CN103320825A - Method for manufacturing high-density large-scale micro-nano-structure array - Google Patents
Method for manufacturing high-density large-scale micro-nano-structure array Download PDFInfo
- Publication number
- CN103320825A CN103320825A CN2013102248933A CN201310224893A CN103320825A CN 103320825 A CN103320825 A CN 103320825A CN 2013102248933 A CN2013102248933 A CN 2013102248933A CN 201310224893 A CN201310224893 A CN 201310224893A CN 103320825 A CN103320825 A CN 103320825A
- Authority
- CN
- China
- Prior art keywords
- micro
- array
- conduit
- nano structure
- little electrolysis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
The invention discloses a method for manufacturing a high-density large-scale micro-nano-structure array. The method comprises the steps that: (1) a low-density micro-electrolysis catheter array template composed of N*M micro-electrolysis catheters is prepared; (2) the low-density micro-electrolysis catheter array template prepared in the step (1) is arranged on a micro-electrolytic deposition system; the electro-deposition growth of the micro-electrolysis catheters on a conductive substrate are controlled, such that a high-density small-scale micro-nano-structure array with n micro-nano-structures on a row with a space of d1 between adjacent micro-nano-structures and with m micro-nano-structures on a column with a space of d2 between adjacent micro-nano-structures is formed. Micro-electrolysis catheters on the entire N*M micro-electrolysis catheter array work synchronically, such that the high-density large-scale micro-nano-structure array formed by (N*N)*(m*M) micro-nano-structures can be manufactured. With the method, the high-density large-scale micro-nano-structure array can be manufactured with low cost and high efficiency.
Description
Technical field
The present invention relates to micro-nano material and make the field, specifically is a kind of method of making the large-scale micro-nano structure array of high-density.
Background technology
Micro-nano structure array is the orderly material structure of arrangement of a kind of micron or nanoscale, material can be metal, pottery, semi-conductor or organic materials, have specific electricity, magnetics, optics and mechanical characteristic and function, be applied to various unicircuit and photoelectric chip manufacturing, test and medical probe field.The micro-nano structure array of indication of the present invention refers in particular to metal, semi-conductor or the ceramic structure of planar arranging orderly different shape.
Microcell electrolytic deposition technology is a kind of micro-nano processing technology based on Scanning probe technique (SPT), and its principle is to adopt bore at little electrolysis conduit of micro-nano size supply source as electrolytic solution, realizes the growth of microcell electrochemical deposition.Microcell electrolytic deposition system is comprised of computer and circuit amplifier, piezoelectric bar (or precision motor and drive shaft), little electrolysis conduit and the electrolytic solution that fills in little electrolysis conduit.Computer and circuit amplifier provide and control three road Voltage-outputs, every road voltage drives a piezoelectric bar (or precision motor), changing three road voltage output values just can make little electrolysis conduit at three piezoelectric bars (or motor drive shaft) intersection point place of being fixed in X, Y, Z axis do three-dimensional motion, the current potential of controlling simultaneously electrolytic solution in little electrolysis conduit carries out the microcell galvanic deposit of material, realizes the deposition growth of three-dimensional micro-nano structure; Principle of work is similar to the 3D printer, but referenced patent US7955486.
Microcell electrolytic deposition technology is owing to combining the similar Piezoelectric Control Technology of SPT, can carry out high precision control at three-dimensional space to Material growth position (being little electrolysis conduit outlet point), as: at the nano metal post of the silicon substrate growth ordered arrangement of conduction etc.Therefore, microcell electrolytic deposition technology is that a kind of three-dimensional straight of novelty is write the micro-nano structure growing technology that declines, and can be used for making the micro-nano structure array of various complicated shapes.
