CN103247389B - 导电性膜卷的制造方法 - Google Patents

导电性膜卷的制造方法 Download PDF

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Publication number
CN103247389B
CN103247389B CN201310048931.4A CN201310048931A CN103247389B CN 103247389 B CN103247389 B CN 103247389B CN 201310048931 A CN201310048931 A CN 201310048931A CN 103247389 B CN103247389 B CN 103247389B
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China
Prior art keywords
roll
layer
film
oxide
conductive film
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CN201310048931.4A
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English (en)
Chinese (zh)
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CN103247389A (zh
Inventor
藤野望
鹰尾宽行
石桥邦昭
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Nitto Denko Corp
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Nitto Denko Corp
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Publication of CN103247389A publication Critical patent/CN103247389A/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Inorganic Chemistry (AREA)
  • Position Input By Displaying (AREA)
CN201310048931.4A 2012-02-06 2013-02-06 导电性膜卷的制造方法 Active CN103247389B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012023078A JP5826656B2 (ja) 2012-02-06 2012-02-06 導電性フィルムロールの製造方法
JP2012-023078 2012-02-06

Publications (2)

Publication Number Publication Date
CN103247389A CN103247389A (zh) 2013-08-14
CN103247389B true CN103247389B (zh) 2016-02-17

Family

ID=48901935

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310048931.4A Active CN103247389B (zh) 2012-02-06 2013-02-06 导电性膜卷的制造方法

Country Status (5)

Country Link
US (1) US20130199927A1 (https=)
JP (1) JP5826656B2 (https=)
KR (2) KR20130090805A (https=)
CN (1) CN103247389B (https=)
TW (1) TWI479511B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108027688B (zh) * 2015-09-30 2021-04-13 住友金属矿山株式会社 导电性基板
JP6668273B2 (ja) * 2017-01-31 2020-03-18 富士フイルム株式会社 巻取ロール
JP6953170B2 (ja) 2017-04-19 2021-10-27 日東電工株式会社 導電性フィルムおよびタッチパネル
JP2020075364A (ja) 2018-11-05 2020-05-21 日東電工株式会社 導電性フィルムおよびタッチパネル

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1525499A (zh) * 2003-02-24 2004-09-01 Tdk��ʽ���� 软磁性部件、电磁波控制板及软磁性部件的制造方法
CN1809799A (zh) * 2003-04-22 2006-07-26 触摸传感器技术有限责任公司 具有多个导电层的基板以及制造和使用该基板的方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3895129A (en) * 1973-02-20 1975-07-15 Sprague Electric Co Method for metallizing plastic film
US4262034A (en) * 1979-10-30 1981-04-14 Armotek Industries, Inc. Methods and apparatus for applying wear resistant coatings to roto-gravure cylinders
US4622240A (en) * 1985-11-12 1986-11-11 Air Products And Chemicals, Inc. Process for manufacturing thick-film electrical components
US5153074A (en) * 1991-11-05 1992-10-06 Mobil Oil Corporation Metallized film combination
US5583285A (en) * 1994-11-29 1996-12-10 Lucent Technologies Inc. Method for detecting a coating material on a substrate
EP1419286A1 (en) * 2001-08-20 2004-05-19 Nova-Plasma Inc. Coatings with low permeation of gases and vapors
US8307549B2 (en) * 2001-11-20 2012-11-13 Touchsensor Technologies, Llc Method of making an electrical circuit
EP1333323A3 (en) * 2002-02-01 2004-10-06 Nikon Corporation Self-cleaning reflective optical elements for use in x-ray optical systems, and optical systems and microlithography systems comprising same
JP4667471B2 (ja) * 2007-01-18 2011-04-13 日東電工株式会社 透明導電性フィルム、その製造方法及びそれを備えたタッチパネル
US8349731B2 (en) * 2011-03-25 2013-01-08 GlobalFoundries, Inc. Methods for forming copper diffusion barriers for semiconductor interconnect structures

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1525499A (zh) * 2003-02-24 2004-09-01 Tdk��ʽ���� 软磁性部件、电磁波控制板及软磁性部件的制造方法
CN1809799A (zh) * 2003-04-22 2006-07-26 触摸传感器技术有限责任公司 具有多个导电层的基板以及制造和使用该基板的方法

Also Published As

Publication number Publication date
KR101954483B1 (ko) 2019-03-05
CN103247389A (zh) 2013-08-14
JP2013161282A (ja) 2013-08-19
TW201337960A (zh) 2013-09-16
JP5826656B2 (ja) 2015-12-02
US20130199927A1 (en) 2013-08-08
KR20130090805A (ko) 2013-08-14
KR20150083982A (ko) 2015-07-21
TWI479511B (zh) 2015-04-01

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