CN102738103B - 短的和低的回路丝线键合 - Google Patents
短的和低的回路丝线键合 Download PDFInfo
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- CN102738103B CN102738103B CN201210028228.2A CN201210028228A CN102738103B CN 102738103 B CN102738103 B CN 102738103B CN 201210028228 A CN201210028228 A CN 201210028228A CN 102738103 B CN102738103 B CN 102738103B
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- bond pads
- length
- silk thread
- salient point
- semiconductor element
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- Wire Bonding (AREA)
Abstract
本发明涉及短的和低的回路丝线键合,公开了一种多管芯封装,该多管芯封装包括各自具有其上布置有多个键合焊垫的上表面的第一半导体管芯和第二半导体管芯。第二半导体管芯的上表面可以是与第一半导体管芯的上表面一起基本上共同延伸的并且基本上沿平面延伸。多管芯封装还包括多根键合丝线,每根键合丝线将在第一半导体管芯的上表面上的键合焊垫之一耦接至在第二半导体管芯的上表面上的对应的一个键合焊垫。该多根键合丝线中的键合丝线具有布置于平面上方的一高度处的扭折,布置于第一半导体管芯与扭折之间的第一凸点,以及布置于第二半导体管芯与扭折之间的第二凸点。
Description
技术领域
本发明一般地涉及半导体封装,并且更特别地涉及在半导体封装中的处于基本上相同的高度或层级(level)上的触点之间的丝线键合。
背景技术
半导体封装的一方面涉及丝线键合工艺。常规的丝线键合工艺可以使用导电丝线来将半导体管芯(die)连接到引线框的引线。这允许半导体管芯与外部系统电通信。丝线键合工艺典型地产生在导电丝线中的回路。回路的高度确定着半导体封装的容许厚度。
半导体封装正不断地被设计成更加紧凑。这能够通过使用多管芯封装,减小封装的厚度,和/或最小化封装的尺寸来实现。回路高度影响这些选项中的每一个选项。
减小在处于不同层级的触点之间的回路高度的常规方法可以包括将键合丝线向下拉。但是,这会增加键合丝线中的应力,并且能够导致在球键(ball bond)附近的破裂或开裂。其它方法包括在键合丝线中形成折叠的回路或者在键合丝线的颈部上形成凹陷。但是,这些方法的质量难以评估,并且它们一般会降低丝线的强度。一种已经取得一定成功应用的方法包括在较高的触点上形成第一球键,然后使用球键将键合丝线附接于较低的触点,并且然后使用针脚式键合将键合丝线附接于较高的触点。
对于处于同一高度或层级的触点,通常通过将键合丝线向下拉来降低回路高度。但是,如上文所解释的,这会增加在键合丝线中的应力并且能够导致在球键附近的破裂或开裂。该应力能够通过使触点分得更开以及延长键合丝线来减小。但是,这会增加封装的横向尺寸和大小。已经用来在连接处于不同层级的触点时降低回路高度的其它方法未能提供与结合在处于同一高度或层级的触点来使用的方法相同的好处。
因此,需要在不增加丝线长度的情况下降低用来连接处于同一高度或层级的触点的键合丝线的回路高度。
发明内容
本发明的实施例在半导体封装中提供处于基本上相同高度的触点之间的短的和低的回路丝线键合。例如,根据一种实施例,多管芯封装包括管芯焊垫(pad)以及布置于管芯焊垫上的第一半导体管芯。第一半导体管芯可以包括在其上具有第一多个键合焊垫的上表面。多管芯封装还包括布置于管芯焊垫上的第二半导体管芯。第二半导体管芯可以包括在其上具有第二多个键合焊垫的上表面。第二半导体管芯的上表面可以是与第一半导体管芯的上表面一起基本上共同延伸的并且基本上沿平面延伸。多管芯封装还包括多根键合丝线,每根键合丝线将在第一半导体管芯的上表面上的第一多个键合焊垫中的一个键合焊垫耦接至在第二半导体管芯的上表面上的第二多个键合焊垫中的对应一个键合焊垫。该多根键合丝线中的键合丝线可以具有布置于平面上方的一高度处的扭折(kink),布置于第一半导体管芯与扭折之间的第一凸点(hump),以及布置于第二半导体管芯与扭折之间的第二凸点。第一凸点的第一高度和第二凸点的第二高度可以各自都大于在平面上方的扭折的高度。
