CN106199781A - A kind of flexible method making curved surface bionic compound eyes structure - Google Patents
A kind of flexible method making curved surface bionic compound eyes structure Download PDFInfo
- Publication number
- CN106199781A CN106199781A CN201610808686.6A CN201610808686A CN106199781A CN 106199781 A CN106199781 A CN 106199781A CN 201610808686 A CN201610808686 A CN 201610808686A CN 106199781 A CN106199781 A CN 106199781A
- Authority
- CN
- China
- Prior art keywords
- photoresist
- time
- curved surface
- method making
- flexible method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The invention discloses a kind of flexible method making curved surface bionic compound eyes structure, step is as follows: three layers of positive photoresist of spin coating on substrate, and wherein the photoresist of bottom and top layer is AZ4620 photoresist, and intermediate layer is S1813 photoresist；Carrying out twice maskless lithography, expose three layer photoetching glue for the first time completely, second time only exposes the photoresist of intermediate layer and top layer；Development obtains preliminary multilevel hierarchy；Being carried out continuously twice thermal reflux to process, ordinary hot backflow for the first time obtains the big lens arrangement of compound eye, and second time is inverted contactless hot reflux and is obtained the lenslet array array structure of distribution on the big lens of compound eye.The advantages such as the present invention has that technological operation is simple, the process-cycle is short, low cost and controlled shape, it is possible to well meet the requirement of big view field imaging.
Description
Technical field
The present invention relates to optical bionic field, particularly to a kind of flexible method making curved surface bionic compound eyes structure.
Background technology
Bionic compound eyes has that volume is little, lightweight, visual field is big, highly sensitive, the advantage such as can test the speed, national defense and military and the people
Have a wide range of applications with in industry.For the angle of visual field curved surface bionic compound eyes more than plane bionic compound eyes, make at present
Make curved surface bionic compound eyes structure main method and have Ultraprecision Machining, curved surface photoetching process and two-photon femtosecond laser direct write skill
Art etc..
Wherein Ultraprecision Machining is owing to its equipment cost is high, operation requires height, and the size for processing has necessarily
Restriction, be usually no more than micron order.Curved surface photoetching process generally comprises sessile drop method and gray level mask photoetching process, for sessile drop method by
In the restriction of droplet process precision, single lens size is extremely difficult to less than 1 millimeter；And for gray level mask photoetching process, although
Undersized lens arrangement can be produced in theory, but the method is complicated when curved surface gray level mask plate designs, and is fabricated to
This is higher.Apply wider two-photon femtosecond laser direct writing technology at present, although processing dimension is unrestricted, can reach nanoscale
Precision, but its equipment cost is higher, and working (machining) efficiency is relatively low.
Summary of the invention
It is an object of the invention to provide a kind of flexible method making curved surface bionic compound eyes structure, it is to avoid directly at song
The complexity of little eyelens is made in the substrate of face, various by utilizing DMD mask-free photolithography technology to generate simply and easily
Ommatidium graphic structure, and utilize the difference of two kinds of photoresisted glass softening temperatures (Tg) to carry out hot reflux process, the method has
Have that technological operation is simple, the process-cycle is short, the advantage such as low cost and controlled shape, it is possible to well meet big view field imaging
Requirement.
It is an object of the invention to be achieved through the following technical solutions:
A kind of flexible method making curved surface bionic compound eyes structure, main hot by DMD mask-free photolithography technology and classification
Technique of backflow completes, particularly as follows:
Step 1: the photoresist of three layers of two kinds of different-thickness of spin coating on substrate, bottom and top layer are the first photoresists,
Intermediate layer is that glass transition temperature Tg is at least above the first another photoresist of more than tens degrees Celsius；Wherein, bottom
Thickness is at least above an order of magnitude than top layer thickness, and top layer is below several microns, and bottom is more than tens microns, as slow
Rush the very thin thickness in intermediate layer, at 1～2 micrometer ranges；
Step 2: use DMD (DMD) the mask-free photolithography technology in micro-optic process technology, carry out twice
Maskless lithography, exposes three layer photoetching glue for the first time completely, and second time only exposes the photoresist of intermediate layer and top layer；
Step 3: development obtains bottom microtrabeculae figure and top layer and the microtrabeculae in intermediate layer or positive six prism graphic arrays；
Step 4: being carried out continuously twice thermal reflux and process, ordinary hot backflow for the first time obtains the big lens arrangement of compound eye,
Its basal diameter scope is hundreds of micron to 1.5 millimeters；Second time is inverted contactless hot reflux and is obtained dividing on the big lens of compound eye
The lenslet array array structure of cloth, its basal diameter scope is 20 microns to 100 microns.
