CN103282552B - 加强的多孔质金属箔及其制造方法 - Google Patents

加强的多孔质金属箔及其制造方法 Download PDF

Info

Publication number
CN103282552B
CN103282552B CN201280005334.7A CN201280005334A CN103282552B CN 103282552 B CN103282552 B CN 103282552B CN 201280005334 A CN201280005334 A CN 201280005334A CN 103282552 B CN103282552 B CN 103282552B
Authority
CN
China
Prior art keywords
mentioned
porous
tinsel
metal foil
porous metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201280005334.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN103282552A (zh
Inventor
松永哲广
西川丞
渡边肇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Kinzoku Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Publication of CN103282552A publication Critical patent/CN103282552A/zh
Application granted granted Critical
Publication of CN103282552B publication Critical patent/CN103282552B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/04—Hybrid capacitors
    • H01G11/06—Hybrid capacitors with one of the electrodes allowing ions to be reversibly doped thereinto, e.g. lithium ion capacitors [LIC]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22—Electrodes
    • H01G11/26—Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features
    • H01G11/28—Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features arranged or disposed on a current collector; Layers or phases between electrodes and current collectors, e.g. adhesives
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/66—Current collectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/66—Current collectors
    • H01G11/70—Current collectors characterised by their structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • H01G11/86—Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00—Secondary cells; Manufacture thereof
    • H01M10/05—Accumulators with non-aqueous electrolyte
    • H01M10/052—Li-accumulators
    • H01M10/0525—Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/64—Carriers or collectors
    • H01M4/66—Selection of materials
    • H01M4/661—Metal or alloys, e.g. alloy coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/64—Carriers or collectors
    • H01M4/70—Carriers or collectors characterised by shape or form
    • H01M4/72—Grids
    • H01M4/74—Meshes or woven material; Expanded metal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/64—Carriers or collectors
    • H01M4/70—Carriers or collectors characterised by shape or form
    • H01M4/80—Porous plates, e.g. sintered carriers
    • H01M4/806—Nonwoven fibrous fabric containing only fibres
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13—Energy storage using capacitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T10/00—Road transport of goods or passengers
    • Y02T10/60—Other road transportation technologies with climate change mitigation effect
    • Y02T10/70—Energy storage systems for electromobility, e.g. batteries
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12153—Interconnected void structure [e.g., permeable, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12361—All metal or with adjacent metals having aperture or cut
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12431—Foil or filament smaller than 6 mils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Power Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Electric Double-Layer Capacitors Or The Like (AREA)
  • Electroplating Methods And Accessories (AREA)
CN201280005334.7A 2011-01-13 2012-01-06 加强的多孔质金属箔及其制造方法 Expired - Fee Related CN103282552B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011005111A JP5636291B2 (ja) 2011-01-13 2011-01-13 補強された多孔質金属箔およびその製造方法
JP2011-005111 2011-03-04
PCT/JP2012/050189 WO2012096233A1 (ja) 2011-01-13 2012-01-06 補強された多孔質金属箔およびその製造方法

Publications (2)

Publication Number Publication Date
CN103282552A CN103282552A (zh) 2013-09-04
CN103282552B true CN103282552B (zh) 2016-04-27

Family

ID=46507133

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280005334.7A Expired - Fee Related CN103282552B (zh) 2011-01-13 2012-01-06 加强的多孔质金属箔及其制造方法

Country Status (6)

Country Link
US (1) US9512527B2 (enExample)
JP (1) JP5636291B2 (enExample)
KR (1) KR101483574B1 (enExample)
CN (1) CN103282552B (enExample)
TW (1) TWI439574B (enExample)
WO (1) WO2012096233A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101582376B1 (ko) * 2013-06-07 2016-01-04 주식회사 제낙스 전극, 이의 제조 방법 및 이를 이용한 전지
US9583277B2 (en) * 2013-09-30 2017-02-28 The Paper Battery Company, Inc. Ultra-capacitor structures and electronic systems with ultra-capacitor structures
KR101887793B1 (ko) 2014-02-07 2018-08-10 가부시키가이샤 무라타 세이사쿠쇼 콘덴서
FR3029386A1 (fr) * 2014-11-28 2016-06-03 Commissariat Energie Atomique Blindage magnetique ameliore
JP2017001312A (ja) * 2015-06-11 2017-01-05 吉田 英夫 ワークの皮膜形成構造およびワークの皮膜形成方法
CN107851510B (zh) 2015-08-12 2019-06-14 株式会社村田制作所 电容器
TWI687949B (zh) * 2016-03-31 2020-03-11 日商日本貴彌功股份有限公司 電極箔、電極箔的製造方法及捲繞型電容器的製造方法
JP6978262B2 (ja) * 2017-09-22 2021-12-08 セーレン株式会社 通気性防水金属箔
JP2019173164A (ja) * 2018-03-28 2019-10-10 日立金属株式会社 アルミニウム箔の製造方法
CN108436100B (zh) * 2018-04-09 2021-06-04 哈尔滨工业大学(深圳) 一种超薄多孔纳米镍箔的制备方法
US12334543B2 (en) * 2019-03-29 2025-06-17 Industry-University Cooperation Foundation Hanyang University Erica Campus Electrode structure and manufacturing method thereof
JP7546246B2 (ja) * 2020-07-07 2024-09-06 星和電機株式会社 多孔質銅およびその製造方法
EP4447169A4 (en) * 2022-02-28 2025-07-16 Contemporary Amperex Technology Hong Kong Ltd NEGATIVE ELECTRODE POLE PIECE, ELECTRODE ASSEMBLY, BATTERY CELL, BATTERY, ELECTRICAL DEVICE, AND METHOD AND DEVICE FOR MANUFACTURING NEGATIVE ELECTRODE POLE PIECE
WO2024048565A1 (ja) * 2022-08-30 2024-03-07 三井金属鉱業株式会社 金属不織布及びそれを用いてなる電極
WO2025005272A1 (ja) * 2023-06-29 2025-01-02 三井金属鉱業株式会社 被膜構造体の製造方法、及び被膜構造体

