CN106199781B - A kind of flexible method for making curved surface bionic compound eyes structure - Google Patents
A kind of flexible method for making curved surface bionic compound eyes structure Download PDFInfo
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- CN106199781B CN106199781B CN201610808686.6A CN201610808686A CN106199781B CN 106199781 B CN106199781 B CN 106199781B CN 201610808686 A CN201610808686 A CN 201610808686A CN 106199781 B CN106199781 B CN 106199781B
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- 239000000758 substrate Substances 0.000 claims abstract description 15
- 238000012545 processing Methods 0.000 claims abstract description 12
- 238000010992 reflux Methods 0.000 claims abstract description 8
- 238000011161 development Methods 0.000 claims abstract description 7
- 238000004528 spin coating Methods 0.000 claims abstract description 7
- 238000009738 saturating Methods 0.000 claims abstract description 6
- 238000005516 engineering process Methods 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 8
- 238000000206 photolithography Methods 0.000 claims description 7
- 230000009477 glass transition Effects 0.000 claims description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 238000013461 design Methods 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 230000008901 benefit Effects 0.000 abstract description 7
- 238000001459 lithography Methods 0.000 abstract description 4
- 238000003384 imaging method Methods 0.000 abstract description 3
- 238000001259 photo etching Methods 0.000 description 5
- 210000000158 ommatidium Anatomy 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 241000209094 Oryza Species 0.000 description 2
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
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- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The invention discloses a kind of flexible method for making curved surface bionic compound eyes structure, step are as follows：Three layers of positive photoresist of spin coating on substrate, the wherein photoresist of bottom and top layer are AZ4620 photoresists, and intermediate layer is S1813 photoresists；Maskless lithography twice is carried out, exposes three layers of photoresist, second photoresist for exposing saturating intermediate layer and top layer completely for the first time；Development obtains preliminary multilevel hierarchy；It is carried out continuously thermal reflux processing, first time ordinary hot twice to flow back to obtain the big lens arrangement of compound eye, is inverted contactless heat backflow for the second time and obtains the lenslet array array structure being distributed on the big lens of compound eye.The present invention has the advantages that technological operation is simple, the process-cycle is short, cost is low and controlled shape, can be good at the requirement for meeting big view field imaging.
Description
Technical field
The present invention relates to optical bionic field, more particularly to a kind of flexible method for making curved surface bionic compound eyes structure.
Background technology
Bionic compound eyes have the advantages that big small volume, in light weight, visual field, high sensitivity, can tested the speed, in national defense and military and the people
Had a wide range of applications with industry.For the angle of visual field is more than the curved surface bionic compound eyes of plane bionic compound eyes, make at present
Making curved surface bionic compound eyes structure main method has Ultraprecision Machining, curved surface photoetching process and two-photon femtosecond laser direct write skill
Art etc..
Wherein Ultraprecision Machining is because its equipment cost is high, operation requires high, and had necessarily for the size of processing
Limitation, be usually no more than micron order.Curved surface photoetching process generally comprises sessile drop method and gray level mask photoetching process, for sessile drop method by
In the limitation of droplet process precision, single lens size is extremely difficult to less than 1 millimeter；And for gray level mask photoetching process, although
The lens arrangement of small size can be produced in theory, but this method is complicated when curved surface gray level mask plate designs, and is fabricated to
This is higher.Wider two-photon femtosecond laser direct writing technology is applied at present, although processing dimension is unrestricted, can reach nanoscale
Precision, but its equipment cost is higher, processing efficiency is relatively low.
The content of the invention
It is an object of the invention to provide a kind of flexible method for making curved surface bionic compound eyes structure, avoid directly in song
The complexity of small eyelens is made in the substrate of face, can simply and easily be generated by using DMD mask-free photolithographies technology various
Ommatidium graphic structure, and carry out hot reflow treatment, this method tool using the difference of two kinds of photoresisted glass softening temperatures (Tg)
Have the advantages that technological operation is simple, the process-cycle is short, cost is low and controlled shape, can be good at meeting big view field imaging
It is required that.
