CN102564611B - High-power laser wave front measuring instrument and wave front measuring method - Google Patents
High-power laser wave front measuring instrument and wave front measuring method Download PDFInfo
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Abstract
The invention discloses a high-power laser wave front measuring instrument and a wave front measuring method, and solves the problems of single-beam laser wave front analysis and phase difference measurement of two arbitrary beams of laser in multi-beam high-power laser coherent combination. The measuring instrument comprises a mechanical shutter, a light beam sampling reflecting mirror, a laser compressing optical system, a transmission-type attenuator, a reflection-type attenuator, a Hartmann wave front analyzer, a phase difference detecting charge coupled device (CCD) camera, and a computer. When the measuring instrument works, the mechanical shutter is opened only during the wave front measurement. The measuring method includes the steps of using the Hartmann wave front analyzer for measuring the wave front of each single-beam laser and simultaneously using the phase difference detecting CCD camera for recording the light distribution of each single-beam laser; taking one single-beam laser as a reference, opening other beams of laser in sequence to interfere with the referential laser respectively; using the phase difference detecting CCD camera for measuring the light intensity of each two beams of laser after the coherent combining so as to obtain phase differences of each beam of laser relative to the referential laser; and using the Hartmann wave front analyzer for measuring the wave front of the laser after the coherent combination.
Description
Technical field
The invention belongs to the laser technology fields of measurement, a kind of measuring system that solves the phase difference measurement of single channel laser wavefront analysis and any two-way laser in the multi-path large power Laser coherent combining specifically, this measuring system can solve power in other laser wave pre-test of myriawatt level.
Background technology
Improving the front performance of laser wave is to improve the important means of laser beam quality, and therefore, the laser wavefront properties is a technical indicator of laser performance, is also an evaluation index of beam quality.
For high-power laser device, the wavefront distortion of shoot laser and atmospheric turbulence effect can be to the near field of light beam qualities, and focus characteristics and Laser Transmission ability exert an influence.Therefore, medium-high frequency position phase distortion is suppressed and is compensated to become the key that guarantees laser beam quality, and the laser wave front-distortion compensatory device based on adaptive optical technique is that to take accurate detection laser wavefront properties be prerequisite, so before the accurate detection laser wave, tool is of great significance.
Along with the development of Beam Wave-Front Detection Techniques, various wavefront analysis instrument arise at the historic moment.Can be divided into two classes measuring principle: a class is according to geometric optical theory, measures wavefront geometrical aberration or face shape error, mainly contains Hartmann's one Shack (Hartmann-Shack) wavefront analysis instrument, curvature analysis instrument and Pyramid wavefront analysis instrument; The another kind of interferometric principle that is based on, before probing wave, the interference capability of different piece, to obtain wavefront information, mainly contains shearing interferometer wavefront analysis instrument and phase place and obtains analyser.And combine with the microelectric technique binary optical technique that grows up of optics is made the maturation of microarray lens method, ccd sensor is combined with dexterous microarray lens and corresponding computer technology, make the Shack-Hartmann method produce breakthrough, this just provides new approaches for development high power laser wavefront measurement system.
The advantage of traditional shearing interferometer is the reference optical surface that can save standard, simple and stable structure.Its weakness is comparatively responsive to measurement environment, and the conoscope image interpretation formed after shearing is more difficult, and wave front restoration is loaded down with trivial details, is difficult to be applicable to the high precision detection on heavy caliber diffraction limit corrugated, generally is used for detecting differing of optical instrument.Curvature wavefront analysis instrument structure is relatively simple, Pyramid (rectangular pyramid) wavefront analysis instrument is as a kind of novel wavefront detecting element, the wavefront analysis instrument traditional with other compared higher sensitivity, but technical development is still immature, can't meet general engineering application.At present, for above-mentioned existing wavefront measurement system, be difficult to be applicable to the large-caliber laser corrugated and can not meet other high power laser wavefront measurement of myriawatt level, needing the corresponding surveying instrument of development to meet wavefront measurement in this case.
Summary of the invention
The technical problem to be solved in the present invention is not to be suitable for large-caliber laser corrugated and the deficiency that meets other high power laser wavefront measurement of myriawatt level for traditional wavefront analysis instrument, and provide a kind of high power laser wavefront measurement instrument and measuring method, the phase difference measurement of single channel laser wavefront analysis and any two-way laser in solution multi-path large power Laser coherent combining.
