CN202226911U - Single-tube direct current sputtering glass coating equipment - Google Patents
Single-tube direct current sputtering glass coating equipment Download PDFInfo
- Publication number
- CN202226911U CN202226911U CN2011203268127U CN201120326812U CN202226911U CN 202226911 U CN202226911 U CN 202226911U CN 2011203268127 U CN2011203268127 U CN 2011203268127U CN 201120326812 U CN201120326812 U CN 201120326812U CN 202226911 U CN202226911 U CN 202226911U
- Authority
- CN
- China
- Prior art keywords
- cover plate
- cathode
- interface
- direct current
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The specification discloses single-tube direct current sputtering glass coating equipment capable of greatly reducing the equipment investment yet without influencing the sputtering effect through improving production equipment. Aiming to solve the technical problem, the single-tube direct current sputtering glass coating equipment mainly includes a single-tube rotary cathode, wherein the single-tube rotary cathode mainly includes cathode target material, rotary end sockets and a cathode cover plate; the cathode cover plate forms a frame body; the cathode target material is installed between one pair of the rotary end sockets; the rotary end sockets are connected with the lower part of the cathode cover plate; a power interface, a cooling water interface, a control loop interface and an air feeding interface are arranged at one end of the cathode cover plate; a direct current supply is connected onto the power interface; and an air flowmeter, upper air feeding openings, a control part and a rotary motor are arranged in the cathode cover plate. The single-tube direct current sputtering glass coating equipment improves the utilization ratio of the target material and saves the equipment investment.
Description
Technical field
The utility model relates to a kind of filming equipment, particularly a kind of single tube d.c. sputtering glass coating equipment.
Background technology
Vacuum coating film equipment mainly refers to one type of plated film that need under higher vacuum, carry out, and specifically comprises many types, comprises the vacuum ionic evaporation, magnetron sputtering, and the MBE molecular beam epitaxy, PLD laser splash depositions etc. are a variety of.Main thought is to be divided into evaporation and two kinds of sputters.Need the substrate that is called as of plated film, the material of plating is called as target.Substrate and target coexist in the vacuum chamber.
For sputter class plated film, can be interpreted as simply and utilize electronics or superlaser bombardment target, and surface component is sputtered out with atomic group or ionic species, and finally be deposited on substrate surface that the experience film process finally forms film.
The sputter mode of building glass LOWE plated film mainly contains the plane d.c. sputtering at present, and two-tube rotation exchanges sputter.In these two kinds of methods, plane sputtering equipment cost of investment is low, but sputtering yield has only 30%, and bad to non-metallic material sputter effect; And two-tube rotation exchanges the sputtering yield height, but facility investment is higher.
The utility model content
The technical problem that the utility model solved provides a kind of can reducing cost does not significantly but influence the single tube of sputter effect d.c. sputtering glass coating equipment.
For solving the problems of the technologies described above, the described single tube d.c. sputtering of the utility model glass coating equipment mainly comprises the single tube rotating cathode;
Said single tube rotating cathode mainly is made up of cathode targets, rotation termination, negative electrode cover plate; Said negative electrode cover plate constitutes framework, and cathode targets is installed between a pair of rotation termination, and the rotation termination is connected the negative electrode under, and negative electrode cover plate one end is provided with power interface, water coolant interface, loop interface and air feed interface; Be connected with direct supply on the power interface; Be provided with gas meter in the negative electrode cover plate, top air feed port, control section and rotating machine.
The positively effect that the utility model had is: exchanges sputter and compares with two-tube, practice thrift investment, and the termination that needs, magnet steel, target, target cooling apparatus have only the half the of two-tube interchange sputter, can save facility investment 50%; Good product quality, the target utilising efficiency is higher.
Description of drawings
Below in conjunction with accompanying drawing and embodiment the utility model is done further detailed explanation.
Fig. 1 single tube dc sputtering deposition glass equipment synoptic diagram.
Among the figure:
1 direct supply, 2 power interfaces, 3 water coolant interfaces
4 loop interfaces, 5 rotation terminations, 6 cathode targets
7 negative electrode cover plates, 8 air feed interfaces, 9 gas meters
10 top air feed ports, 11 control sections, 12 rotating machines
Embodiment
As shown in Figure 1, the described single tube d.c. sputtering of the utility model glass coating equipment mainly comprises the single tube rotating cathode;
Said single tube rotating cathode mainly is made up of rotation termination 5, cathode targets 6, negative electrode cover plate 7; Said negative electrode cover plate 7 constitutes framework, and cathode targets 6 is installed between a pair of rotation termination 5, and rotation termination 5 is connected negative electrode cover plate 7 belows, and negative electrode cover plate 7 one ends are provided with power interface 2, water coolant interface 3, loop interface 4 and air feed interface 8; Connect direct supply 1 on the power interface 2; Negative electrode cover plate 7 inboards are provided with gas meter 8, and negative electrode cover plate 7 lower plates are provided with top air feed port 10, control section 11 and rotating machine 12.
