CN103246168A - Active driving wire cable table of silicon wafer stage of lithography machine - Google Patents
Active driving wire cable table of silicon wafer stage of lithography machine Download PDFInfo
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- CN103246168A CN103246168A CN2012100246074A CN201210024607A CN103246168A CN 103246168 A CN103246168 A CN 103246168A CN 2012100246074 A CN2012100246074 A CN 2012100246074A CN 201210024607 A CN201210024607 A CN 201210024607A CN 103246168 A CN103246168 A CN 103246168A
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Abstract
The invention provides an active driving wire cable table of a silicon wafer stage of a lithography machine. The active driving wire cable table comprises a Y-direction sliding table, a Y-direction guide rail and a cross-telescopic linkage mechanism, wherein the Y-direction sliding table is disposed on the Y-direction guide rail through an air bearing; the Y-direction sliding table is driven by a sliding table motor and moves synchronously in the Y direction and on the silicon wafer stage; wire cable instrument is conveyed to the silicon wafer stage along the cross-telescopic linkage mechanism through the Y-direction sliding table; the cross-telescopic linkage mechanism comprises a cross telescopic connecting rod and a driver; one end of the cross telescopic connecting rod is connected with the Y-direction sliding table; the other end of the cross telescopic connecting rod is connected with the silicon wafer stage through the wire cable instrument; and the driver is used for driving the cross telescopic connecting rod to move along with an X direction, so that the wire cable is driven to move along the X direction. The active driving wire cable table of the silicon wafer stage of the lithography machine can realize active control of the wire cable table and follow motion of the wire cable table to the silicon wafer stage in an X-Y plane.
Description
Technical field
The present invention relates to the semiconductor lithography apparatus field, and be particularly related to a kind of active drive cable stage of photo-etching machine silicon chip platform.
Background technology
In semiconductor lithography equipment, precision workpiece stage movement systems such as silicon chip platform and mask platform are extremely important critical components, and its bearing accuracy directly influences the performance of lithographic equipment, and its travelling speed directly influences the production efficiency of lithographic equipment.Along with improving constantly of VLSI (very large scale integrated circuit) device integrated level, the continuous enhancing of photoetching resolution, also in continuous lifting, travelling speed, acceleration and the accuracy requirement of corresponding work stage also improve constantly to the characteristic line breadth index request of litho machine.
The typical version of photo-etching machine work-piece platform system is thick, fine motion structure combining, because planar motor has the force density of going out height, characteristics such as high reliability at a high speed,, and be easy to it is integrated in the controlled device, have advantages such as response speed is fast, control is highly sensitive, physical construction is simple, be applied at present in the semiconductor lithography equipment, realized the long stroke coarse motion of silicon chip platform.But realize that the silicon chip platform of long stroke coarse motion does not have X, Y-direction guide rail owing to adopt planar motor, move in the XY plane and be used for to follow the silicon chip platform to pipeline facilities such as silicon chip the platform supporting various communications cables, power cable and tracheae, water pipes, therefore the cable support oriented device need be set.Common silicon chip platform cable facility is that the passive silicon chip platform of following moves in the XY plane, carries out high-speed motion and nanoscale when accurately locating at the silicon chip platform, and the pipeline facility that drags will be can not ignore the disturbance that the silicon chip platform produces.
Prior art has announced that a kind of planar motor that adopts drives the work stage system that the silicon chip platform is realized long stroke coarse motion, its cable support oriented device comprises one group of V-type link assembly that links together by a revolute pair, one end of link assembly is installed on the X-direction slide unit by revolute pair, the other end is installed on the silicon chip platform by revolute pair, silicon chip platform cable facility is sent on the silicon chip platform from slide unit along link assembly, and moves at the passive silicon chip platform of following of Y-direction with link assembly.This scheme pipeline facility has a support vertical, has avoided sagging and work top friction, but follows the motion of silicon chip platform in that Y-direction is passive, can influence silicon chip platform motion positions precision.
Another prior art has been announced a kind of cable stage that adopts the photo-etching machine silicon chip platform of multi-joint manipulator, this cable stage comprises a control device and at least one multi-joint manipulator, silicon chip platform pipeline facility is gone on the silicon chip platform by multi-joint manipulator, guarantee that by the corner of controlling each joint driver pipeline facility initiatively follows the silicon chip platform and move in the XY plane, avoided the influence of pipeline facility to silicon chip platform motion positions precision, but this cable stage complex structure, the manipulator joint number is more to cause the number of drives used more, the more complicated of redundant degree of freedom manipulator control system design simultaneously, cost of development is higher relatively.
