CN103400790A - Transmission device in wet chemical cleaning equipment - Google Patents
Transmission device in wet chemical cleaning equipment Download PDFInfo
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- CN103400790A CN103400790A CN2013103547839A CN201310354783A CN103400790A CN 103400790 A CN103400790 A CN 103400790A CN 2013103547839 A CN2013103547839 A CN 2013103547839A CN 201310354783 A CN201310354783 A CN 201310354783A CN 103400790 A CN103400790 A CN 103400790A
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- support
- conveyer
- wet
- cleaning equipment
- chemical cleaning
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Abstract
The invention provides a transmission device in wet chemical cleaning equipment. The transmission device comprises a transmission support, a lifting device and a cleaning trough, wherein the lifting device is arranged inside the cleaning trough; the transmission support is connected with the lifting device. The transmission device in the wet chemical cleaning equipment, provided by the invention, is subjected to position adjustment through the lifting device, and can move to the inside of the cleaning trough of the transmission device to be subjected to automatic cleaning, so that manual cleaning is unnecessary, and the working efficiency of the equipment is improved.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, particularly the conveyer in a kind of wet-chemical cleaning equipment.
Background technology
Cleaning is the technical process the most used, that number of repetition is maximum in the semiconductor manufacture.Wherein, the wet-chemical cleaning technology is used widely in the semiconductor manufacture, its operation principle is to use the various impurity of various chemical liquids and semiconductor device surface, particle generation chemical reaction to generate water-soluble material, with high purity water, rinse again, remove successively the pollutant of semiconductor device surface.Wet-chemical cleaning equipment comprises the conveyer of semiconductor device, and the semiconductor device before cleaning is sent in cleaning equipment and cleans by conveyer, after cleaning completes, by conveyer, is sent to next operation.
For avoiding semiconductor device to clean the front and back cross pollution, in conveyer, be provided with two transmission supports, two directly contacts of transmission supports.Before semiconductor device cleaned, a transmission support in conveyer carried out transmission work with contact of semiconductor device, another transmission support not with contact of semiconductor device.After semiconductor device cleaned, another in conveyer transmitted support and carries out transmission work with contact of semiconductor device, at this moment, with the transmission support that cleans front contact of semiconductor device not with contact of semiconductor device.
Visible, before and after cleaning, conveyer is different from the position of contact of semiconductor device.Pollutant before cleaning on semiconductor device generally can not pollute the semiconductor device after cleaning.But along with the increase of wash number, the pollutant that remains on conveyer can get more and more, and the transmission environment of semiconductor device worse and worse, still can be contaminated after semiconductor device cleans,, cause product bad.For this reason, need regular closed-down manual to clean conveyer.So, not only increase downtime, reduced the operating efficiency of equipment, also can increase Facilities Engineer's workload.
Summary of the invention
The object of the present invention is to provide the conveyer in a kind of wet-chemical cleaning equipment, with the conveyer that solves in existing wet-chemical cleaning equipment, need Manual-cleaning, affect the problem of the operating efficiency of equipment.
For solving the problems of the technologies described above, the invention provides the conveyer in a kind of wet-chemical cleaning equipment, the conveyer in described wet-chemical cleaning equipment comprises:
Transmit support, lowering or hoisting gear and rinse bath;
Transmit support, lowering or hoisting gear and rinse bath;
Wherein, described lowering or hoisting gear is arranged on the inside of rinse bath, and described transmission support is connected with lowering or hoisting gear.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described transmission support comprises the first support and the second support;
Wherein, the first support is fixedly installed on and transmits on support, and the second support is movably arranged on and transmits on support.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described transmission support further comprises the second support lifting device;
Wherein, the second support is connected with the second support lifting device.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described transmission support comprises the first support and the second support;
Wherein, the first support and the second support all are movably arranged on and transmit on support.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described transmission support further comprises the first support lifting device and the second support lifting device;
Wherein, the first support is connected with the first support lifting device, and the second support is connected with the second support lifting device.
Preferably, in the conveyer in described wet-chemical cleaning equipment, described cleaning flute profile be shaped as cube, its rib is grown up in the full-size that transmits support.