根据另一种实施例,半导体封装包括布置于第一上表面上的第一键合焊垫以及布置于第二上表面上的第二键合焊垫。第一上表面可以与第二上表面横向间隔开并且是与第二上表面一起基本上共同延伸的。半导体封装还包括具有第一末端和第二末端的键合丝线。键合丝线的第一末端可以与第一键合焊垫耦接,并且键合丝线的第二末端可以与第二键合焊垫耦接。键合丝线包括从第二键合焊垫向上延伸到第一凸点的第一长度,以及与第一长度耦接于第一凸点的第二长度。第二长度从第一凸点向下延伸到扭折。扭折被布置于第一上表面和第二上表面的上方。键合丝线还包括与第二长度耦接于扭折处的第三长度。第三长度从扭折向上延伸到第二凸点。键合丝线还包括与第三长度耦接于第二凸点的第四长度。第四长度从第二凸点向下延伸到第一键合焊垫。
根据又一种实施例,将键合丝线的第一末端耦接至第一键合焊垫并且将键合丝线的第二末端耦接至第二键合焊垫的方法包括使用键合丝线的一部分在第二键合焊垫上形成球键。该方法还包括形成键合丝线的第一长度,其中该第一长度与球键耦接并且在键合丝线中向上延伸到第一凸点处。该方法还包括形成键合丝线的与第一长度耦接于第一凸点的第二长度。第二长度在键合丝线中从第一凸点向下延伸到扭折。扭折被布置于第一键合焊垫的上表面和第二键合焊垫的上表面上方的一高度处。该方法还包括形成键合丝线的与第二长度耦接于扭折处的第三长度。第三长度在键合丝线中从扭折向上延伸到第二凸点。该方法还包括形成键合丝线的与第三长度耦接于第二凸点的第四长度。第四长度从第二凸点向下延伸到布置于第一键合焊垫上的第一球键。该方法还包括将第四长度耦接至第一球键。
与常规的丝线键合技术相比,使用本发明的实施例可获得众多好处。例如,在一种实施例中,形成于处于同一高度或层级的两个触点之间的键合丝线包括在扭折的每一侧的凸点。这降低了回路高度并且使半导体封装的厚度得以减小。这同样减小了在键合丝线中的应力。取决于该实施例,这些好处中的一个或多个可以存在。这些及其它好处将在下文更全面地描述。
附图说明
图1是根据本发明的一种实施例的用于电连接处于同一层级的两个表面的键合丝线的简化图;
图2是根据本发明的另一种实施例的用于电连接处于同一层级的两个表面的键合丝线的简化图;
图3是示出在根据本发明的另一种实施例的键合丝线的形成期间由毛细管所跟随的路径的简化图;
图4是根据本发明的一种实施例的键合丝线的简化图;
图5A-5L是示出在根据本发明的一种实施例的键合丝线的形成期间毛细管的各种位置和丝线的各种形状的简化图;
图6是示出在根据本发明的一种实施例的球键的形成期间由毛细管所跟随的路径的简化图;
图7A-7H是示出在根据本发明的一种实施例的球键的形成期间毛细管的各种位置的简化图;
图8是根据本发明的一种实施例的示例性键合丝线的放大图像;以及
图9是示出根据本发明的一种实施例的用于将键合丝线的第一末端耦接至第一键合焊垫以及将键合丝线的第二末端耦接至第二键合焊垫的示例性方法的简化流程图。
具体实施方式
本发明的实施例在半导体封装中提供处于基本上同一高度或层级的触点之间的丝线键合。一个或两个触点可以是在半导体管芯上的键合焊垫、在基板上的键合焊垫、引线框的引线等。例如,在一种实施例中,键合丝线将在第一半导体管芯上的键合焊垫与在第二半导体管芯上的键合焊垫连接。键合丝线可以包括在扭折的每一侧上的凸点,其中扭折低于凸点但高于所键合的表面。该键合丝线与常规的方法相比能够提供更低的回路高度、更短的丝线长度以及降低的应力。
图1是根据本发明的一种实施例的用于电连接处于同一高度或层级的两个表面的键合丝线的简化图。图1所示的布局可以存在于还可以包含密封剂材料(没有示出)的所组装的半导体封装中,或者该布局可以存在于半导体封装的组装阶段内。在本实例中的表面可以是键合焊垫106a、106b的上表面和/或半导体管芯108a、108b的上表面。注意,键合焊垫106a、106b,半导体管芯108a、108b以及管芯焊垫110a、110b的相对大小和形状为了图示起见而被放大。同样,键合焊垫106a、106b可以不凸出到在本申请所提供的实例中所示出的半导体管芯108a、108b的上表面之上。