Summary of the invention
The present invention proposes a kind of active drive cable stage of photo-etching machine silicon chip platform, realizes the ACTIVE CONTROL of cable stage and cable stage the accompany movement of silicon chip platform at X-Y plane.
For reaching above-mentioned purpose, the present invention proposes a kind of active drive cable stage of photo-etching machine silicon chip platform, comprise the Y-direction slide unit, Y-direction guide rail and the pantograph linkage of intersecting, the Y-direction slide unit is arranged on the Y-direction guide rail by air-bearing, the Y-direction slide unit is kept being synchronized with the movement in Y-direction and silicon chip platform by the slide unit motor-driven, the cable facility is transported on the silicon chip platform along the intersection pantograph linkage via described Y-direction slide unit, the pantograph linkage of intersecting comprises intersection shrinking connecting-rod and driver, shrinking connecting-rod one end that intersects connects described Y-direction slide unit, the other end is connected in the silicon chip platform by the cable facility, driver is used for driving the intersection shrinking connecting-rod and moves along X-direction, moves along X-direction thereby drive the cable facility.
Further, described intersection shrinking connecting-rod comprises eight rod members, described eight rod members intersect to form four intersection points and three parallelogram in twos, be individually fixed in 2 points of Y-direction slide unit near two intersection points of described Y-direction slide unit, intersection point near described silicon chip platform is unsettled, and connects described silicon chip platform by the cable facility.
Further, the Y-direction slide unit is provided with first supporting base and second supporting base, be provided with leading screw between first supporting base and second supporting base, feed screw nut is installed on the leading screw by screw pair, be individually fixed in above-mentioned first supporting base and above-mentioned second supporting base of Y-direction slide unit in four intersection points near two intersection points of described Y-direction slide unit, described driver is electric rotating machine, and the motor shaft of electric rotating machine connects firmly mutually by the end of shaft coupling with leading screw.
Further, the motor shaft of described electric rotating machine is provided with rotary encoder or circle grating, is used for measuring and control motor corner.
Further, all be connected by revolute pair between eight of described intersection shrinking connecting-rod rod members.
Further, described each bar of intersection shrinking connecting-rod
The side of part is provided with the cable buckle for cable facility cabling.
Further, the intersection point near the silicon chip platform in described four intersection points connects sensor stand, and sensor stand is provided with two displacement transducers, is used for measuring and intersects pantograph linkage with respect to the X-direction displacement of silicon chip platform and the axial angular displacement of silicon chip platform Rz.
Further, described intersection shrinking connecting-rod is cantilever design, and every rod member aluminium alloy, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials come processing and manufacturing.
Further, the cable by described cable facility flexibly connects between described intersection shrinking connecting-rod and the silicon chip platform.
Further, described silicon chip platform is plane air supporting single silicon-chip platform, many silicon chips of plane air supporting platform, the floating single silicon-chip platform of plane magnetic or the floating many silicon chips platform of plane magnetic.
Further, described cable facility comprises the communications cable, power cable, tracheae, water pipe.
In sum, the present invention is directed to and adopt planar motor to realize the work stage kinematic system of silicon chip director stroke coarse motion, a kind of active drive cable stage structure has been proposed, each silicon chip platform is to there being an independently cable stage, this cable stage is simple in structure, can drive silicon chip platform cable facility and in the XY plane, initiatively follow the motion of silicon chip platform, guarantee that the cable facility can not be delivered to disturbance the silicon chip platform at the flexible of X-direction.
The present invention estimate the benefit that produces can be summarized as following some:
1. the photo-etching machine silicon chip platform cable stage that proposes of the present invention, can effectively support and drive silicon chip platform cable facility and follow the step-scan campaign of silicon chip platform synchronously, guarantee that the disturbance that produces in the cable ride motion process can not be delivered to the silicon chip platform, and then improve the motion positions precision of silicon chip platform;
2. the intersection pantograph linkage on the cable stage only comprises single driver, physical construction and control algolithm are simple relatively, at different photo-etching machine work-piece platform systems, can choose the cable stage of the group array Cheng Xin of the parallelogram length of side and parallelogram linkage flexibly at the minimum of the limit travel of X-direction and the cable facility disposed thereon radius that bends according to the silicon chip platform, simple in structure, extensibility is good.