Preferably, in the conveyer in described wet-chemical cleaning equipment, on the cell wall of described rinse bath, be provided with a plurality of nozzles, described a plurality of nozzles comprise a plurality of chemical liquid nozzles, a plurality of pure water nozzle and a plurality of nitrogen nozzle.
Preferably, in the conveyer in described wet-chemical cleaning equipment, the position of described a plurality of chemical liquid nozzles, a plurality of pure water nozzle and a plurality of nitrogen nozzles is all symmetrical.
In sum, the conveyer in wet-chemical cleaning equipment of the present invention is adjusted position by lowering or hoisting gear, can move in the rinse bath of conveyer and automatically clean, and without manual cleaning, has improved the operating efficiency of equipment.
The accompanying drawing explanation
Structural representation when Fig. 1 is the conveyer work in a kind of wet-chemical cleaning equipment of the embodiment of the present invention;
Fig. 2 is the structural representation while cleaning of the conveyer in a kind of wet-chemical cleaning equipment of the embodiment of the present invention;
Fig. 3 be in a kind of wet-chemical cleaning equipment of the embodiment of the present invention conveyer with clean before the structural representation of contact of semiconductor device;
Fig. 4 be in a kind of wet-chemical cleaning equipment of the embodiment of the present invention conveyer with clean after the structural representation of contact of semiconductor device.
Embodiment
Below in conjunction with the drawings and specific embodiments, the conveyer in the wet-chemical cleaning equipment of the present invention's proposition is described in further detail.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of the aid illustration embodiment of the present invention lucidly.
Please refer to Fig. 1, the structural representation while Figure 1 shows that the conveyer work in a kind of wet-chemical cleaning equipment of the embodiment of the present invention.As shown in Figure 1, the conveyer 10 in described wet-chemical cleaning equipment comprises: transmit support 11, lowering or hoisting gear 12 and rinse bath 13; Wherein, described transmission support 11 and lowering or hoisting gear 12 are arranged on the inside of rinse bath 13, and described transmission support 11 is connected with lowering or hoisting gear 12.
Concrete, rinse bath 13 be shaped as cube, its rib is grown up in the full-size that transmits support 11.Transmit support 11 and be connected with lowering or hoisting gear 12, lowering or hoisting gear 12 can drive and transmit support 11 in the inner oscilaltion of rinse bath 13.During the semiconductor device wet-chemical cleaning, start lowering or hoisting gear 12 and drive 11 risings of transmission support, make the conveyer 10 in wet-chemical cleaning equipment be in service position, transmit support 11 and can transmit semiconductor device with contact of semiconductor device.
Please continue to refer to Fig. 1, as shown in Figure 1, transmit support 11 and comprise the first support 15 and the second support 16, wherein, the first support 15 is fixedly installed on and transmits on support 11, and the second support 16 is movably arranged on and transmits on support 11.Transmit support 11 and comprise that further the second support lifting device 17, the second support lifting 17 devices are connected with the second support 16.Transmit the position of the first support 15 in support 11 and fix, the second support 16 can oscilaltion.When the second support 16 dropped to primary importance, when its level height rose to the second place lower than the first support 15, the second supports 16, its level height was higher than the first support 15.
The first support 15 and the second support 16 all are movably set in and transmit on support 11.Transmit support 11 and further comprise the first support lifting device and the second support lifting device 17, wherein, the first support 15 is connected with the first support lifting device, and the second support 16 is connected with the second support lifting device 17.
Equally, the first support 15 and the second support 16 can be realized alternately transmitting, and when the second support 16 dropped to primary importance, when its level height rose to the second place lower than the first support 15, the second supports 16, its level height was higher than the first support 15.
Generally speaking, all the transmission support of activities is more stable than the first support 15 and the second support 16 for the transmission supports of fixing and the second support 16 activities of the first support 15.
Please refer to Fig. 3, as shown in Figure 3, before semiconductor device cleans, the second support 16 is in down position, its level height lower than the first support 15, the second supports 16 not with contact of semiconductor device, the first support 15 and contact of semiconductor device, transmit semiconductor device by the first support 15.