如图1所示,键合丝线102延伸于球键104a、104b之间。球键104a、104b被键合于半导体管芯108a、108b各自的键合焊垫106a、106b,并且半导体管芯108a、108b被布置于各自的管芯焊垫110a、110b上。如同以下将更全面地解释的,可以使用球形针脚式键合(ballstitch bonding)将键合丝线102键合于键合焊垫106a,并且可以使用球形(或楔形)上的球形针脚式键合(ball stitch on ball(or wedge)bonding)将键合丝线102键合于键合焊垫106b。在本实例中,键合丝线102包括凸点112、116和扭折114。扭折114被布置于键合焊垫106a、106b的上表面以及半导体管芯108a、108b的上表面上方的,但在凸点112、116的最大高度下方的某一高度处。
如同在此所使用的,凸点一般指的是具有在每一侧向下延伸的(例如,下凹的)部分的扭折。凸点的拐点与触点的表面的距离比与丝线在凸点两侧的部分的距离大。
键合丝线102的形状通过将最大高度从键合丝线102中的单个点移动到凸点112、116中的一个凸点处来降低回路高度。通常,在键合焊垫106a的上表面上方的凸点112的高度将略微大于在键合焊垫106b的上表面上方的凸点116的高度。键合丝线102的形状还通过限制在球键104a、104b的下拉来减小应力。高度和应力的减小可在没有像传统技术那样增加键合丝线的长度的情况下得以实现。
键合丝线102可以包含许多导电元素。例如,在某些实施例中,键合丝线102包括金或铜中的至少一种。键合丝线102还可以是任意典型直径的。例如,在某些实施例中,键合丝线具有大约20μm的直径。
本领域技术人员应当意识到,半导体管芯可以包括多个键合焊垫,并且每个键合焊垫可以使用键合丝线来电耦接至另一半导体管芯的对应的键合焊垫或者电耦接至的引线框的对应引线。因而,典型的半导体封装可以包括多根与图1所示的键合丝线102相似的键合丝线。
图2是根据本发明的另一种实施例的用于电连接处于同一层级的两个表面的键合丝线的简化图。在本实例中,键合丝线202延伸于球键204a、204b之间并且连接键合焊垫206a、206b,并且半导体管芯208a、208b被布置于单个管芯焊垫210c上。能够从图2中看出,键合丝线202具有与图1中的键合丝线102相似的形状。键合丝线202包括在扭折的每一侧的凸点,其中该扭折被布置于键合焊垫206a、206b和半导体管芯208a、208b的上表面上方的,但是在凸点的最大高度下方的某一高度处。
图3是示出在根据本发明的另一种实施例的键合丝线的形成期间由毛细管所跟随的路径的简化图。该路径可以用来生产具有与图4所示的形状相似的形状的键合丝线。在图4中的键合丝线402延伸于球键404a、404b之间并且电连接半导体管芯408a、408b的键合焊垫406a、406b。半导体管芯408a、408b被布置于各自的管芯焊垫410a、410b上。
在本实例中,键合丝线402包括凸点412、416和扭折414、418。扭折418将键合丝线402在凸点416与球键404b之间的部分分隔成上部和下部。上部延伸于扭折418与凸点416之间。下部延伸于扭折418与球键404b之间。下部比上部更垂直地向上朝远离半导体管芯408b的上表面的方向延伸。这在半导体管芯408b的上表面与键合丝线402之间提供了额外的间隙。
图5A-5L是示出在根据本发明的一种实施例的键合丝线的形成期间毛细管的各种位置和丝线的各种形状的简化图。在图3所示的路径中示出的点A-K每个都参照图5A-5L来说明。如同本实例所示出的,键合丝线被形成于触点506a、506b之间。触点506a,506b可以是分别布置于管芯焊垫510a、510b上的半导体管芯508a,508b的键合焊垫。触点506a、506b的上表面处于基本上同一高度或层级并且因而是基本上共同延伸的。半导体管芯508a,508b的上表面同样处于基本上同一高度或层级并且因而是基本上共同延伸的。
如图5A所示,球键504b可以形成于触点506b上。用于形成球键504b的示例性方法的细节将在下文参照图6和7A-7H来提供。图5A还示出了延伸通过毛细管520的丝线526。毛细管520可以是更大的键合工具(为简便起见而没有示出)的一部分。根据已知的技术,延伸到毛细管520下方的丝线526的尾部使用电火花524来加热并熔化。电火花524一般称为电火炬(EFO)并且可以使用EFO棒(没有示出)来生成。EFO使丝线526的末端熔化以形成无空气球(FAB)522。
在图5B中,毛细管520被向下移动直到FAB 522与键合焊垫506a接触。可以根据已知的技术来施加超声能量和力以在触点506a上形成球键504a。
在图5C中,夹钳打开并且毛细管520被从球键504a基本上垂直地向上提高第一距离。毛细管520被从点A提高到点B(参见图3)。
