CN102738118B - 半导体器件 - Google Patents
半导体器件 Download PDFInfo
- Publication number
- CN102738118B CN102738118B CN201210092828.5A CN201210092828A CN102738118B CN 102738118 B CN102738118 B CN 102738118B CN 201210092828 A CN201210092828 A CN 201210092828A CN 102738118 B CN102738118 B CN 102738118B
- Authority
- CN
- China
- Prior art keywords
- layer
- line
- via layer
- ground
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5384—Conductive vias through the substrate with or without pins, e.g. buried coaxial conductors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/535—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including internal interconnections, e.g. cross-under constructions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76898—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics formed through a semiconductor substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/66—High-frequency adaptations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
- H01L25/0657—Stacked arrangements of devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/58—Structural electrical arrangements for semiconductor devices not otherwise provided for
- H01L2223/64—Impedance arrangements
- H01L2223/66—High-frequency adaptations
- H01L2223/6605—High-frequency electrical connections
- H01L2223/6616—Vertical connections, e.g. vias
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/58—Structural electrical arrangements for semiconductor devices not otherwise provided for
- H01L2223/64—Impedance arrangements
- H01L2223/66—High-frequency adaptations
- H01L2223/6605—High-frequency electrical connections
- H01L2223/6627—Waveguides, e.g. microstrip line, strip line, coplanar line
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06527—Special adaptation of electrical connections, e.g. rewiring, engineering changes, pressure contacts, layout
- H01L2225/06537—Electromagnetic shielding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/04—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same main group of the same subclass of class H10
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06541—Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
- H01L2225/06544—Design considerations for via connections, e.g. geometry or layout
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5225—Shielding layers formed together with wiring layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Layout of the interconnection structure
- H01L23/5286—Arrangements of power or ground buses
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011087048A JP5842368B2 (ja) | 2011-04-11 | 2011-04-11 | 半導体装置 |
| JP2011-087048 | 2011-04-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102738118A CN102738118A (zh) | 2012-10-17 |
| CN102738118B true CN102738118B (zh) | 2017-04-12 |
Family
ID=46965465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210092828.5A Expired - Fee Related CN102738118B (zh) | 2011-04-11 | 2012-03-31 | 半导体器件 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US8786061B2 (enExample) |
| JP (1) | JP5842368B2 (enExample) |
| CN (1) | CN102738118B (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2991108A1 (fr) * | 2012-05-24 | 2013-11-29 | St Microelectronics Sa | Ligne coplanaire blindee |
| CN206976318U (zh) * | 2014-11-21 | 2018-02-06 | 株式会社村田制作所 | 模块 |
| FR3029301B1 (fr) * | 2014-12-01 | 2017-01-06 | Commissariat Energie Atomique | Procede de fabrication d'un guide d'onde incluant une jonction semiconductrice |
| CN105187089B (zh) * | 2015-08-24 | 2018-07-06 | 小米科技有限责任公司 | 信号传输装置及终端 |
| US10410939B2 (en) * | 2015-12-16 | 2019-09-10 | Intel Corporation | Package power delivery using plane and shaped vias |
| JP6866789B2 (ja) * | 2017-07-11 | 2021-04-28 | 富士通株式会社 | 電子デバイス、及び、電子デバイスの製造方法 |
