CN102886609A - Multi-focus femtosecond laser scribing method applied to separation of light emitting diode (LED) device - Google Patents

Multi-focus femtosecond laser scribing method applied to separation of light emitting diode (LED) device Download PDF

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CN102886609A
CN102886609A CN2012103090674A CN201210309067A CN102886609A CN 102886609 A CN102886609 A CN 102886609A CN 2012103090674 A CN2012103090674 A CN 2012103090674A CN 201210309067 A CN201210309067 A CN 201210309067A CN 102886609 A CN102886609 A CN 102886609A
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femtosecond laser
separation
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谢海忠
张逸韵
杨华
李璟
伊晓燕
王军喜
王国宏
李晋闽
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Abstract

一种应用于LED器件分离的多焦点飞秒激光划片方法,包括:步骤1:将制备好的LED器件固定在水平移动平台上,并位于CCD成像设备的成像中心;步骤2:在飞秒激光器的激光光路上放置多个透镜,将激光分成多个焦点;步骤3:将多个焦点聚焦在LED器件衬底内部不同深度的部位;步骤4:横向和纵向移动水平移动平台,完成飞秒激光划片;步骤5:对LED器件进行裂片,得到单个LED器件。本发明可以达到不同光束同时切割蓝宝石衬底,实现一次切割、多处划痕的效果,从而实现对较厚蓝宝石衬底的低损伤切割,以达到发光二极管的器件分离。

Figure 201210309067

A multi-focus femtosecond laser scribing method applied to the separation of LED devices, comprising: Step 1: fixing the prepared LED device on a horizontal moving platform and positioning it at the imaging center of a CCD imaging device; Step 2: Multiple lenses are placed on the laser light path of the laser to divide the laser light into multiple focal points; Step 3: Focus multiple focal points on parts of different depths inside the LED device substrate; Step 4: Move the horizontal platform horizontally and vertically to complete the femtosecond Laser scribing; step 5: splitting the LED device to obtain a single LED device. The invention can cut the sapphire substrate with different light beams at the same time, realize the effect of one-time cutting and multiple scratches, thereby realizing the low-damage cutting of the thicker sapphire substrate, so as to achieve the device separation of the light-emitting diode.

Figure 201210309067

Description

应用于LED器件分离的多焦点飞秒激光划片方法Multi-focus femtosecond laser scribing method applied to separation of LED devices

技术领域 technical field

本发明属于半导体技术领域,特别是指氮化镓基发光二极管晶圆激光划片技术领域。  The invention belongs to the technical field of semiconductors, in particular to the technical field of gallium nitride-based light-emitting diode wafer laser scribing technology. the

背景技术 Background technique

激光划片技术广泛应用于氮化镓基发光二极管晶圆的器件分离工艺,具有简单、快速、高效等特点。现在普通的纳秒激光划片机在切割蓝宝石衬底进行器件分离时,只能在蓝宝石衬底上留下深度为20μm至50μm的切割痕迹。这样就使得460μm左右厚度的蓝宝石衬底需要机械减薄、抛光至70-120μm的厚度才能划裂开,以达到器件分离的目的。但是,机械减薄及抛光蓝宝石会使得氮化镓外延层受到一定程度的破坏,从而降低了发光二极管的发光效率。同时,机械减薄及抛光蓝宝石衬底会使得发光二极管的制备工艺复杂化,从而提高了器件的生产成本。而且由于纳秒激光脉冲较长,其聚焦在蓝宝石衬底上所产生的高温会使得激光划痕附近的蓝宝石发生相变,使得激光划痕附近的光透过率降低,这也影响了器件的光提取效率。另一方面,出于成本考虑,氮化镓基发光二极管的外延片正在向4英寸、6英寸甚至8英寸等大尺寸外延的方向进行产业升级,由于氮化镓材料与蓝宝石衬底晶格失配所引起的巨大应力使得蓝宝石衬底很难再减薄到100μm左右的厚度。这样就需要一种新型的激光切割方式来进行大尺寸、低损伤、高效率的激光划片技术。  Laser scribing technology is widely used in the device separation process of gallium nitride-based light-emitting diode wafers, which is simple, fast and efficient. Now the ordinary nanosecond laser scribing machine can only leave cutting marks with a depth of 20 μm to 50 μm on the sapphire substrate when cutting the sapphire substrate for device separation. In this way, the sapphire substrate with a thickness of about 460 μm needs to be mechanically thinned and polished to a thickness of 70-120 μm before it can be scratched to achieve the purpose of device separation. However, the mechanical thinning and polishing of sapphire will damage the gallium nitride epitaxial layer to a certain extent, thereby reducing the luminous efficiency of the light emitting diode. At the same time, mechanically thinning and polishing the sapphire substrate will complicate the preparation process of the light-emitting diode, thereby increasing the production cost of the device. Moreover, due to the long nanosecond laser pulse, the high temperature generated by its focus on the sapphire substrate will cause a phase change in the sapphire near the laser scratch, which will reduce the light transmittance near the laser scratch, which also affects the performance of the device. light extraction efficiency. On the other hand, due to cost considerations, the epitaxial wafers of GaN-based light-emitting diodes are undergoing industrial upgrading in the direction of large-scale epitaxy such as 4 inches, 6 inches, and even 8 inches. The huge stress caused by matching makes it difficult to thin the sapphire substrate to a thickness of about 100 μm. In this way, a new laser cutting method is needed to perform large-size, low-damage, and high-efficiency laser scribing technology. the