3. at double-workpiece-table system, this cable stage device can the work stage laser interferometer measurement less than the zone as two work stage be in two platforms exchanges position, up and down during position such as sheet position, perhaps before the initialization of work stage laser interferometer, replace laser interferometer to measure the position of silicon chip platform in the XY plane.
Description of drawings
Figure 1 shows that the active drive cable stage structural representation of the photo-etching machine silicon chip platform of the embodiment of the invention 1.
Figure 2 shows that among the embodiment 1 that intersecting pantograph linkage is installed on the synoptic diagram of feed screw nut.
Figure 3 shows that the synoptic diagram of the intersection pantograph linkage among the embodiment 1.
Figure 4 shows that the kinetic control system calcspar of the active drive cable stage of the photo-etching machine silicon chip platform among the embodiment 1.
Figure 5 shows that the active drive cable stage structural representation of the photo-etching machine silicon chip platform of the embodiment of the invention 2.
Figure 6 shows that the active drive cable stage structural representation of the photo-etching machine silicon chip platform of the embodiment of the invention 3.
Embodiment
In order more to understand technology contents of the present invention, especially exemplified by specific embodiment and cooperate appended graphic being described as follows.
A kind of silicon chip platform cable stage that is applied to the employing intersection pantograph linkage of litho machine that the present invention proposes, be particularly useful for adopting planar motor to realize the work stage kinematic system of silicon chip director stroke coarse motion, the dual-workpiece system that adopts traditional H type framework also is suitable for.
Figure 1 shows that the active drive cable stage structural representation of the photo-etching machine silicon chip platform of the embodiment of the invention 1.Figure 2 shows that the synoptic diagram that is installed on feed screw nut of intersection pantograph linkage among the embodiment 1; Figure 3 shows that the intersection pantograph linkage synoptic diagram among the embodiment 1.Please also refer to Fig. 1 to Fig. 3, the active drive cable stage CS1 of photo-etching machine silicon chip platform comprises Y-direction slide unit 1, Y-direction guide rail 2 and along the reciprocating intersection pantograph linkage 10 of X-direction, Y-direction slide unit 1 is arranged on the Y-direction guide rail 2 by air-bearing, Y-direction slide unit 1 is kept being synchronized with the movement in Y-direction and silicon chip platform WST1 by the slide unit motor-driven, necessary various communications cables during silicon chip platform WST1 operate as normal, power cable, tracheae, pipeline facilities such as water pipe are carried by cable stage CS1, and namely the cable facility is transported on the silicon chip platform WST1 along intersection pantograph linkage 10 via Y-direction slide unit 1.The pantograph linkage 10 of intersecting comprises intersection shrinking connecting-rod 107 and driver 101, shrinking connecting-rod 107 1 ends that intersect connect Y-direction slide unit 1, the other end is connected in silicon chip platform WST1 by the cable facility, driver 101 is used for driving the intersection shrinking connecting-rod and moves along X-direction, moves along X-direction thereby drive the cable facility.
Particularly when silicon chip platform WS1 moves along X-direction, the pantograph linkage 10 of intersecting can either play the support guide effect to the cable facility, can intersect under the effect of driver 101 of pantograph linkage 10 again, the drive cable facility is made reciprocal stretching motion in X-direction, realizes the folding of X-direction cable and stretches.In addition, the pantograph linkage of intersecting is terminal to be remained constantly with the silicon chip platform in the distance of X-direction, avoid the cable facility to be delivered to the silicon chip platform in the disturbance that the stretching motion of X-direction produces.
The shrinking connecting-rod 107 that intersects comprises eight rod member 107a-107h, and eight rod members intersect to form four intersection points and three parallelogram in twos.Y-direction slide unit 1 is provided with between first supporting base 103 and second supporting base, 106, the first supporting bases 103 and second supporting base 106 and is provided with leading screw 104, and feed screw nut 105 is installed on the leading screw 104 by screw pair.2 points that the shrinking connecting-rod 107 that intersects is individually fixed in the Y-direction slide unit near two intersection point A and the B of Y-direction slide units 1, unsettled near the intersection point C of silicon chip platform WST1, do not have with silicon chip platform WST1 that machinery is connected and in X-direction maintenance certain clearance.
