CN102483587B - 曝光装置用光照射装置、光照射装置的控制方法、曝光装置以及曝光方法 - Google Patents

曝光装置用光照射装置、光照射装置的控制方法、曝光装置以及曝光方法 Download PDF

Info

Publication number
CN102483587B
CN102483587B CN201180001999.6A CN201180001999A CN102483587B CN 102483587 B CN102483587 B CN 102483587B CN 201180001999 A CN201180001999 A CN 201180001999A CN 102483587 B CN102483587 B CN 102483587B
Authority
CN
China
Prior art keywords
light
light source
source portion
fuse
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201180001999.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN102483587A (zh
Inventor
原田智纪
永井新一郎
川岛洋德
山田丰
轻石修作
林慎一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vn Systems Ltd
V Technology Co Ltd
Original Assignee
NSK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2011154669A external-priority patent/JP5799306B2/ja
Application filed by NSK Ltd filed Critical NSK Ltd
Priority claimed from PCT/JP2011/066467 external-priority patent/WO2012011497A1/ja
Publication of CN102483587A publication Critical patent/CN102483587A/zh
Application granted granted Critical
Publication of CN102483587B publication Critical patent/CN102483587B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
    • F21K2/00—Non-electric light sources using luminescence; Light sources using electrochemiluminescence
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V13/00—Producing particular characteristics or distribution of the light emitted by means of a combination of elements specified in two or more of main groups F21V1/00 - F21V11/00
    • F21V13/02—Combinations of only two kinds of elements
    • F21V13/08—Combinations of only two kinds of elements the elements being filters or photoluminescent elements and reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201180001999.6A 2010-07-22 2011-07-20 曝光装置用光照射装置、光照射装置的控制方法、曝光装置以及曝光方法 Expired - Fee Related CN102483587B (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2010165163 2010-07-22
JP2010-165163 2010-07-22
JP2010191288 2010-08-27
JP2010-191288 2010-08-27
JP2011-154669 2011-07-13
JP2011154669A JP5799306B2 (ja) 2010-07-22 2011-07-13 露光装置用光照射装置の制御方法、及び露光方法
PCT/JP2011/066467 WO2012011497A1 (ja) 2010-07-22 2011-07-20 露光装置用光照射装置、光照射装置の制御方法、露光装置及び露光方法

Publications (2)

Publication Number Publication Date
CN102483587A CN102483587A (zh) 2012-05-30
CN102483587B true CN102483587B (zh) 2014-11-05

Family

ID=46093351

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180001999.6A Expired - Fee Related CN102483587B (zh) 2010-07-22 2011-07-20 曝光装置用光照射装置、光照射装置的控制方法、曝光装置以及曝光方法

Country Status (3)

Country Link
KR (1) KR101443431B1 (ko)
CN (1) CN102483587B (ko)
TW (1) TWI443479B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101591852B1 (ko) * 2014-04-17 2016-02-18 주식회사 필옵틱스 광축 얼라이너를 포함한 led 광원 노광장치
JP6721420B2 (ja) * 2016-06-02 2020-07-15 株式会社ディスコ 漏れ光検出方法
JP7060244B2 (ja) * 2018-12-12 2022-04-26 フェニックス電機株式会社 露光装置用光源、それを用いた露光装置、およびレジストの露光方法
JP7379036B2 (ja) * 2019-09-13 2023-11-14 キヤノン株式会社 シャッタ装置、光量制御方法、リソグラフィ装置及び物品の製造方法
JP7154603B2 (ja) * 2019-11-13 2022-10-18 フェニックス電機株式会社 露光装置用光源

