CN102564611A - High-power laser wave front measuring instrument and wave front measuring method - Google Patents
High-power laser wave front measuring instrument and wave front measuring method Download PDFInfo
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Abstract
The invention discloses a high-power laser wave front measuring instrument and a wave front measuring method, and solves the problems of single-beam laser wave front analysis and phase difference measurement of two arbitrary beams of laser in multi-beam high-power laser coherent combination. The measuring instrument comprises a mechanical shutter, a light beam sampling reflecting mirror, a laser compressing optical system, a transmission-type attenuator, a reflection-type attenuator, a Hartmann wave front analyzer, a phase difference detecting charge coupled device (CCD) camera, and a computer. When the measuring instrument works, the mechanical shutter is opened only during the wave front measurement. The measuring method includes the steps of using the Hartmann wave front analyzer for measuring the wave front of each single-beam laser and simultaneously using the phase difference detecting CCD camera for recording the light distribution of each single-beam laser; taking one single-beam laser as a reference, opening other beams of laser in sequence to interfere with the referential laser respectively; using the phase difference detecting CCD camera for measuring the light intensity of each two beams of laser after the coherent combining so as to obtain phase differences of each beam of laser relative to the referential laser; and using the Hartmann wave front analyzer for measuring the wave front of the laser after the coherent combination.
Description
Technical field
The invention belongs to the laser technology field of measurement; Specifically a kind of measuring system that solves the phase difference measurement of the synthetic middle single channel laser wavefront analysis of multi-path large power laser coherence and any two-way laser, this measuring system can solve power and before other laser wave of myriawatt level, measure.
Background technology
Improving the preceding performance of laser wave is to improve the important means of laser beam quality, and therefore, the laser wavefront properties is a technical indicator of laser performance, also is an evaluation index of beam quality.
To high-power laser device, the wavefront distortion of shoot laser and atmospheric turbulence effect can be to the near field of light beam qualities, and focus characteristics and Laser Transmission ability exert an influence.Therefore; Medium-high frequency position phase distortion is suppressed and compensates to become the key that guarantees laser beam quality; And be to be prerequisite with accurate exploring laser light wavefront properties based on the laser wave front-distortion compensatory device of adaptive optical technique, therefore accurately the exploring laser light wavefront has crucial meaning.
Along with the development of Beam Wave-Front Detection Techniques, various wavefront analysis appearance arise at the historic moment.On measuring principle, can be divided into two types: one type is according to geometric optical theory, measures wavefront geometrical aberration or face shape error, mainly contains Hartmann's one Shack (Hartmann-Shack) wavefront analysis appearance, curvature analysis appearance and Pyramid wavefront analysis appearance; The interference capability of different piece mainly contains shearing interferometer wavefront analysis appearance and phase place and obtains analyser to obtain wavefront information before the another kind of interferometric principle that is based on, probing wave.And combine with the microelectric technique binary optical technique that grows up of optics is made the maturation of microarray lens method; Ccd sensor combines with dexterous microarray lens and corresponding computer technology; Make the Shack-Hartmann method produce breakthrough, this just provides new approaches for development high power laser wavefront measurement system.
The advantage of traditional shearing interferometer is the reference optical surface that can save standard, simple and stable structure.Its weakness is comparatively responsive to measurement environment, shears relatively difficulty of conoscope image interpretation that the back forms, and wave front restoration is loaded down with trivial details, is difficult to be applicable to the high Precision Detection on heavy caliber diffraction limit corrugated, generally is used for the differing of detection optical instrument.Curvature wavefront analysis appearance structure is simple relatively; Pyramid (rectangular pyramid) wavefront analysis appearance is as a kind of novel wavefront detecting element; Comparing with other traditional wavefront analysis appearance has higher sensitivity, but technical development is still immature, can't satisfy general practical applications.At present, be difficult to be applicable to the large-caliber laser corrugated and can not satisfy other high power laser wavefront measurement of myriawatt level, need the corresponding surveying instrument of development to satisfy wavefront measurement in this case to above-mentioned existing wavefront measurement system.