The purpose of the present invention is achieved through the following technical solutions：
A kind of flexible method for making curved surface bionic compound eyes structure, mainly passes through DMD mask-free photolithographies technology and classification heat
Technique of backflow is completed, and is specially：
Step 1：The photoresist of two kinds of different-thickness of spin coating three layer on substrate, bottom and top layer are the first photoresists,
Intermediate layer is that glass transition temperature Tg is at least above the first more than tens degrees Celsius another photoresist；Wherein, bottom
Thickness is at least above an order of magnitude than top layer thickness, and top layer is below several microns, and bottom is more than tens microns, as slow
The very thin thickness in intermediate layer is rushed, in 1~2 micrometer range；
Step 2：Using DMD (DMD) mask-free photolithography technology in micro-optics process technology, carry out twice
Maskless lithography, expose three layers of photoresist, second photoresist for exposing saturating intermediate layer and top layer completely for the first time；
Step 3：Development obtains the microtrabeculae or positive six prismsby graphic array of bottom microtrabeculae figure and top layer and intermediate layer；
Step 4：Thermal reflux processing, first time ordinary hot twice is carried out continuously to flow back to obtain the big lens arrangement of compound eye,
Its basal diameter scope is hundreds of microns to 1.5 millimeters；Contactless heat backflow is inverted for the second time to obtain dividing on the big lens of compound eye
The lenslet array array structure of cloth, its basal diameter scope are 20 microns to 100 microns.
The photoresist of the bottom and top layer is AZ4620 photoresists, and intermediate layer is S1813 photoresists.
The substrate of the step 1 is using any one in silicon, quartz glass.
When the bottom photoresist of the step 1 can fully flow back, its thickness pass directly proportional to bottom microtrabeculae pattern diameter
System, to be greater than the big lens base radius of 1/10 times of compound eye as far as possible higher than the critical thickness under the big lens sizes of required compound eye
Size.
The double exposure mask pattern of the step 2 is virtual digit mask pattern, instead of traditional physical mask version
Figure, so as to avoid the design of mask plate and making；First time exposure mask figure is circular array, second of mask graph
For any one in circle, square, regular hexagon.
When developing in the step 3, developer solution uses alkaline-based developer；Developing time is 2-8 minutes.
The alkaline-based developer is AZ 400K (1:4), any one in TMAH.
In the step 4, the temperature of heat backflow for the first time is equal to or a little higher than glass transition temperature Tg so that heat backflow temperature
Degree is maintained between Tg to Tg+5 DEG C of scopes；The gap of contactless heat backflow photoresist and hot plate is inverted for the second time in 0.5 milli
Rice is too big or too small can all cause reflowing result to be deteriorated to 1 millimeter of scope.
In the step 4, the time of heat backflow for the first time and second heat backflow be within 5 minutes respectively and 1 minute with
Interior scope.
The technique effect of the present invention is embodied in：
By invent the curved compound eye structure produced have small volume, it is in light weight (due to being micron-sized processing, difference
Processed in the compound eye structural of macroscopic view, so volume and weight nature very little, typically seldom refers to specific scope), cost is low, knot
Structure is controllable and the features such as manufacture craft is simple.Due in the present invention, mainly using micro-optics process technology, ultraprecise can be broken through
The size limitation of the technologies such as processing, realizes small volume, advantage in light weight.Due in invention, twice without mask pattern
Exposure can design required lens easily and fast and cover using DMD (DMD) mask-free photolithography technology
Film pattern, the making of physical mask plate is avoided, realize that cost is low, advantage of structure-controllable.Due in invention, final compound eye
The formation of lens, come what is completed, realizes the simple advantage of manufacture craft mainly by hot technique of backflow twice.
Brief description of the drawings
Fig. 1 is the flow chart of preparation method of the present invention；
Fig. 2 is manufacture craft schematic diagram of the present invention；
Fig. 3 is mask-free photolithography processing unit (plant) schematic diagram of the present invention；
Fig. 4 is the big lens mask pattern of bionic compound eyes of the present invention.
Fig. 5 is bionic compound eyes lenslet mask pattern of the present invention.
In figure：1- silicon substrates, 2-AZ4620 photoresists, 3-S1813 photoresists, the small column that 4- second exposes, 5- the
The big cylinder of single exposure, 6- hot plates, the big lens of 7- compound eyes, 8- pads, the lenslet 10- high-pressure sodium lamps of 9- compound eyes, 11- liquid
Body photoconductive tube, 12- light collimation adapter, 13-DMD chips, 14- cylinder mirrors, 15- Amici prisms, 16-CCD cameras, 17- are calculated
Machine, 18- speculums, 19- projection microscope heads, 20-X, Y-axis moveable platform.
Embodiment
Step detailed description is done to the present invention below in conjunction with the accompanying drawings.
As shown in figure 1, the preparation method of curved surface bionic compound eyes structure of the present invention, is specially：
Step 1 three layers of positive photoresist of spin coating on substrate, the wherein photoresist of bottom and top layer are AZ4620 photoresists,
Intermediate layer is S1813 photoresists；
Step 2 carries out maskless lithography twice, exposes three layers of photoresist completely for the first time, second expose saturating intermediate layer and
The photoresist of top layer；
Step 3 development obtains preliminary multilevel hierarchy；
Step 4 is carried out continuously thermal reflux processing twice, and first time ordinary hot flows back to obtain big eyelens structure, and second
The secondary contactless heat backflow of inversion obtains the ommatidium array structure thereof being distributed on big eyelens.