| JP6845118B2 (ja) * | 2017-10-25 | 2021-03-17 | 株式会社Soken | 高周波伝送線路 |
| KR102777475B1 (ko) | 2019-10-17 | 2025-03-10 | 에스케이하이닉스 주식회사 | 반도체 패키지 |
| US11302645B2 (en) * | 2020-06-30 | 2022-04-12 | Western Digital Technologies, Inc. | Printed circuit board compensation structure for high bandwidth and high die-count memory stacks |
| US20250038388A1 (en) * | 2021-12-21 | 2025-01-30 | Fujikura Ltd. | Transmission line |
| US12334442B2 (en) | 2022-08-31 | 2025-06-17 | International Business Machines Corporation | Dielectric caps for power and signal line routing |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08125412A (ja) * | 1994-10-19 | 1996-05-17 | Mitsubishi Electric Corp | 伝送線路,及びその製造方法 |
| US6307252B1 (en) * | 1999-03-05 | 2001-10-23 | Agere Systems Guardian Corp. | On-chip shielding of signals |
| JP4734723B2 (ja) * | 2001-01-31 | 2011-07-27 | 凸版印刷株式会社 | 同軸ビアホールを用いた多層配線基板の製造方法 |
| JP3561747B2 (ja) * | 2001-03-30 | 2004-09-02 | ユーディナデバイス株式会社 | 高周波半導体装置の多層配線構造 |
| JP2004363975A (ja) * | 2003-06-05 | 2004-12-24 | Matsushita Electric Ind Co Ltd | 高周波回路 |
| DE102004060345A1 (de) * | 2003-12-26 | 2005-10-06 | Elpida Memory, Inc. | Halbleitervorrichtung mit geschichteten Chips |
| JP4383939B2 (ja) * | 2004-03-29 | 2009-12-16 | シャープ株式会社 | 伝送線路形成方法、伝送線路、半導体チップおよび半導体集積回路ユニット |
| JP4441328B2 (ja) * | 2004-05-25 | 2010-03-31 | 株式会社ルネサステクノロジ | 半導体装置及びその製造方法 |
| DE102005008195A1 (de) * | 2005-02-23 | 2006-08-24 | Atmel Germany Gmbh | Hochfrequenzanordnung |
| US20060255434A1 (en) * | 2005-05-12 | 2006-11-16 | Yinon Degani | Shielding noisy conductors in integrated passive devices |
| US20060264029A1 (en) * | 2005-05-23 | 2006-11-23 | Intel Corporation | Low inductance via structures |
| CN100559574C (zh) * | 2005-08-26 | 2009-11-11 | 皇家飞利浦电子股份有限公司 | 电屏蔽穿通晶片互连和其制造方法及检测元件和检测设备 |
| WO2007138895A1 (ja) * | 2006-05-25 | 2007-12-06 | National Institute Of Advanced Industrial Science And Technology | 同軸型ビア接続構造およびその製造方法 |
| JP4735614B2 (ja) * | 2007-07-26 | 2011-07-27 | セイコーエプソン株式会社 | 回路基板 |
| US8028406B2 (en) * | 2008-04-03 | 2011-10-04 | International Business Machines Corporation | Methods of fabricating coplanar waveguide structures |
| JP5985136B2 (ja) | 2009-03-19 | 2016-09-06 | ソニー株式会社 | 半導体装置とその製造方法、及び電子機器 |
| US8487430B1 (en) * | 2010-01-21 | 2013-07-16 | Semtech Corporation | Multi-layer high-speed integrated circuit ball grid array package and process |
| US7999361B1 (en) * | 2010-02-19 | 2011-08-16 | Altera Corporation | Shielding structure for transmission lines |
| US9087840B2 (en) * | 2010-11-01 | 2015-07-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Slot-shielded coplanar strip-line compatible with CMOS processes |
| US8912581B2 (en) * | 2012-03-09 | 2014-12-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | 3D transmission lines for semiconductors |
| US8912634B2 (en) * | 2012-03-29 | 2014-12-16 | International Business Machines Corporation | High frequency transition matching in an electronic package for millimeter wave semiconductor dies |
-
2011
- 2011-04-11 JP JP2011087048A patent/JP5842368B2/ja not_active Expired - Fee Related
-
2012
- 2012-03-31 CN CN201210092828.5A patent/CN102738118B/zh not_active Expired - Fee Related
- 2012-04-04 US US13/439,025 patent/US8786061B2/en not_active Expired - Fee Related
-
2014
- 2014-05-27 US US14/288,165 patent/US9343410B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP5842368B2 (ja) | 2016-01-13 |
| US20120256318A1 (en) | 2012-10-11 |
| US20140264939A1 (en) | 2014-09-18 |
| US9343410B2 (en) | 2016-05-17 |
| CN102738118A (zh) | 2012-10-17 |
| US8786061B2 (en) | 2014-07-22 |
| JP2012222182A (ja) | 2012-11-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170412 Termination date: 20210331 |