CN102766857B - 等离子体处理系统 - Google Patents
等离子体处理系统 Download PDFInfo
- Publication number
- CN102766857B CN102766857B CN201210137245.XA CN201210137245A CN102766857B CN 102766857 B CN102766857 B CN 102766857B CN 201210137245 A CN201210137245 A CN 201210137245A CN 102766857 B CN102766857 B CN 102766857B
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/100,605 | 2011-05-04 | ||
| US13/100,605 US8333166B2 (en) | 2011-05-04 | 2011-05-04 | Plasma treatment systems and methods for uniformly distributing radiofrequency power between multiple electrodes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102766857A CN102766857A (zh) | 2012-11-07 |
| CN102766857B true CN102766857B (zh) | 2016-04-13 |
Family
ID=47089447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210137245.XA Expired - Fee Related CN102766857B (zh) | 2011-05-04 | 2012-05-04 | 等离子体处理系统 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8333166B2 (enExample) |
| JP (1) | JP6068825B2 (enExample) |
| KR (1) | KR101935766B1 (enExample) |
| CN (1) | CN102766857B (enExample) |
| TW (1) | TWI618456B (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8372238B2 (en) * | 2008-05-20 | 2013-02-12 | Nordson Corporation | Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes |
| TWI494030B (zh) * | 2008-07-07 | 2015-07-21 | Lam Res Corp | 供使用於電漿處理腔室中之含真空間隙的面向電漿之探針裝置 |
| KR101606736B1 (ko) | 2008-07-07 | 2016-03-28 | 램 리써치 코포레이션 | 플라즈마 프로세싱 챔버에서 플라즈마 불안정성을 검출하기 위한 패시브 용량성-결합된 정전식 (ｃｃｅ) 프로브 장치 |
| KR101136728B1 (ko) * | 2010-10-18 | 2012-04-20 | 주성엔지니어링(주) | 기판처리장치와 그의 분해 및 조립방법 |
| US8333166B2 (en) * | 2011-05-04 | 2012-12-18 | Nordson Corporation | Plasma treatment systems and methods for uniformly distributing radiofrequency power between multiple electrodes |
| TWI473382B (zh) * | 2012-09-28 | 2015-02-11 | Au Optronics Corp | 無線電力傳輸裝置 |
| JP6068667B2 (ja) | 2013-10-04 | 2017-01-25 | 東芝三菱電機産業システム株式会社 | 電源装置 |
| JP5857207B2 (ja) * | 2013-11-18 | 2016-02-10 | パナソニックＩｐマネジメント株式会社 | プラズマ処理装置及び方法 |
| JP6726865B2 (ja) * | 2015-06-05 | 2020-07-22 | パナソニックＩｐマネジメント株式会社 | プラズマ生成装置 |
| CN105142324A (zh) * | 2015-08-17 | 2015-12-09 | 深圳市华鼎星科技有限公司 | 一种线性等离子发生器 |
| KR101881536B1 (ko) * | 2017-02-24 | 2018-07-24 | 주식회사 뉴파워 프라즈마 | 출력전류 제어가 가능한 전력공급장치 및 이를 이용한 전력공급방법 |
| KR101881535B1 (ko) * | 2017-02-24 | 2018-07-24 | 주식회사 뉴파워 프라즈마 | 수동소자를 구비한 전력공급장치 및 이를 이용한 플라즈마 점화를 위한 전력제공방법 |
| HUE047152T2 (hu) * | 2017-02-28 | 2020-04-28 | Meyer Burger Germany Gmbh | Elektródegység belsõ villamos hálózattal nagyfrekvenciás feszültség hozzávezetésére és tartószerkezet plazmakezelõ berendezéshez |
| KR102038276B1 (ko) * | 2017-04-12 | 2019-10-30 | (주)아이작리서치 | 배치 타입의 플라즈마 원자층 증착 장치 |
| US11143618B2 (en) * | 2018-04-09 | 2021-10-12 | Roche Sequencing Solutions, Inc. | Fabrication of tunneling junctions with nanopores for molecular recognition |
| CN108787634A (zh) * | 2018-07-19 | 2018-11-13 | 深圳市神州天柱科技有限公司 | 一种等离子清洗机 |
| CN110042348A (zh) * | 2019-03-12 | 2019-07-23 | 深圳奥拦科技有限责任公司 | 等离子表面处理装置及方法 |
| CN110911262B (zh) * | 2019-11-12 | 2022-07-22 | 北京北方华创微电子装备有限公司 | 电感耦合等离子体系统 |