发明内容 Contents of the invention

本发明的目的在于,提供一种应用于LED器件分离的多焦点飞秒激光划片方法,其是利用超短脉冲的飞秒激光器对200μm以上较厚的蓝宝石衬 底进行低损伤的激光切割。同时对飞秒激光器出射的激光光路进行设计,在光路内引入一个多焦点调光系统,使得激光经过此多焦点调光系统后被分散成不同光束,并聚焦在蓝宝石衬度不同的深度上,以达到不同光束同时切割蓝宝石衬底,实现一次切割、多处划痕的效果,从而实现对较厚蓝宝石衬底的低损伤切割,以达到发光二极管的器件分离。多焦点调光系统的引入,只需要一次就可以完成对较厚蓝宝石衬底的切割,从而降低了生产成本。同时由于飞秒激光器的激光脉冲非常短,使得蓝宝石直接汽化分解,降低了激光束对蓝宝石的破坏,并提高了出光效率。  The object of the present invention is to provide a multi-focus femtosecond laser scribing method applied to the separation of LED devices, which uses ultrashort-pulse femtosecond lasers to perform low-damage laser cutting on thicker sapphire substrates above 200 μm. At the same time, the laser optical path emitted by the femtosecond laser is designed, and a multi-focus dimming system is introduced in the optical path, so that the laser is dispersed into different beams after passing through the multi-focus dimming system, and focused on different depths of sapphire contrast. In order to achieve the simultaneous cutting of sapphire substrates with different beams, the effect of one-time cutting and multiple scratches can be achieved, so as to achieve low-damage cutting of thicker sapphire substrates and achieve the separation of light-emitting diode devices. The introduction of the multi-focus dimming system can complete the cutting of thicker sapphire substrates only once, thereby reducing production costs. At the same time, because the laser pulse of the femtosecond laser is very short, the sapphire is directly vaporized and decomposed, which reduces the damage of the laser beam to the sapphire and improves the light extraction efficiency. the

本发明提供一种应用于LED器件分离的多焦点飞秒激光划片方法,包括:  The invention provides a multi-focus femtosecond laser scribing method applied to the separation of LED devices, comprising:

步骤1:将制备好的LED器件固定在水平移动平台上,并位于CCD成像设备的成像中心;  Step 1: Fix the prepared LED device on the horizontal moving platform and place it in the imaging center of the CCD imaging device;

步骤2:在飞秒激光器的激光光路上放置多个透镜,将激光分成多个焦点;  Step 2: Place multiple lenses on the laser light path of the femtosecond laser to divide the laser into multiple focal points;

步骤3:将多个焦点聚焦在LED器件衬底内部不同深度的部位;  Step 3: focus multiple focal points on different depths inside the LED device substrate;

步骤4:横向和纵向移动水平移动平台,完成飞秒激光划片;  Step 4: Move the horizontal platform horizontally and vertically to complete the femtosecond laser scribing;

步骤5:对LED器件进行裂片,得到单个LED器件。  Step 5: Splitting the LED device to obtain a single LED device. the

其中所述飞秒激光器输出的激光中心波长范围为200nm-1600nm,脉冲宽度范围为1fs-1000fs,重复频率为1MHz-1000MHz,平均功率范围为1mw-100W。  Wherein the femtosecond laser output laser center wavelength range is 200nm-1600nm, pulse width range is 1fs-1000fs, repetition frequency is 1MHz-1000MHz, average power range is 1mw-100W. the

其中所述透镜和焦点的数量为1-10。  Wherein the number of lenses and focal points is 1-10. the

其中该多个焦点均匀分布在衬底内部不同深度的部位。  Wherein the plurality of focal points are uniformly distributed at different depths inside the substrate. the

其中所述的焦点直径为100nm-5μm。  The focus diameter mentioned therein is 100nm-5μm. the

附图说明 Description of drawings

为使审查员能进一步了解本发明的结构、特征及其目的,以下结合附图及较佳具体实施例的详细说明如后,其中:  In order to enable the examiner to further understand the structure, features and purpose of the present invention, the following detailed description in conjunction with the accompanying drawings and preferred specific embodiments is as follows, wherein:

图1为本发明应用于LED器件分离的多焦点飞秒激光划片方法的流程图;  Fig. 1 is the flow chart of the multi-focus femtosecond laser scribing method that the present invention is applied to LED device separation;

图2为本发明多焦点飞秒激光器切割原理示意图;  Fig. 2 is the schematic diagram of multi-focus femtosecond laser cutting principle of the present invention;

图3为多焦点飞秒激光器的聚焦结构示意图。  Fig. 3 is a schematic diagram of a focusing structure of a multi-focus femtosecond laser. the

具体实施方式Detailed ways

请参照图1至图3所示,本发明提供一种应用于LED器件分离的多焦点飞秒激光划片方法,包括:  Please refer to Figures 1 to 3, the present invention provides a multi-focus femtosecond laser scribing method applied to the separation of LED devices, including:

步骤S10:将制备好的LED器件400固定在水平移动平台500上,然后调整光路系统的CCD焦点,使LED器件400背面位于CCD成像设备200的成像中心(参阅图2);调整水平移动平台500与LED器件400的跑道平行。  Step S10: Fix the prepared LED device 400 on the horizontal moving platform 500, then adjust the CCD focus of the optical path system so that the back of the LED device 400 is located at the imaging center of the CCD imaging device 200 (see FIG. 2); adjust the horizontal moving platform 500 Parallel to the runway of the LED device 400 . the

步骤S20:在飞秒激光器100的激光光路上放置多个透镜300,将激光分成多个焦点,所述飞秒激光器100输出的激光中心波长范围为200nm-1600nm,脉冲宽度范围为1fs-1000fs,重复频率为1MHz-1000MHz,平均功率范围为1mw-100W,所述透镜300和焦点的数量为1-10(本实施例给出的透镜300数量为两个,透镜301和透镜302),该多个焦点均匀分布在衬底内部不同深度的部位,所述的焦点直径为100nm-5μm;  Step S20: placing a plurality of lenses 300 on the laser optical path of the femtosecond laser 100 to divide the laser light into multiple focal points, the central wavelength range of the laser output by the femtosecond laser 100 is 200nm-1600nm, and the pulse width range is 1fs-1000fs, The repetition frequency is 1MHz-1000MHz, the average power range is 1mw-100W, the number of the lens 300 and the focal point is 1-10 (the number of the lens 300 provided in this embodiment is two, the lens 301 and the lens 302), the number The focal points are uniformly distributed at different depths inside the substrate, and the diameter of the focal points is 100nm-5μm;

步骤S30:通过调整透镜300的位置将多个焦点401和焦点402(参阅图3,本实施例给出两个焦点401、402)聚焦在LED器件400衬底内部不同深度的部位;使多个焦点处的激光能量均匀。  Step S30: by adjusting the position of the lens 300, multiple focal points 401 and focal points 402 (referring to Fig. 3, the present embodiment provides two focal points 401, 402) are focused on the positions of different depths inside the substrate of the LED device 400; The laser energy is uniform at the focal point. the

步骤S40:调整完成后,打开激光器开关,用步进电机控制水平移动平台500横向和纵向移动,完成LED器件400的飞秒激光划片工艺;  Step S40: After the adjustment is completed, turn on the laser switch, use a stepping motor to control the horizontal movement platform 500 to move horizontally and vertically, and complete the femtosecond laser scribing process of the LED device 400;

步骤S50:划片完成后,将LED器件400用保护膜保护后,放置在裂片机台上,调整裂片机台的X和Y轴与LED器件400的跑道平行后进行裂片,得到单个LED器件。从而完成LED器件400的划片裂片工艺。  Step S50: After the dicing is completed, protect the LED device 400 with a protective film, place it on a splitting machine, adjust the X and Y axes of the splitting machine to be parallel to the running track of the LED device 400, and split to obtain a single LED device. Thus, the dicing and splitting process of the LED device 400 is completed. the

以上所述,仅为本发明中的具体实施方式,但本发明的保护范围并不局限于此,任何熟悉该技术的人在本发明所揭露的技术范围内,可轻易想到的变换或替换,都应涵盖在本发明的包含范围之内。因此,本发明的保护范围应该以权利要求书的保护范围为准。  The above is only a specific implementation mode in the present invention, but the scope of protection of the present invention is not limited thereto. Anyone familiar with the technology can easily think of changes or replacements within the technical scope disclosed in the present invention. All should be covered within the scope of the present invention. Therefore, the protection scope of the present invention should be determined by the protection scope of the claims. the

Claims (5)

1.一种应用于LED器件分离的多焦点飞秒激光划片方法,包括:1. A multi-focus femtosecond laser scribing method applied to the separation of LED devices, comprising: 步骤1:将制备好的LED器件固定在水平移动平台上,并位于CCD成像设备的成像中心;Step 1: Fix the prepared LED device on the horizontal moving platform and place it in the imaging center of the CCD imaging device; 步骤2:在飞秒激光器的激光光路上放置多个透镜,将激光分成多个焦点;Step 2: Place multiple lenses on the laser light path of the femtosecond laser to divide the laser into multiple focal points; 步骤3:将多个焦点聚焦在LED器件衬底内部不同深度的部位;Step 3: focusing multiple focal points on parts at different depths inside the LED device substrate; 步骤4:横向和纵向移动水平移动平台,完成飞秒激光划片;Step 4: Move the horizontal platform horizontally and vertically to complete femtosecond laser scribing; 步骤5:对LED器件进行裂片,得到单个LED器件。Step 5: Splitting the LED device to obtain a single LED device. 2.如权利要求1中所述的应用于LED器件分离的多焦点飞秒激光划片方法,其中所述飞秒激光器输出的激光中心波长范围为200nm-1600nm,脉冲宽度范围为1fs-1000fs,重复频率为1MHz-1000MHz,平均功率范围为1mw-100W。2. The multi-focus femtosecond laser scribing method applied to the separation of LED devices as claimed in claim 1, wherein the laser center wavelength range of the femtosecond laser output is 200nm-1600nm, and the pulse width range is 1fs-1000fs, The repetition frequency is 1MHz-1000MHz, and the average power range is 1mw-100W. 3.如权利要求1中所述的应用于LED器件分离的多焦点飞秒激光划片方法,其中所述透镜和焦点的数量为1-10。3. The multi-focus femtosecond laser scribing method applied to the separation of LED devices as claimed in claim 1, wherein the number of said lenses and focus points is 1-10. 4.如权利要求1中所述的应用于LED器件分离的多焦点飞秒激光划片方法,其中该多个焦点均匀分布在衬底内部不同深度的部位。4. The multi-focus femtosecond laser scribing method applied to the separation of LED devices as claimed in claim 1, wherein the multiple focus points are uniformly distributed at different depths inside the substrate. 5.如权利要求1中所述的应用于LED器件分离的多焦点飞秒激光划片方法,其中所述的焦点直径为100nm-5μm。5. The multi-focus femtosecond laser scribing method applied to the separation of LED devices as claimed in claim 1, wherein said focus diameter is 100 nm-5 μm.
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Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104275555A (en) * 2013-07-05 2015-01-14 三星显示有限公司 Substrate separation device, and substrate separation method using substrate separation device
CN104319336A (en) * 2014-10-29 2015-01-28 山东浪潮华光光电子股份有限公司 Method for forming inverted-pyramid-shaped blue LED flip chip
CN106271111A (en) * 2016-09-26 2017-01-04 华中科技大学 A kind of multifocal separation by laser laminated glass method and device
CN106392337A (en) * 2016-09-26 2017-02-15 华中科技大学 Method and device for correlative multi-focus laser separation of fragile transmission material
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CN107863423A (en) * 2017-10-26 2018-03-30 江苏新广联半导体有限公司 The patterned preparation method of LED flip chip sapphire exiting surface
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005028438A (en) * 2003-07-11 2005-02-03 Disco Abrasive Syst Ltd Machining apparatus utilizing laser beam
US20060076327A1 (en) * 2004-10-07 2006-04-13 Disco Corporation Laser beam processing machine
JP2007229758A (en) * 2006-02-28 2007-09-13 Fukami Seisakusho:Kk Laser processing equipment
JP2007324326A (en) * 2006-05-31 2007-12-13 Aisin Seiki Co Ltd Light-emitting diode chip and wafer division processing method
CN101983825A (en) * 2010-10-09 2011-03-09 苏州德龙激光有限公司 Picosecond laser scribing device for light emitting diode (LED) wafer
JP2012096274A (en) * 2010-11-04 2012-05-24 Disco Corp Laser processing apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005028438A (en) * 2003-07-11 2005-02-03 Disco Abrasive Syst Ltd Machining apparatus utilizing laser beam
US20060076327A1 (en) * 2004-10-07 2006-04-13 Disco Corporation Laser beam processing machine
JP2007229758A (en) * 2006-02-28 2007-09-13 Fukami Seisakusho:Kk Laser processing equipment
JP2007324326A (en) * 2006-05-31 2007-12-13 Aisin Seiki Co Ltd Light-emitting diode chip and wafer division processing method
CN101983825A (en) * 2010-10-09 2011-03-09 苏州德龙激光有限公司 Picosecond laser scribing device for light emitting diode (LED) wafer
JP2012096274A (en) * 2010-11-04 2012-05-24 Disco Corp Laser processing apparatus

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104275555B (en) * 2013-07-05 2018-02-02 三星显示有限公司 Substrate separator and the substrate separation method using substrate separator
CN104275555A (en) * 2013-07-05 2015-01-14 三星显示有限公司 Substrate separation device, and substrate separation method using substrate separation device
CN104319336A (en) * 2014-10-29 2015-01-28 山东浪潮华光光电子股份有限公司 Method for forming inverted-pyramid-shaped blue LED flip chip
CN104319336B (en) * 2014-10-29 2017-02-15 山东浪潮华光光电子股份有限公司 Method for forming inverted-pyramid-shaped blue LED flip chip
CN106624373A (en) * 2015-10-30 2017-05-10 三星显示有限公司 Laser cutting apparatus
CN106392337B (en) * 2016-09-26 2018-04-24 华中科技大学 A kind of correlation multifocal separation by laser brittleness transmission material method and device
CN106271111A (en) * 2016-09-26 2017-01-04 华中科技大学 A kind of multifocal separation by laser laminated glass method and device
CN106392337A (en) * 2016-09-26 2017-02-15 华中科技大学 Method and device for correlative multi-focus laser separation of fragile transmission material
CN106695113A (en) * 2016-12-08 2017-05-24 华中科技大学 Axial bifocus lens
CN106695113B (en) * 2016-12-08 2018-11-06 华中科技大学 An axial bifocal lens
CN107243690A (en) * 2017-07-13 2017-10-13 华中科技大学 A kind of laser multifocal dynamic machining method and system
CN107863423A (en) * 2017-10-26 2018-03-30 江苏新广联半导体有限公司 The patterned preparation method of LED flip chip sapphire exiting surface
CN107861249A (en) * 2017-11-09 2018-03-30 武汉茂捷光电科技有限公司 A method for laser to achieve long focal depth through lens group
CN109128530A (en) * 2018-09-27 2019-01-04 广东工业大学 A kind of multifocal laser micropore processing method of dynamic adjustment
CN110510887A (en) * 2019-08-21 2019-11-29 吉林大学 Manufacturing method and optical device of multifocal optical curved surface
US20220331907A1 (en) * 2019-09-11 2022-10-20 Hamamatsu Photonics K.K. Laser processing device and laser processing method
CN112427812A (en) * 2020-09-22 2021-03-02 厦门云天半导体科技有限公司 Method for realizing separation of ultrathin workpieces through spacing ultrafine laser through holes
CN112192772A (en) * 2020-10-26 2021-01-08 中国科学院半导体研究所 Ultrafast laser continuous splitting device and method
CN112620930A (en) * 2020-12-29 2021-04-09 苏州科韵激光科技有限公司 Semiconductor laser processing multi-focus optical path system, laser system and processing method
CN116748703A (en) * 2023-08-15 2023-09-15 蓝思科技股份有限公司 Method and system for processing matte substrate

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