Please refer to Fig. 4, as shown in Figure 4, after semiconductor device cleaned, the second support lifting device 17 was started working, and drove the second support 16 and rose.When the second support 16 was in lifting position, the second support lifting device 17 quit work.At this moment, the level height of the second support 16 higher than the first support 15, the first supports 15 not with contact of semiconductor device, the second support 16 and contact of semiconductor device, transmit semiconductor device by the second support 16.In the time of need to again transmitting the semiconductor device before cleaning, the second support lifting device 17 is task again, drives the second support 16 and descends, and makes the second support 16 be in down position, changes by the first support 15 and transmits.
In the wet-chemical cleaning process, transmit support 11 periodic duty as mentioned above, transmit semiconductor device.As can be seen here, semiconductor device is different from the position of conveyer contact before and after cleaning, can avoid like this pollutant that cleans front semiconductor device to remain on conveyer, and then pollute the semiconductor device after cleaning.
Please refer to Fig. 2, Figure 2 shows that the structural representation when conveyer in a kind of wet-chemical cleaning equipment of the embodiment of the present invention cleans.As shown in Figure 2, when wet-chemical cleaning equipment is not worked, conveyer 10 in wet-chemical cleaning equipment is in idle state, can start lowering or hoisting gear 12 and drive 11 declines of transmission support, and the conveyer 10 in wet-chemical cleaning equipment is dropped to cleaning positions.
Further, the cell wall of rinse bath 13 is provided with a plurality of nozzles 14, and described a plurality of nozzles 14 comprise a plurality of chemical liquid nozzles, a plurality of pure water nozzle and a plurality of nitrogen nozzle.In the present embodiment, the kind of nozzle 14 has three kinds, is respectively chemical liquid nozzle, pure water nozzle and nitrogen nozzle.The position of described a plurality of nozzle 14 is symmetrical, wherein on a side channel wall, nozzle 14 is arranged, and on the cell wall of a relative side, correspondence position also has the nozzle 14 of identical type.When the conveyer 10 in wet-chemical cleaning equipment is in cleaning positions, open nozzle 14, ejection chemical liquid, pure water, nitrogen clean the conveyer 10 in wet-chemical cleaning equipment.
After cleaning completes, again start lowering or hoisting gear 12 conveyer 10 in wet-chemical cleaning equipment is risen to service position, the conveyer 10 in wet-chemical cleaning equipment just can be started working, and transmits semiconductor device.
To sum up; in conveyer in the wet-chemical cleaning equipment that the embodiment of the present invention provides; conveyer rises to service position by lowering or hoisting gear and carries out transmission work; perhaps dropping to cleaning positions is placed in rinse bath by the conveyer in wet-chemical cleaning equipment and cleans; conveyer in described wet-chemical cleaning equipment has possessed self-cleaning function; without shutdown, carry out manual cleaning, greatly improved the operating efficiency of equipment.
Foregoing description is only the description to preferred embodiment of the present invention, and not to any restriction of the scope of the invention, any change, modification that the those of ordinary skill in field of the present invention is done according to above-mentioned disclosure, all belong to the protection range of claims.
Claims (8)
1. the conveyer in a wet-chemical cleaning equipment, is characterized in that, comprising:
Transmit support, lowering or hoisting gear and rinse bath;
Wherein, described lowering or hoisting gear is arranged on the inside of rinse bath, and described transmission support is connected with lowering or hoisting gear.
2. the conveyer in wet-chemical cleaning equipment as claimed in claim 1, is characterized in that, described transmission support comprises the first support and the second support;
Wherein, the first support is fixedly installed on and transmits on support, and the second support is movably arranged on and transmits on support.
3. the conveyer in wet-chemical cleaning equipment as claimed in claim 2, is characterized in that, described transmission support further comprises the second support lifting device;
Wherein, the second support is connected with the second support lifting device.
4. the conveyer in wet-chemical cleaning equipment as claimed in claim 1, is characterized in that, described transmission support comprises the first support and the second support;
Wherein, the first support and the second support all are movably arranged on and transmit on support.