In the present embodiment, driver 101 is electric rotating machine, and the motor shaft of electric rotating machine 101 connects firmly mutually by the end of shaft coupling 102 with leading screw 104.Rotary encoder or circle grating also are installed on the motor shaft, are used for measuring and control motor corner.The shrinking connecting-rod 107 that intersects adopts electric rotating machine to drive, utilize feed screw nut 105 that rotatablely moving of motor 101 is converted into straight reciprocating motion along X-direction, and then the cable facility that drive is arranged on the intersection pantograph linkage 10 is made reciprocal stretching motion along X-direction, in conjunction with the motion of the Y-direction slide unit 1 on the cable stage in Y-direction, but cable stage drive cable facility is initiatively followed silicon chip platform WST1 motion in the XY plane, the disturbance that produces when guaranteeing the cable ride motion can not be delivered to silicon wafer stage system.
In the present embodiment, all be connected by revolute pair between each rod member of intersection shrinking connecting-rod 107.
Further, the side of each rod member arranges cable buckle 108, is used for fixedly being transported to the various cable facilities on the silicon chip platform.When reducing power cable and signal cable hypotelorism, produce each other and crosstalk, power cable and signal cable divide two-way to be transported on the silicon chip platform from the Y-direction slide unit along parallelogram pantograph linkages 107 through cable buckle 108, and pipeline facilities such as tracheae, water pipe also are transported on the silicon chip platform WST1 along intersection shrinking connecting-rod 107 by two-way Y-direction slide unit respectively.Above-mentioned two cabling circuits are respectively: circuit 1, Y-direction slide unit → 107b-107c-107f-107g → silicon chip platform; Circuit 2, Y-direction slide unit → 107a-107d-107e-107h → silicon chip platform.
Further, intersection point C near silicon chip platform WST1 connects sensor stand 110, it is provided with two parallel placements, is used for measuring over against X-direction and intersects shrinking connecting-rod 107 with respect to displacement transducer 109a, the 109b of silicon chip platform WST1 at the X axis relative position, by the measured displacement difference of displacement transducer 109a, 109b, can obtain silicon chip platform WST1 in the axial angular displacement of Rz.The vertical height of intersection pantograph linkage 10 at vertical height, is followed the measurement light path that when silicon chip platform WST1 XY plane in move can not block laser interferometer to guarantee cable stage less than silicon chip platform WST1 laser interferometer catoptron.
In the present embodiment, the pantograph linkage 10 of intersecting is cantilever design, and every rod member aluminium alloy, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials come processing and manufacturing.The silicon chip platform can be plane air supporting single silicon-chip platform, many silicon chips of plane air supporting platform, the floating single silicon-chip platform of plane magnetic or the floating many silicon chips platform of plane magnetic.The cable facility comprises the communications cable, power cable, tracheae, water pipe.
Adopt the motion control of the photo-etching machine silicon chip platform cable stage of intersection pantograph linkage to adopt close-loop feedback control, its feedback control system calcspar is as shown in Figure 4: be arranged on one group of displacement transducer 109a, 109b intersecting on pantograph linkage 10 ends and be used for measuring the relative silicon chip platform of pantograph linkages WST1 in the distance of X-direction, when intersection pantograph linkage 10 was synchronized with the movement with silicon chip platform WST1 according to given distance, displacement transducer 109a, 109b did not have signal output; When being disturbed, ranging offset expectation value between the two, displacement transducer 109a, the signal that 109b output is directly proportional with range deviation, through comparator circuit relatively, amplifier is sent to control device after amplifying, control device control performance element electric rotating machine turns an angle, drive the 10 flexible certain displacements of controlled device intersection pantograph linkage, to reduce to intersect the range deviation of the relative silicon chip platform of pantograph linkages WST1 in X-direction, along with reducing of range deviation, displacement transducer 109a, the output signal of 109b is more and more littler, range deviation also reduces thereupon, gets back to expectation value up to distance.In order better to improve the driving control accuracy to cable stage, in the present embodiment above-mentioned close-loop feedback control is called main feedback control, describe in conjunction with following LOCAL FEEDBACK control.LOCAL FEEDBACK control is to regulate the angular displacement axial with respect to silicon chip platform Rz of intersection pantograph linkage.Described referring to Fig. 4, displacement transducer 109a, 109b output intersects pantograph linkage with respect to the axial angular displacement of silicon chip platform Rz, be sent to control device through comparator circuit comparison, amplifier after amplifying, control device control performance element electric rotating machine turns an angle, to reduce intersecting pantograph linkage with respect to the axial angular displacement of silicon chip platform Rz, along with reducing of angular displacement deviation, the output signal of displacement transducer 109a, 109b is more and more littler, the angular displacement deviation also reduces thereupon, get back to expectation value up to distance, carry out main feedback control again.