Little electrolysis conduit is the key part of microcell electrolytic deposition system (having adopted the system of microcell electrolytic deposition technology), the little electrolysis conduit that uses at present is the common mono-layer tube of glass-pulling, will be with microcell electrolytic deposition technical application, key is to improve the efficient that this technology is made the large-scale micro-nano structure array of high-density.The practical large-scale micro-nano structure array of high-density (such as high-density probe etc.), often comprise tens thousand of above monomer micro-nano structures, adopt single little electrolysis conduit to be engaged in this large array manufacturing, efficient and yield rate are all very low.Make the large-scale micro-nano structure array of the next disposable synchronous forming manufacturing high-density of little electrolysis conduit template and directly adopt with the little electrolysis conduit of the large array of Target Aerial Array high-density in proportion, although make efficient very high (once can finish the manufacturing of whole array), can run into technology and a cost difficult problem of making the little electrolysis conduit template of the large array of high-density itself.
Summary of the invention
Technical problem to be solved by this invention is to overcome the shortcoming of above prior art: provide a kind of low cost, the method for the large-scale micro-nano structure array of high efficiency manufacturing high-density.
Technical solution of the present invention is as follows:
A kind of method of making the large-scale micro-nano structure array of high-density, it may further comprise the steps:
1) the little electrolysis conduit array of low density template that is formed by N * M little electrolysis conduit of preparation, described little electrolysis conduit array is rectangular array, described N is little electrolysis conduit number of horizontally-arranged in little electrolysis conduit array, described M is little electrolysis conduit number of tandem in little electrolysis conduit array, and described N and M are the integer between the 3-500; In the little electrolysis conduit array of the described low density template, the spacing of adjacent little electrolysis conduit of horizontally-arranged is D1, and the spacing of adjacent little electrolysis conduit of tandem is D2;
2) the little electrolysis conduit array of the low density for preparing in step 1) template is installed in the microcell electrolytic deposition system, microcell electrolytic deposition system is by each the little electrolysis conduit synchronous electric deposition growing micro-nano structure on electrically-conductive backing plate on the little electrolysis conduit array of the described low density of the computer control template, controlling the spacing that each little electrolysis conduit finishes a horizontally-arranged n micro-nano structure and adjacent micro-nano structure at electrically-conductive backing plate is d1, the spacing of tandem m micro-nano structure and adjacent micro-nano structure is the deposition growth of the high density, compact micro-nano structure array of d2, little electrolysis conduit synchronous working on the little electrolysis conduit array of whole N * M, can make by (n * N) * (the large-scale micro-nano structure array of high-density that the individual micro-nano structure of m * M) forms, the large-scale micro-nano structure array of described high-density is spliced by N * M high density, compact micro-nano structure array, described high density, compact micro-nano structure array is rectangular array, described n is the horizontally-arranged number of micro-nano structure in the high density, compact micro-nano structure array, described m is the tandem number of micro-nano structure in the high density, compact micro-nano structure array, and described n and m are the integer between the 1-100; Described D1 be d1 positive integer doubly, described D2 be d2 positive integer doubly; Described d1 and d2 scale size are 5nm-20 μ m.
As preferably, described D1 be d1 n doubly, described D2 be d2 m doubly.
The little electrolysis conduit array of described low density template is that N * M little electrolysis conduit assembles or directly is made of one piece.
As preferably, the outlet internal diameter of described little electrolysis conduit is 5nm-100 μ m.
Beneficial effect of the present invention is: adopt the little electrolysis conduit array of low density of the present invention template to make the large-scale micro-nano structure array of high-density in conjunction with microcell electrolytic deposition technology, be engaged in the large-scale micro-nano structure array of this high-density with the single little electrolysis conduit of employing and compare, can increase substantially the manufacturing efficient of array of structures; The present invention adopts the little electrolysis conduit array of low density template, compare the large-scale micro-nano structure array template of direct use high-density in proportion as the processing template, manufacture difficulty and cost all reduce greatly, and the little electrolysis conduit of each in little electrolysis conduit array is when growth n * m micro-nano structure array, different electrolytic solution be can be filled with, thereby material complicacy and the functional diversity of micro-nano structure array further expanded.
Description of drawings
Fig. 1 is the structural representation of the little electrolysis conduit of the present invention.
Fig. 2 is mounting board structure schematic diagram in the embodiment of the invention.
Fig. 3 is the little electrolysis conduit array of low density of the present invention formwork structure schematic diagram.