5. the conveyer in wet-chemical cleaning equipment as claimed in claim 4, is characterized in that, described transmission support further comprises the first support lifting device and the second support lifting device;
Wherein, the first support is connected with the first support lifting device, and the second support is connected with the second support lifting device.
6. the conveyer in wet-chemical cleaning equipment as claimed in claim 1, is characterized in that, described cleaning flute profile be shaped as cube, its rib is grown up in the full-size that transmits support.
7. the conveyer in wet-chemical cleaning equipment as claimed in claim 1, is characterized in that, on the cell wall of described rinse bath, is provided with a plurality of nozzles, and described a plurality of nozzles comprise a plurality of chemical liquid nozzles, a plurality of pure water nozzle and a plurality of nitrogen nozzle.
8. the conveyer in wet-chemical cleaning equipment as claimed in claim 7, is characterized in that, the position of described a plurality of chemical liquid nozzles, a plurality of pure water nozzle and a plurality of nitrogen nozzles is all symmetrical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310354783.9A CN103400790B (en) | 2013-08-14 | 2013-08-14 | Conveyer in wet-chemical cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310354783.9A CN103400790B (en) | 2013-08-14 | 2013-08-14 | Conveyer in wet-chemical cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103400790A true CN103400790A (en) | 2013-11-20 |
| CN103400790B CN103400790B (en) | 2016-05-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310354783.9A Active CN103400790B (en) | 2013-08-14 | 2013-08-14 | Conveyer in wet-chemical cleaning equipment |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111081603A (en) * | 2019-11-25 | 2020-04-28 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment and wafer cleaning method |
| CN115458472A (en) * | 2022-11-11 | 2022-12-09 | 智程半导体设备科技(昆山)有限公司 | Semiconductor supporting device |
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| JPH07310192A (en) * | 1994-05-12 | 1995-11-28 | Tokyo Electron Ltd | Washing treatment device |
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| CN1450608A (en) * | 2002-03-01 | 2003-10-22 | 东京毅力科创株式会社 | Liquid processing apparatus and method thereof |
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| CN1602229A (en) * | 2001-11-13 | 2005-03-30 | Fsi国际公司 | Semiconductor wafer cleaning systems and methods |
| CN1841663A (en) * | 2005-03-28 | 2006-10-04 | 三星电子株式会社 | Semiconductor manufacturing apparatus |
| US20070026602A1 (en) * | 2005-07-26 | 2007-02-01 | Victor Mimken | Method of minimal wafer support on bevel edge of wafer |
| CN101740324A (en) * | 2008-11-25 | 2010-06-16 | 上海华虹Nec电子有限公司 | Silicon wafer cleaner and silicon wafer cleaning method |
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2013
- 2013-08-14 CN CN201310354783.9A patent/CN103400790B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW238429B (en) * | 1992-11-10 | 1995-01-11 | Tokyo Electron Co Ltd | |
| JPH07310192A (en) * | 1994-05-12 | 1995-11-28 | Tokyo Electron Ltd | Washing treatment device |
| CN1171858A (en) * | 1995-01-05 | 1998-01-28 | 施蒂格微技术有限公司 | Wet chemical treatment installation |
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| CN1841663A (en) * | 2005-03-28 | 2006-10-04 | 三星电子株式会社 | Semiconductor manufacturing apparatus |
| US20070026602A1 (en) * | 2005-07-26 | 2007-02-01 | Victor Mimken | Method of minimal wafer support on bevel edge of wafer |
| CN101740324A (en) * | 2008-11-25 | 2010-06-16 | 上海华虹Nec电子有限公司 | Silicon wafer cleaner and silicon wafer cleaning method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111081603A (en) * | 2019-11-25 | 2020-04-28 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment and wafer cleaning method |
| CN111081603B (en) * | 2019-11-25 | 2024-02-27 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment and wafer cleaning method |
| CN115458472A (en) * | 2022-11-11 | 2022-12-09 | 智程半导体设备科技(昆山)有限公司 | Semiconductor supporting device |
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| CN103400790B (en) | 2016-05-11 |
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