The scheme of technical solution problem of the present invention is: the measuring instrument provided is comprised of optical system and measuring system.Described optical system is comprised of mechanical shutter, beam sampling catoptron, contracting beam optics system, transmission-type attenuator and reflective attenuator, and measuring system surveys the CCD camera by Hartmann's wavefront analysis instrument, phase differential and computing machine forms.When described mechanical shutter is opened, laser beam is incident to the beam sampling catoptron with 10 ° of incident angles, by the beam sampling catoptron, the laser beam reflection is entered to contracting beam optics system, contracting beam optics system is compressed the large-caliber laser bundle, outgoing laser beam enters Hartmann's wavefront analysis instrument by the transmission-type attenuator respectively and is measured, enter phase differential detection CCD camera by reflective attenuator and measured, computer control Hartmann wavefront analysis instrument and phase differential are surveyed the work of CCD camera.Described beam sampling catoptron adopts the not fused quartz glass of plated film of surface, for the wedge form, is of a size of 165 * 160mm
2, Diagonal Dimension is 230mm, thickness is got 35mm.The Kepler telescope system that the structure of described contracting beam optics system is transmission-type, at the object focal point place of telescopic system, spatial filter filtering parasitic light is set, object lens are selected fused quartz glass, by two faces, formed, wherein first face is ellipsoid, second face is plane, and the diaphragm of telescopic system is located on ellipsoid, and the eyepiece of telescopic system is selected ordinary optical glass.Described transmission-type attenuator is comprised of three transmission-type wedge mirrors, and reflective attenuator is comprised of three reflective wedge mirrors, to reduce the absorption of element to high power laser.Described Hartmann's wavefront analysis instrument, based on Shack-Hartmann wavefront measurement method, has the advantages that measuring accuracy is high, spatial resolution is high and dynamic range is large.Phase differential is surveyed the CCD camera and is obtained the view picture interferogram, can utilize digital image processing techniques to do careful processing to interferogram.Described computer control Hartmann wavefront analysis instrument and phase differential are surveyed the work of CCD camera, and the function of realization comprises: system control, image acquisition, wavefront reconstruction and phase difference calculating.
The step that the measuring method of utilizing high power laser wave pre-test instrument of the present invention is carried out wavefront measurement is as follows:
1) in measuring instrument when work,, mechanical shutter is only opened when wavefront measurement, to be less than or equal to the speed operation of 1/100 second, makes measuring instrument with pulse mode work;
2) the synthetic Ge road laser instrument that will be concerned with is opened respectively, with Hartmann's wavefront analysis instrument, carries out Measurement and analysis before to each single channel laser wave, simultaneously with the light distribution of each single channel laser of phase differential detection CCD cameras record;
3), using a road laser as benchmark, open successively other each road laser and interfere with reference laser respectively;
4) survey the light intensity after the CCD camera is measured every two-way Laser coherent combining with phase differential, calculate the phase differential of each road laser with respect to reference laser; Wavefront after simultaneously with Hartmann's wavefront analysis instrument, the two-way coherent laser being synthesized carries out Measurement and analysis.
The present invention is compared with the prior art has following effect:
1) the present invention can realize that bore is 150 * 150mm
2the large-caliber laser bundle and the measurement of other high power laser wavefront of power Da Wanwa level, and measuring instrument operation is clear simple, speed of detection is fast, intuitively the front information parameter of disclosing solution.
2) wavefront measurement method of the present invention can solve single channel laser wavefront analysis and the phase difference measurement of two-way laser arbitrarily in the multi-path large power Laser coherent combining.
3) the present invention is by selecting the reasonable constituents of mechanical shutter, optical sampling catoptron and attenuator, when can guaranteeing higher measuring accuracy, solve high power laser and irradiated for a long time the wavefront measurement instrument, cause thermal deformation and the fire damage problem of optical element, guarantee the effective attenuation of high power laser power.
4) measuring instrument of the present invention for realize to more powerful expansion with in the infrared and expansion far infrared wavelength lay a good foundation.
