embodiment of the present inventionStructural representation while putting work. As shown in Figure 1, the conveyer 10 in described wet-chemical cleaning equipmentComprise: transmit support 11, lowering or hoisting gear 12 and rinse bath 13; Wherein, described transmission support 11 and liftingDevice 12 is arranged on the inside of rinse bath 13, and described transmission support 11 is connected with lowering or hoisting gear 12.
Concrete, rinse bath 13 be shaped as cube, its rib is grown up in the full-size that transmits support 11.Transmit support 11 and be connected with lowering or hoisting gear 12, lowering or hoisting gear 12 can drive and transmit support 11 at rinse bath13 inner oscilaltions. When semiconductor devices wet-chemical cleaning, start lowering or hoisting gear 12 and drive transmission support11 rise, and make conveyer 10 in wet-chemical cleaning equipment in operating position, transmit support 11Can transmit semiconductor devices with contact of semiconductor device.
Please continue to refer to Fig. 1, as shown in Figure 1, transmit support 11 and comprise the first support 15 and the second support16, wherein, the first support 15 is fixedly installed on and transmits on support 11, and the second support 16 is movably arranged on biographySend on support 11. Transmit support 11 and further comprise the second support lifting device 17, the second support liftings 17Device is connected with the second support 16. Transmit the position of the first support 15 in support 11 and fix, the second support 16Can oscilaltion. When the second support 16 drops to primary importance, its level height is lower than the first support 15,When the second support 16 rises to the second place, its level height is higher than the first support 15.
The first support 15 and the second support 16 are all movably set in and transmit on support 11. Transmit support 11 and enter oneStep comprises the first support lifting device and the second support lifting device 17, wherein, and the first support 15 and firstFrame lowering or hoisting gear connects, and the second support 16 is connected with the second support lifting device 17.
Equally, the first support 15 and the second support 16 can be realized alternately and transmitting, and the second support 16 drops toWhen primary importance, when its level height rises to the second place lower than the first support 15, the second supports 16, itsLevel height is higher than the first support 15.
Generally speaking, the transmission support of fixing and the second support 16 activities of the first support 15 is than the first support 15More stable with the equal movable transmission support of the second support 16.
Please refer to Fig. 3, as shown in Figure 3, before semiconductor devices cleans, the second support 16 is in the position that declinesPut, its level height lower than the first support 15, the second supports 16 not with contact of semiconductor device, the first support15 and contact of semiconductor device, transmit semiconductor devices by the first support 15.
Please refer to Fig. 4, as shown in Figure 4, after semiconductor devices cleans, the second support lifting device 17 startsWork, drives the second support 16 to rise. When the second support 16 is during in lifting position, the second support liftingDevice 17 quits work. Now, the level height of the second support 16 is higher than the first support 15, the first supports15 not with contact of semiconductor device, the second support 16 and contact of semiconductor device, is transmitted by the second support 16Semiconductor devices. Need to again transmit the semiconductor devices before cleaning time, the second support lifting device 17 againWork, drives the second support 16 to decline, and makes the second support 16 in down position, changes by the first support15 transmit.
In wet-chemical cleaning process, transmit support 11 periodic duty described above, transmit semiconductor devices. ByThis is visible, and semiconductor devices is different from the position of conveyer contact before and after cleaning, and can keep away like thisThe pollutant of exempting to clean front semiconductor devices remains on conveyer, and then pollutes the semiconductor device after cleaningPart.
Please refer to Fig. 2, Figure 2 shows that the transmission dress in a kind of wet-chemical cleaning equipment of the embodiment of the present inventionPut the structural representation while cleaning. As shown in Figure 2, when wet-chemical cleaning equipment is not worked, wet chemistryConveyer 10 in cleaning equipment, in idle state, can start lowering or hoisting gear 12 and drive transmission support11 decline, and the conveyer in wet-chemical cleaning equipment 10 is dropped to cleaning positions.
Further, the cell wall of rinse bath 13 is provided with multiple nozzles 14, and described multiple nozzles 14 comprise manyIndividual chemical liquid nozzle, multiple pure water nozzle and multiple nitrogen nozzle. In the present embodiment, the kind of nozzle 14Having three kinds, is respectively chemical liquid nozzle, pure water nozzle and nitrogen nozzle. The position of described multiple nozzle 14Be symmetrical, wherein on a side channel wall, have nozzle 14, on the cell wall of a relative side, correspondence position also has mutually of the same raceThe nozzle 14 of class. When the conveyer 10 in wet-chemical cleaning equipment is during in cleaning positions, open nozzle14, ejection chemical liquid, pure water, nitrogen carry out clearly the conveyer 10 in wet-chemical cleaning equipmentWash.
After cleaning completes, again start lowering or hoisting gear 12 by the conveyer in wet-chemical cleaning equipment 10Rise to operating position, the conveyer 10 in wet-chemical cleaning equipment just can be started working, and transmits halfConductor device.
To sum up, in the conveyer in the wet-chemical cleaning equipment providing in the embodiment of the present invention, transmit dressPut and rise to operating position by lowering or hoisting gear and carry out transmission work, or drop to cleaning positions by wet methodConveyer in cleaning equipment is placed in rinse bath and cleans, in described wet-chemical cleaning equipmentConveyer possessed self-cleaning function, carry out manual cleaning without shutdown, greatly improved the work of equipmentMake efficiency.
Foregoing description is only the description to preferred embodiment of the present invention, not any limit to the scope of the inventionFixed, any change, modification that the those of ordinary skill in field of the present invention does according to above-mentioned disclosure, all belong toIn the protection domain of claims.