Summary of the invention
The technical matters that the present invention will solve is not to be suitable for large-caliber laser corrugated and the deficiency that satisfies other high power laser wavefront measurement of myriawatt level to traditional wavefront analysis appearance; And a kind of high power laser wavefront measurement appearance and measuring method are provided, solve the phase difference measurement of the synthetic middle single channel laser wavefront analysis of multi-path large power laser coherence and any two-way laser.
The scheme of technical solution problem of the present invention is: the measuring instrument that is provided is made up of optical system and measuring system.Described optical system is made up of mechanical shutter, beam sampling catoptron, the beam optics system that contracts, transmission-type attenuator and reflective attenuator, and measuring system surveys the CCD camera by Hartmann's wavefront analysis appearance, phase differential and computing machine is formed.Laser beam was incident to the beam sampling catoptron with 10 ° of incident angles when said mechanical shutter was opened; By the beam sampling catoptron laser beam reflection is got into the beam optics system that contracts; The beam optics system that contracts compresses the large-caliber laser bundle; Outgoing laser beam gets into Hartmann's wavefront analysis appearance by the transmission-type attenuator respectively and measures, and gets into phase differential detection CCD camera by reflective attenuator and measures, and computer control Hartmann wavefront analysis appearance and phase differential are surveyed the work of CCD camera.Described beam sampling catoptron adopts the not fused quartz glass of plated film of surface, for the wedge form, is of a size of 165 * 160mm
2, Diagonal Dimension is 230mm, thickness is got 35mm.The structure of the described beam optics system that contracts is the Kepler telescope system of transmission-type; At the object focal point place of telescopic system spatial filter filtering parasitic light is set, object lens are selected fused quartz glass for use, are made up of two faces; Wherein first face is an ellipsoid; Second face is the plane, and the diaphragm of telescopic system is located on the ellipsoid, and the eyepiece of telescopic system is selected ordinary optical glass for use.Described transmission-type attenuator is made up of three transmission-type wedge mirrors, and reflective attenuator is made up of three reflective wedge mirrors, to reduce the absorption of element to high power laser.Described Hartmann's wavefront analysis appearance has measuring accuracy height, spatial resolution height and the big characteristics of dynamic range based on Shack-Hartmann wavefront measurement method.Phase differential is surveyed the CCD camera and is obtained the view picture interferogram, can utilize digital image processing techniques that interferogram is done careful processing.Described computer control Hartmann wavefront analysis appearance and phase differential are surveyed the work of CCD camera, and the function of realization comprises: system's control, IMAQ, wavefront reconstruction and phase difference calculating.
The step that the measuring method of utilizing high power laser wavefront measurement appearance of the present invention is carried out wavefront measurement is following:
1) in measuring instrument when work,, mechanical shutter is only opened when wavefront measurement, with smaller or equal to 1/100 second speed operation, makes measuring instrument with pulse mode work;
Each road laser instrument that 2) will be concerned with synthetic is opened respectively, carries out Measurement and analysis with Hartmann's wavefront analysis appearance before to each single channel laser wave, surveys the light distribution of each single channel laser of CCD cameras record simultaneously with phase differential;
3) with one road laser as benchmark, open other each road laser successively and interfere with reference laser respectively;
4) survey the CCD camera with phase differential and measure the light intensity after every two-way laser coherence synthesizes, calculate the phase differential of each road laser with respect to reference laser; Wavefront after with Hartmann's wavefront analysis appearance the two-way coherent laser being synthesized simultaneously carries out Measurement and analysis.
The present invention and prior art contrast have following effect:
1) the present invention can realize that bore is 150 * 150mm
2Large-caliber laser bundle and the measurement of other high power laser wavefront of power Da Wanwa level, and the measuring instrument operation is clear simple, speed of detection is fast, intuitively the preceding information parameter of disclosing solution.
2) wavefront measurement method of the present invention can solve synthetic middle single channel laser wavefront analysis of multi-path large power laser coherence and the phase difference measurement of two-way laser arbitrarily.