The accompanying drawing explanation
Fig. 1 measuring instrument of the present invention forms schematic diagram;
Fig. 2 measuring method process flow diagram of the present invention;
Fig. 3 Shack-Hartmann wavefront analysis instrument schematic diagram;
Fig. 4 standard flat ripple incides single lenticular situation;
Fig. 5 incides single lenticular situation at the corrugated of distorting;
Fig. 6 contracting beam optics systematic schematic diagram;
Fig. 7 transmission-type attenuator structure figure;
The reflective attenuator structure figure of Fig. 8;
Fig. 9 goggle structure;
The wave aberration of Figure 10 contracting beam optics system object lens.
Embodiment
Below in conjunction with accompanying drawing, detailed, complete description measuring principle of the present invention, system architecture and specific works process.
1, system architecture of the present invention and specific works process are as follows:
With reference to Fig. 1, measuring instrument of the present invention comprises: mechanical shutter 1, beam sampling catoptron 2, contracting beam optics system 3, transmission-type attenuator 4, reflective attenuator 6, Hartmann's wavefront analysis instrument 5, phase differential are surveyed CCD camera 7 and computing machine 8.1 of mechanical shutter is opened when wavefront measurement, makes measuring instrument with pulse mode work, avoids high power laser to cause the thermal deformation of measuring system optical element, affects measuring accuracy.2 pairs of high power lasers of beam sampling catoptron carry out attenuation of the first kind, the laser beam reflection is entered to contracting beam optics system 3, contracting beam optics system 3, by the compression of large-caliber laser bundle, makes outgoing beam bore and Hartmann's wavefront analysis instrument 5 and phase differential survey the bore coupling of CCD camera 7.Very strong from contracting beam optics system 3 emitting laser bundles, need to further decay through attenuator, outgoing laser beam enters Hartmann's wavefront analysis instrument 5 through 4 decay of transmission-type attenuator and is measured, outgoing laser beam enters phase differential detection CCD camera 7 through reflective attenuator 6 decay and is measured, computing machine 8 is controlled the work of Hartmann's wavefront analysis instrument 5 and phase differential detection CCD camera 7, completion system control, image acquisition, wavefront reconstruction and phase difference calculating function.
In conjunction with Fig. 2, the multi-path laser synthetic wavefront measurement method that is concerned with is described:
1) in measuring instrument when work,, 1 of mechanical shutter is opened when wavefront measurement, to be less than or equal to the speed operation of 1/100 second, makes measuring instrument with pulse mode work;
2) the synthetic Ge road laser that will be concerned with is opened respectively, with Hartmann's wavefront analysis instrument 5, respectively to before each single channel laser wave, carrying out Measurement and analysis, records respectively the light intensity distributions of each single channel laser with phase differential detection CCD camera 7 simultaneously;
3), then using a road laser as benchmark, open successively other each road laser and interfere with reference laser respectively;
4) survey the light intensity after CCD camera 7 is measured every two-way Laser coherent combining with phase differential, calculate Phase Difference Principle according to direct method and obtain the phase differential of each road laser with respect to reference laser, the wavefront after simultaneously synthesizing with 5 pairs of two-way coherent lasers of Hartmann's wavefront analysis instrument carries out Measurement and analysis.
For example, if the measurement of three road Laser coherent combinings: for convenience of explanation, Dui Ge road laser is numbered respectively 1 tunnel, 2 tunnels, 3 tunnels, carry out Measurement and analysis before the laser wave of Dui Ge road respectively with Hartmann's wavefront analysis instrument, survey with phase differential the light intensity distributions that the CCD camera records respectively each road laser simultaneously; Using arbitrary road laser wherein as benchmark, suppose to using that 1 road laser is as benchmark, opening 2 road laser and reference light interferes, survey the light intensity after the CCD camera is measured the two-way Laser coherent combining with phase differential, calculate the phase differential of 2 road laser with respect to reference laser, the wavefront after simultaneously with Hartmann's wavefront analysis instrument, the two-way coherent laser being synthesized carries out Measurement and analysis; Opening 3 road laser and reference light interferes, survey the light intensity after the CCD camera is measured the two-way Laser coherent combining with phase differential, calculate the phase differential of 3 road laser with respect to reference laser, the wavefront after simultaneously with Hartmann's wavefront analysis instrument, the two-way coherent laser being synthesized carries out Measurement and analysis; Light beam after 1 road laser and 2 road Laser coherent combinings and 3 road Laser coherent combinings can also be obtained to the relevant synthetic light of three beams of laser, survey the CCD camera with Hartmann's wavefront analysis instrument and phase differential simultaneously and measure accordingly.Using the same method can also be to four road laser, five road laser, the even more multi-path laser synthetic measurement that is concerned with.
