CN103217874B - Maskless lithography system based on colloid micro ball nano lens - Google Patents
Maskless lithography system based on colloid micro ball nano lens Download PDFInfo
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- 238000000034 method Methods 0.000 claims abstract description 26
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
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- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention discloses a kind of maskless lithography system based on colloid micro ball nano lens, in order to realize the transfer of micro nano structure.Light beam is assembled by native system based on existing etching system, the nano lens utilizing colloid micro ball to prepare, and the focusing array of formation is photosensitive to photoresist, it is possible to achieve spacing is the lattice arrangement of 100nm 2000nm.This system realizes micro-nano lattice structure, technique is simple, need not add extra equipment, overcome in nanosphere lithography technique, need to repeat to assemble industrialization difficulty, low process efficiency that micro-nano ball caused and the shortcoming such as consequent quality is uncontrollable.The present invention on figure shifts highly controllable, pattern height accurately in order, graphic pattern various, simple to operate, with low cost, it is easy to industrialized production, has good application prospect preparing on nano graph substrate, quantum dot, plasma, mesh electrodes, photonic crystal and micro-nano device etc..
Description
Technical field
The present invention relates to a kind of semiconductor microactuator nanoprocessing equipment, receive based on colloid micro ball particularly to one
The maskless lithography system of rice lens.
Background technology
Conventional lithography process is by optical system, mask pattern to be reduced several times (1-20 times) project afterwards
On photoresist, being then passed through develops obtains required pattern.Along with the development of semiconductor industry, feature
Size reduces day by day, and traditional photoetching faces increasing challenge.Lithographic nano rank figure there is bottle
Neck, and use electron beam exposure that cost can be made big, and it is not easy to large area industrialized production.Additionally cover
The preparation expense of mould and preparation time (preparation efficiency) are also important challenges.The most a set of 90nm
The mask price of integrated circuit is up to millions of dollar, and the manufacturing cycle is up to the several months, and yield rate is low.
This causes small lot preparation cost to be difficult to bear.
And the colloid micro-nano ball photoetching (Nanosphere Lithography) grown up at present is due to it
With low cost, the advantages such as micro-nano-scale control is accurate are in widespread attention.This method is mainly used in receiving
The preparation of rice figure.Microballoon is utilized to gather based on colloid micro ball optically focused photoetching (Colloidal Lithography)
Ball lattice structure is transferred on photoresist by light, it is possible to achieve prepared by more rich nanostructured, but technique
Process needs to repeat to assemble micro-nano ball and makes preparation efficiency low and cause quality uncontrollable.
Summary of the invention
The technical problem to be solved in the present invention overcomes existing colloid micro-nano ball photoetching technique needs exactly
Repeat to assemble micro-nano ball make preparation efficiency low and cause the uncontrollable problem of quality, propose one
Maskless lithography system based on colloid micro ball nano lens, it is not necessary to repeat to prepare colloid monolayer microballoon.
In order to solve the problems referred to above, the present invention provides a kind of maskless lithography system, including exposure light source,
Described maskless lithography system also includes being supported by colloid micro ball nano lens and colloid micro ball nano lens
The concentrating element of substrate composition, described concentrating element is between exposure light source and element to be exposed.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
Described maskless lithography system also includes exposing mobile platform, and described exposure mobile platform is positioned at described
Colloid micro ball nano lens supports on substrate, for adjust between concentrating element and element to be exposed away from
From.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
Described maskless lithography system also includes tying element, and described knot element is positioned at described exposure light source
With between concentrating element, the light beam that described exposure light source sends forms the battle array of desirable pattern by knot element
Row light beam, invests concentrating element.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
Described knot element is usually micromirror arrays.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
The individual layer with lattice structure that described colloid micro ball nano lens is formed by colloid micro-nano ball
Colloid micro-nano ball array.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
Described colloid micro-nano ball can be polymer microsphere, such as polystyrene microsphere；Or it is inorganic
Oxidic transparent microballoon, such as silicon dioxide microsphere.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
The formation of described colloid monolayer micro-nano ball array can be obtained by the method for spin coating or self assembly
?.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
Described colloid micro-nano ball can be spherical, hemisphere or spheroid.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
A diameter of 0.05-3um of described colloid micro-nano ball.