The photoresist of described bottom and top layer is AZ4620 photoresist, and intermediate layer is S1813 photoresist.
The substrate of described step 1 uses any one in silicon, quartz glass.
When the bottom photoresist of described step 1 can fully reflux, its thickness is directly proportional to bottom microtrabeculae pattern diameter pass
System, will i.e. be greater than 1/10 times of compound eye big lens base radius as far as possible higher than the critical thickness under the big lens sizes of required compound eye
Size.
The double exposure mask pattern of described step 2 is virtual digit mask pattern, instead of traditional physical mask version
Figure, thus avoid design and the making of mask plate；Exposure mask figure is circular array, for the second time mask graph for the first time
For any one in circle, square, regular hexagon.
In described step 3 during development, developer solution uses alkaline-based developer；Developing time is 2-8 minute.
Described alkaline-based developer is any one in AZ 400K (1:4), TMAH.
In described step 4, the temperature of hot reflux for the first time is equal to or a little higher than glass transition temperature Tg so that hot reflux temperature
Degree maintains between Tg to Tg+5 DEG C of scope；Second time is inverted the contactless hot reflux photoresist gap with hot plate at 0.5 milli
Rice is to 1 millimeter of scope, the biggest or the least reflowing result all can be caused to be deteriorated.
In described step 4, hot reflux for the first time and second time hot reflux time be respectively within 5 minutes and 1 minute with
Interior scope.
The technique effect of the present invention is embodied in:
The curved compound eye structure produced by invention have volume little, lightweight (owing to being micron-sized processing, difference
In macroscopic view compound eye structural processing, so volume and weight is the least, seldom mention concrete scope), low cost, knot
The features such as structure is controlled and processing technology is simple.Owing to, in the present invention, mainly using micro-optic process technology, ultraprecise can be broken through
The technology such as processing size limitation, it is achieved that volume advantage little, lightweight.Owing to, in invention, twice without mask pattern
Exposure uses DMD (DMD) mask-free photolithography technology, can design required lens easily and fast and cover
Film pattern, it is to avoid the making of physical mask plate, it is achieved that low cost, the advantage of structure-controllable.In inventing, final compound eye
Being formed of lens is mainly completed by twice hot reflux technology, it is achieved that the simple advantage of processing technology.
Accompanying drawing explanation
Fig. 1 is the flow chart of manufacture method of the present invention；
Fig. 2 is processing technology schematic diagram of the present invention；
Fig. 3 is mask-free photolithography processing unit (plant) schematic diagram of the present invention；
Fig. 4 is bionic compound eyes of the present invention big lens mask pattern.
Fig. 5 is bionic compound eyes lenslet mask pattern of the present invention.
In figure: 1-silicon substrate, 2-AZ4620 photoresist, 3-S1813 photoresist, the small column of 4-second time exposure, 5-the
The big cylinder of single exposure, 6-hot plate, the big lens of 7-compound eye, 8-pad, the lenslet 10-high voltage mercury lamp of 9-compound eye, 11-liquid
Body light guide, 12-light collimation adapter, 13-DMD chip, 14-cylinder mirror, 15-Amici prism, 16-CCD camera, 17-calculates
Machine, 18-reflecting mirror, 19-projection microscope head, 20-X, Y-axis moveable platform.