2, in the present invention, the front analysis principle of single channel laser wave is as follows:
With Hartmann's wavefront analysis instrument, measured before to each single channel laser wave, the Shack-Hartmann analyser is to consist of lenticule and photoelectric sensor, is a kind of wavefront measurement instrument based on slope measurement.As shown in Figure 3 and Figure 4, microlens array is divided into many sub-apertures by input aperture to the principle of Shack-Hartmann wavefront analysis instrument, and focuses on ccd detector, forms a spot array.In advance with a branch of standard directional light, demarcate the original position of each hot spot, and preserved.When distorted wavefront is surveyed, the inclination of inciding every wavefront on sub-aperture will cause the movement of this sub-aperture facula position, amount of movement is proportional to wavefront slope and lenticular focal length, measure hot spot by ccd detector just can measure wavefront in this sub-aperture with respect to the displacement in the original position of prior demarcation and, at the slope of both direction, finally utilize the wave front restoration algorithm to reconstruct Wave-front phase by wavefront slope on two vertical direction.Can obtain the wavefront information parameter from the Wave-front phase of reconstruct, as P-V value and rms value and the zernike coefficient of Wave-front phase.
As mentioned above, each lenticule of microlens array is collected and is impinged upon the light on its aperture, and produces a hot spot on the ccd detector plane.Be illustrated in figure 5 wavefront and incide the situation on single lenticule.Only have when incident wavefront be plane and while being parallel to the lenslet plane, the rear of lens (black round dot) is just directly dropped in the position of hot spot.For the wavefront in the microlens region distortion, facula position will be offset at X and Y-direction (white round dot), so each hot spot will depart from its corresponding lenticular optical axis Z with the α angle.As shown in FIG., this angle [alpha] is identical with the angle between distorted wavefront and plane wave front.
Four parameters that affect Shack-Hartmann wavefront analysis instrument performance are lenticule quantity, dynamic area, measurement sensitivity and the lenticule focal lengths that cover detector aperture.Lenticular restricted number again the structure algorithm calculate reliably the maximum order of zernike coefficient.While needing to select lenticule quantity, should consider the amount of distortion (being that the actual wavefront aberration needs how many zernike coefficients ability Efficient Characterizations) of required simulation.
Measurement sensitivity θ
minminimum detectable facula deviation amount δ y
minfunction, as following formula:
θ
min＝δy
min/f (1)
F is lenticular focal length, θ
maxmeasuring of maximum detection amount phase place:
θ
max＝δy
min/f＝(d/2)/f (2)
D is lenticular diameter, and these two formula are all to have used small angle approximation.θ
minit is the minimum value by the wavefront slope of wavefront analysis instrument measurement.The skew δ y of I photometry spot
mindepend on the Pixel Dimensions of detector, the precision of center of circle algorithm and the signal to noise ratio (S/N ratio) of analyser.θ
maxbe the maximal value of the measurable wavefront slope of wavefront analysis instrument, it is equivalent to facula deviation δ y
max, equal lenticular radius.
The measuring accuracy of Shack-Hartmann wavefront analysis instrument (reliable measure required minimum wavefront slope) depends on that its accurately measures the ability of the skew of the hot spot that focuses on and its reference position.If hot spot and other hot spot partly overlap, or lenticular focal spot drops on beyond the zone of analyser appointment (hot spot intersection), and traditional algorithm can not correctly measure the home position of hot spot.Adopt special method to address this problem, but by the dynamic range of restriction analysis instrument.The lenticule of use major diameter or short focal length can increase the dynamic range of system.Can reduce the quantity of the zernike coefficient that can represent wavefront by increasing lenticular enlarged diameter dynamic range.On the contrary, increase by reducing focal length the sensitivity that dynamic range can reduce analyser.Ideally, when meeting dynamic range and measuring the sensitivity requirement, should use the lenticule of maximum focal length.
