HUE047152T2 - Elektródegység belsõ villamos hálózattal nagyfrekvenciás feszültség hozzávezetésére és tartószerkezet plazmakezelõ berendezéshez - Google Patents
Elektródegység belsõ villamos hálózattal nagyfrekvenciás feszültség hozzávezetésére és tartószerkezet plazmakezelõ berendezéshezInfo
- Publication number
- HUE047152T2 HUE047152T2 HUE17158448A HUE17158448A HUE047152T2 HU E047152 T2 HUE047152 T2 HU E047152T2 HU E17158448 A HUE17158448 A HU E17158448A HU E17158448 A HUE17158448 A HU E17158448A HU E047152 T2 HUE047152 T2 HU E047152T2
- Authority
- HU
- Hungary
- Prior art keywords
- processing system
- high frequency
- plasma processing
- electrode unit
- frequency voltage
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17158448.5A EP3367419B1 (de) | 2017-02-28 | 2017-02-28 | Elektrodeneinheit mit einem internen elektrischen netzwerk zur zuführung von hochfrequenter spannung und trägeranordnung für eine plasmabehandlungsanlage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HUE047152T2 true HUE047152T2 (hu) | 2020-04-28 |
Family
ID=58266365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HUE17158448A HUE047152T2 (hu) | 2017-02-28 | 2017-02-28 | Elektródegység belsõ villamos hálózattal nagyfrekvenciás feszültség hozzávezetésére és tartószerkezet plazmakezelõ berendezéshez |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20200006041A1 (hu) |
| EP (1) | EP3367419B1 (hu) |
| JP (1) | JP6703198B2 (hu) |
| KR (1) | KR102124434B1 (hu) |
| CN (1) | CN110462782B (hu) |
| ES (1) | ES2758273T3 (hu) |
| HU (1) | HUE047152T2 (hu) |
| WO (1) | WO2018158013A1 (hu) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8303602A (nl) | 1983-10-19 | 1985-05-17 | Johannes Hendrikus Leonardus H | Plasma-gestimuleerde chemische opdampinrichting en in het bijzonder een substratenondersteunings- en elektrodeopstelling daarvoor en de betreffende onderdelen. |
| US4887005A (en) | 1987-09-15 | 1989-12-12 | Rough J Kirkwood H | Multiple electrode plasma reactor power distribution system |
| AU2003195A (en) | 1994-06-21 | 1996-01-04 | Boc Group, Inc., The | Improved power distribution for multiple electrode plasma systems using quarter wavelength transmission lines |
| JP2003031504A (ja) * | 2001-07-13 | 2003-01-31 | Sharp Corp | プラズマ処理装置及びプラズマ処理方法、それらを用いて作製した半導体装置 |
| WO2009147993A1 (ja) * | 2008-06-02 | 2009-12-10 | シャープ株式会社 | プラズマ処理装置、それを用いた成膜方法およびエッチング方法 |
| WO2013046286A1 (ja) * | 2011-09-26 | 2013-04-04 | 株式会社島津製作所 | プラズマ成膜装置 |
| JP6218650B2 (ja) * | 2014-03-11 | 2017-10-25 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| DE102015004352A1 (de) | 2015-04-02 | 2016-10-06 | Centrotherm Photovoltaics Ag | Waferboot und Behandlungsvorrichtung für Wafer |
-
2017
- 2017-02-28 HU HUE17158448A patent/HUE047152T2/hu unknown
- 2017-02-28 EP EP17158448.5A patent/EP3367419B1/de active Active
- 2017-02-28 ES ES17158448T patent/ES2758273T3/es active Active
-
2018
- 2018-01-25 US US16/488,966 patent/US20200006041A1/en not_active Abandoned
- 2018-01-25 JP JP2019546923A patent/JP6703198B2/ja active Active
- 2018-01-25 CN CN201880022075.6A patent/CN110462782B/zh active Active
- 2018-01-25 WO PCT/EP2018/051874 patent/WO2018158013A1/de active Application Filing
- 2018-01-25 KR KR1020197028363A patent/KR102124434B1/ko active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| US20200006041A1 (en) | 2020-01-02 |
| CN110462782B (zh) | 2021-09-17 |
| KR20190114015A (ko) | 2019-10-08 |
| JP2020510964A (ja) | 2020-04-09 |
| JP6703198B2 (ja) | 2020-06-03 |
| WO2018158013A1 (de) | 2018-09-07 |
| EP3367419A1 (de) | 2018-08-29 |
| KR102124434B1 (ko) | 2020-06-18 |
| ES2758273T3 (es) | 2020-05-04 |
| EP3367419B1 (de) | 2019-08-14 |
| CN110462782A (zh) | 2019-11-15 |
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