3) the present invention is through selecting the reasonable composition of mechanical shutter, optical sampling catoptron and attenuator for use; When can guaranteeing higher measuring accuracy; Solve high power laser and shone the wavefront measurement appearance for a long time; Cause the thermal deformation and the fire damage problem of optical element, guarantee the effective attenuation of high power laser power.
4) measuring instrument of the present invention for realize to more powerful expansion with in infraredly lay a good foundation with the expansion far infrared wavelength.
Description of drawings
Fig. 1 measuring instrument of the present invention is formed synoptic diagram;
Fig. 2 measuring method process flow diagram of the present invention;
Fig. 3 Shack-Hartmann wavefront analysis appearance schematic diagram;
Fig. 4 standard flat ripple incides single lenticular situation;
Fig. 5 incides single lenticular situation at the corrugated of distorting;
Fig. 6 beam optics systematic schematic diagram that contracts;
Fig. 7 transmission-type attenuator structural drawing;
The reflective attenuator structural drawing of Fig. 8;
Fig. 9 goggle structure;
The contract wave aberration of beam optics system object lens of Figure 10.
Embodiment
To combine accompanying drawing below, detailed, complete description measuring principle of the present invention, system architecture and the concrete course of work.
1, system architecture of the present invention is following with the concrete course of work:
With reference to Fig. 1, measuring instrument of the present invention comprises: mechanical shutter 1, beam sampling catoptron 2, the beam optics system 3 that contracts, transmission-type attenuator 4, reflective attenuator 6, Hartmann's wavefront analysis appearance 5, phase differential are surveyed CCD camera 7 and computing machine 8.1 of mechanical shutter is opened when wavefront measurement, makes measuring instrument with pulse mode work, avoids high power laser to cause the thermal deformation of measuring system optical element, influences measuring accuracy.2 pairs of high power lasers of beam sampling catoptron carry out attenuation of the first kind; The laser beam reflection is got into the beam optics system 3 that contracts; The beam optics system 3 that contracts makes outgoing beam bore and Hartmann's wavefront analysis appearance 5 and phase differential survey the bore coupling of CCD camera 7 compression of large-caliber laser bundle.Beam optics system 3 emitting laser bundles are very strong from contracting; Need further decay through attenuator; Outgoing laser beam gets into Hartmann's wavefront analysis appearance 5 through 4 decay of transmission-type attenuator and measures; Outgoing laser beam gets into phase differential detection CCD camera 7 through reflective attenuator 6 decay and measures, and computing machine 8 control Hartmann wavefront analysis appearance 5 and phase differential are surveyed the work of CCD camera 7, the control of completion system, IMAQ, wavefront reconstruction and phase difference calculating function.
In conjunction with Fig. 2 the relevant synthetic wavefront measurement method of multi-path laser is described:
1) in measuring instrument when work,, 1 of mechanical shutter is opened when wavefront measurement, with smaller or equal to 1/100 second speed operation, makes measuring instrument with pulse mode work;
Each road laser that 2) will be concerned with synthetic is opened respectively, respectively to carrying out Measurement and analysis before each single channel laser wave, surveys the light intensity distributions that CCD camera 7 writes down each single channel laser respectively with phase differential with Hartmann's wavefront analysis appearance 5 simultaneously;
3) then with one road laser as benchmark, open other each road laser successively and interfere with reference laser respectively;
4) survey CCD camera 7 with phase differential and measure the light intensity after every two-way laser coherence synthesizes; Calculate the phase differential principle according to direct method and obtain the phase differential of each road laser with respect to reference laser, the wavefront after synthesizing with 5 pairs of two-way coherent lasers of Hartmann's wavefront analysis appearance simultaneously carries out Measurement and analysis.
