CN102738118B - 半导体器件 - Google Patents

半导体器件 Download PDF

Info

Publication number
CN102738118B
CN102738118B CN201210092828.5A CN201210092828A CN102738118B CN 102738118 B CN102738118 B CN 102738118B CN 201210092828 A CN201210092828 A CN 201210092828A CN 102738118 B CN102738118 B CN 102738118B
Authority
CN
China
Prior art keywords
layer
line
via layer
ground
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201210092828.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN102738118A (zh
Inventor
泽田宪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of CN102738118A publication Critical patent/CN102738118A/zh
Application granted granted Critical
Publication of CN102738118B publication Critical patent/CN102738118B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5384Conductive vias through the substrate with or without pins, e.g. buried coaxial conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/535Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including internal interconnections, e.g. cross-under constructions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76898Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics formed through a semiconductor substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/481Internal lead connections, e.g. via connections, feedthrough structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/03Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
    • H01L25/0657Stacked arrangements of devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6616Vertical connections, e.g. vias
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6627Waveguides, e.g. microstrip line, strip line, coplanar line
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/04All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same main group of the same subclass of class H10
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06527Special adaptation of electrical connections, e.g. rewiring, engineering changes, pressure contacts, layout
    • H01L2225/06537Electromagnetic shielding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/04All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same main group of the same subclass of class H10
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06541Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
    • H01L2225/06544Design considerations for via connections, e.g. geometry or layout
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222Capacitive arrangements or effects of, or between wiring layers
    • H01L23/5225Shielding layers formed together with wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528Layout of the interconnection structure
    • H01L23/5286Arrangements of power or ground buses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/552Protection against radiation, e.g. light or electromagnetic waves
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
CN201210092828.5A 2011-04-11 2012-03-31 半导体器件 Expired - Fee Related CN102738118B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011087048A JP5842368B2 (ja) 2011-04-11 2011-04-11 半導体装置
JP2011-087048 2011-04-11

Publications (2)

Publication Number Publication Date
CN102738118A CN102738118A (zh) 2012-10-17
CN102738118B true CN102738118B (zh) 2017-04-12

Family

ID=46965465

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201210092828.5A Expired - Fee Related CN102738118B (zh) 2011-04-11 2012-03-31 半导体器件

Country Status (3)

Country Link
US (2) US8786061B2 (enExample)
JP (1) JP5842368B2 (enExample)
CN (1) CN102738118B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2991108A1 (fr) * 2012-05-24 2013-11-29 St Microelectronics Sa Ligne coplanaire blindee
CN206976318U (zh) * 2014-11-21 2018-02-06 株式会社村田制作所 模块
FR3029301B1 (fr) * 2014-12-01 2017-01-06 Commissariat Energie Atomique Procede de fabrication d'un guide d'onde incluant une jonction semiconductrice
CN105187089B (zh) * 2015-08-24 2018-07-06 小米科技有限责任公司 信号传输装置及终端
US10410939B2 (en) * 2015-12-16 2019-09-10 Intel Corporation Package power delivery using plane and shaped vias
JP6866789B2 (ja) * 2017-07-11 2021-04-28 富士通株式会社 電子デバイス、及び、電子デバイスの製造方法
JP6845118B2 (ja) * 2017-10-25 2021-03-17 株式会社Soken 高周波伝送線路
KR102777475B1 (ko) 2019-10-17 2025-03-10 에스케이하이닉스 주식회사 반도체 패키지
US11302645B2 (en) * 2020-06-30 2022-04-12 Western Digital Technologies, Inc. Printed circuit board compensation structure for high bandwidth and high die-count memory stacks
US20250038388A1 (en) * 2021-12-21 2025-01-30 Fujikura Ltd. Transmission line
US12334442B2 (en) 2022-08-31 2025-06-17 International Business Machines Corporation Dielectric caps for power and signal line routing