The positively effect that the utility model had is: exchanges sputter and compares with two-tube, practice thrift investment, and the termination that needs, magnet steel, target, target cooling apparatus have only the half the of two-tube interchange sputter, can save facility investment 50%; Good product quality, the target utilising efficiency is higher.
Adopt this Apparatus and method for to sputter coated glass and the two-tube coated glass performance comparison that sputters is following:
The product optical property contrasts as follows:
Visible light transmissivity Delta T=0.8%;
Visible light glass surface Delta R=0.5%;
Visible light glass surface chromaticity coordinates Delta E=0.9;
The basic no change of the radiant ratio of glass;
Subsequent handling is to the outward appearance Effect on Performance, mechanical property: with two-tube sputter contrast indifference.
Claims (2)
1. single tube dc sputtering deposition glass equipment, it is characterized in that: described single tube d.c. sputtering glass coating equipment mainly comprises the single tube rotating cathode;
Said single tube rotating cathode mainly is made up of cathode targets, rotation termination, negative electrode cover plate; Said negative electrode cover plate constitutes framework, and cathode targets is installed between a pair of rotation termination, and the rotation termination is connected the negative electrode under, and negative electrode cover plate one end is provided with power interface, water coolant interface, loop interface and air feed interface; Be provided with gas meter in the negative electrode cover plate, top air feed port, control section and rotating machine.
2. single tube dc sputtering deposition glass equipment according to claim 1 is characterized in that: said power interface connects direct supply.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203268127U CN202226911U (en) | 2011-09-02 | 2011-09-02 | Single-tube direct current sputtering glass coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203268127U CN202226911U (en) | 2011-09-02 | 2011-09-02 | Single-tube direct current sputtering glass coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202226911U true CN202226911U (en) | 2012-05-23 |
Family
ID=46077509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203268127U Expired - Fee Related CN202226911U (en) | 2011-09-02 | 2011-09-02 | Single-tube direct current sputtering glass coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202226911U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103374703A (en) * | 2012-04-26 | 2013-10-30 | 北京物华天宝镀膜科技有限公司 | Single-tube direct-current sputtering coating equipment and use method for same |
-
2011
- 2011-09-02 CN CN2011203268127U patent/CN202226911U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103374703A (en) * | 2012-04-26 | 2013-10-30 | 北京物华天宝镀膜科技有限公司 | Single-tube direct-current sputtering coating equipment and use method for same |
| CN103374703B (en) * | 2012-04-26 | 2016-11-16 | 北京物华天宝镀膜科技有限公司 | Single-tube direct current sputtering filming equipment and using method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105543792B (en) | Magnetic control sputtering device and magnetically controlled sputter method | |
| CN103668095B (en) | A kind of high power pulse plasma enhancing combined magnetic-controlled sputter deposition apparatus and using method thereof | |
| CN103695858B (en) | A kind of multi-functional full-automatic ion film coating machine for cutter coat deposition and using method thereof | |
| CN101877372B (en) | Back electrode film of thin film solar cell | |
| CN107604328A (en) | A kind of fuel battery metal double polar plate highly effective ring vacuum coater | |
| CN101634012B (en) | Ion beam assisting magnetic control sputtering deposition method for surface protection | |
| CN101876062A (en) | Hollow cathode sputtering ion plating device | |
| KR101160680B1 (en) | A cylindrical sputtering cathode | |
| CN102453880A (en) | Method for improving uniformity of magnetron sputtering thin film | |
| CN1718849A (en) | Multifunction composite magnetic controlled plasma sputtering device | |
| CN109161842A (en) | The manufacturing method of coating system and coated glass | |
| CN202226911U (en) | Single-tube direct current sputtering glass coating equipment | |
| CN202576553U (en) | Magnetron sputtering target material | |
| CN206706198U (en) | Magnetic control sputtering device and magnetron sputtering apparatus | |
| CN101403101A (en) | Quick solid-ceramic coating ion plating apparatus | |
| CN109023274A (en) | Watch dail plate word follows closely vacuum coating method | |
| US20120067717A1 (en) | Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus | |
| CN209778983U (en) | Dual-purpose vacuum coating machine of evaporation sputtering | |
| CN103993274A (en) | Magnetron sputtering system and cleaning method | |
| CN109735821A (en) | A kind of cathode of high field intensity high target utilization ratio | |
| CN204111859U (en) | Magnetron sputtering loop device and magnetron sputter reactor | |
| CN1948546A (en) | Medium frequency twin magnetron sputtering device for cooling metal gallium target | |
| CN204779787U (en) | Magnetron sputtering target rifle | |
| CN109487225A (en) | Magnetron sputtering film formation device and method | |
| CN112921286A (en) | Production method of gradient U-shaped coating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120523 Termination date: 20190902 |