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000328284A (ja) * 1999-05-18 2000-11-28 Sumitomo Metal Steel Products Inc 多孔金属箔製造用の電着ドラム
JP2001202968A (ja) * 2000-01-17 2001-07-27 Dainippon Printing Co Ltd 電池用集電体
CN2676421Y (zh) * 2003-11-05 2005-02-02 邝达辉 一种用于制造电极的折边金属扩张网带
CN101557927A (zh) * 2006-12-27 2009-10-14 日立化成工业株式会社 凹版和使用该凹版的带有导体层图形的基材
WO2010034949A1 (fr) * 2008-09-25 2010-04-01 Saint-Gobain Glass France Procede de fabrication d'une grille submillimetrique electroconductrice, grille submillimetrique electroconductrice

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5030233A (en) 1984-10-17 1991-07-09 Paul Ducheyne Porous flexible metal fiber material for surgical implantation
CA2131872A1 (en) * 1993-09-14 1995-03-15 Hirofumi Sugikawa Metallic porous sheet and method for manufacturing same
JPH10195689A (ja) 1996-12-27 1998-07-28 Fukuda Metal Foil & Powder Co Ltd 微細孔明き金属箔の製造方法
JPH1167222A (ja) * 1997-08-22 1999-03-09 Kazuo Tagawa 電池用集電体およびこれを用いた電池
CN1184359C (zh) 1998-09-14 2005-01-12 三井金属鉱业株式会社 多孔铜箔及其用途和制造方法
JP4292436B2 (ja) * 1999-05-26 2009-07-08 住友電気工業株式会社 金属多孔質体とその製造方法およびそれを用いた電池用集電体
NL1015535C2 (nl) * 2000-06-27 2001-12-28 Stork Screens Bv Elektroformeringsmatrijs, werkwijze voor het vervaardigen daarvan, alsmede toepassing daarvan en geÙlektroformeerd product.
NL1017213C2 (nl) * 2001-01-29 2002-07-30 Stork Screens Bv Werkwijzen voor het vervaardigen van elektrische geleiders, en toepassing van aldus vervaardigde geleiders.
JP2005251429A (ja) 2004-03-01 2005-09-15 Mitsui Mining & Smelting Co Ltd Al合金キャリア付孔開き金属箔及びその製造方法並びにAl合金キャリア付孔開き金属箔から分離された該孔開き金属箔を含む二次電池用電極及び二次電池

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000328284A (ja) * 1999-05-18 2000-11-28 Sumitomo Metal Steel Products Inc 多孔金属箔製造用の電着ドラム
JP2001202968A (ja) * 2000-01-17 2001-07-27 Dainippon Printing Co Ltd 電池用集電体
CN2676421Y (zh) * 2003-11-05 2005-02-02 邝达辉 一种用于制造电极的折边金属扩张网带
CN101557927A (zh) * 2006-12-27 2009-10-14 日立化成工业株式会社 凹版和使用该凹版的带有导体层图形的基材
WO2010034949A1 (fr) * 2008-09-25 2010-04-01 Saint-Gobain Glass France Procede de fabrication d'une grille submillimetrique electroconductrice, grille submillimetrique electroconductrice

Also Published As

Publication number Publication date
KR20130107327A (ko) 2013-10-01
US20130216849A1 (en) 2013-08-22
US9512527B2 (en) 2016-12-06
TWI439574B (zh) 2014-06-01
KR101483574B1 (ko) 2015-01-16
JP2012144790A (ja) 2012-08-02
WO2012096233A1 (ja) 2012-07-19
JP5636291B2 (ja) 2014-12-03
CN103282552A (zh) 2013-09-04
TW201307617A (zh) 2013-02-16

Similar Documents

Publication Publication Date Title
CN103282552A (zh) 加强的多孔质金属箔及其制造方法
TWI441948B (zh) Porous metal foil and its manufacturing method
JP5466664B2 (ja) 多孔質金属箔およびその製造方法
JP5400826B2 (ja) 複合金属箔およびその製造方法
JP2012144790A5 (enExample)
TW201207161A (en) Method of manufacturing aluminum structure, and aluminum structure
Nikolić et al. The control of morphology and structure of galvanostatically produced tin dendrites by analysis of chronopotentiometry response
CN113061890A (zh) 一种铝合金表面恒压电沉积Ni-SiC复合镀层的方法
JP4298578B2 (ja) キャリア箔付き多孔質金属箔及びその製造方法
JP2012176483A (ja) 固定砥粒ワイヤの製造方法
Snowdon The Electrolytic Precipitation of Nickel on Nickel
WO2015122301A1 (ja) 多孔質金属箔及びその製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160427

CF01 Termination of patent right due to non-payment of annual fee