3, in the present invention, the principle of measurement two-way coherent light phase differential is as follows:
Direct method and process of heterodyning are to measure the common method of two-way coherent light phase differential.The heterodyne measurement precision is high, but need in the laser of relevant synthetic Ge road, insert measuring system, very high to the optical path adjusting requirement, and influential to relevant synthetic Ge road laser optical path.Direct method does not affect the light path of relevant synthetic Ge road laser, but measuring accuracy is lower than process of heterodyning, and can not judge the positive and negative of phase differential.Consider practical situations, the present invention adopts direct method to measure the phase differential of two-way laser.If the luminous power of two-way coherent laser is respectively I
1and I
2, the luminous power I after synthesizing is:
The phase differential that in formula, δ is the two-way coherent laser, as long as record I, I
1and I
2, can obtain phase differential δ:
4, the present invention estimates the luminous power of measuring system:
High power laser wavefront measurement system luminous power and power density everywhere is as shown in table 1, major parameter value when luminous power is estimated is: the incident angle of laser beam on sampling reflective mirror is 10 °, contracting beam optics system reduction magnification is 11 times, its transmitance position 93%, the percent of pass of transmission-type attenuator and reflective attenuator is 1.25 * 10
-7.
Luminous power in table 1 measuring system and power density
Annotate 1: the beam sampling reflectance of reflector is approximate gets 3.5%, consider the Multi reflection of beam sampling catoptron rear surface, also have part laser can enter contracting beam optics system (the most about 300W), but this part light can quilt contracting beam optics system stop, can not enter attenuator;
Annotate 2: the approximate reflectivity of getting the 1st high reflective mirror of transmission-type attenuator is 1.
5, the mechanical shutter opening time in the present invention realizes being less than or equal to the speed of 1/100 millisecond and can meet the measuring instrument requirement.
6, the beam sampling catoptron in the present invention adopts the not fused quartz glass of plated film of surface:
After the fused quartz glass surface coating, increased Interface Absorption, and the resisting laser damage energy force rate fused quartz glass substrate of optical thin film is far short of what is expected, when Ear Mucosa Treated by He Ne Laser Irradiation, optical thin film is failure at first, and then increases the absorption to follow-up laser, cause the destruction to fused quartz glass, be unfavorable for that the high power laser wavefront measurement system is measured the high power laser of 100 myriawatts in the future, in addition, optical thin film also can impact the surface precision on large-aperture optical surface.Therefore, fused quartz beam sampling mirror surface plated film not.When 45 ° of incident angles, s wave reflection rate is that 0.0801, p wave reflection rate is 0.0064, and during 10 ° of incident angles, s wave reflection rate is that 0.0351, p wave reflection rate is 0.0323.We get 10 ° of incident angles, and fused quartz beam sampling catoptron is of a size of 165 * 160mm
2, Diagonal Dimension is 230mm, thickness is got 35mm.Fused quartz beam sampling catoptron is the wedge pattern.
Fused quartz beam sampling catoptron bears maximum incident power in measuring system, below estimate the temperature variation of fused quartz beam sampling catoptron under high power laser illumination, if fused quartz beam sampling catoptron evenly absorbs, disregard the Gaussian distribution of laser beam intensity, have:
c
p·ρ·V·ΔT＝P·(1-R)·(1-T
in)·Δt (5)
In formula, specific heat c
pfor 0.79J/ (gK) (20-100 ℃), density p is 2.2g/cm
3, V is volume, and Δ T is temperature variation, and P is incident laser power, and R is surface reflectivity, T
infor the iuuminting rate, Δ t is the time shutter.Get P=10000W, R=3.5%, T
in=99.7% (the thick model of 35mm, 1060nm wavelength), mechanical shutter exposure time Δ t=1 second, can obtain temperature variation Δ T ≈ 0.02K by (5) formula, considers that the linear expansion coefficient α of fused quartz glass only has 0.5 * 10
-6/ K the order of magnitude, therefore, be 10000W in incident laser power, and in the situation that mechanical shutter exposure time is 1 second, the temperature deformation of fused quartz beam sampling catoptron can be ignored.
7, the contracting beam optics system principle in the present invention is as shown in Figure 6:
The bore of Hartmann's wavefront analysis instrument is 14.6 * 14.6mm
2, the bore of incoming laser beam is 150 * 150mm
2, the reduction magnification of getting contracting beam optics system is 11 times, the outgoing laser beam bore is 13.6 * 13.6mm
2, meet the requirement of Hartmann's wavefront analysis instrument to beam size.Can determine that according to the bore of incoming laser beam the aperture of objective lens of contracting beam optics system is 220mm, such bore transmission-type and reflective optical system can be realized.The Kepler telescope system of selective transmission formula of the present invention is as the version of contracting beam optics system, and at the object focal point place, spatial filter is set.Kepler system has the real image point to be convenient to debug, and can place diaphragm, suppresses parasitic light.The atmosphere breakdown threshold of Nd:YAG laser is roughly 10
10-10
12w/cm
2, the laser beam that will measure for us, can not puncture atmosphere at Kepler system object focal point place.
