CN103374703A - Single-tube direct-current sputtering coating equipment and use method for same - Google Patents
Single-tube direct-current sputtering coating equipment and use method for same Download PDFInfo
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- CN103374703A CN103374703A CN201210124826XA CN201210124826A CN103374703A CN 103374703 A CN103374703 A CN 103374703A CN 201210124826X A CN201210124826X A CN 201210124826XA CN 201210124826 A CN201210124826 A CN 201210124826A CN 103374703 A CN103374703 A CN 103374703A
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Abstract
The invention discloses a single-tube direct-current sputtering coating method and single-tube direct-current sputtering coating equipment capable of greatly saving equipment investment and without influence on a sputtering speed by improving production equipment. In order to solve the technical problems aforementioned, the equipment and the method disclosed by the invention adopt the following technical scheme: the use equipment comprises a direct-current power supply and a single-tube rotating cathode, wherein the structure of the single-tube rotating cathode comprises a cathode target, the cathode target is installed on a pair of rotating end heads, the rotating end heads are connected below a cathode cover plate, and a power supply interface, a cooling water connector, a control loop interface and a gas supply connector are formed at one end of the cathode cover plate; the direct-current power supply is connected to the power supply interface; a gas flow meter, an upper gas supply port, a control part and a rotating motor are arranged in the cathode cover plate. According to the equipment and the method disclosed by the invention, the utilization rate of the target is increased and equipment investment is saved.
Description
Technical field
The present invention relates to a kind of filming equipment and method, particularly a kind of single-tube direct current sputtering film coating method and equipment thereof.
Background technology
The sputter mode of building glass LOWE plated film mainly contains the plane d.c. sputtering at present, and two-tube rotation exchanges sputter.In these two kinds of methods, plane sputtering equipment cost of investment is low, but sputtering yield only has 30%, and bad to non-metallic material sputter effect; And two-tube rotation exchanges the sputtering yield height, but facility investment is higher.
Summary of the invention
Technical problem solved by the invention provides a kind of by improving production unit, can significantly save single-tube direct current sputtering film coating method and equipment thereof that facility investment does not but affect the sputter effect.
For solving the problems of the technologies described above, the present invention adopts following technical scheme: institute's use equipment comprises: direct supply and single tube rotating cathode;
Described single tube rotating cathode structure comprises: cathode targets, described cathode targets are installed on a pair of rotating end, and rotating end is connected to negative electrode cover plate below, and negative electrode cover plate one end is provided with power interface, cooling water connector, control loop interface and air feed interface; Connect direct supply on the power interface; Be provided with gas meter in the negative electrode cover plate, top air feed port, control section and rotating machine.
The film coating method step that the present invention takes is:
1. the body vacuum reaches 8E-6mbar;
2. open direct supply, give single tube rotating cathode water flowing energising;
3. open rotation;
4. input 1500-2500SCCM argon Ar makes its vacuum reach 3～5E-3bar;
5. light target;
6. increase target power to 20 between the 40KW;
7. input glass carries out plated film.
Positively effect of the present invention is: exchange sputter and compare with two-tube: save investment, and the termination that needs, magnet steel, target, the target cooling apparatus only has half of two-tube interchange sputter, can save facility investment 50%; Good product quality, the target utilising efficiency is higher.
Description of drawings
The present invention is further detailed explanation below in conjunction with the drawings and specific embodiments.
Fig. 1 single-tube direct current sputtering coated glass equipment synoptic diagram.
Among the figure:
1 direct supply, 2 power interfaces, 3 cooling water connectors
4 control loops connect 5 rotating ends, 6 cathode targets
7 negative electrode cover plates, 8 air feed connect 9 gas meters
10 top air feed ports, 11 control sections, 12 rotating machines
Embodiment
As shown in Figure 1, present device mainly is comprised of direct supply 1 and single tube rotating cathode; Wherein, single tube rotating cathode structure comprises: cathode targets 6, described cathode targets 6 are installed on a pair of rotating end 5, rotating end 5 is connected to negative electrode cover plate 7 belows, negative electrode cover plate 7 one ends are provided with power interface 2, cooling water connector 3, control loop interface 4 and air feed interface 8; Connect direct supply 1 on the power interface 2; Be provided with gas meter 9 in the negative electrode cover plate 7, top air feed port 10, control section 11 and rotating machine 12.
Single-tube direct current sputtering method of the present invention is as follows:
1. the body vacuum reaches 8E-6mbar;
2. open direct supply, give single tube rotating cathode water flowing energising;
3. open rotation;
4. input 1500 to 2500SCCM argon Ars, make its vacuum reach 3 to 5E-3bar;
5. light target;
6. increase target power to 20 between the 40KW;
7. input glass carries out plated film.