Preferably, above-mentioned maskless lithography system also has the following characteristics that
The displacement accuracy of described exposure mobile platform is nanometer.
Light beam is gathered by the present invention based on existing etching system, the nano lens utilizing colloid micro ball to prepare
Collection, the focusing array of formation is photosensitive to photoresist.The dot matrix that spacing is 100nm-2000nm can be realized
Arrangement.Nano lens and sample operating distance are 0-5000nm.This system realizes micro-nano lattice structure,
Technique is simple, it is not necessary to add extra equipment.This technique overcomes in nanosphere lithography technique, needs
Repeat to assemble industrialization difficulty, low process efficiency and the consequent quality that micro-nano ball is caused
The shortcoming such as uncontrollable.
On figure shifts, highly controllable, pattern height is accurately in order, graphic pattern is various for the present invention, behaviour
Make simple, with low cost, it is simple to industrialized production.Prepare nano graph substrate, quantum dot, etc. from
Good application prospect is had on daughter, mesh electrodes, photonic crystal and micro-nano device etc..Can extensively answer
For LED, LD, HEMT, quantum dot memory, solar cell, fuel battery double plates, micro-
The semiconductor photoelectronic device micro nano structures such as fluidic devices manufacture.
Accompanying drawing explanation
Fig. 1 is the maskless lithography system based on colloid micro ball nano lens of the embodiment of the present invention；
Fig. 2 is receiving based on colloid micro ball of the knot element being additionally formed array beams of the embodiment of the present invention
The maskless lithography system of rice lens；
Fig. 3 is the ball shaped nano microsphere lens piece preparation method schematic diagram of the embodiment of the present invention；
Fig. 4 is the hemispherical Nano microsphere lens preparation method schematic diagram of the embodiment of the present invention；
Wherein, 10 light source；11 light beams；12 mobile platforms；13 Nano microsphere lens supports bases
Sheet, 14 Nano microsphere lens, 13 and 14 collectively form concentrating element；15 Nano microsphere lens gather
Defocused array beams；16 photoresists, 17 substrates, 16 and 17 collectively form element to be exposed；
The 18 knot element forming array beams；19 array beams formed, 20 water liquid levels, 21 water,
22 tanks.
Detailed description of the invention
Below in conjunction with accompanying drawing, embodiments of the invention are described in detail.It should be noted that
In the case of not conflicting, the embodiment in the application and the feature in embodiment can mutually be combined.
The present invention provide a kind of based on colloid micro ball nano lens as the maskless lithography system of concentrating element
System, uses colloid micro ball nano lens as concentrating element.
As it is shown in figure 1, the maskless lithography system of the embodiment of the present invention includes exposing required exposure light source
10 (they form light beam 11), exposure mobile platform 12 and by colloid micro ball nano lens support substrate
13 and colloid micro ball nano lens 14 composition concentrating element, have photoresist 16 and base under concentrating element
Sheet 17 constitutes element to be exposed.
Exposure mobile platform 12 is used (to be propped up support group by colloid micro ball nano lens to adjust concentrating element
Sheet 13 and colloid micro ball nano lens 14 are constituted) with element to be exposed (by photoresist 16 and substrate 17 structure
Become) between distance, due to be micro-nano ball constitute colloidal nano microsphere lens 14, its focal length is shorter,
Therefore the displacement accuracy of exposure mobile platform 12 is nanometer.