在图5D中,毛细管520沿着朝向触点506b的方向横向移动了第二距离。毛细管520被从点B移动到点C(参见图3)。
在图5E中,毛细管520被基本上垂直地向上提高了第三距离。毛细管520被从点C移动到点D(参见图3)。如图5E所示,扭折(或凸点)512被形成于丝线526中。
在图5F中,毛细管520沿着朝向触点506b的方向横向并向下移动了第四距离。该毛细管被从点D移动点E(参见图3)。
在图5G中,毛细管520被基本上垂直地向上提高了第五距离。毛细管520被从点E移动到点F(参见图3)。如图5G所示,扭折514被形成于丝线526中。
在图5H中,毛细管520沿着远离触点506b的方向横向移动了第六距离。毛细管520被从点F移动到点G(参见图3)。
在图5I中,毛细管520首先沿着远离触点506b的方向横向并向下移动了第七距离。毛细管520然后沿着朝向触点506b的方向横向并向上移动了第八距离。这使毛细管520从点G移动到点H以及从点H移动到点I(参见图3)。在一种实施例中,点I处于与点G基本上相同的位置,以及第七距离与第八距离近似相同。如图5I所示,扭折(或凸点)516被形成于丝线526中。
在图5J中,毛细管520被基本上垂直地向上提高了第九距离。毛细管520被从点I移动到点J(参见图3)。如图5G所示,扭折518被形成于丝线526中。
在图5K中,毛细管520被向下移动到触点506b附近的位置。毛细管520被从点J移动到点K(参见图3)。在毛细管520内的夹钳可以在从点J移动到点K之前合上。在点K处,丝线526可以使用球形(或楔形)上的球形针脚式键合来连接到球键504b。
图5L示出了在图5A-5K所示出的步骤中形成的键合丝线。键合丝线包括凸点512、516和扭折514、518。使用这些步骤,键合丝线可以被形成为具有在触点506a,506b的上表面上方的不大于大约55μm的最大高度(h)(或者在半导体管芯508a、508b的上表面上方的不大于大约55μm的最大值h,如果触点506a、506b和半导体管芯508a、508b处于近似相同的层级)。与此相比,使用常规工艺的回路高度为大约150-200μm。
图6是示出在根据本发明的一种实施例的球键的形成期间由毛细管所跟随的路径的简化图。该路径可以被用来产生与图5A所示的球键504a相似的球键。图7A-7H是示出在根据本发明的一种实施例的球键的形成期间毛细管的各种位置的简化图。在图6所示的路径中示出的点A1-F1每个都参照图7A-7H来说明。
图7A示出了延伸通过毛细管720的丝线726。图7A还示出了触点706a、706b。触点706a、706b可以是分别布置于管芯焊垫710a、710b上的半导体管芯708a、708b的键合焊垫。
在图7B中,根据已知的技术,延伸至毛细管720下方的丝线726的尾部使用EFO 724来加热并熔化。EFO 724可以使用EFO棒728来生成。EFO使丝线726的末端熔化以形成无空气球722。
在图7C中,毛细管720被向下移动直到FAB 722与键合焊垫706b接触。可以根据已知的技术来施加超声能量和力以在触点706b上形成球键704b。
在图7D中,夹钳打开并且毛细管720被基本上垂直地向上提高了第一距离。毛细管720被从点A1提高到B1提高(参见图6)。第一距离为毛细管720的后续移动提供了足够的间隙。
在图7E中,毛细管720被横向移动了第二距离以偏离球键704b。毛细管720被从点B1移动到点C1移动(参见图6)。
在图7F中,毛细管720被向下移动了第三距离。毛细管720被从点C1移动到点D1(参见图6)。针脚形键(stitch bond)被形成于球键704b之上。
在图7G中,毛细管720被横向移动了第四距离。毛细管720被从点D1移动到点E1(参见图6)。在球键704b的颈部的丝线726可能在毛细管720从点B1移动到点C1以及从点C1移动到点D1时被弱化。
在图7H中,毛细管720被基本上垂直地向上提高了第五距离。毛细管720被从点E1移动到点F1(参见图6)。在毛细管720内的夹钳可以合上,并且丝线726可以被从球键704b上扯下,将球键704b留在触点706b上。
图8是根据本发明的一种实施例的示例性键合丝线的放大图像。在该图中示出的键合丝线可以使用图5A-5L所示的步骤来形成。在该图中示出的在右侧触点上的球键可以使用图7A-7H所示的步骤来形成。键合丝线包括在丝线的中心附近的扭折以及在扭折的每一侧的凸点。能够看出,在触点的上表面上方的键合丝线的最大高度位于凸点处,左侧的凸点略微高于右侧(left)的凸点。扭折被布置于触点的上表面上方的,但低于任一凸点的某一高度处。键合丝线使用球形(或楔形)上的球形针脚式键合来与布置于右侧触点上的球键连接。