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08125412A (ja) * 1994-10-19 1996-05-17 Mitsubishi Electric Corp 伝送線路,及びその製造方法
US6307252B1 (en) * 1999-03-05 2001-10-23 Agere Systems Guardian Corp. On-chip shielding of signals
JP4734723B2 (ja) * 2001-01-31 2011-07-27 凸版印刷株式会社 同軸ビアホールを用いた多層配線基板の製造方法
JP3561747B2 (ja) * 2001-03-30 2004-09-02 ユーディナデバイス株式会社 高周波半導体装置の多層配線構造
JP2004363975A (ja) * 2003-06-05 2004-12-24 Matsushita Electric Ind Co Ltd 高周波回路
DE102004060345A1 (de) * 2003-12-26 2005-10-06 Elpida Memory, Inc. Halbleitervorrichtung mit geschichteten Chips
JP4383939B2 (ja) * 2004-03-29 2009-12-16 シャープ株式会社 伝送線路形成方法、伝送線路、半導体チップおよび半導体集積回路ユニット
JP4441328B2 (ja) * 2004-05-25 2010-03-31 株式会社ルネサステクノロジ 半導体装置及びその製造方法
DE102005008195A1 (de) * 2005-02-23 2006-08-24 Atmel Germany Gmbh Hochfrequenzanordnung
US20060255434A1 (en) * 2005-05-12 2006-11-16 Yinon Degani Shielding noisy conductors in integrated passive devices
US20060264029A1 (en) * 2005-05-23 2006-11-23 Intel Corporation Low inductance via structures
CN100559574C (zh) * 2005-08-26 2009-11-11 皇家飞利浦电子股份有限公司 电屏蔽穿通晶片互连和其制造方法及检测元件和检测设备
WO2007138895A1 (ja) * 2006-05-25 2007-12-06 National Institute Of Advanced Industrial Science And Technology 同軸型ビア接続構造およびその製造方法
JP4735614B2 (ja) * 2007-07-26 2011-07-27 セイコーエプソン株式会社 回路基板
US8028406B2 (en) * 2008-04-03 2011-10-04 International Business Machines Corporation Methods of fabricating coplanar waveguide structures
JP5985136B2 (ja) 2009-03-19 2016-09-06 ソニー株式会社 半導体装置とその製造方法、及び電子機器
US8487430B1 (en) * 2010-01-21 2013-07-16 Semtech Corporation Multi-layer high-speed integrated circuit ball grid array package and process
US7999361B1 (en) * 2010-02-19 2011-08-16 Altera Corporation Shielding structure for transmission lines
US9087840B2 (en) * 2010-11-01 2015-07-21 Taiwan Semiconductor Manufacturing Company, Ltd. Slot-shielded coplanar strip-line compatible with CMOS processes
US8912581B2 (en) * 2012-03-09 2014-12-16 Taiwan Semiconductor Manufacturing Co., Ltd. 3D transmission lines for semiconductors
US8912634B2 (en) * 2012-03-29 2014-12-16 International Business Machines Corporation High frequency transition matching in an electronic package for millimeter wave semiconductor dies

Also Published As

Publication number Publication date
JP5842368B2 (ja) 2016-01-13
US20120256318A1 (en) 2012-10-11
US20140264939A1 (en) 2014-09-18
US9343410B2 (en) 2016-05-17
CN102738118A (zh) 2012-10-17
US8786061B2 (en) 2014-07-22
JP2012222182A (ja) 2012-11-12

Similar Documents

Publication Publication Date Title
CN102738118B (zh) 半导体器件
US9853002B2 (en) Semiconductor device
TWI463933B (zh) 多層配線基板
US8704627B2 (en) Inductor element, integrated circuit device, and three-dimensional circuit device
US9437535B2 (en) Wireless module and production method for wireless module
JP2008524845A (ja) スルーコネクションを含む高周波用多層プリント回路基板
CN103650132B (zh) 无线模块
JP2009070969A (ja) キャパシタ内蔵基板及びその製造方法
US20130286620A1 (en) Package with Integrated Pre-Match Circuit and Harmonic Suppression
JP5789701B1 (ja) 伝送モード変換装置
TW201503482A (zh) 電子電路及電子機器
US20180174906A1 (en) Semiconductor device and method of manufacturing the same, and stacked semiconductor device
CN105244367A (zh) 衬底结构及其制造方法
JP2012084723A (ja) 半導体装置
CN104981087B (zh) 信号传输线结构及其应用的电子装置
TWI533500B (zh) 信號傳輸線結構及其應用之電子裝置
TWI467722B (zh) 用於阻抗匹配及電性互連的矽穿孔結構
US8385084B2 (en) Shielding structures for signal paths in electronic devices
US20110241803A1 (en) Signal transmission line
US8975737B2 (en) Transmission line for electronic circuits
CN108011178B (zh) 一种基于硅通孔的三维结构差分片上天线
JP4885618B2 (ja) 高周波回路チップの実装構造を有した電子装置
JP2013093521A (ja) 差動伝送線路および多層配線基板

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170412

Termination date: 20210331