For example; If the measurement that three road laser coherences are synthetic: for the ease of explanation; Each road laser is numbered 1 the tunnel, the 2 tunnel, the 3 tunnel respectively; Respectively to carrying out Measurement and analysis before each road laser wave, survey the light intensity distributions that the CCD camera writes down each road laser respectively with phase differential with Hartmann's wavefront analysis appearance simultaneously; With arbitrary road laser wherein as benchmark; Suppose with 1 road laser as benchmark; Opening 2 road laser and reference light interferes; Survey the CCD camera with phase differential and measure the light intensity after the two-way laser coherence synthesizes, calculate the phase differential of 2 road laser with respect to reference laser, the wavefront after with Hartmann's wavefront analysis appearance the two-way coherent laser being synthesized simultaneously carries out Measurement and analysis; Opening 3 road laser and reference light interferes; Survey the CCD camera with phase differential and measure the light intensity after the two-way laser coherence synthesizes; Calculate the phase differential of 3 road laser with respect to reference laser, the wavefront after with Hartmann's wavefront analysis appearance the two-way coherent laser being synthesized simultaneously carries out Measurement and analysis; Light beam after can also be with 1 road laser and 2 road laser coherences synthetic is synthetic with 3 road laser coherences, obtains the relevant synthetic light of three beams of laser, measures accordingly with Hartmann's wavefront analysis appearance and phase differential detection CCD camera simultaneously.Using the same method can also be to four road laser, five road laser, even the more multi-path laser synthetic measurement that is concerned with.
2, the preceding analysis principle of single channel laser wave is following among the present invention:
Measure before to each single channel laser wave with Hartmann's wavefront analysis appearance, the Shack-Hartmann analyser is to be made up of lenticule and photoelectric sensor, is a kind of wavefront measurement appearance based on slope measurement.The principle of Shack-Hartmann wavefront analysis appearance such as Fig. 3 and shown in Figure 4, microlens array is divided into many sub-apertures with the input aperture, and focuses on the ccd detector, forms a spot array.Demarcate the original position of each hot spot in advance with a branch of standard directional light, and preserve.When distorted wavefront is surveyed; The inclination of inciding the wavefront on each sub-aperture will cause moving of this sub-aperture facula position; Amount of movement is proportional to wavefront slope and lenticular focal length; Measure hot spot through ccd detector and just can measure with respect to the displacement in the original position of prior demarcation on two vertical direction that wavefront utilizes the wave front restoration algorithm to reconstruct Wave-front phase through wavefront slope at the slope of both direction at last in this sub-aperture.Can obtain the wavefront information parameter from the Wave-front phase of reconstruct, like P-V value and the rms value and the zernike coefficient of Wave-front phase.
As stated, each lenticule of microlens array is collected and is impinged upon the light on its aperture, and on the ccd detector plane, produces a hot spot.Be illustrated in figure 5 as wavefront and incide the situation on the single lenticule.Have only when incident wavefront be the plane and when being parallel to the lenslet plane, the rear of lens (black round dot) is just directly dropped in the position of hot spot.For the wavefront in the microlens region distortion, facula position will squint at X and Y direction (white round dot), so each hot spot will depart from its corresponding lenticular optical axis Z with the α angle.Shown in figure, this angle [alpha] is identical with angle between distorted wavefront and plane wave front.
Four parameters that influence Shack-Hartmann wavefront analysis appearance performance are lenticule quantity, dynamic area, measurement sensitivity and the lenticule focal lengths that cover the detector useful area.Lenticular restricted number again the structure algorithm calculate the maximum order of zernike coefficient reliably.When needing to select lenticule quantity, the amount of distortion of the required simulation of considered (being that what zernike coefficients the actual wavefront aberration needs effectively to characterize).
Measurement sensitivity θ
MinBe minimum detectable facula deviation amount δ y
MinFunction, like following formula:
θ
min＝δy
min/f (1)
F is lenticular focal length, θ
MaxThen be measuring of maximum detection amount phase place:
θ
max＝δy
min/f＝(d/2)/f (2)
D is lenticular diameter, and these two formula all are to have used small angle approximation.θ
MinIt is minimum value by the wavefront slope of wavefront analysis appearance measurement.The skew δ y of I photometry spot
MinDepend on the Pixel Dimensions of detector, the precision of center of circle algorithm and the signal to noise ratio (S/N ratio) of analyser.θ
MaxBe the maximal value of the measurable wavefront slope of wavefront analysis appearance, it is equivalent to facula deviation δ y
Max, equal lenticular radius.