Fig. 4 is micro-nano structure array of the present invention and electrically-conductive backing plate schematic diagram.
Fig. 5 is the large-scale micro-nano structure array of high-density of the present invention and electrically-conductive backing plate schematic diagram.
As shown in the figure: 1, little electrolysis conduit, 1.1, little electrolysis conduit outlet, 2, installation base plate, 3, open holes, 4, electrically-conductive backing plate, 5, micro-nano structure.
Embodiment
The below is described in further details the present invention with specific embodiment, but the present invention not only is confined to following specific embodiment.
Embodiment one
Manufacturing is by (n * N) * (the large-scale micro-nano structure array of high-density that the individual micro-nano structure of m * M) forms, described N and M are the integer between the 3-500, described n and m are the integer between the 1-100, described N is little electrolysis conduit number of horizontally-arranged in little electrolysis conduit array, and described M is little electrolysis conduit number of tandem in little electrolysis conduit array; In the large-scale micro-nano structure array of described high-density, the spacing of the adjacent micro-nano structure of horizontally-arranged is d1, and the spacing of the adjacent micro-nano structure of tandem is d2, and described d1 and d2 scale size are 5nm-20 μ m:
1) in conjunction with Fig. 1-Fig. 5, installation base plate 2 with Plane Installation hole rectangular array is provided, the quantity of described Plane Installation hole rectangular array midplane open holes 3 equals N * M, in the rectangular array of described Plane Installation hole, the spacing of the adjacent open holes 3 of horizontally-arranged is D1, and the spacing of the adjacent open holes 3 of tandem is D2; The thickness of described installation base plate 2 is 10 μ m-5mm, and described installation base plate 2 can be prepared by the precision optical machinery working method of prior art or the mode of microelectromechanical systems (MEMS) processing, and described D1 is n times of d1, and described D2 is m times of d2; N * M little electrolysis conduit 1 is provided, and described little electrolysis conduit outlet 1.1 internal diameters are 5nm-100 μ m; The little electrolysis conduit 1 of vertical insertion in the Plane Installation hole 3 of each installation base plate 2, regulate all little electrolysis conduit outlet 1.1 ends and be in same level, and the fixing little electrolysis conduit 1 of bonding is made the little electrolysis conduit array of a low density template that is comprised of N * M little electrolysis conduit at installation base plate 2.
2) the little electrolysis conduit array of the low density for preparing in step 1) template is installed in the microcell electrolytic deposition system, microcell electrolytic deposition system is by each the little electrolysis conduit 1 synchronous electric deposition growing micro-nano structure 5 on electrically-conductive backing plate on the little electrolysis conduit array of the described low density of the computer control template, and the spacing of finishing a horizontally-arranged n micro-nano structure and adjacent micro-nano structure at electrically-conductive backing plate by accurate step motor type of drive or each little electrolysis conduit of the accurate control of Piezoelectric Driving mode is d1, the spacing of tandem m micro-nano structure and adjacent micro-nano structure is the deposition growth of the high density, compact micro-nano structure array of d2, little electrolysis conduit synchronous working on the little electrolysis conduit array of whole N * M, can make by (n * N) * (the large-scale micro-nano structure array of high-density that the individual micro-nano structure of m * M) forms, the large-scale micro-nano structure array of described high-density is equivalent to be spliced by N * M high density, compact micro-nano structure array, described high density, compact micro-nano structure array is rectangular array, described n is the horizontally-arranged number of micro-nano structure in the high density, compact micro-nano structure array, described m is the tandem number of micro-nano structure in the high density, compact micro-nano structure array, can adopt precision optical machinery working method or microelectromechanical systems (MEMS) processing mode directly to process the little electrolysis conduit array of the low density template that makes in the step 1).