| WO2022011581A1 (en) * | 2020-07-15 | 2022-01-20 | Nordson Corporation | Plasma treatment with isolated cooling paths |
| KR102405333B1 (ko) * | 2020-11-25 | 2022-06-07 | (주)이노플라즈텍 | 평판형 필터 전극을 이용한 분말 표면처리용 플라즈마 장치 |
| US11621587B1 (en) | 2022-07-18 | 2023-04-04 | Caps Medical Ltd. | Configurable plasma generating system |
| IL318434A (en) * | 2022-07-18 | 2025-03-01 | Caps Medical Ltd | Plasma production system |
| US12389521B2 (en) | 2022-07-18 | 2025-08-12 | Caps Medical Ltd. | Plasma generating system |
| US20240170254A1 (en) * | 2022-11-21 | 2024-05-23 | Applied Materials, Inc. | Batch processing chambers for plasma-enhanced deposition |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101420816A (zh) * | 2007-10-22 | 2009-04-29 | 新动力等离子体株式会社 | 容性耦合等离子体反应器 |
| CN102027810A (zh) * | 2008-05-14 | 2011-04-20 | 应用材料股份有限公司 | 使用rf功率传递的时间分解调频方案以用于脉冲等离子体工艺的方法及设备 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2961103B1 (ja) * | 1998-04-28 | 1999-10-12 | 三菱重工業株式会社 | プラズマ化学蒸着装置 |
| GB2387023B (en) * | 1998-12-17 | 2003-12-03 | Trikon Holdings Ltd | Inductive coil assembly |
| KR20060115734A (ko) | 2003-10-28 | 2006-11-09 | 노드슨 코포레이션 | 플라즈마 프로세싱 시스템 및 플라즈마 처리 방법 |
| US7993489B2 (en) * | 2005-03-31 | 2011-08-09 | Tokyo Electron Limited | Capacitive coupling plasma processing apparatus and method for using the same |
| WO2006118161A1 (ja) * | 2005-04-28 | 2006-11-09 | Hitachi Kokusai Electric Inc. | 基板処理装置および電極部材 |
| JP5168907B2 (ja) * | 2007-01-15 | 2013-03-27 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ処理方法及び記憶媒体 |
| TWI440405B (zh) * | 2007-10-22 | 2014-06-01 | New Power Plasma Co Ltd | 電容式耦合電漿反應器 |
| US8372238B2 (en) | 2008-05-20 | 2013-02-12 | Nordson Corporation | Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes |
| US8333166B2 (en) * | 2011-05-04 | 2012-12-18 | Nordson Corporation | Plasma treatment systems and methods for uniformly distributing radiofrequency power between multiple electrodes |
-
2011
- 2011-05-04 US US13/100,605 patent/US8333166B2/en not_active Expired - Fee Related
-
2012
- 2012-05-02 JP JP2012105137A patent/JP6068825B2/ja not_active Expired - Fee Related
- 2012-05-03 KR KR1020120046880A patent/KR101935766B1/ko not_active Expired - Fee Related
- 2012-05-04 CN CN201210137245.XA patent/CN102766857B/zh not_active Expired - Fee Related
- 2012-05-04 TW TW101116058A patent/TWI618456B/zh not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101420816A (zh) * | 2007-10-22 | 2009-04-29 | 新动力等离子体株式会社 | 容性耦合等离子体反应器 |
| CN102027810A (zh) * | 2008-05-14 | 2011-04-20 | 应用材料股份有限公司 | 使用rf功率传递的时间分解调频方案以用于脉冲等离子体工艺的方法及设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20120125177A (ko) | 2012-11-14 |
| US8333166B2 (en) | 2012-12-18 |
| TW201251520A (en) | 2012-12-16 |
| JP6068825B2 (ja) | 2017-01-25 |
| JP2012238593A (ja) | 2012-12-06 |
| CN102766857A (zh) | 2012-11-07 |
| US20120279658A1 (en) | 2012-11-08 |
| TWI618456B (zh) | 2018-03-11 |
| KR101935766B1 (ko) | 2019-01-08 |
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Legal Events
| Date | Code | Title | Description |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160413 |