图9是示出根据本发明的一种实施例的用于将键合丝线的第一末端耦接至第一键合焊垫以及将键合丝线的第二末端耦接至第二键合焊垫的示例性方法的简化流程图。第一键合焊垫的上表面可以是与第二键合焊垫的上表面一起基本上共同延伸的。该方法包括使用键合丝线的一部分来在第二键合焊垫上形成球键(902)。在一种实施例中,在将球键形成于第二键合焊垫上之前,在第一键合焊垫上形成第一球键。
该方法还包括形成键合丝线的第一长度,其中该第一长度与球键耦接并且在键合丝线中向上延伸至第一凸点(904)。该方法还包括形成键合丝线的与第一长度耦接于第一凸点的第二长度,其中该第二长度在键合丝线中从第一凸点向下延伸到扭折,以及该扭折被布置于第一键合焊垫的上表面和第二键合焊垫的上表面上方的一高度处(906)。该方法还包括形成键合丝线的与第二长度耦接于扭折的第三长度,其中该第三长度在键合丝线中从扭折向上延伸到第二凸点(908)。
该方法还包括形成键合丝线的与第三长度耦接于第二凸点的第四长度,其中第四长度从第二凸点向下延伸到布置于第一键合焊垫上的第一球键(910)。在一种实施例中,第四长度可以包括耦接于第二扭折的上部和下部,上部与第三长度耦接于第二凸点,以及下部与第一球键耦接。下部可以比上部更垂直地向上朝远离第一上表面的方向延伸。
该方法还包括将第四长度耦接至第一球键(912)。在一种实施例中,第四长度使用球形(楔形)上的球形针脚式键合来耦接至第一球键。
应当意识到,在图9中所示出的具体步骤提供了根据本发明的一种实施例的用于将键合丝线的第一末端耦接至第一键合焊垫以及将键合丝线的第二末端耦接至第二键合焊垫的特定方法。以上所概述的步骤可以由系统软件不断地重复。其它顺序的步骤同样可以根据可另选的实施例来执行。例如,以上所概述的步骤可以按照不同的顺序来执行。而且,在图9中所示出的个体步骤可以包括可以按照对该个体步骤适宜的各种顺序来执行的多个子步骤。而且,可以根据特定的应用来添加或去除另外的步骤。
应当指出,本发明的某些实施例可以由硬件、软件、固件、中间件(middleware)、微代码、硬件描述语言或者它们的任意组合来实现。当以软件、固件、中间件或微代码来实现时,用于执行必要的任务的程序代码或代码段可以存储于计算机可读的介质(例如,存储介质)中。处理器可以适用于执行必要的任务。术语“计算机可读的介质”包括但不限于:便携式的或固定的存储器件、光存储器件、SIM卡、其它智能卡以及能够存储、容纳或携带指令或数据的其它各种介质。
虽然本发明已经根据具体的实施例进行了描述,但是本领域技术人员应当清楚,本发明的范围不限于在此所描述的本实施例。例如,本发明的一种或多种实施例的特征在不脱离本发明的范围的情况下可以与其它实施例的一个或多个特征结合。因此,本说明书和附图应当被看作是说明性的,而不是限制性的。因而,本发明的范围不应参照以上描述来确定,而应当参照所附的权利要求书及等同权利要求书的全部范围来确定。
Claims (19)
1.一种多管芯封装,包括:
管芯焊垫;
布置于所述管芯焊垫上的第一半导体管芯,所述第一半导体管芯包括其上具有第一多个键合焊垫的上表面;
布置于所述管芯焊垫上的第二半导体管芯,所述第二半导体管芯包括其上具有第二多个键合焊垫的上表面,所述第二半导体管芯的所述上表面与所述第一半导体管芯的所述上表面共同延伸并且沿平面延伸;以及
多个键合丝线,每个所述键合丝线将所述第一半导体管芯的所述上表面上的所述第一多个键合焊垫中的一个键合焊垫耦接至所述第二半导体管芯的所述上表面上的所述第二多个键合焊垫中的对应的一个键合焊垫,所述多个键合丝线中的键合丝线具有布置于所述平面上方的一高度处的扭折,所述键合丝线具有布置于所述第一半导体管芯与所述扭折之间的第一凸点,以及布置于所述第二半导体管芯与所述扭折之间的第二凸点,所述第一凸点的第一高度和所述第二凸点的第二高度中的每一个大于在所述平面上方的所述扭折的所述高度,其中所述多个键合丝线的每个键合丝线包括:
从所述第二多个键合焊垫中的键合焊垫向上延伸到第一凸点的第一长度;
与所述第一长度耦接于所述第一凸点的第二长度,所述第二长度从所述第一凸点向下延伸到所述扭折,所述扭折被布置于所述第一半导体管芯的上表面和所述第二半导体管芯的上表面上方的一高度处;