Embodiment two
The large-scale column micro-nano structure of the high-density rectangular array that manufacturing is comprised of the individual column micro-nano structure in (3 * 3) * (1 * 3), wherein the spacing of adjacent column micro-nano structure is 2 μ m in the tandem, the spacing of adjacent column micro-nano structure is 1 μ m in the horizontally-arranged:
1) in conjunction with Fig. 1-Fig. 5, installation base plate 2 with Plane Installation hole rectangular array is provided, the quantity of described Plane Installation hole rectangular array midplane open holes 3 equals namely 9 of 3 * 3(), wherein, the spacing of adjacent open holes 3 is made as 2 μ m in the tandem, the spacing of adjacent open holes 3 is made as 3 μ m in the horizontally-arranged, the thickness of described installation base plate 2 is 350 μ m, described installation base plate 2 is prepared by the mode of microelectromechanical systems (MEMS) processing of prior art, i.e. 9 the little electrolysis conduits 1 of 3 * 3 little electrolysis conduit 1(are provided), the internal diameter of described little electrolysis conduit outlet 1.1 is 200nm; The little electrolysis conduit 1 of vertical insertion in the Plane Installation hole 3 of each installation base plate 2, regulate all little electrolysis conduit outlet 1.1 ends and be in same level, and the fixing little electrolysis conduit 1 of bonding is made the little electrolysis conduit array of a low density template that is comprised of 3 * 3 little electrolysis conduits at installation base plate 2.
2) the little electrolysis conduit array of the low density for preparing in step 1) template is installed in the microcell electrolytic deposition system, microcell electrolytic deposition system is by the synchronous electric deposition growing column micro-nano structure 5 on electrically-conductive backing plate of each the little electrolysis conduit 1 on the little electrolysis conduit array of the described low density of the computer control template, at first the synchronous electric deposition growing goes out 3 * 3 column micro-nano structure rectangular arrays (as shown in Figure 4) corresponding with the little electrolysis conduit array of low density template on electrically-conductive backing plate, secondly after being offset the distance of 1 μ m by the little electrolysis conduit array of Piezoelectric Driving mode accurate control low density template in the horizontal position, the synchronous electric deposition growing goes out 3 * 3 column micro-nano structure rectangular arrays corresponding with the little electrolysis conduit array of low density template on electrically-conductive backing plate again, continue at last by the little electrolysis conduit array of Piezoelectric Driving mode accurate control low density template keep in the horizontal position with last time the offset direction consistent, again be offset the distance of 1um, the synchronous electric deposition growing goes out 3 * 3 column micro-nano structure rectangular arrays corresponding with the little electrolysis conduit array of low density template on electrically-conductive backing plate again, the spacing that finally makes the adjacent column micro-nano structure of tandem is 2um, and the spacing of the adjacent column micro-nano structure of horizontally-arranged is the large-scale column micro-nano structure of the high-density rectangular array (as shown in Figure 5) that is comprised of the individual column micro-nano structure in (3 * 3) * (1 * 3) of 1um.The present embodiment just simply illustrates, and does not represent the little electrolysis conduit array of described low density template and is only limited to transverse excursion, and it can also produce more massive array in conjunction with vertical misalignment.
Claims (4)
1. method of making the large-scale micro-nano structure array of high-density, it is characterized in that: it may further comprise the steps:
1) the little electrolysis conduit array of low density template that is formed by N * M little electrolysis conduit of preparation, described little electrolysis conduit array is rectangular array, described N is little electrolysis conduit number of horizontally-arranged in little electrolysis conduit array, described M is little electrolysis conduit number of tandem in little electrolysis conduit array, and described N and M are the integer between the 3-500; In the little electrolysis conduit array of the described low density template, the spacing of adjacent little electrolysis conduit of horizontally-arranged is D1, and the spacing of adjacent little electrolysis conduit of tandem is D2;
2) the little electrolysis conduit array of the low density for preparing in step 1) template is installed in the microcell electrolytic deposition system, microcell electrolytic deposition system is by each the little electrolysis conduit synchronous electric deposition growing micro-nano structure on electrically-conductive backing plate on the little electrolysis conduit array of the described low density of the computer control template, controlling the spacing that each little electrolysis conduit finishes a horizontally-arranged n micro-nano structure and adjacent micro-nano structure at electrically-conductive backing plate is d1, the spacing of tandem m micro-nano structure and adjacent micro-nano structure is the deposition growth of the high density, compact micro-nano structure array of d2, little electrolysis conduit synchronous working on the little electrolysis conduit array of whole N * M, can make by (n * N) * (the large-scale micro-nano structure array of high-density that the individual micro-nano structure of m * M) forms, the large-scale micro-nano structure array of described high-density is spliced by N * M high density, compact micro-nano structure array, described high density, compact micro-nano structure array is rectangular array, described n is the horizontally-arranged number of micro-nano structure in the high density, compact micro-nano structure array, described m is the tandem number of micro-nano structure in the high density, compact micro-nano structure array, and described n and m are the integer between the 1-100; Described D1 be d1 positive integer doubly, described D2 be d2 positive integer doubly; Described d1 and d2 scale size are 5nm-20 μ m, and in the large-scale micro-nano structure array of described high-density, the spacing of the adjacent micro-nano structure of horizontally-arranged is d1, and the spacing of the adjacent micro-nano structure of tandem is d2.