Detailed description of the invention
The present invention does a step below in conjunction with the accompanying drawings describe in detail.
As it is shown in figure 1, the manufacture method of curved surface bionic compound eyes structure of the present invention, particularly as follows:
Step 1 is three layers of positive photoresist of spin coating on substrate, and wherein the photoresist of bottom and top layer is AZ4620 photoresist,
Intermediate layer is S1813 photoresist；
Step 2 carries out twice maskless lithography, exposes three layer photoetching glue for the first time completely, second time only expose intermediate layer and
The photoresist of top layer；
Step 3 development obtains preliminary multilevel hierarchy；
Step 4 is carried out continuously twice thermal reflux and processes, and ordinary hot refluxes and obtains big eyelens structure for the first time, and second
The contactless hot reflux of secondary inversion obtains the ommatidium array structure thereof of distribution on big eyelens.
The substrate of described step 1 uses any one in silicon, quartz glass；
When the bottom AZ4620 photoresist of described step 1 can fully reflux, its thickness is directly proportional to molded lens diameter
Relation, be as far as possible higher than the critical thickness under required lens sizes；
The first time exposure mask figure of described step 2 is circular array, and mask graph can be circular, positive four for the second time
Any one in limit shape, regular hexagon；
The double exposure of described step 2 completes on DMD maskless lithography platform, can complete institute easily and fast
Need the exposure of mask pattern；
Alkaline-based developer used by described step 3 is any one in AZ400K (1:4), TMAH；
The temperature of the first time hot reflux of described step 4 to be equal to or a little higher than glass transition temperature (Tg) so that it is at 5 DEG C
Within.And the gap of second time hot reflux photoresist and hot plate is 1 millimeter, the biggest or the least reflowing result all can be caused to be deteriorated；
An embodiment be given below:
The present embodiment includes: a diameter of 500 microns of curved substrate spheric curvature, thickness is 40 microns, on curved substrate
A diameter of 20 microns of lenslet, thickness is 10 microns, in the curved compound eye structure such as Fig. 2 that the making of this embodiment obtains shown in (d).
The present embodiment is made by following steps:
The first step: three layers of positive photoresist of spin coating on substrate.
Clean and dring silicon substrate (1), difference three layers of positive photoresist of spin coating, wherein bottom and the light of top layer on substrate
Photoresist is AZ4620 photoresist (2), and intermediate layer is S1813 photoresist (3).And the thickness of bottom is 34 microns, top layer thickness is
6.5 microns, middle thickness is 1.5 microns, and the photoresist for bottom uses twice spin coating to obtain the glue-line that glue is thick.
Second step: be carried out continuously twice and expose without mask pattern, mask pattern lens arra figure as big in Fig. 4 and figure respectively
Shown in 5 lenslet array figures.Wherein Fig. 4 is shown that the big lens arra of a diameter of 500 microns, and Fig. 5 is a diameter of 20 micro-
The lenslet array of rice.Utilizing the exposure stage of Fig. 3 such as to carry out continuous exposure, corresponding exposure wavelength is 365 nanometers, exposure
Dosage is 1260 MJs every square centimeter and 250 MJs every square centimeter respectively.Under this exposure dose, expose the most completely thoroughly
Three layer photoetching glue, second time only exposes the photoresist of intermediate layer and top layer；
3rd step: development obtains preliminary multilevel hierarchy, is formed such as the big cylinder 5 in Fig. 2 and small cylinder 4.Used
Developer solution is AZ400K (1:4) alkaline-based developer, during development a length of 5 minutes.
4th step: be carried out continuously twice thermal reflux and process.By obtaining at hot plate 6 ordinary hot reflux technique for the first time
The big lens arrangement of compound eye 7, second time is inverted contactless hot reflux and is obtained the ommatidium lens arrangement 9 of distribution on the big lens of compound eye.