Figure 5 shows that the active drive cable stage structural representation of the photo-etching machine silicon chip platform of the embodiment of the invention 2.Referring to Fig. 5, silicon chip platform WST1, WST2 is separately to there being an independently cable stage CS1, CS2, cable stage CS1, the structure of CS2 is identical and in full accord with the cable stage structure among the embodiment 1, cable stage CS1, two displacement transducer 109a of the parallelogram intersection pantograph linkage end on the CS2,109b can record the relative cable stage of silicon chip platform intersect pantograph linkage at the relative displacement of X-direction and silicon chip platform around the axial angular displacement of Rz, in conjunction with the one-dimensional grating chi of measuring cable stage Y-direction sliding displacement, this cable stage device CS1, CS2 can the work stage laser interferometer measurement less than the zone be in two platforms exchanges position as two silicon chip platforms, up and down during position such as sheet position, perhaps before the initialization of work stage laser interferometer, replace laser interferometer to measure the position of silicon chip platform in the XY plane.
Figure 6 shows that the active drive cable stage structural representation of the photo-etching machine silicon chip platform of the embodiment of the invention 3.Referring to Fig. 6, among this embodiment with embodiment 1, the driver of pantograph linkage 10 of intersecting among the embodiment 2 has been made into the linear electric motors that move along X-direction by electric rotating machine, the stator 111 of linear electric motors is arranged on the Y-direction slide unit 1, mover 112 is arranged on the X-direction slide unit 113,113 on slide unit is arranged on the Y-direction slide unit 1 by vertical levitation device, intersection pantograph linkage 10 described in the embodiment 1 is connected with X-direction slide unit 113 by revolute pair, X-direction slide unit 113 adopts the one-dimensional grating chi to measure in the displacement of X axis, intersects in the plane of pantograph linkage and silicon chip interstation the relative position measurement employing with mode identical among the embodiment 1.This example structure is simple, by two in the XY plane quadrature arrangement intersect pantograph linkage at two linear electric motors on the cable stage slide unit and one group of parallelogram and support and drive silicon chip platform cable facility and initiatively follow the silicon chip platform and in the XY plane, move, the disturbance that has produced when greatly having reduced silicon chip platform cable facility stretching motion is to the influence of silicon chip platform motion positions precision.
Though the present invention discloses as above with preferred embodiment, so it is not in order to limit the present invention.The persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is as the criterion when looking claims person of defining.
Claims (11)
1. the active drive cable stage of a photo-etching machine silicon chip platform, it is characterized in that, comprise the Y-direction slide unit, Y-direction guide rail and the pantograph linkage of intersecting, described Y-direction slide unit is arranged on the described Y-direction guide rail by air-bearing, described Y-direction slide unit is kept being synchronized with the movement in Y-direction and silicon chip platform by the slide unit motor-driven, described cable facility is transported on the described silicon chip platform along described intersection pantograph linkage via described Y-direction slide unit, the pantograph linkage of intersecting comprises intersection shrinking connecting-rod and driver, described intersection shrinking connecting-rod one end connects described Y-direction slide unit, the other end is connected in the silicon chip platform by the cable facility, described driver is used for driving described intersection shrinking connecting-rod and moves along X-direction, moves along X-direction thereby drive described cable facility.
2. the active drive cable stage of photo-etching machine silicon chip platform according to claim 1, it is characterized in that, described intersection shrinking connecting-rod comprises eight rod members, described eight rod members intersect to form four intersection points and three parallelogram in twos, be individually fixed in 2 points of Y-direction slide unit near two intersection points of described Y-direction slide unit, intersection point near described silicon chip platform is unsettled, and connects described silicon chip platform by the cable facility.
3. the active drive cable stage of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, the Y-direction slide unit is provided with first supporting base and second supporting base, be provided with leading screw between first supporting base and second supporting base, feed screw nut is installed on the leading screw by screw pair, be individually fixed in above-mentioned first supporting base and above-mentioned second supporting base of Y-direction slide unit in four intersection points near two intersection points of described Y-direction slide unit, described driver is electric rotating machine, and the motor shaft of electric rotating machine connects firmly mutually by the end of shaft coupling with leading screw.
4. the active drive cable stage of photo-etching machine silicon chip platform according to claim 3 is characterized in that, the motor shaft of described electric rotating machine is provided with rotary encoder or circle grating, is used for measuring and control motor corner.