The below provides embodiment the present invention is further specified:
The first embodiment: vacuum reaches 3E-3bar, target power is 20KW, process gas argon gas input is 1500sccm, product is single silver products, the excessive layer of former of the float glass process that this list silver products sets gradually, basic unit, first medium layer, the first blocking layer that is consisted of by metal, silver layer, the second blocking layer, second medium layer and the top layer that are consisted of by metal.Wherein, first medium layer ZnO or ZnSnOx,, thicknesses of layers is 5nm～20nm.Adopt single-tube direct current sputtering, second medium layer: ZnO or ZnSnOx, thicknesses of layers are 10nm～25nm.Adopt single-tube direct current sputtering.Its film coating method is:
1. the body vacuum reaches 8E-6mbar;
2. open direct supply, give single tube rotating cathode water flowing energising;
3. open rotation;
4. input 1500SCCM argon Ar makes its vacuum reach 3E-3bar;
5. light target;
6. increase target power to 20kw;
7. input glass carries out plated film.
The second embodiment: vacuum reaches 5E-3bar, target power is 40KW, process gas argon gas input is that the 2500sccm product is single silver products, the excessive layer of former of the float glass process that this list silver products sets gradually, basic unit, first medium layer, the first blocking layer that is consisted of by metal, silver layer, the second blocking layer, second medium layer and the top layer that are consisted of by metal.Wherein, first medium layer ZnO or ZnSnOx,, thicknesses of layers is 5nm～20nm.Adopt single-tube direct current sputtering, second medium layer: ZnO or ZnSnOx, thicknesses of layers are 10nm～25nm.Adopt single-tube direct current sputtering.Its film coating method is:
1. the body vacuum reaches 8E-6mbar;
2. open direct supply, give single tube rotating cathode water flowing energising;
3. open rotation;
4. input 2500SCCM argon Ar makes its vacuum reach 5E-3bar;
5. light target;
6. increase target power to 40kw;
7. input glass carries out plated film.
Adopt this Apparatus and method for to sputter coated glass and two-tube to sputter coated glass contrast as follows:
The contrast of product optical property is as follows:
Visible light transmissivity Delta T=0.8%;
Visible light glass surface Delta R=0.5%;
Visible light glass surface chromaticity coordinates Delta E=0.9;
The radiant ratio of glass is substantially unchanged;
Subsequent handling is on the impact of appearance property, mechanical property: with two-tube sputter contrast indifference.
Claims (2)
1. single-tube direct current sputtering coated glass equipment, it is characterized in that: its composition comprises direct supply and single tube rotating cathode; Described single tube rotating cathode structure comprises: cathode targets, described cathode targets are installed on a pair of rotating end, and rotating end is connected to negative electrode cover plate below, and negative electrode cover plate one end is provided with power interface, cooling water connector, control loop interface and air feed interface; Connect direct supply on the power interface; Be provided with gas meter in the negative electrode cover plate, top air feed port, control section and rotating machine.
2. a right to use requires the film coating method of 1 described single-tube direct current sputtering coated glass equipment, and it is characterized in that: described method realizes according to following steps successively:
(1). the body vacuum reaches 8E-6mbar;
(2). open direct supply, give single tube rotating cathode water flowing energising;
(3). open rotation;
(4). input 1500-2500SCCM argon Ar makes its vacuum reach 3～5E-3bar;
(5). light target;
(6). increase target power to 20 between the 40KW;
(7). input glass, carry out plated film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210124826.XA CN103374703B (en) | 2012-04-26 | 2012-04-26 | Single-tube direct current sputtering filming equipment and using method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210124826.XA CN103374703B (en) | 2012-04-26 | 2012-04-26 | Single-tube direct current sputtering filming equipment and using method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103374703A true CN103374703A (en) | 2013-10-30 |
| CN103374703B CN103374703B (en) | 2016-11-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201210124826.XA Active CN103374703B (en) | 2012-04-26 | 2012-04-26 | Single-tube direct current sputtering filming equipment and using method thereof |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1134032A (en) * | 1995-03-23 | 1996-10-23 | 美国Boc氧气集团有限公司 | Use of multiple anodes in magnetron for improving uniformity of its plasma |
| CN101842511A (en) * | 2007-10-31 | 2010-09-22 | 荏原优吉莱特株式会社 | Film forming apparatus and film forming method |
| CN102278833A (en) * | 2011-05-16 | 2011-12-14 | 山东桑乐光热设备有限公司 | High-temperature resistant selective absorption coating and manufacturing method thereof |
| CN202226911U (en) * | 2011-09-02 | 2012-05-23 | 北京物华天宝镀膜科技有限公司 | Single-tube direct current sputtering glass coating equipment |
-
2012
- 2012-04-26 CN CN201210124826.XA patent/CN103374703B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1134032A (en) * | 1995-03-23 | 1996-10-23 | 美国Boc氧气集团有限公司 | Use of multiple anodes in magnetron for improving uniformity of its plasma |
| CN101842511A (en) * | 2007-10-31 | 2010-09-22 | 荏原优吉莱特株式会社 | Film forming apparatus and film forming method |
| CN102278833A (en) * | 2011-05-16 | 2011-12-14 | 山东桑乐光热设备有限公司 | High-temperature resistant selective absorption coating and manufacturing method thereof |
| CN202226911U (en) * | 2011-09-02 | 2012-05-23 | 北京物华天宝镀膜科技有限公司 | Single-tube direct current sputtering glass coating equipment |
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| CN103374703B (en) | 2016-11-16 |
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