The object lens of contracting beam optics system are selected fused quartz glass, and wherein first face is aspheric surface (ellipsoid), and second face is plane, and diaphragm is located on first face.Table 2 provides the primary design result of contracting beam optics system object lens.Relative aperture
focal distance f '=2200mm, field angle ω=± 0.06 °.
Table 2 object lens optical design parameter
As shown in figure 10, on axle, the some wave aberration is less than the wave aberration of contracting beam optics system object lens
(P-V value), also be less than during 0.06 ° of field angle
(P-V value), can meet request for utilization.First face is revised as to high order aspheric surface, and image quality is not significantly improved, if relative aperture is changed into
image quality has clear improvement, but the tube length of contracting beam optics system is roughly in about 3.6m, and relative aperture is got at present
tube length is roughly in the 2.4m left and right.Consider image quality, debug technique and tube length factor, the relative aperture of contracting beam optics system object lens should
extremely
in scope, under the prerequisite that guarantees image quality, relative aperture is as far as possible larger, to shorten tube length.
The eyepiece bore is less, can select ordinary optical glass, adopts version as shown in Figure 9 to realize.
Because the lens barrel of contracting beam optics system is longer, in order to guarantee mechanical stability, adopt three stage structure, establish 4 supports, the eyepiece lens barrel has precision adjustment unit, to facilitate, debugs and uses.Under laboratory condition, use, the expansion factor that temperature variation causes can be ignored.
8, in the present invention the structure of transmission-type attenuator as shown in Figure 7, the structure of reflective attenuator as shown in Figure 8:
The transmission-type attenuator is comprised of three transmission-type wedge mirrors, to reduce the absorption of element to high power laser, the residue transmitance of every wedge mirror≤0.5%, the percent of pass of transmission-type attenuator≤1.25 * 10
-7.Consider integrally-built needs and real work situation, reflective attenuator is comprised of three reflective wedge mirrors, the reflectivity of every wedge mirror≤0.5%, the percent of pass of reflective attenuator≤1.25 * 10
-7.
9, the selection of Hartmann's wavefront analysis instrument in the present invention:
Select the HASO3-128 Hartmann wavefront analysis instrument of French Imaging Optics company, this wavefront analysis instrument, based on the Shack-Hartmann wavefront sensor principle, has the advantages that measuring accuracy is high, spatial resolution is high and dynamic range is large.The important technological parameters of HASO3-128 Hartmann wavefront analysis instrument comprises: aperture size is 14.6 * 14.6mm
2sub-aperture quantity is 128 * 128, dynamic range is greater than ± 3 ° (1500 λ), wavefront measurement precision (rms) is λ/100, operation wavelength is 350-1100nm, maximum operation frequency is 3.2Hz (FireWire), 7.5Hz (CameraLink), and working temperature is controlled at 15-30 ℃.
The process software system of HAS03-128 Hartmann wavefront analysis instrument can calculate P-V value and rms value and the zernike coefficient of Wave-front phase.
10, the selection of phase differential detection CCD camera in the present invention:
Phase differential is surveyed the CCD camera and is selected the photosurface size to be about 15 * 15mm
2model, the pixel number is 1024 * 1024 or 2048 * 2048, it is approximate that to get the sensitivity of CCD at the 1060nm place be 1V/ (μ J/cm
2), when be 10ms integral time, the amplitude output signal of CCD is about 0.219V, can meet the needs of detection.What phase differential detection CCD camera obtained is the view picture interferogram, can utilize digital image processing techniques to do careful processing to interferogram.