与所述第二长度耦接于所述扭折处的第三长度,所述第三长度从所述扭折向上延伸到第二凸点;以及
与所述第三长度耦接于所述第二凸点的第四长度,所述第四长度从所述第二凸点向下延伸到所述第一多个键合焊垫中的键合焊垫,其中所述第四长度包括耦接于第二扭折的上部和下部,所述上部与所述第三长度耦接于所述第二凸点,并且所述下部与所述第一多个键合焊垫中的键合焊垫耦接,所述下部比所述上部更垂直地向上远离所述第一半导体管芯的上表面延伸。
2.根据权利要求1所述的多管芯封装,其中在所述平面上方的所述键合丝线的最大高度位于所述第一凸点处并且不大于55μm。
3.根据权利要求1所述的多管芯封装,其中在所述平面上方的所述键合丝线的最大高度位于所述第二凸点处并且不大于55μm。
4.根据权利要求1所述的多管芯封装,其中所述键合丝线的第一末端使用楔形键来与布置在所述第一半导体管芯的所述上表面上的键合焊垫上的第一球键进行键合。
5.根据权利要求4所述的多管芯封装,其中所述键合丝线的第二末端使用第二球键来与在所述第二半导体管芯的所述上表面上的键合焊垫键合。
6.一种多管芯封装,包括:
管芯焊垫,包括第一管芯焊垫和第二管芯焊垫,
所述第一管芯焊垫与所述第二管芯焊垫横向间隔开,
布置于所述第一管芯焊垫上的第一半导体管芯,所述第一半导体管芯包括其上具有第一多个键合焊垫的上表面;
布置于所述第二管芯焊垫上的第二半导体管芯,所述第二半导体管芯包括其上具有第二多个键合焊垫的上表面,所述第二半导体管芯的所述上表面与所述第一半导体管芯的所述上表面共同延伸并且沿平面延伸;以及
多个键合丝线,每个所述键合丝线将所述第一半导体管芯的所述上表面上的所述第一多个键合焊垫中的一个键合焊垫耦接至所述第二半导体管芯的所述上表面上的所述第二多个键合焊垫中的对应的一个键合焊垫,所述多个键合丝线中的键合丝线具有布置于所述平面上方的一高度处的扭折,所述键合丝线具有布置于所述第一半导体管芯与所述扭折之间的第一凸点,以及布置于所述第二半导体管芯与所述扭折之间的第二凸点,所述第一凸点的第一高度和所述第二凸点的第二高度中的每一个大于在所述平面上方的所述扭折的所述高度,所述多个键合丝线中的每个键合丝线包括:
从所述第二多个键合焊垫中的键合焊垫向上延伸到第一凸点的第一长度;
与所述第一长度耦接于所述第一凸点的第二长度,所述第二长度从所述第一凸点向下延伸到所述扭折,所述扭折被布置于所述第一半导体管芯的上表面和所述第二半导体管芯的上表面上方的一高度处;
与所述第二长度耦接于所述扭折处的第三长度,所述第三长度从所述扭折向上延伸到第二凸点;以及
与所述第三长度耦接于所述第二凸点的第四长度,所述第四长度从所述第二凸点向下延伸到所述第一多个键合焊垫中的键合丝线,其中所述第四长度包括耦接于第二扭折的上部和下部,所述上部与所述第三长度耦接于所述第二凸点,并且所述下部与所述第一多个键合焊垫中的键合焊垫耦接,所述下部比所述上部更垂直地向上远离所述第一半导体管芯的上表面延伸。
7.一种半导体封装,包括:
布置于第一上表面上的第一键合焊垫;
布置于第二上表面上的第二键合焊垫,所述第一上表面与所述第二上表面横向间隔开并且与所述第二上表面共同延伸;以及
具有第一末端和第二末端的键合丝线,所述键合丝线的所述第一末端与所述第一键合焊垫耦接,并且所述键合丝线的所述第二末端与所述第二键合焊垫耦接,所述键合丝线包括:
从所述第二键合焊垫向上延伸到第一凸点的第一长度;
与所述第一长度耦接于所述第一凸点的第二长度,所述第二长度从所述第一凸点向下延伸到扭折,所述扭折被布置于所述第一上表面和所述第二上表面上方的一高度处;
与所述第二长度耦接于所述扭折处的第三长度,所述第三长度从所述扭折向上延伸到第二凸点;以及
与所述第三长度耦接于所述第二凸点的第四长度,所述第四长度从所述第二凸点向下延伸到所述第一键合焊垫,其中所述第四长度包括耦接于第二扭折的上部和下部,所述上部与所述第三长度耦接于所述第二凸点,并且所述下部与所述第一键合焊垫耦接,所述下部比所述上部更垂直地向上远离所述第一上表面延伸。
8.根据权利要求7所述的半导体封装,其中在所述第一上平面和所述第二上平面上方的所述键合丝线的最大高度位于所述第一凸点处并且不大于55μm。
9.根据权利要求7所述的半导体封装,其中在所述第一上表面和所述第二上表面上方的所述键合丝线的最大高度位于所述第二凸点处并且不大于55μm。
10.根据权利要求7所述的半导体封装,其中所述第一长度使用球键来与所述第二键合焊垫耦接。
11.根据权利要求7所述的半导体封装,其中所述第四长度使用楔形键来与布置于所述第一键合焊垫上的球键耦接。