5. the active drive cable stage of photo-etching machine silicon chip platform according to claim 2 is characterized in that, all is connected by revolute pair between eight rod members of described intersection shrinking connecting-rod.
6. the active drive cable stage of photo-etching machine silicon chip platform according to claim 2 is characterized in that, the side of described each rod member of intersection shrinking connecting-rod is provided with the cable buckle for cable facility cabling.
7. the active drive cable stage of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, intersection point near the silicon chip platform in described four intersection points connects sensor stand, sensor stand is provided with two displacement transducers, is used for measuring intersecting pantograph linkage with respect to the X-direction displacement of silicon chip platform and the axial angular displacement of silicon chip platform Rz.
8. the active drive cable stage of photo-etching machine silicon chip platform according to claim 2, it is characterized in that, described intersection shrinking connecting-rod is cantilever design, and every rod member aluminium alloy, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials come processing and manufacturing.
9. the active drive cable stage of photo-etching machine silicon chip platform according to claim 1 is characterized in that, the cable by described cable facility between described intersection shrinking connecting-rod and the silicon chip platform flexibly connects.
10. the active drive cable stage of photo-etching machine silicon chip platform according to claim 1 is characterized in that, described silicon chip platform is plane air supporting single silicon-chip platform, many silicon chips of plane air supporting platform, the floating single silicon-chip platform of plane magnetic or the floating many silicon chips platform of plane magnetic.
11. the active drive cable stage of photo-etching machine silicon chip platform according to claim 1 is characterized in that, described cable facility comprises the communications cable, power cable, tracheae, water pipe.
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| CN201210024607.4A CN103246168B (en) | 2012-02-03 | 2012-02-03 | A kind of active driving cable table of photo-etching machine silicon chip platform |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104874860A (en) * | 2015-04-07 | 2015-09-02 | 苏州金童机械制造股份有限公司 | Telescopic cutting device for composite color steel plates |
| CN108121167A (en) * | 2016-11-30 | 2018-06-05 | 上海微电子装备（集团）股份有限公司 | A kind of work stage shift unit and litho machine |
| CN109856920A (en) * | 2017-11-30 | 2019-06-07 | 上海微电子装备（集团）股份有限公司 | Anti-rotation device, sports platform system and lithographic equipment |
| CN110481452A (en) * | 2019-09-27 | 2019-11-22 | 深圳市车安达机电有限公司 | A kind of stacked clamp bracket with lever |
| CN112089585A (en) * | 2020-10-15 | 2020-12-18 | 苏州爱令明科技有限公司 | Vision training device |
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| CN2798198Y (en) * | 2005-06-13 | 2006-07-19 | 林永兴 | Selling machine for finished product of toilet ware |
| CN101770180A (en) * | 2010-02-02 | 2010-07-07 | 清华大学 | Cable stage for lithography wafer stages, adopting multi-joint manipulators |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN2798198Y (en) * | 2005-06-13 | 2006-07-19 | 林永兴 | Selling machine for finished product of toilet ware |
| CN101770180A (en) * | 2010-02-02 | 2010-07-07 | 清华大学 | Cable stage for lithography wafer stages, adopting multi-joint manipulators |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104874860A (en) * | 2015-04-07 | 2015-09-02 | 苏州金童机械制造股份有限公司 | Telescopic cutting device for composite color steel plates |
| CN108121167A (en) * | 2016-11-30 | 2018-06-05 | 上海微电子装备（集团）股份有限公司 | A kind of work stage shift unit and litho machine |
| CN108121167B (en) * | 2016-11-30 | 2020-05-01 | 上海微电子装备（集团）股份有限公司 | Workpiece table shifting device and photoetching machine |
| CN109856920A (en) * | 2017-11-30 | 2019-06-07 | 上海微电子装备（集团）股份有限公司 | Anti-rotation device, sports platform system and lithographic equipment |
| CN109856920B (en) * | 2017-11-30 | 2021-06-04 | 上海微电子装备（集团）股份有限公司 | Rotation prevention device, motion table system and photoetching equipment |
| CN110481452A (en) * | 2019-09-27 | 2019-11-22 | 深圳市车安达机电有限公司 | A kind of stacked clamp bracket with lever |
| CN112089585A (en) * | 2020-10-15 | 2020-12-18 | 苏州爱令明科技有限公司 | Vision training device |
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| CN103246168B (en) | 2016-02-03 |
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