Claims (2)
1. a high power laser wavefront measurement instrument, be comprised of optical system and measuring system; It is characterized in that: described optical system is comprised of mechanical shutter (1), beam sampling catoptron (2), contracting beam optics system (3), transmission-type attenuator (4) and reflective attenuator (6); Described measuring system surveys CCD camera (7) by Hartmann's wavefront analysis instrument (5), phase differential and computing machine (8) forms; Described mechanical shutter (1) while opening laser beam be incident to beam sampling catoptron (2) with 10 ° of incident angles, by beam sampling catoptron (2), the laser beam reflection is entered to contracting beam optics system (3), contracting beam optics system (3) is compressed the large-caliber laser bundle, outgoing laser beam enters Hartmann's wavefront analysis instrument (5) by transmission-type attenuator (4) respectively and is measured, enter phase differential detection CCD camera (7) by reflective attenuator (6) and measured, computing machine (8) is controlled the work of Hartmann's wavefront analysis instrument (5) and phase differential detection CCD camera (7); Wherein beam sampling catoptron (2) adopts the not fused quartz glass of plated film of surface, for the wedge form, is of a size of 165 * 160mm
2, Diagonal Dimension is 230mm, thickness is got 35mm; The Kepler telescope system that the structure of contracting beam optics system (3) is transmission-type, at the object focal point place of telescopic system, spatial filter filtering parasitic light is set, object lens are selected fused quartz glass, by two faces, formed, wherein first face is ellipsoid, second face is plane, and the diaphragm of telescopic system is located on ellipsoid, and the eyepiece of telescopic system is selected ordinary optical glass; Transmission-type attenuator (4) is comprised of three transmission-type wedge mirrors; Reflective attenuator (6) is comprised of three reflective wedge mirrors.
2. the wavefront measurement method based on the described high power laser wavefront measurement of claim 1 instrument, its feature comprises the steps:
(2.1) in measuring instrument when work,, mechanical shutter (1) is only opened when wavefront measurement, to be less than or equal to the speed operation of 1/100 second, makes measuring instrument with pulse mode work;
(2.2) the synthetic Ge road laser instrument that will be concerned with is opened respectively, with Hartmann's wavefront analysis instrument (5), carries out Measurement and analysis, the light distribution of simultaneously with phase differential detection CCD camera (7), recording each single channel laser before to each single channel laser wave;
(2.3), using a road laser as benchmark, open successively other each road laser and interfere with reference laser respectively;
(2.4) survey the light intensity after CCD camera (7) is measured every two-way Laser coherent combining with phase differential, calculate the phase differential of each road laser with respect to reference laser; Wavefront after simultaneously using Hartmann's wavefront analysis instrument (5) synthetic to the two-way coherent laser carries out Measurement and analysis.
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| CN110455420B (en) * | 2019-07-11 | 2021-12-07 | 长春理工大学 | Wavefront measuring device |
| CN113720443A (en) * | 2020-05-26 | 2021-11-30 | 深圳市大族数控科技股份有限公司 | Laser power test system and test method |
| CN114879355A (en) * | 2021-02-05 | 2022-08-09 | 中国科学院苏州纳米技术与纳米仿生研究所 | Telescope structure and manufacturing method thereof |
| CN112859359B (en) * | 2021-02-05 | 2022-02-08 | 中国工程物理研究院激光聚变研究中心 | Focal spot control method |
| CN113790807A (en) * | 2021-08-25 | 2021-12-14 | 长春理工大学 | Hartmann wavefront detection device and method for laser communication optical system |
| CN117232785A (en) * | 2023-08-18 | 2023-12-15 | 青岛芯微半导体科技有限公司 | Device for improving optical wavefront error detection precision with controllable sub-optical path channel switch |
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| US6570143B1 (en) * | 1998-09-23 | 2003-05-27 | Isis Innovation Limited | Wavefront sensing device |
| CN101694544A (en) * | 2009-10-21 | 2010-04-14 | 中国科学院上海光学精密机械研究所 | Device for enhancing power density of focal spot of large light-spot laser system |
| CN101718590A (en) * | 2009-11-27 | 2010-06-02 | 中国科学院光电技术研究所 | Calibration device of self-adaption optical system based on far field performance indexes |
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- 2012-01-04 CN CN 201210001566 patent/CN102564611B/en not_active Expired - Fee Related
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6570143B1 (en) * | 1998-09-23 | 2003-05-27 | Isis Innovation Limited | Wavefront sensing device |
| CN101694544A (en) * | 2009-10-21 | 2010-04-14 | 中国科学院上海光学精密机械研究所 | Device for enhancing power density of focal spot of large light-spot laser system |
| CN101718590A (en) * | 2009-11-27 | 2010-06-02 | 中国科学院光电技术研究所 | Calibration device of self-adaption optical system based on far field performance indexes |
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