12.根据权利要求7所述的半导体封装,其中所述键合丝线的直径为20μm,并且所述键合丝线包括金或铜中的至少一种。
13.一种将键合丝线的第一末端耦接至第一半导体管芯上的第一键合焊垫以及将所述键合丝线的第二末端耦接至第二半导体管芯上的第二键合焊垫的方法,其中所述第一键合焊垫的上表面与所述第二键合焊垫的上表面共同延伸,所述方法包括:
使用所述键合丝线的一部分在所述第二键合焊垫上形成球键;
形成所述键合丝线的第一长度,所述第一长度与所述球键耦接并且在所述键合丝线中向上延伸到第一凸点处;
形成所述键合丝线的与所述第一长度耦接于所述第一凸点的第二长度,所述第二长度在所述键合丝线中从所述第一凸点向下延伸到扭折,所述扭折被布置于所述第一键合焊垫的所述上表面和所述第二键合焊垫的所述上表面上方的一高度处;
形成所述键合丝线的与所述第二长度耦接于所述扭折处的第三长度,所述第三长度在所述键合丝线中从所述扭折向上延伸到第二凸点;
形成所述键合丝线的与所述第三长度耦接于所述第二凸点的第四长度,所述第四长度从所述第二凸点向下延伸到布置于所述第一键合焊垫上的第一球键;以及
将所述第四长度耦接至所述第一球键,其中所述第四长度包括耦接于第二扭折的上部和下部,所述上部与所述第三长度耦接于所述第二凸点,并且所述下部与所述第一键合焊垫耦接,所述下部比所述上部更垂直地向上远离所述第一上表面延伸。
14.根据权利要求13所述的方法,还包括:
在将所述球键形成于所述第二键合焊垫上之前,在所述第一键合焊垫上形成所述第一球键;以及
将所述键合丝线扯下以将所述键合丝线与所述第一球键分离。
15.一种丝线键合方法,其中通过毛细管的丝线与第一键合焊垫耦接并且与第二键合焊垫耦接,所述方法包括以下步骤:
在所述第二键合焊垫上形成球键;
其后,在放出所述丝线的长度时:
将所述毛细管从所述球键垂直地向上提高第一距离;
其后,将所述毛细管沿着朝向所述第一键合焊垫的方向横向移动第二距离;
其后,将所述毛细管垂直地向上提高第三距离;
其后,将所述毛细管沿着朝向所述第一键合焊垫的方向横向并向下移动第四距离;
其后,将所述毛细管垂直地向上提高第五距离;
其后,将所述毛细管沿着远离所述第一键合焊垫的方向横向移动第六距离;
其后,将所述毛细管沿着远离所述第一键合焊垫的方向横向并向下移动第七距离;
其后,将所述毛细管沿着朝向所述第一键合焊垫的方向横向并向上移动第八距离;
其后,将所述毛细管垂直地向上提高第九距离;
其后,将所述毛细管沿着朝向所述第一键合焊垫的方向成弓形地向下移动;以及
其后,将所述丝线耦接至所述第一键合焊垫。
16.根据权利要求15所述的丝线键合方法,其中所述第七距离与所述第八距离相同。
17.根据权利要求15所述的丝线键合方法,其中形成所述球键包括使用电火炬来熔化所述丝线的末端以形成无空气球。
18.根据权利要求15所述的丝线键合方法,还包括:
在将所述球键形成于所述第二键合焊垫上之前,在所述第一键合焊垫上形成第一球键;以及
将所述丝线扯下以使所述丝线与在所述第一键合焊垫上的所述第一球键分离。
19.根据权利要求18所述的丝线键合方法,其中将所述丝线耦接至所述第一键合焊垫包括:形成在所述第一球键上的楔形键。
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MY152355A (en) | 2011-04-11 | 2014-09-15 | Carsem M Sdn Bhd | Short and low loop wire bonding |
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US20140374151A1 (en) * | 2013-06-24 | 2014-12-25 | Jia Lin Yap | Wire bonding method for flexible substrates |
TWI585927B (zh) * | 2014-02-21 | 2017-06-01 | 新川股份有限公司 | 半導體裝置的製造方法、半導體裝置以及打線裝置 |
US9165904B1 (en) * | 2014-06-17 | 2015-10-20 | Freescale Semiconductor, Inc. | Insulated wire bonding with EFO before second bond |