The measuring accuracy of Shack-Hartmann wavefront analysis appearance (promptly reliable measure required minimum wavefront slope) depends on that its accurately measures the ability of the skew of the hot spot that focuses on and its reference position.If hot spot and other hot spot are overlapped, perhaps lenticular focal spot drops on beyond the zone of analyser appointment (hot spot intersection), and traditional algorithm can not correctly measure the home position of hot spot.Adopt special method to address this problem, but with the dynamic range of restriction analysis appearance.The lenticule of use major diameter or short focal length can increase the dynamic range of system.Through increasing the quantity that lenticular enlarged diameter dynamic range can reduce the zernike coefficient that can represent wavefront.On the contrary, increase the sensitivity that dynamic range can reduce analyser through reducing focal length.Under the ideal situation, when satisfying dynamic range and measuring the sensitivity requirement, should use the lenticule of maximum focal length.
3, the principle of measurement two-way coherent light phase differential is following among the present invention:
Direct method and process of heterodyning are to measure the common method of two-way coherent light phase differential.The heterodyne measurement precision is high, but need in relevant each synthetic road laser, insert measuring system, and it is very high that light path is regulated requirement, and influential to relevant each synthetic road laser optical path.Direct method does not influence the light path of relevant each the road laser that synthesizes, but measuring accuracy is lower than process of heterodyning, and can not judge the positive and negative of phase differential.Consider practical situations, the present invention adopts direct method to measure the phase differential of two-way laser.If the luminous power of two-way coherent laser is respectively I
1And I
2, the luminous power I after then synthesizing is:
δ is the phase differential of two-way coherent laser in the formula, as long as record I, I
1And I
2, promptly can obtain phase differential δ:
4, the present invention estimates the luminous power of measuring system:
High power laser wavefront measurement system luminous power and power density everywhere is as shown in table 1; Major parameter value when luminous power is estimated is: the incident angle of laser beam on sampling reflective mirror is 10 °; The beam optics system that contracts reduction magnification is 11 times; Its transmitance position 93%, the percent of pass of transmission-type attenuator and reflective attenuator are 1.25 * 10
-7
Luminous power in table 1 measuring system and power density
Annotate 1: the beam sampling reflectance of reflector is approximate gets 3.5%; The repeatedly reflection on surface behind the consideration beam sampling catoptron; Also have part laser can get into the beam optics system that contracts (the most approximately 300W), the beam optics system stops but this part light can be contracted, and can not get into attenuator;
Annotate 2: the approximate reflectivity of getting the 1st high reflective mirror of transmission-type attenuator is 1.
5, the mechanical shutter opening time among the present invention realizes that the speed smaller or equal to 1/100 millisecond can satisfy the measuring instrument requirement.
6, the beam sampling catoptron among the present invention adopts the not fused quartz glass of plated film of surface:
Behind the fused quartz glass surface coating, increased the interface absorption, and the substrate of the resisting laser damage of optical thin film ability force rate fused quartz glass is far short of what is expected; When laser radiation, optical thin film at first destroys, and then increases the absorption to follow-up laser; Cause destruction to fused quartz glass; Be unfavorable for that the high power laser wavefront measurement system measures the high power laser of 100 myriawatts in the future, in addition, optical thin film also can impact the surface precision on large-aperture optical surface.Therefore, fused quartz beam sampling mirror surface plated film not.When 45 ° of incident angles, s wave reflection rate is 0.0801, and p wave reflection rate is 0.0064, and during 10 ° of incident angles, s wave reflection rate is 0.0351, and p wave reflection rate is 0.0323.We get 10 ° of incident angles, and fused quartz beam sampling catoptron is of a size of 165 * 160mm
2, Diagonal Dimension is 230mm, thickness is got 35mm.Fused quartz beam sampling catoptron is the wedge pattern.