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101236358A (zh) * 2007-02-01 2008-08-06 凤凰电机公司 曝光用光源以及使用该曝光用光源的曝光装置
CN101277566A (zh) * 2007-03-26 2008-10-01 凤凰电机公司 光源装置以及使用该光源装置的曝光装置
JP4391136B2 (ja) * 2003-06-05 2009-12-24 株式会社目白ゲノッセン 露光用照明装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4546019B2 (ja) * 2002-07-03 2010-09-15 株式会社日立製作所 露光装置
JP2006019412A (ja) * 2004-06-30 2006-01-19 Canon Inc 露光装置及びデバイスの製造方法
JP5057382B2 (ja) * 2007-12-18 2012-10-24 Ｎｓｋテクノロジー株式会社 露光装置及び基板の製造方法
JP5212629B2 (ja) * 2008-08-05 2013-06-19 ウシオ電機株式会社 光照射装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4391136B2 (ja) * 2003-06-05 2009-12-24 株式会社目白ゲノッセン 露光用照明装置
CN101236358A (zh) * 2007-02-01 2008-08-06 凤凰电机公司 曝光用光源以及使用该曝光用光源的曝光装置
CN101277566A (zh) * 2007-03-26 2008-10-01 凤凰电机公司 光源装置以及使用该光源装置的曝光装置

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
JP特开2004-39871A 2004.02.05 *
JP特开2006-19412A 2006.01.19 *
JP特开2009-150919A 2009.07.09 *
JP特开2010-40343A 2010.02.18 *
JP特许4391136B2 2009.12.24 *

Also Published As

Publication number Publication date
KR101443431B1 (ko) 2014-10-30
KR20120037908A (ko) 2012-04-20
CN102483587A (zh) 2012-05-30
TWI443479B (zh) 2014-07-01
TW201232186A (en) 2012-08-01

Similar Documents

Publication Publication Date Title
CN102369484B (zh) 曝光装置用照光装置及其亮灯控制方法、以及曝光装置、曝光方法及基板
CN102483587B (zh) 曝光装置用光照射装置、光照射装置的控制方法、曝光装置以及曝光方法
KR101111934B1 (ko) 노광 장치 및 노광 방법
CN102449552B (zh) 曝光装置用光照射装置、曝光装置、曝光方法、基板制造方法、掩模和被曝光基板
CN101986207A (zh) 曝光装置以及曝光方法
JP5799306B2 (ja) 露光装置用光照射装置の制御方法、及び露光方法
JP6663914B2 (ja) 露光用照明装置、露光装置及び露光方法
KR101169240B1 (ko) 노광 장치용 광조사 장치, 노광 장치 및 노광 방법
JP5057382B2 (ja) 露光装置及び基板の製造方法
CN101907831B (zh) 用于曝光装置的光照射装置、其点亮控制方法以及曝光装置和基板
JP5935294B2 (ja) 近接露光装置及び近接露光方法
CN101859069B (zh) 曝光装置用光照射装置、曝光装置及曝光方法
JP2011175025A (ja) 近接走査露光装置及び基板の製造方法
US6356341B1 (en) Exposure device, beam shape setting device and illuminating area setting device
WO2012011497A1 (ja) 露光装置用光照射装置、光照射装置の制御方法、露光装置及び露光方法
JP5418962B2 (ja) 位置合わせ装置、位置合わせ方法、露光装置、露光方法及びデバイス製造方法
TW201107891A (en) Light irradiation apparatus for exposure apparatus, exposure apparatus, and exposure method
JP2016148811A (ja) 露光装置及び照明装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
C56 Change in the name or address of the patentee
CP03 Change of name, title or address

Address after: Kanagawa, Japan

Patentee after: VN Systems Ltd.

Address before: Tokyo, Japan

Patentee before: NSK Technology Co.,Ltd.

TR01 Transfer of patent right

Effective date of registration: 20160106

Address after: Kanagawa, Japan

Patentee after: V TECHNOLOGY Co.,Ltd.

Address before: Kanagawa, Japan

Patentee before: VN Systems Ltd.

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20141105

Termination date: 20210720

CF01 Termination of patent right due to non-payment of annual fee