US9881891B1 (en) * | 2016-11-15 | 2018-01-30 | Asm Technology Singapore Pte Ltd | Method of forming three-dimensional wire loops and wire loops formed using the method |
US11502231B2 (en) * | 2017-11-28 | 2022-11-15 | Foshan Nationstar Optoelectronics Co., Ltd | Light-emitting diode device, LED lamp and method for machining conductive wire of LED device |
CN108493164A (zh) * | 2018-04-10 | 2018-09-04 | 同源微(北京)半导体技术有限公司 | 一种封装结构及其制作方法 |
US11152326B2 (en) * | 2018-10-30 | 2021-10-19 | Stmicroelectronics, Inc. | Semiconductor die with multiple contact pads electrically coupled to a lead of a lead frame |
CN111029266B (zh) * | 2019-11-22 | 2021-10-15 | 中国电子科技集团公司第十三研究所 | 一种制备钉头凸点的方法及钉头凸点 |
JP7293155B2 (ja) * | 2020-03-12 | 2023-06-19 | 株式会社東芝 | 半導体装置、及びワイヤボンディング方法 |
CN114005924B (zh) * | 2020-07-27 | 2024-06-14 | 佛山市国星光电股份有限公司 | 发光器件、背光灯条、背光模组及发光器件的制作方法 |
US11848297B2 (en) * | 2021-06-30 | 2023-12-19 | Texas Instruments Incorporated | Semiconductor device packages with high angle wire bonding and non-gold bond wires |
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JP3455092B2 (ja) | 1997-10-27 | 2003-10-06 | 株式会社新川 | 半導体装置及びワイヤボンディング方法 |
JP3741184B2 (ja) | 1998-07-27 | 2006-02-01 | 日本テキサス・インスツルメンツ株式会社 | 半導体装置 |
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CN101483163B (zh) * | 2008-01-07 | 2011-11-16 | 力成科技股份有限公司 | 窗口型球格阵列封装构造及其基板 |
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JP5700927B2 (ja) | 2008-11-28 | 2015-04-15 | 新光電気工業株式会社 | 半導体装置及び半導体装置の製造方法 |
MY152355A (en) | 2011-04-11 | 2014-09-15 | Carsem M Sdn Bhd | Short and low loop wire bonding |
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US20120256314A1 (en) | 2012-10-11 |
CN103794586B (zh) | 2017-08-25 |
CN102738103A (zh) | 2012-10-17 |
US20130328194A1 (en) | 2013-12-12 |
US8946913B2 (en) | 2015-02-03 |
CN103794586A (zh) | 2014-05-14 |
MY152355A (en) | 2014-09-15 |
US8525352B2 (en) | 2013-09-03 |
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