CN102896824A - 镀膜件及其制备方法 - Google Patents

镀膜件及其制备方法 Download PDF

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CN102896824A
CN102896824A CN2011102117374A CN201110211737A CN102896824A CN 102896824 A CN102896824 A CN 102896824A CN 2011102117374 A CN2011102117374 A CN 2011102117374A CN 201110211737 A CN201110211737 A CN 201110211737A CN 102896824 A CN102896824 A CN 102896824A
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layer
film
molybdenum
titanium
coated part
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陈文荣
蒋焕梧
陈正士
李聪
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Priority to TW100126887A priority patent/TW201305360A/zh
Priority to US13/247,038 priority patent/US8722180B2/en
Publication of CN102896824A publication Critical patent/CN102896824A/zh
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
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    • C22C27/04—Alloys based on tungsten or molybdenum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
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    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C—CHEMISTRY; METALLURGY
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

一种镀膜件，其包括基材、形成于基材表面的若干钼层和若干钛铝氮层，该若干钼层和若干钛铝氮层交替排布，其中与所述基材直接相结合的是钼层，最外层为钛铝氮层。所镀多层涂层具有高硬度，良好的耐腐蚀性及耐高温性能，从而有效提高镀膜件的使用寿命。此外，本发明还提供一种所述镀膜件的制备方法。

Description

镀膜件及其制备方法
技术领域
本发明涉及一种镀膜件及其制备方法。
背景技术
过渡金属氮化物、碳化物和碳氮化物具有高硬度、高抗磨损性能和良好的化学稳定性等优异性能。因此，通常将过渡金属氮化物、碳化物和碳氮化物以薄膜的形式镀覆在刀具或模具表面，以此来提高刀具和模具的使用寿命。
然而，对于工作条件苛刻的刀具或模具，不仅要求镀覆在刀具或模具表面的膜层具有高抗磨损性能，还要求膜层具有较佳的耐腐蚀性及耐高温性能。因此，在刀具或者模具表面仅镀覆过渡金属氮化物、碳化物和碳氮化物层，无法满足要求。
发明内容
有鉴于此，有必要提供一种有效解决上述问题的镀膜件。
另外，还有必要提供一种上述镀膜件的制备方法。
一种镀膜件，其包括基材、形成于基材表面的若干钼层和若干钛铝氮层，该若干钼层和若干钛铝氮层交替排布，其中与所述基材直接相结合的是钼层，最外层为钛铝氮层。
一种镀膜件的制备方法，其包括如下步骤：
提供基材；
在该基材的表面形成钼层；
在该钼层的表面形成钛铝氮层；
交替重复上述形成钼层和钛铝氮层的步骤，且使镀膜件的最外层为钛铝氮层。
本发明镀膜件在基材表面交替溅镀钼层和钛铝氮层形成钼/钛铝氮纳米多层膜，该纳米多层膜中的组份呈周期性变化，产生较强的界面效应、层间耦合效应，因此具有与单层涂层不同的特性；膜层界面的增多抑制了钼/钛铝氮纳米多层膜之间位错的产生，从而使镀膜件获得了高强硬度；同时，钼/钛铝氮纳米多层膜结构能够使膜层的晶粒细化，膜层更加致密，从而提高钼/钛铝氮纳米多层膜的耐腐蚀性；此外，由于钼层具有良好的耐高温性能，使所述镀膜件具有良好的耐高温性能，从而有效提高镀膜件的使用寿命。
附图说明
图1为本发明一较佳实施例的镀膜件的剖视图；
图2为本发明一较佳实施例真空镀膜机的俯视示意图。
主要元件符号说明
镀膜件 10
基材 11
钼层 13
钛铝氮层 15
真空镀膜机 20
镀膜室 21
钼靶 23
钛铝合金靶 24
轨迹 25
真空泵 30
如下具体实施方式将结合上述附图进一步说明本发明。
具体实施方式
请参阅图1，本发明一较佳实施方式的镀膜件10包括基材11、形成于基材11表面的若干钼层13和若干钛铝氮层15，该若干钼层13和若干钛铝氮层15交替排布，其中与所述基材11直接相结合的是钼层13，最外层为钛铝氮层15。所述若干钼层13加上若干钛铝氮层15的总厚度可为1.2～2.4μm。本实施例中，所述若干钼层13和若干钛铝氮层15的层数可分别为40～60层。
该基材11的材质可为金属、玻璃或陶瓷。
该钼层13可以磁控溅射的方式形成，所述每一钼层13的厚度为15～20nm。
该钛铝氮层15可以磁控溅射的方式形成，所述每一钛铝氮层15的厚度为15～20nm。该钛铝氮层15中钛的原子百分含量为75～82%，铝的原子百分含量为15～17%，氮的原子百分含量为1～10%。
本明一较佳实施方式的镀膜件10的制备方法，其包括如下步骤：
请参阅图2，提供一真空镀膜机20，该真空镀膜机20包括一镀膜室21及连接于镀膜室21的一真空泵30，真空泵30用以对镀膜室21抽真空。该镀膜室21内设有转架(未图示)、相对设置的二钼靶23和相对设置的二钛铝合金靶24。转架带动基材11沿圆形的轨迹25公转，且基材11在沿轨迹25公转时亦自转。该钛铝合金靶24中钛的原子百分含量为75～82%，剩余的为铝。
提供基材11，该基材11的材质可为金属、玻璃或陶瓷。
对该基材11进行表面预处理。该表面预处理可包括常规的对基材11进行无水乙醇超声波清洗及烘干等步骤。
采用磁控溅射法在经清洗后的基材11的表面溅镀钼层13。溅镀该钼层13在所述真空镀膜机20中进行。将基材11放入镀膜室21内，将该镀膜室21抽真空至8×10-3Pa，并加热所述镀膜室21至温度为60～200℃。溅镀时，开启钼靶23的电源，设置钼靶23的电源功率为10～15kw，通入工作气体氩气，氩气流量为400～800sccm，对基材11施加-150～-500V的偏压。溅镀钼层13的时间为0.5～1min。
保持氩气流量、基材11的偏压、镀膜室21的温度等参数不变，继续采用磁控溅射法在所述钼层13的表面溅镀钛铝氮层15。关闭钼靶23的电源，开启钛铝合金靶24，设置钛铝合金靶24的电源功率为8～12kw；并通入反应气体氮气，氮气流量为100～200sccm。溅镀钛铝氮层15的时间为0.5～1min。
重复上述步骤，以交替溅镀钼层13和钛铝氮层15。
下面通过实施例来对本发明进行具体说明。
实施例1
本实施例所使用的真空镀膜机20为中频磁控溅射镀膜机。
本实施例所使用的基材11的材质为模具钢。
溅镀钼层13：钼靶23的功率为10kw，氩气流量为400sccm，基材11的偏压为-200V，镀膜室21的温度温度为82℃，镀膜时间为0.5min；该钼层13的厚度为15nm；
溅镀钛铝氮层15：钛铝合金靶24的功率为10kw，氩气流量、偏压、镀膜室21的温度等工艺参数与溅镀钼层13的相同，镀膜时间为0.5min；该钛铝氮层15的厚度为15nm。
重复上述交替溅镀钼层13和钛铝氮层15的步骤，交替溅镀钼层13和钛铝氮层15的次数总共为55次。
实施例2
本实施例所使用的真空镀膜机20为中频磁控溅射镀膜机。
本实施例所使用的基材11的材质为模具钢。
溅镀钼层13：钼靶23的功率为10kw，氩气流量为500sccm，基材11的偏压为-200V，镀膜室21的温度温度为82℃，镀膜时间为1min；该钼层13的厚度为20nm；
溅镀钛铝氮层15：钛铝合金靶24的功率为10kw，氩气流量、偏压、镀膜室21的温度等工艺参数与溅镀钼层13的相同，镀膜时间为1min；该钛铝氮层15的厚度为20nm。
重复上述交替溅镀钼层13和钛铝氮层15的步骤，交替溅镀钼层13和钛铝氮层15的次数总共为55次。
本发明镀膜件10在基材11表面交替溅镀钼层13和钛铝氮层15形成钼/钛铝氮纳米多层膜，该纳米多层膜中的组份呈周期性变化，产生较强的界面效应、层间耦合效应，因此具有与单层涂层不同的特性；膜层界面的增多抑制了钼/钛铝氮纳米多层膜之间位错的产生，从而使镀膜件10获得了高强硬度；同时，钼/钛铝氮纳米多层膜结构能够使膜层的晶粒细化，膜层更加致密，从而提高钼/钛铝氮纳米多层膜的耐腐蚀性；此外，由于钼层13具有良好的耐高温性能，使所述镀膜件10具有良好的耐高温性能，从而有效提高镀膜件10的使用寿命。