Fused quartz beam sampling catoptron bears maximum incident power in measuring system; Estimate the temperature variation of fused quartz beam sampling catoptron under high power laser illumination below; If fused quartz beam sampling catoptron evenly absorbs, disregard the Gaussian distribution of laser beam intensity, then have:
c
p·ρ·V·ΔT＝P·(1-R)·(1-T
in)·Δt (5)
In the formula, specific heat c
pBe 0.79J/ (gK) (20-100 ℃) that density p is 2.2g/cm
3, V is a volume, and Δ T is a temperature variation, and P is an incident laser power, and R is a surface reflectivity, T
InBe the iuuminting rate, Δ t is the time shutter.Get P=10000W, R=3.5%, T
In=99.7% (the thick model of 35mm, 1060nm wavelength) then can obtain temperature variation Δ T ≈ 0.02K by (5) formula at mechanical shutter time shutter Δ t=1 second, considers that the linear expansion coefficient α of fused quartz glass has only 0.5 * 10
-6Therefore/K the order of magnitude, is 10000W in incident laser power, and the mechanical shutter time shutter is that the temperature deformation of fused quartz beam sampling catoptron can be ignored under 1 second the situation.
7, the beam optics system principle that contracts among the present invention is as shown in Figure 6:
The bore of Hartmann's wavefront analysis appearance is 14.6 * 14.6mm
2, the bore of incoming laser beam is 150 * 150mm
2, the reduction magnification of getting the beam optics system that contracts is 11 times, then the outgoing laser beam bore is 13.6 * 13.6mm
2, satisfy of the requirement of Hartmann's wavefront analysis appearance to beam size.According to the bore of incoming laser beam can confirm the to contract aperture of objective lens of beam optics system is 220mm, and such bore transmission-type and reflective optical system can be realized.The Kepler telescope system of selective transmission formula of the present invention is as the version of the beam optics system that contracts, and at the object focal point place spatial filter is set.Kepler system has the real image point to be convenient to debug, and can place diaphragm, suppresses parasitic light.The atmosphere breakdown threshold of Nd:YAG laser is roughly 10
10-10
12W/cm
2, the laser beam to we will measure can not puncture atmosphere at Kepler system object focal point place.
The object lens of the beam optics system that contracts are selected fused quartz glass for use, and wherein first face is aspheric surface (ellipsoid), and second face is the plane, and diaphragm is located on first face.Table 2 provides the primary design result of the beam optics system object lens that contract.Relative aperture
focal distance f '=2200mm, field angle ω=± 0.06 °.
Table 2 object lens optical design parameter
The wave aberration of the beam optics system that contracts object lens is shown in figure 10; The point wave aberration is less than
(P-V value) on the axle; 0.06 also less than
(P-V value), can satisfy request for utilization during ° field angle.First face is revised as high order aspheric surface; Image quality is not significantly improved; If relative aperture is changed into
then image quality have clear improvement; But roughly about 3.6m, relative aperture is got
tube length roughly about 2.4m to the tube length of the beam optics system that contracts at present.Take all factors into consideration image quality, debug technology and tube length factor; The relative aperture of the beam optics system that contracts object lens should be in
to
scope; Under the prerequisite that guarantees image quality; Relative aperture is big as far as possible, to shorten tube length.
The eyepiece bore is less, can select ordinary optical glass for use, adopts version as shown in Figure 9 to realize.
The lens barrel of beam optics system is longer owing to contract, and in order to guarantee mechanical stability, adopts three stage structure, establishes 4 supports, and the eyepiece lens barrel has precision adjustment unit, conveniently to debug and to use.Under laboratory condition, use, the expansion factor that temperature variation causes can be ignored.
