CN102859638B - 用于介质阻挡放电等离子体方法的电极 - Google Patents

用于介质阻挡放电等离子体方法的电极 Download PDF

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Publication number
CN102859638B
CN102859638B CN201180021657.0A CN201180021657A CN102859638B CN 102859638 B CN102859638 B CN 102859638B CN 201180021657 A CN201180021657 A CN 201180021657A CN 102859638 B CN102859638 B CN 102859638B
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CN
China
Prior art keywords
cooling circuit
planar electrode
electrode
heat exchanger
working part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201180021657.0A
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English (en)
Chinese (zh)
Other versions
CN102859638A (zh
Inventor
E·蒂克霍
E·米歇尔
J·勒克莱尔克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Glass Europe SA
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AGC Glass Europe SA
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Publication of CN102859638A publication Critical patent/CN102859638A/zh
Application granted granted Critical
Publication of CN102859638B publication Critical patent/CN102859638B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32715Workpiece holder
    • H01J37/32724Temperature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348Dielectric barrier discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/3255Material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/52Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)
CN201180021657.0A 2010-04-30 2011-04-27 用于介质阻挡放电等离子体方法的电极 Expired - Fee Related CN102859638B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP10161557 2010-04-30
EP10161557.3 2010-04-30
PCT/EP2011/056621 WO2011134978A1 (fr) 2010-04-30 2011-04-27 Electrode pour procede plasma dbd

Publications (2)

Publication Number Publication Date
CN102859638A CN102859638A (zh) 2013-01-02
CN102859638B true CN102859638B (zh) 2016-09-21

Family

ID=42738894

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180021657.0A Expired - Fee Related CN102859638B (zh) 2010-04-30 2011-04-27 用于介质阻挡放电等离子体方法的电极

Country Status (9)

Country Link
US (1) US20130038196A1 (https=)
EP (1) EP2564412B1 (https=)
JP (1) JP5756514B2 (https=)
CN (1) CN102859638B (https=)
AR (1) AR081458A1 (https=)
BR (1) BR112012027756B1 (https=)
EA (1) EA024404B1 (https=)
PL (1) PL2564412T3 (https=)
WO (1) WO2011134978A1 (https=)

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* Cited by examiner, † Cited by third party
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GB2501933A (en) * 2012-05-09 2013-11-13 Linde Ag device for providing a flow of non-thermal plasma
EP2935648B1 (en) 2012-12-21 2019-08-28 AGC Inc. Pair of electrodes for dbd plasma process
CN111377401A (zh) * 2018-12-29 2020-07-07 中国石油化工股份有限公司 多反应管低温等离子体设备和分解硫化氢的方法
KR102031713B1 (ko) * 2019-01-29 2019-10-14 (주)에스제이글로벌 창상치료용 플라즈마 전극 패드 및 플라즈마 치료 장치

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CN1812682A (zh) * 2005-01-28 2006-08-02 爱德牌工程有限公司 等离子加工设备

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* Cited by examiner, † Cited by third party
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WO2004001790A1 (en) * 2002-06-21 2003-12-31 Axcelis Technologies, Inc. Dielectric barrier discharge apparatus and process for treating a substrate
CN1745607A (zh) * 2003-01-31 2006-03-08 陶氏康宁爱尔兰有限公司 产生等离子体的电极组件
CN1812682A (zh) * 2005-01-28 2006-08-02 爱德牌工程有限公司 等离子加工设备

Also Published As

Publication number Publication date
EP2564412A1 (fr) 2013-03-06
JP5756514B2 (ja) 2015-07-29
EP2564412B1 (fr) 2018-03-14
JP2013530489A (ja) 2013-07-25
EA201291130A1 (ru) 2013-04-30
US20130038196A1 (en) 2013-02-14
BR112012027756A2 (https=) 2017-08-15
CN102859638A (zh) 2013-01-02
EA024404B1 (ru) 2016-09-30
AR081458A1 (es) 2012-09-05
WO2011134978A1 (fr) 2011-11-03
BR112012027756B1 (pt) 2021-09-21
PL2564412T3 (pl) 2018-08-31

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