Owing to the glass transition temperature of AZ4620 and S1813 photoresist is 115 degrees Celsius and 170 degrees Celsius respectively, therefore for the first time
In ordinary hot reflux technique, parameter is set to: temperature 115 degrees Celsius, 40 seconds time；Second time is inverted contactless hot reflux work
Skill parameter is set to: temperature 130 degrees Celsius, 20 seconds time, and gap length is 1 millimeter, i.e. the thickness of pad 8.By this backflow
The process of technique, can obtain the curved surface bionic compound eyes structure of design after natural cooling.
In a word, present invention, avoiding the complexity directly making little eyelens on curved substrate, by utilizing numeral micro-
Mirror device (DMD) mask-free photolithography technology can generate various ommatidium graphic structure simply and easily, and utilizes two kinds of photoetching
The difference of glue glass transition temperature (Tg) carries out hot reflux process, have that technological operation is simple, the process-cycle is short, low cost and
The advantages such as controlled shape, it is possible to well meet the requirement of big view field imaging.
As it will be easily appreciated by one skilled in the art that and the foregoing is only presently preferred embodiments of the present invention, not in order to
Limit the present invention, all any amendment, equivalent and improvement etc. made within the spirit and principles in the present invention, all should comprise
Within protection scope of the present invention.
Claims (9)
1. the flexible method making curved surface bionic compound eyes structure, it is characterised in that comprise the following steps:
Step 1: the photoresist of three layers of two kinds of different-thickness of spin coating on substrate, bottom and top layer are the first photoresists, middle
Layer is that glass transition temperature Tg is at least above the first another photoresist of more than tens degrees Celsius；Wherein, underlayer thickness
Being at least above an order of magnitude than top layer thickness, top layer is below several microns, and bottom is more than tens microns, as in buffering
The very thin thickness of interbed, at 1～2 micrometer ranges；
Step 2: use DMD (DMD) the mask-free photolithography technology in micro-optic process technology, carries out twice without covering
Film exposes, and exposes three layer photoetching glue for the first time completely, and second time only exposes the photoresist of intermediate layer and top layer；
Step 3: development obtains bottom microtrabeculae figure and top layer and the microtrabeculae in intermediate layer or positive six prism graphic arrays；
Step 4: being carried out continuously twice thermal reflux and process, ordinary hot backflow for the first time obtains the big lens arrangement of compound eye, its end
Face diameter range is hundreds of micron to 1.5 millimeters；Second time is inverted contactless hot reflux and is obtained distribution on the big lens of compound eye
Lenslet array array structure, its basal diameter scope is 20 microns to 100 microns.
The flexible method making curved surface bionic compound eyes structure the most according to claim 1, it is characterised in that: described bottom and
The photoresist of top layer is AZ4620 photoresist, and intermediate layer is S1813 photoresist.
The flexible method making curved surface bionic compound eyes structure the most according to claim 1, it is characterised in that: described step 1
Substrate use in silicon, quartz glass any one.
The flexible method making curved surface bionic compound eyes structure the most according to claim 1, it is characterised in that: described step 1
Bottom photoresist when can fully reflux, its thickness is proportional with bottom microtrabeculae pattern diameter, be as far as possible higher than required
Critical thickness under the big lens sizes of compound eye, is i.e. greater than 1/10 times of compound eye big lens base radius size.
The flexible method making curved surface bionic compound eyes structure the most according to claim 1, it is characterised in that: described step 2
Double exposure mask pattern be virtual digit mask pattern, instead of traditional physical mask domain shape, thus avoid and cover
The design of lamina membranacea and making；Exposure mask figure is circular array for the first time, for the second time mask graph be circle, square,
Any one in regular hexagon.
The flexible method making curved surface bionic compound eyes structure the most according to claim 1, it is characterised in that: described step 3
During middle development, developer solution uses alkaline-based developer；Developing time is 2-8 minute.
The flexible method making curved surface bionic compound eyes structure the most according to claim 6, it is characterised in that: described alkalescence shows
Shadow liquid is any one in AZ 400K (1:4), TMAH.