8, the structure of transmission-type attenuator is as shown in Figure 7 among the present invention, and the structure of reflective attenuator is as shown in Figure 8:
The transmission-type attenuator is made up of three transmission-type wedge mirrors, to reduce the absorption of element to high power laser, residue transmitance≤0.5% of every wedge mirror, the then percent of pass of transmission-type attenuator≤1.25 * 10
-7Consider integrally-built needs and real work situation, reflective attenuator is made up of three reflective wedge mirrors, the reflectivity of every wedge mirror≤0.5%, the then percent of pass of reflective attenuator≤1.25 * 10
-7
9, the selection of Hartmann's wavefront analysis appearance among the present invention:
Select the HASO3-128 Hartmann wavefront analysis appearance of French Imaging Optics company for use, this wavefront analysis appearance has measuring accuracy height, spatial resolution height and the big characteristics of dynamic range based on the Shack-Hartmann wavefront sensor principle.The important technological parameters of HASO3-128 Hartmann wavefront analysis appearance comprises: aperture size is 14.6 * 14.6mm
2, sub-aperture quantity is 128 * 128, dynamic range is greater than ± 3 ° (1500 λ); Wavefront measurement precision (rms) is λ/100; Operation wavelength is 350-1100nm, and maximum operation frequency is 3.2Hz (FireWire), 7.5Hz (CameraLink), and working temperature is controlled at 15-30 ℃.
The process software system of HAS03-128 Hartmann wavefront analysis appearance can calculate P-V value and the rms value and the zernike coefficient of Wave-front phase.
10, the selection of phase differential detection CCD camera among the present invention:
Phase differential is surveyed the CCD camera and is selected for use the photosurface size to be about 15 * 15mm
2Model, the pixel number is 1024 * 1024 or 2048 * 2048, it is approximate that to get the sensitivity of CCD at the 1060nm place be 1V/ (μ J/cm
2), when then be 10ms integral time, the amplitude output signal of CCD was about 0.219V, can satisfy the needs of detection.What phase differential detection CCD camera obtained is the view picture interferogram, can utilize digital image processing techniques that interferogram is done careful processing.
Claims (2)
1. a high power laser wavefront measurement appearance is made up of optical system and measuring system.It is characterized in that: described optical system is made up of mechanical shutter (1), beam sampling catoptron (2), the beam optics system that contracts (3), transmission-type attenuator (4) and reflective attenuator (6); Described measuring system surveys CCD camera (7) by Hartmann's wavefront analysis appearance (5), phase differential and computing machine (8) is formed; Said mechanical shutter (1) when opening laser beam be incident to beam sampling catoptron (2) with 10 ° of incident angles; By beam sampling catoptron (2) the laser beam reflection is got into the beam optics system (3) that contracts; The beam optics system that contracts (3) compresses the large-caliber laser bundle; Outgoing laser beam gets into Hartmann's wavefront analysis appearance (5) by transmission-type attenuator (4) respectively and measures; Get into phase differential detection CCD camera (7) by reflective attenuator (6) and measure, computing machine (8) control Hartmann's wavefront analysis appearance (5) and phase differential are surveyed the work of CCD camera (7); Wherein beam sampling catoptron (2) adopts the not fused quartz glass of plated film of surface, for the wedge form, is of a size of 165 * 160mm
2, Diagonal Dimension is 230mm, thickness is got 35mm; The structure of the beam optics system that contracts (3) is the Kepler telescope system of transmission-type; At the object focal point place of telescopic system spatial filter filtering parasitic light is set, object lens are selected fused quartz glass for use, are made up of two faces; Wherein first face is an ellipsoid; Second face is the plane, and the diaphragm of telescopic system is located on the ellipsoid, and the eyepiece of telescopic system is selected ordinary optical glass for use; Transmission-type attenuator (4) is made up of three transmission-type wedge mirrors; Reflective attenuator (6) is made up of three reflective wedge mirrors.
2. based on the wavefront measurement method of the said high power laser wavefront measurement of claim 1 appearance, its characteristic comprises the steps:
(2.1) in measuring instrument when work,, mechanical shutter (1) is only opened when wavefront measurement, with smaller or equal to 1/100 second speed operation, makes measuring instrument with pulse mode work;
Each road laser instrument that (2.2) will be concerned with synthetic is opened respectively, carries out Measurement and analysis with Hartmann's wavefront analysis appearance (5) before to each single channel laser wave, surveys the light distribution that CCD camera (7) writes down each single channel laser with phase differential simultaneously;
(2.3) with one road laser as benchmark, open other each road laser successively and interfere with reference laser respectively;
(2.4) survey CCD camera (7) with phase differential and measure the light intensity after every two-way laser coherence synthesizes, calculate the phase differential of each road laser with respect to reference laser; Use the wavefront after Hartmann's wavefront analysis appearance (5) synthesizes the two-way coherent laser to carry out Measurement and analysis simultaneously.
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| CN106525255A (en) * | 2016-10-27 | 2017-03-22 | 中国科学院光电技术研究所 | Phase difference wavefront sensor based on image compensation |
| CN106768882A (en) * | 2016-12-15 | 2017-05-31 | 中国科学院光电技术研究所 | Optical system distortion measurement method based on shack-Hartmann wavefront sensor |
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| CN110166707A (en) * | 2019-06-13 | 2019-08-23 | Oppo广东移动通信有限公司 | Image processing method, device, electronic equipment and storage medium |
| CN110455420A (en) * | 2019-07-11 | 2019-11-15 | 长春理工大学 | Wavefront measuring apparatus |
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| CN102636824A (en) * | 2012-04-28 | 2012-08-15 | 中国科学院西安光学精密机械研究所 | Large-caliber high-power laser beam-shrinking lens |
| CN105004511A (en) * | 2015-07-14 | 2015-10-28 | 中国人民解放军国防科学技术大学 | Wide-range wavefront detection device for measuring low-order aberration |
| CN105004511B (en) * | 2015-07-14 | 2017-06-30 | 中国人民解放军国防科学技术大学 | A kind of wide range Wavefront detecting device for low order aberration measurement |
| CN106525255A (en) * | 2016-10-27 | 2017-03-22 | 中国科学院光电技术研究所 | Phase difference wavefront sensor based on image compensation |
| CN106768882A (en) * | 2016-12-15 | 2017-05-31 | 中国科学院光电技术研究所 | Optical system distortion measurement method based on shack-Hartmann wavefront sensor |
| CN108344507A (en) * | 2017-12-26 | 2018-07-31 | 湖北航天技术研究院总体设计所 | A kind of performance testing device and method of Spectral beam combining system |
| CN108123358A (en) * | 2017-12-28 | 2018-06-05 | 西安应用光学研究所 | The linear damped system of Larger Dynamic scope laser and attenuator |
| CN108955904B (en) * | 2018-06-28 | 2020-04-10 | 北京空间机电研究所 | Multifunctional wavefront detection device considering point-surface target |
| CN108955904A (en) * | 2018-06-28 | 2018-12-07 | 北京空间机电研究所 | A kind of multi-functional Wavefront detecting device for taking into account an Area Objects |
| CN110166707A (en) * | 2019-06-13 | 2019-08-23 | Oppo广东移动通信有限公司 | Image processing method, device, electronic equipment and storage medium |
| CN110166707B (en) * | 2019-06-13 | 2020-09-25 | Oppo广东移动通信有限公司 | Image processing method, image processing apparatus, electronic device, and storage medium |
| CN110455420A (en) * | 2019-07-11 | 2019-11-15 | 长春理工大学 | Wavefront measuring apparatus |
| CN113720443A (en) * | 2020-05-26 | 2021-11-30 | 深圳市大族数控科技股份有限公司 | Laser power test system and test method |
| CN112859359A (en) * | 2021-02-05 | 2021-05-28 | 中国工程物理研究院激光聚变研究中心 | Focal spot control method |
| CN112859359B (en) * | 2021-02-05 | 2022-02-08 | 中国工程物理研究院激光聚变研究中心 | Focal spot control method |
| CN114879355A (en) * | 2021-02-05 | 2022-08-09 | 中国科学院苏州纳米技术与纳米仿生研究所 | Telescope structure and manufacturing method thereof |
| CN113790807A (en) * | 2021-08-25 | 2021-12-14 | 长春理工大学 | Hartmann wavefront detection device and method for laser communication optical system |
| CN117232785A (en) * | 2023-08-18 | 2023-12-15 | 青岛芯微半导体科技有限公司 | Device for improving optical wavefront error detection precision with controllable sub-optical path channel switch |
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