The individual layer glue with lattice structure that colloid micro ball nano lens 14 is formed by colloid micro-nano ball
Body micro-nano ball array.Colloid micro-nano ball can be polymer microsphere, such as polystyrene microsphere；Or
Person is transparent inorganic-oxide microballoon, such as silicon dioxide microsphere.The formation of array can pass through spin coating (spin
Coating) or self-assembling method obtain.The microballoon forming array can be spherical, hemisphere or ellipsoid
Body.
Here the formation to concentrating element is done and is described in detail a bit:
Method one: take colloid microsphere nano lens supports substrate 13, cover the colloid of an individual layer above
Microsphere nano lens 14, form hemisphere or convex surface ball by high annealing, and firm with what substrate combined,
Constitute one and move integrally lens.Colloid micro ball nano lens supports substrate 13, and its material is double polishings
The organic and inorganic materials such as sapphire, quartz plate, silicon chip, sheet glass, plastics, resin, silica gel, only
Will be to the most transparent dielectric material of exposed wave band.Colloid micro ball nano lens 14, permissible
It is that polystyrene spheres, silica spheres, PDMS ball, alumina balls, cesium chloride ball etc. can be by from groups
The single-layer and transparent ball of packing technique arrangement, a diameter of 0.05-3um.
Method two: as Fig. 1 takes colloid microsphere nano lens supports substrate 13, cover colloid above
Microsphere nano lens 14, fill glue at gap location, constitute a micro-nano lens of entirety.Filling glue can
To be PDMS, PDMA, silica gel, titanium oxide gel, other is organic and inorganic for standard lithographic glue etc.
Colloid, it is desirable to must be with the refractive index close or equal of colloid micro ball nano lens 14.So filling
After, be equivalent to individual layer micro-nano ball and become the micro-nano hemisphere of individual layer, constitute micro-nano lens.Also may be used
To fill the dielectric material such as silica, silicon nitride by colloid micro ball nano lens 14 by the method for sputtering
It is fixed on micro-nano lens supports substrate 13.
As in figure 2 it is shown, described maskless lithography system may also include knot element 18, it is positioned at exposure light
Between source 10 and concentrating element, the light beam 11 that can realize optionally making exposure light source 10 send is formed
(colloid micro ball nano lens supports substrate 13 and colloid micro ball nano lens to invest concentrating element after array
14 are constituted), form desirable pattern array beams 19.Knot element 18 usually micromirror arrays or
Person's mask plate.
(colloid micro ball nanometer is saturating to following is a brief introduction of individual layer micro-nano ball (particle diameter 50nm-3000nm) film
Mirror) preparation method: prepare the colloid micro ball that colloid micro ball nano lens uses and be mainly macromolecule and inorganic
Colloid micro ball, such as polystyrene microsphere (PS) and silica (SiO2) microballoon, these colloid micro balls
Particle diameter at 50nm 3000nm.In test, select phase according to required micro-nano graph characteristic dimension
The microspherulite diameter answered.Prepare the method that two-dimensional colloidal crystal generally uses at present and have LB film method, from group
Dress or the colloid monolayer crystal film of spin-coating method (spin-coating) composition rule arrangement.
Self-assembly method: this example utilizes surface tension of liquid, is self-assembly of individual layer by microballoon at the water surface
Micro-nano ball film, as shown in Figure 3.Implementation process is as follows: colloid micro ball is in water in diffusant mixed liquor
Dispersion, ultrasonic the most standby.This solution is labeled as A.At the built-in water of tank 22 21, delay with by A
Slowly dripping at water surface, due to capillary effect, microballoon can become colloid micro ball to receive at surface self-organization
Rice lens 14 also float over the surface of water.The substrate scribbling photoresist is inserted in water and slowly mentions, so
Individual layer micro-nano ball film just can transfer to photoresist surface.When colloid micro ball nano lens 14 swims in water
Time on liquid level 20, square tube toluene, ethyl acetate, acetone, tetrachloromethane on Nano microsphere lens 14
Deng the organic solvent of swellable polystyrene, hemispherical micro-nano lens can be prepared, as shown in Figure 4.
Spin-coating method: utilize spin coating equipment, molten at substrate surface dropping microballoon water (organic solvent)
Liquid, by turning effort, forms individual layer micro-nano ball film at substrate surface.Colloid micro ball is (organic at water
Solvent) middle dispersion, ultrasonic the most standby.This solution is labeled as B.The substrate scribbling photoresists is placed
Film is prepared in spin coating equipment.On photoresists surface, dropping B causes to be paved with surface completely, quiet
Putting 10-1000s, regulate rotation program, rotating speed controls at 100-30000r/min, and the time is 5-1000s.
Individual layer micro-nano ball film is obtained on photoresist surface.
In sum, the preparation of colloid micro ball nano lens is no longer necessary to repeat to prepare colloid monolayer microballoon,
Utilize colloid micro ball nano lens as collective optics, it is possible to achieve the transfer of micro nano structure.Solve
Micro-nano ball repeat preparation.
Colloid micro ball nano lens collective optics has only to existing etching system is carried out simple refit
It is embodied as the transfer of nanostructured.Compare existing preparation method, for nano impression, it is not necessary to increase
Add new equipment and special macromolecule glue.Whole process costs is cheap, and preparation efficiency is high.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for this
For the technical staff in field, the present invention can have various modifications and variations.All spirit in the present invention and
Within principle, any modification, equivalent substitution and improvement etc. made, should be included in the protection of the present invention
Within the scope of.
Claims (2)
1. a maskless lithography system, including exposure light source, it is characterised in that described maskless light
Etching system also included by gathering that colloid micro ball nano lens and colloid micro ball nano lens support substrate form
Burnt element, described concentrating element is between exposure light source and element to be exposed；Described maskless lithography system
System also includes exposing mobile platform, and described exposure mobile platform is positioned at described colloid micro ball nano lens and supports
On substrate, for adjusting the distance between concentrating element and element to be exposed；Described maskless lithography system
System also includes tying element, and described knot element is between described exposure light source and concentrating element, described
The light beam that exposure light source sends forms the array beams of desirable pattern by knot element, invests and focuses on unit
Part；
Described knot element is usually micromirror arrays；Described colloid micro ball nano lens is that colloid is micro-
What nanosphere was formed has the colloid monolayer micro-nano ball array of lattice structure；
Described colloid micro-nano ball is polymer microsphere or transparent inorganic-oxide microballoon；
The formation of described colloid monolayer micro-nano ball array can be obtained by the method for spin coating or self assembly
?；
Described colloid micro-nano ball can be spherical, hemisphere or spheroid；
A diameter of 0.05-3um of described colloid micro-nano ball；
The displacement accuracy of described exposure mobile platform is nanometer.
2. maskless lithography system as claimed in claim 1, it is characterised in that:
Described colloid micro-nano ball is polystyrene microsphere or silicon dioxide microsphere.
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| CN104698768B (en) * | 2013-12-10 | 2017-02-01 | 上海微电子装备有限公司 | Photoetching exposure system |
| CN104174999B (en) * | 2014-08-13 | 2016-09-21 | 清华大学 | Utilize the method that two-step method prepares surface micro-nano graph |
| CN104355287B (en) * | 2014-11-18 | 2016-08-24 | 中国科学院半导体研究所 | A kind of multifunctional combination type nano graph preparation method |
| CN105858594A (en) * | 2016-04-15 | 2016-08-17 | 清华大学 | Steel structure surface processing method |
| CN107199403B (en) * | 2017-05-18 | 2019-12-31 | 长春理工大学 | By using TiO2Method for assisting femtosecond laser super-diffraction limit processing by particle array |
| CN110187599B (en) * | 2019-07-02 | 2020-04-07 | 电子科技大学 | Micro-lens mask and preparation method thereof |
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| CN102701143A (en) * | 2012-06-14 | 2012-10-03 | 吴奎 | Lithography process with micro-nano lens for auxiliary light condensation for preparing ordered micro-nano structure |
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