The flexible method making curved surface bionic compound eyes structure the most according to claim 1, it is characterised in that: described step 4
In, the temperature of hot reflux for the first time is equal to or a little higher than glass transition temperature Tg so that hot reflux temperature maintains Tg to Tg+5
Between DEG C scope；Second time is inverted the gap of contactless hot reflux photoresist and hot plate 0.5 millimeter to 1 millimeter scope, too
Big or the least reflowing result all can be caused to be deteriorated.
The flexible method making curved surface bionic compound eyes structure the most according to claim 1, it is characterised in that: described step 4
In, the time of hot reflux for the first time and second time hot reflux is scope within 5 minutes and within 1 minute respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610808686.6A CN106199781B (en) | 2016-09-07 | 2016-09-07 | A kind of flexible method for making curved surface bionic compound eyes structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610808686.6A CN106199781B (en) | 2016-09-07 | 2016-09-07 | A kind of flexible method for making curved surface bionic compound eyes structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106199781A true CN106199781A (en) | 2016-12-07 |
| CN106199781B CN106199781B (en) | 2018-04-10 |
Family
ID=58066878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610808686.6A Active CN106199781B (en) | 2016-09-07 | 2016-09-07 | A kind of flexible method for making curved surface bionic compound eyes structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106199781B (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110568530A (en) * | 2019-09-11 | 2019-12-13 | 北京理工大学 | Curved surface bionic compound eye processing method based on die forming |
| CN111060997A (en) * | 2020-01-19 | 2020-04-24 | 西安交通大学 | Method for manufacturing multistage fly-eye lens |
| CN113126453A (en) * | 2021-04-23 | 2021-07-16 | 东北师范大学 | Femtosecond laser direct writing and DMD maskless photoetching composite processing method |
| CN113341663A (en) * | 2021-06-28 | 2021-09-03 | 中国科学院物理研究所 | Controllable processing method of spherical microstructure with any curvature |
| CN114895389A (en) * | 2022-04-25 | 2022-08-12 | 安徽工程大学 | Method for flexibly manufacturing multi-focus micro-lens array structure |
| CN115327680A (en) * | 2022-08-08 | 2022-11-11 | 苏州华太电子技术股份有限公司 | Lens preparation method |
| CN117872517A (en) * | 2024-03-11 | 2024-04-12 | 广东工业大学 | Curved fly-eye lens and preparation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102901997A (en) * | 2012-09-14 | 2013-01-30 | 华中科技大学 | Preparation method of curved compound eye |
| CN103345008A (en) * | 2013-06-28 | 2013-10-09 | 广州中国科学院先进技术研究所 | Flexible curved surface micro lens array and manufacturing method and application thereof |
| CN105700047A (en) * | 2014-11-28 | 2016-06-22 | 方端 | Artificial compound eye structure and manufacturing method thereof |
| JP2016114873A (en) * | 2014-12-17 | 2016-06-23 | コニカミノルタ株式会社 | Compound eye optical system unit, compound eye image capturing device, and compound eye image capturing system |
-
2016
- 2016-09-07 CN CN201610808686.6A patent/CN106199781B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102901997A (en) * | 2012-09-14 | 2013-01-30 | 华中科技大学 | Preparation method of curved compound eye |
| CN103345008A (en) * | 2013-06-28 | 2013-10-09 | 广州中国科学院先进技术研究所 | Flexible curved surface micro lens array and manufacturing method and application thereof |
| CN105700047A (en) * | 2014-11-28 | 2016-06-22 | 方端 | Artificial compound eye structure and manufacturing method thereof |
| JP2016114873A (en) * | 2014-12-17 | 2016-06-23 | コニカミノルタ株式会社 | Compound eye optical system unit, compound eye image capturing device, and compound eye image capturing system |
Non-Patent Citations (2)
| Title |
|---|