Claims (10)

1.一种镀膜件，其包括基材，其特征在于：该镀膜件还包括形成于基材表面的若干钼层和若干钛铝氮层，该若干钼层和若干钛铝氮层交替排布，其中与所述基材直接相结合的是钼层，最外层为钛铝氮层。
2.如权利要求1所述的镀膜件，其特征在于：所述若干钼层和若干钛铝氮层的总厚度为1.2～2.4μm。
3.如权利要求1所述的镀膜件，其特征在于：所述若干钼层和若干钛铝氮层的层数分别为40～60层。
4.如权利要求1所述的镀膜件，其特征在于：该基材的材质为金属、玻璃或陶瓷。
5.如权利要求1所述的镀膜件，其特征在于：所述每一钼层的厚度为15～20nm。
6.如权利要求1所述的镀膜件，其特征在于：所述每一钛铝氮层的厚度为15～20nm。
7.如权利要求1所述的镀膜件，其特征在于：所述每一钛铝氮层中钛的原子百分含量为75～82%，铝的原子百分含量为15～17%，氮的原子百分含量为1～10%。
8.一种镀膜件的制备方法，其包括如下步骤：
提供基材；
在该基材的表面形成钼层；
在该钼层的表面形成钛铝氮层；
交替重复上述形成钼层和钛铝氮层的步骤，且使镀膜件的最外层为钛铝氮层。
9.如权利要求8所述的镀膜件的制备方法，其特征在于：形成所述钼层的方法为：采用磁控溅射法，使用钼靶，设置钼靶的电源功率为10～15kw，以氩气为工作气体，氩气流量为400～800sccm，对基材施加偏压为-150～-500V，镀膜温度为60～200℃，镀膜时间为0.5～1min。
10.如权利要求8所述的镀膜件的制备方法，其特征在于：形成所述钛铝氮层的方法为：采用磁控溅射法，使用钛铝合金靶，该钛铝合金靶中钛的原子百分含量为75～82%，剩余的为铝，设置所述钛铝合金靶的电源功率为8～12kw，以氮气为工作气体，氮气流量为100～200sccm，以氩气为工作气体，氩气流量为400～800sccm，对基材施加偏压为-150～-500V，镀膜温度为60～200℃，镀膜时间为0.5～1min。
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