2. the method for the large-scale micro-nano structure array of manufacturing high-density according to claim 1 is characterized in that: described D1 be d1 n doubly, described D2 be d2 m doubly.
3. the method for the large-scale micro-nano structure array of manufacturing high-density according to claim 1 is characterized in that: the little electrolysis conduit array of described low density template is that N * M little electrolysis conduit assembles or directly be made of one piece.
4. the method for the large-scale micro-nano structure array of manufacturing high-density according to claim 1, it is characterized in that: the outlet internal diameter of described little electrolysis conduit is 5nm-100 μ m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310224893.3A CN103320825B (en) | 2013-06-06 | 2013-06-06 | Method for manufacturing high-density large-scale micro-nano-structure array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310224893.3A CN103320825B (en) | 2013-06-06 | 2013-06-06 | Method for manufacturing high-density large-scale micro-nano-structure array |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103320825A true CN103320825A (en) | 2013-09-25 |
| CN103320825B CN103320825B (en) | 2015-07-08 |
Family
ID=49189854
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310224893.3A Active CN103320825B (en) | 2013-06-06 | 2013-06-06 | Method for manufacturing high-density large-scale micro-nano-structure array |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103320825B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104674313A (en) * | 2015-02-10 | 2015-06-03 | 华南理工大学 | Electroplating method and device for preparing array micro/nanostructure on coated metal surface |
| CN107177867A (en) * | 2017-05-08 | 2017-09-19 | 南京航空航天大学 | Crack the layering electrocasting method of rectangular waveguide |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090000364A1 (en) * | 2007-02-20 | 2009-01-01 | Min-Feng Yu | Electrochemical deposition platform for nanostructure fabrication |
| CN101844272A (en) * | 2010-01-27 | 2010-09-29 | 长春理工大学 | Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology |
| CN101980083A (en) * | 2010-09-13 | 2011-02-23 | 长春理工大学 | Method and system for preparing filter membrane mesh structure by laser interference photoetching technology |
| CN102205944A (en) * | 2011-04-19 | 2011-10-05 | 北京化工大学 | Device and method for manufacturing micro-nano structure |
| CN102766892A (en) * | 2012-08-10 | 2012-11-07 | 重庆绿色智能技术研究院 | Micro-nano processing method and device |
-
2013
- 2013-06-06 CN CN201310224893.3A patent/CN103320825B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090000364A1 (en) * | 2007-02-20 | 2009-01-01 | Min-Feng Yu | Electrochemical deposition platform for nanostructure fabrication |
| CN101844272A (en) * | 2010-01-27 | 2010-09-29 | 长春理工大学 | Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology |
| CN101980083A (en) * | 2010-09-13 | 2011-02-23 | 长春理工大学 | Method and system for preparing filter membrane mesh structure by laser interference photoetching technology |
| CN102205944A (en) * | 2011-04-19 | 2011-10-05 | 北京化工大学 | Device and method for manufacturing micro-nano structure |
| CN102766892A (en) * | 2012-08-10 | 2012-11-07 | 重庆绿色智能技术研究院 | Micro-nano processing method and device |
Non-Patent Citations (5)
| Title |
|---|
| 崔铮: "《微纳米加工技术及其应用 第二版》", 31 May 2009, 高等教育出版社, article "扫描探针加工技术", pages: 204-221 * |
| 崔铮: "微纳米加工技术及其应用综述", 《物理》, no. 1, 31 January 2006 (2006-01-31), pages 34 - 39 * |
| 文莉: "基于SPM的微等离子无掩模扫描刻蚀加工方法的研究", 《中国博士学位论文全文数据库 工程科技I辑》, 15 January 2013 (2013-01-15), pages 022 - 16 * |