Claims (7)
1. the conveyer in wet-chemical cleaning equipment, is characterized in that, comprising:
Transmit support, lowering or hoisting gear and rinse bath;
Wherein, described transmission support and described lowering or hoisting gear are arranged on the inside of rinse bath, described transmission supportBe connected with lowering or hoisting gear;
Described transmission support comprises the first support and the second support;
Wherein, the first support is fixedly installed on and transmits on support, and the second support is movably arranged on and transmits on support,Described the first support and described the second support are respectively used to support semiconductor device, by described the second supportThe up and down Support Position difference that realizes semiconductor devices cleaning front and back.
2. the conveyer in wet-chemical cleaning equipment as claimed in claim 1, is characterized in that instituteState transmission support and further comprise the second support lifting device;
Wherein, the second support is connected with the second support lifting device.
3. the conveyer in wet-chemical cleaning equipment as claimed in claim 1, is characterized in that instituteState the cube that is shaped as of rinse bath, its rib is grown up in the full-size that transmits support.
4. the conveyer in wet-chemical cleaning equipment as claimed in claim 1, is characterized in that instituteState on the cell wall of rinse bath and be provided with multiple nozzles, described multiple nozzles comprise multiple chemical liquid nozzles, manyIndividual pure water nozzle and multiple nitrogen nozzle.
5. the conveyer in wet-chemical cleaning equipment as claimed in claim 4, is characterized in that instituteThe position of stating multiple chemical liquid nozzles, multiple pure water nozzle and multiple nitrogen nozzles is all symmetrical.
6. the conveyer in wet-chemical cleaning equipment, is characterized in that, comprising:
Transmit support, lowering or hoisting gear and rinse bath;
Wherein, described transmission support and described lowering or hoisting gear are arranged on the inside of rinse bath, described transmission supportBe connected with lowering or hoisting gear;
Described transmission support comprises the first support and the second support;
Wherein, the first support and the second support are all movably arranged on and transmit on support, described the first support and instituteState the second support and be respectively used to support semiconductor device, upper by described the first support and described the second supportLower alternating activity is realized the Support Position difference before and after semiconductor devices cleaning.
7. the conveyer in wet-chemical cleaning equipment as claimed in claim 6, is characterized in that instituteState transmission support and further comprise the first support lifting device and the second support lifting device;
Wherein, the first support is connected with the first support lifting device, the second support and the second support lifting deviceConnect.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310354783.9A CN103400790B (en) | 2013-08-14 | 2013-08-14 | Conveyer in wet-chemical cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310354783.9A CN103400790B (en) | 2013-08-14 | 2013-08-14 | Conveyer in wet-chemical cleaning equipment |
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| Publication Number | Publication Date |
|---|---|
| CN103400790A CN103400790A (en) | 2013-11-20 |
| CN103400790B true CN103400790B (en) | 2016-05-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310354783.9A Active CN103400790B (en) | 2013-08-14 | 2013-08-14 | Conveyer in wet-chemical cleaning equipment |
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| CN (1) | CN103400790B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111081603B (en) * | 2019-11-25 | 2024-02-27 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment and wafer cleaning method |
| CN115458472A (en) * | 2022-11-11 | 2022-12-09 | 智程半导体设备科技(昆山)有限公司 | Semiconductor supporting device |
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| CN1450608A (en) * | 2002-03-01 | 2003-10-22 | 东京毅力科创株式会社 | Liquid processing apparatus and method thereof |
| CN1464533A (en) * | 2002-06-26 | 2003-12-31 | 矽统科技股份有限公司 | Wet-type washing apparatus |
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| CN1602229A (en) * | 2001-11-13 | 2005-03-30 | Fsi国际公司 | Semiconductor wafer cleaning systems and methods |
| CN1841663A (en) * | 2005-03-28 | 2006-10-04 | 三星电子株式会社 | Semiconductor manufacturing apparatus |
| CN101740324A (en) * | 2008-11-25 | 2010-06-16 | 上海华虹Nec电子有限公司 | Silicon wafer cleaner and silicon wafer cleaning method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3194209B2 (en) * | 1992-11-10 | 2001-07-30 | 東京エレクトロン株式会社 | Cleaning equipment |
| JPH07310192A (en) * | 1994-05-12 | 1995-11-28 | Tokyo Electron Ltd | Washing treatment device |
| DE19549488C2 (en) * | 1995-01-05 | 2001-08-02 | Steag Micro Tech Gmbh | Chemical wet treatment plant |
| US20070026602A1 (en) * | 2005-07-26 | 2007-02-01 | Victor Mimken | Method of minimal wafer support on bevel edge of wafer |
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- 2013-08-14 CN CN201310354783.9A patent/CN103400790B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1602229A (en) * | 2001-11-13 | 2005-03-30 | Fsi国际公司 | Semiconductor wafer cleaning systems and methods |
| CN1450608A (en) * | 2002-03-01 | 2003-10-22 | 东京毅力科创株式会社 | Liquid processing apparatus and method thereof |
| CN1464533A (en) * | 2002-06-26 | 2003-12-31 | 矽统科技股份有限公司 | Wet-type washing apparatus |
| CN1484279A (en) * | 2002-08-19 | 2004-03-24 | 住友精密工业株式会社 | Lifting/lowering type substrate proless device and substrate process system having same |
| CN1841663A (en) * | 2005-03-28 | 2006-10-04 | 三星电子株式会社 | Semiconductor manufacturing apparatus |
| CN101740324A (en) * | 2008-11-25 | 2010-06-16 | 上海华虹Nec电子有限公司 | Silicon wafer cleaner and silicon wafer cleaning method |
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| CN103400790A (en) | 2013-11-20 |
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