The substrate of the step 1 is using any one in silicon, quartz glass；
When the bottom AZ4620 photoresists of the step 1 can fully flow back, its thickness is directly proportional to molded lens diameter
Relation, be as far as possible higher than the critical thickness under required lens sizes；
The first time exposure mask figure of the step 2 is circular array, and second of mask graph can be circular, positive four
Any one in side shape, regular hexagon；
The double exposure of the step 2 is completed on DMD maskless lithography platforms, can complete institute easily and fast
Need the exposure of mask pattern；
Alkaline-based developer used in the step 3 is AZ400K (1:4), any one in TMAH；
The temperature of the first time heat backflow of the step 4 to be equal to or a little higher than glass transition temperature (Tg), makes it at 5 DEG C
Within.It is too big or too small can all cause reflowing result to be deteriorated and the gap of second heat backflow photoresist and hot plate is 1 millimeter；
One embodiment is given below：
The present embodiment includes：A diameter of 500 microns of curved substrate spheric curvature, thickness is 40 microns, on curved substrate
A diameter of 20 microns of lenslet, thickness are 10 microns, and the embodiment is made in obtained curved compound eye structure such as Fig. 2 shown in (d).
The present embodiment is made by following steps：
The first step：Three layers of positive photoresist of spin coating on substrate.
Clean and dry silicon substrate (1), three layers of positive photoresist of spin coating, the wherein light of bottom and top layer are distinguished on substrate
Photoresist is AZ4620 photoresists (2), and intermediate layer is S1813 photoresists (3).And the thickness of bottom is 34 microns, top layer thickness is
6.5 microns, middle thickness is 1.5 microns, and the thick glue-line of glue is obtained using spin coating twice for the photoresist of bottom.
Second step：It is carried out continuously and is exposed twice without mask pattern, mask pattern is respectively such as the big lens array figures of Fig. 4 and figure
Shown in 5 lenslet array figures.A diameter of 500 microns of big lens array is shown in wherein Fig. 4, and Fig. 5 is a diameter of 20 micro-
The lenslet array of rice.Continuous exposure is carried out using such as Fig. 3 exposure stage, corresponding exposure wavelength is 365 nanometers, exposure
Dosage is that 1260 MJs every square centimeter and 250 MJs every square centimeter respectively.Under the exposure dose, expose completely for the first time saturating
Three layers of photoresist, second photoresist for exposing saturating intermediate layer and top layer；
3rd step：Development obtains preliminary multilevel hierarchy, is formed such as the big cylinder 5 and small cylinder 4 in Fig. 2.It is used
Developer solution is AZ400K (1:4) alkaline-based developer, a length of 5 minutes during development.
4th step：It is carried out continuously thermal reflux processing twice.By the way that in hot plate 6, common thermal reflux obtains for the first time
The big lens arrangement 7 of compound eye, contactless heat backflow is inverted for the second time and obtains the ommatidium lens arrangement 9 being distributed on the big lens of compound eye.
Because the glass transition temperature of AZ4620 and S1813 photoresists is 115 degrees Celsius and 170 degrees Celsius respectively, therefore for the first time
Parameter is arranged in common thermal reflux：115 degrees Celsius of temperature, 40 seconds time；Contactless heat backflow work is inverted for the second time
Skill parameter is arranged to：130 degrees Celsius of temperature, 20 seconds time, gap length are 1 millimeter, the i.e. thickness of pad 8.Pass through the backflow
The processing of technique, the curved surface bionic compound eyes structure that can be designed after natural cooling.
In a word, it is micro- by using numeral present invention, avoiding the complexity that small eyelens is directly made on curved substrate
Mirror device (DMD) mask-free photolithography technology can simply and easily generate various ommatidium graphic structures, and utilize two kinds of photoetching
The difference of glue glass transition temperature (Tg) carries out hot reflow treatment, have that technological operation is simple, the process-cycle is short, cost is low and
The advantages that controlled shape, it can be good at the requirement for meeting big view field imaging.
As it will be easily appreciated by one skilled in the art that the foregoing is merely illustrative of the preferred embodiments of the present invention, not to
The limitation present invention, any modifications, equivalent replacements and improvementsmade within the spirit and principles of the invention, etc., all should be included
Within protection scope of the present invention.
Claims (9)
- A kind of 1. flexible method for making curved surface bionic compound eyes structure, it is characterised in that comprise the following steps：Step 1：Two kinds of different photoresists of spin coating on substrate, bottom and top layer are the first photoresists, and intermediate layer is glass Softening temperature Tg is at least above the first more than tens degrees Celsius another photoresist；Wherein, underlayer thickness is than top layer Thickness is at least above an order of magnitude, and top layer is below several microns, and bottom is more than tens microns, the thickness as buffer intermediate layer Degree is in 1~2 micrometer range；Step 2：Using DMD (DMD) mask-free photolithography technology in micro-optics process technology, carry out twice without covering Film exposes, and exposes three layers of photoresist, second photoresist for exposing saturating intermediate layer and top layer completely for the first time；Step 3：Development obtains the microtrabeculae or positive six prismsby graphic array of bottom microtrabeculae figure and top layer and intermediate layer；Step 4：Thermal reflux processing, first time ordinary hot twice is carried out continuously to flow back to obtain the big lens arrangement of compound eye, its bottom Face diameter range is hundreds of microns to 1.5 millimeters；Contactless heat backflow is inverted for the second time obtains what is be distributed on the big lens of compound eye Lenslet array array structure, its basal diameter scope are 20 microns to 100 microns.
- 2. the flexible method for making curved surface bionic compound eyes structure according to claim 1, it is characterised in that：The bottom and The photoresist of top layer is AZ4620 photoresists, and intermediate layer is S1813 photoresists.
- 3. the flexible method for making curved surface bionic compound eyes structure according to claim 1, it is characterised in that：The step 1 Substrate using silicon, any one in quartz glass.
- 4. the flexible method for making curved surface bionic compound eyes structure according to claim 1, it is characterised in that：The step 1 Bottom photoresist when can fully flow back, its thickness and bottom microtrabeculae pattern diameter are proportional, are higher than required compound eye Critical thickness under big lens sizes, that is, be greater than the big lens base radius size of 1/10 times of compound eye.
- 5. the flexible method for making curved surface bionic compound eyes structure according to claim 1, it is characterised in that：The step 2 Double exposure mask pattern be virtual digit mask pattern, instead of traditional physical mask domain shape, covered so as to avoid The design and making of diaphragm plate；First time exposure mask figure is circular array, second of mask graph be circle, square, Any one in regular hexagon.
- 6. the flexible method for making curved surface bionic compound eyes structure according to claim 1, it is characterised in that：The step 3 During middle development, developer solution uses alkaline-based developer；Developing time is 2-8 minutes.
- 7. the flexible method for making curved surface bionic compound eyes structure according to claim 6, it is characterised in that：The alkalescence is aobvious Shadow liquid is AZ 400K (1:4), any one in TMAH.
- 8. the flexible method for making curved surface bionic compound eyes structure according to claim 1, it is characterised in that：The step 4 In, the temperature of heat backflow for the first time is equal to or a little higher than glass transition temperature Tg so that hot reflux temperature maintains Tg to Tg+5 Between DEG C scope；The gap of contactless heat backflow photoresist and hot plate is inverted for the second time in 0.5 millimeter to 1 millimeter scope, too It is big or too small can all cause reflowing result to be deteriorated.
- 9. the flexible method for making curved surface bionic compound eyes structure according to claim 1, it is characterised in that：The step 4 In, time of heat backflow for the first time and second heat backflow is scope within 5 minutes and within 1 minute respectively.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110568530A (en) * | 2019-09-11 | 2019-12-13 | 北京理工大学 | Curved surface bionic compound eye processing method based on die forming |
| CN111060997B (en) * | 2020-01-19 | 2021-05-07 | 西安交通大学 | Method for manufacturing multistage fly-eye lens |
| CN113126453A (en) * | 2021-04-23 | 2021-07-16 | 东北师范大学 | Femtosecond laser direct writing and DMD maskless photoetching composite processing method |
| CN113341663B (en) * | 2021-06-28 | 2022-07-08 | 中国科学院物理研究所 | Controllable processing method of spherical microstructure with any curvature |
| CN114895389A (en) * | 2022-04-25 | 2022-08-12 | 安徽工程大学 | Method for flexibly manufacturing multi-focus micro-lens array structure |
| CN115327680B (en) * | 2022-08-08 | 2023-09-01 | 苏州华太电子技术股份有限公司 | Lens preparation method |
| CN117872517B (en) * | 2024-03-11 | 2024-06-14 | 广东工业大学 | Curved fly-eye lens and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102901997B (en) * | 2012-09-14 | 2014-12-31 | 华中科技大学 | Preparation method of curved compound eye |
| CN103345008B (en) * | 2013-06-28 | 2015-04-29 | 广州中国科学院先进技术研究所 | Flexible curved surface micro lens array and manufacturing method and application thereof |
| CN105700047A (en) * | 2014-11-28 | 2016-06-22 | 方端 | Artificial compound eye structure and manufacturing method thereof |
| JP2016114873A (en) * | 2014-12-17 | 2016-06-23 | コニカミノルタ株式会社 | Compound eye optical system unit, compound eye image capturing device, and compound eye image capturing system |
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