| 汤儆等: "电化学扫描探针显微镜在表面微/纳米加工的应用", 《微纳电子技术》, no. 78, 31 August 2003 (2003-08-31), pages 192 - 196 * |
| 王海等: "扫描探针加工技术的新进展及扫描等离子体加工技术的研究", 《微纳电子技术》, no. 78, 31 August 2003 (2003-08-31) * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104674313A (en) * | 2015-02-10 | 2015-06-03 | 华南理工大学 | Electroplating method and device for preparing array micro/nanostructure on coated metal surface |
| CN104674313B (en) * | 2015-02-10 | 2017-05-31 | 华南理工大学 | A kind of electro-plating method and device that array micro-nano structure is prepared on coated metal surface |
| CN107177867A (en) * | 2017-05-08 | 2017-09-19 | 南京航空航天大学 | Crack the layering electrocasting method of rectangular waveguide |
| CN107177867B (en) * | 2017-05-08 | 2019-01-11 | 南京航空航天大学 | Crack the layering electrocasting method of rectangular waveguide |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103320825B (en) | 2015-07-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103668367B (en) | The manufacture method of micro-nano structure array fin | |
| CN103973159B (en) | Miniature Inchworm type Piezoelectric Driving rotary joint mechanism | |
| Xu et al. | A review: development of the maskless localized electrochemical deposition technology | |
| CN110016696B (en) | Micro electroforming device based on photoinduced conductive electrode plate and micro electroforming method thereof | |
| CN1966399A (en) | Micro nano structure direct-writing device | |
| Termebaf et al. | Two-step bipolar electrochemistry: generation of composition gradient and visual screening of electrocatalytic activity | |
| CN103320825B (en) | Method for manufacturing high-density large-scale micro-nano-structure array | |
| CN109590039A (en) | A kind of microfluidic components, micro-fluidic chip and preparation method thereof | |
| CN104626582A (en) | Leveling device and leveling method of large-size fused deposition 3D printer | |
| CN107834893B (en) | Planar ultrasonic motor driven by isomorphic modes of double cross coupling type piezoelectric vibrator and working mode thereof | |
| CN103613064A (en) | Flat-plate-restraint evaporation-induced nanoparticle line self-assembly method | |
| CN100395374C (en) | Three-dimensional microstructure electroforming method and apparatus | |
| CN103030098A (en) | Method for manufacturing large-area nano gap electrode arrays in parallel | |
| CN103575931A (en) | Multi-direction vibration threshold value sensor for achieving contact time delay through nano-micro flexible arrays | |
| CN103159166B (en) | Based on the efficient microarray processing unit (plant) of parasitic motion principle | |
| CN106517083B (en) | A kind of micro channel array and preparation method thereof | |
| CN101837950A (en) | Device and method for assembling nanostructure directly by using two-block copolymer | |
| CN102916343A (en) | Production device and production method for quantum dot material | |
| CN102618914B (en) | Photon-assisted porous silicon electrochemical etching tank | |
| CN103895278A (en) | Porous graphene composite material supported by micropore and preparation method of material | |
| CN103066170B (en) | A kind of manufacture method of nano patterned substrate | |
| CN103305884B (en) | Manufacture the method for micro-nano coaxial tube | |
| CN103806040B (en) | A kind of electrochemical method for synthesizing of nickel-phosphorus alloy nano-tube array | |
| Kang et al. | Layer-by-layer assembly of free-standing nanofilms by controlled rolling | |
| CN105502278A (en) | Cavity film and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |