CN102866588A - 曝光装置 - Google Patents
曝光装置 Download PDFInfo
- Publication number
- CN102866588A CN102866588A CN2012101895151A CN201210189515A CN102866588A CN 102866588 A CN102866588 A CN 102866588A CN 2012101895151 A CN2012101895151 A CN 2012101895151A CN 201210189515 A CN201210189515 A CN 201210189515A CN 102866588 A CN102866588 A CN 102866588A
- Authority
- CN
- China
- Prior art keywords
- substrate
- mask
- exposure device
- gap
- placing platform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-130463 | 2011-06-10 | ||
JP2011130463 | 2011-06-10 | ||
JP2012-118903 | 2012-05-24 | ||
JP2012118903A JP6024016B2 (ja) | 2011-06-10 | 2012-05-24 | 露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN102866588A true CN102866588A (zh) | 2013-01-09 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2012101895151A Pending CN102866588A (zh) | 2011-06-10 | 2012-06-08 | 曝光装置 |
Country Status (1)
Country | Link |
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CN (1) | CN102866588A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104597723A (zh) * | 2015-02-04 | 2015-05-06 | 合肥京东方光电科技有限公司 | 一种掩膜装置、曝光装置及曝光方法 |
CN108149191A (zh) * | 2017-12-25 | 2018-06-12 | 固安翌光科技有限公司 | 一种新型掩膜及蒸镀装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS567430A (en) * | 1979-06-29 | 1981-01-26 | Nippon Telegr & Teleph Corp <Ntt> | Sticking mechanism for mask and wafer |
JP3322167B2 (ja) * | 1997-05-29 | 2002-09-09 | ウシオ電機株式会社 | マスク保持フレームの支持構造 |
CN1470940A (zh) * | 2002-06-21 | 2004-01-28 | 株式会社阿迪泰克工程 | 密接型曝光装置 |
CN101101452A (zh) * | 2006-07-07 | 2008-01-09 | 日本精工株式会社 | 曝光装置 |
WO2008054457A2 (en) * | 2006-02-16 | 2008-05-08 | Searete Llc | Plasmon tomography |
JP2009194147A (ja) * | 2008-02-14 | 2009-08-27 | Seiko Instruments Inc | ウエハ露光装置及びウエハ露光方法 |
-
2012
- 2012-06-08 CN CN2012101895151A patent/CN102866588A/zh active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS567430A (en) * | 1979-06-29 | 1981-01-26 | Nippon Telegr & Teleph Corp <Ntt> | Sticking mechanism for mask and wafer |
JP3322167B2 (ja) * | 1997-05-29 | 2002-09-09 | ウシオ電機株式会社 | マスク保持フレームの支持構造 |
CN1470940A (zh) * | 2002-06-21 | 2004-01-28 | 株式会社阿迪泰克工程 | 密接型曝光装置 |
WO2008054457A2 (en) * | 2006-02-16 | 2008-05-08 | Searete Llc | Plasmon tomography |
CN101101452A (zh) * | 2006-07-07 | 2008-01-09 | 日本精工株式会社 | 曝光装置 |
JP2009194147A (ja) * | 2008-02-14 | 2009-08-27 | Seiko Instruments Inc | ウエハ露光装置及びウエハ露光方法 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104597723A (zh) * | 2015-02-04 | 2015-05-06 | 合肥京东方光电科技有限公司 | 一种掩膜装置、曝光装置及曝光方法 |
WO2016123922A1 (zh) * | 2015-02-04 | 2016-08-11 | 京东方科技集团股份有限公司 | 掩膜装置、曝光装置及曝光方法 |
US9760024B2 (en) | 2015-02-04 | 2017-09-12 | Boe Technology Group Co., Ltd. | Mask device, exposure apparatus and exposure method |
CN108149191A (zh) * | 2017-12-25 | 2018-06-12 | 固安翌光科技有限公司 | 一种新型掩膜及蒸镀装置 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
CB02 | Change of applicant information |
Address after: Kanagawa, Japan Applicant after: VN Systems Ltd. Address before: Tokyo, Japan Applicant before: NSK Technology Co.,Ltd. |
|
COR | Change of bibliographic data | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20160301 Address after: Kanagawa, Japan Applicant after: V TECHNOLOGY Co.,Ltd. Address before: Kanagawa, Japan Applicant before: VN Systems Ltd. |
|
C12 | Rejection of a patent application after its publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20130109 |