| JACQUES DUPARRÉ等: "Artificial apposition compound eye fabricated by micro-optics technology", 《APPLIED OPTICS》 * |
| 史立芳等: "制备人工复眼结构的方法", 《红外与激光工程》 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110568530A (en) * | 2019-09-11 | 2019-12-13 | 北京理工大学 | Curved surface bionic compound eye processing method based on die forming |
| CN111060997A (en) * | 2020-01-19 | 2020-04-24 | 西安交通大学 | Method for manufacturing multistage fly-eye lens |
| WO2021143148A1 (en) * | 2020-01-19 | 2021-07-22 | 西安交通大学 | Method for manufacturing multi-stage compound eye lens |
| CN113126453A (en) * | 2021-04-23 | 2021-07-16 | 东北师范大学 | Femtosecond laser direct writing and DMD maskless photoetching composite processing method |
| CN113341663A (en) * | 2021-06-28 | 2021-09-03 | 中国科学院物理研究所 | Controllable processing method of spherical microstructure with any curvature |
| CN113341663B (en) * | 2021-06-28 | 2022-07-08 | 中国科学院物理研究所 | Controllable processing method of spherical microstructure with any curvature |
| CN114895389A (en) * | 2022-04-25 | 2022-08-12 | 安徽工程大学 | Method for flexibly manufacturing multi-focus micro-lens array structure |
| CN115327680A (en) * | 2022-08-08 | 2022-11-11 | 苏州华太电子技术股份有限公司 | Lens preparation method |
| CN115327680B (en) * | 2022-08-08 | 2023-09-01 | 苏州华太电子技术股份有限公司 | Lens preparation method |
| CN117872517A (en) * | 2024-03-11 | 2024-04-12 | 广东工业大学 | Curved fly-eye lens and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106199781B (en) | 2018-04-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106199781A (en) | A kind of flexible method making curved surface bionic compound eyes structure | |
| US20220276419A1 (en) | Manufacturing Method for Diffraction Grating Waveguide of Near-eye Display | |
| TW200426495A (en) | Exposing mask, production method therefor and exposing method | |
| TWI613534B (en) | Double layer microlens array optical element | |
| CN206920634U (en) | Device and wear-type for manufacturing air gap area in multi-part lens combination show Optical devices | |
| US20210325574A1 (en) | Light diffuser plate, image display device, and lighting device | |
| WO2023042798A1 (en) | Diffuser plate, display device, projection device, and illumination device | |
| CN116520464A (en) | Method for preparing fly-eye lens | |
| US8138749B1 (en) | Optical imaging and patterning based on a magnetically controlled ferrofluid | |
| TWI716076B (en) | An optical collimation system | |
| Voelkel | Micro-optics: enabling technology for illumination shaping in optical lithography | |
| Zhong et al. | Maskless lithography based on DMD | |
| CN208521131U (en) | A kind of light source direct imaging focused photoetching device | |
| KR102337213B1 (en) | Construction of Optical Layers with Imprint Lithography Process | |
| JP4506264B2 (en) | Photoresist lens manufacturing method, lens manufacturing method, mold manufacturing method, optical apparatus, and projection exposure apparatus | |
| CN113573877B (en) | Wafer alignment feature | |
| JP2013246340A (en) | Photomask and method of manufacturing the same, and pattern exposure method | |
| Yang et al. | Fabrication of a high-fill-factor microlens array using different thermal reflow process | |
| US10007032B2 (en) | Exposure device | |
| CN113557126B (en) | Method for manufacturing a plurality of optical elements and products thereof | |
| Gong et al. | Fabricating microlens arrays using moving mask projection lithography | |
| JP2011107601A (en) | Light projection exposure apparatus by stereoscopic projection, and light projection exposure method | |
| KR102025762B1 (en) | Apparatus for manufactuirng curved semiconductor and image sensor using curved semiconductor | |
| Ouyang et al. | Study on high fidelity method of multi-focus microlens array based on digital microlens device | |
| TW200907585A (en) | Projection optical system, exposure apparatus, and semiconductor device fabrication method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |