CN102479750A - 一种化学机械平坦化的方法 - Google Patents
一种化学机械平坦化的方法 Download PDFInfo
- Publication number
- CN102479750A CN102479750A CN2010105716626A CN201010571662A CN102479750A CN 102479750 A CN102479750 A CN 102479750A CN 2010105716626 A CN2010105716626 A CN 2010105716626A CN 201010571662 A CN201010571662 A CN 201010571662A CN 102479750 A CN102479750 A CN 102479750A
- Authority
- CN
- China
- Prior art keywords
- dielectric layer
- conductive layer
- wafer
- layer
- interconnection structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201010571662.6A CN102479750B (zh) | 2010-11-29 | 2010-11-29 | 一种化学机械平坦化的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201010571662.6A CN102479750B (zh) | 2010-11-29 | 2010-11-29 | 一种化学机械平坦化的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102479750A true CN102479750A (zh) | 2012-05-30 |
CN102479750B CN102479750B (zh) | 2015-12-16 |
Family
ID=46092327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201010571662.6A Active CN102479750B (zh) | 2010-11-29 | 2010-11-29 | 一种化学机械平坦化的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN102479750B (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1227402A (zh) * | 1998-02-26 | 1999-09-01 | 联华电子股份有限公司 | 阻挡层及其制造方法 |
CN1541415A (zh) * | 2001-01-24 | 2004-10-27 | �����ɷ� | 微影对准设计及cmp加工波纹表面覆盖量测记号 |
CN101026107A (zh) * | 2006-02-24 | 2007-08-29 | 日月光半导体制造股份有限公司 | 晶圆级封装的凸块制造方法 |
CN101106208A (zh) * | 2006-07-14 | 2008-01-16 | 台湾积体电路制造股份有限公司 | 半导体集成电路中的波导以及电磁波屏蔽 |
-
2010
- 2010-11-29 CN CN201010571662.6A patent/CN102479750B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1227402A (zh) * | 1998-02-26 | 1999-09-01 | 联华电子股份有限公司 | 阻挡层及其制造方法 |
CN1541415A (zh) * | 2001-01-24 | 2004-10-27 | �����ɷ� | 微影对准设计及cmp加工波纹表面覆盖量测记号 |
CN101026107A (zh) * | 2006-02-24 | 2007-08-29 | 日月光半导体制造股份有限公司 | 晶圆级封装的凸块制造方法 |
CN101106208A (zh) * | 2006-07-14 | 2008-01-16 | 台湾积体电路制造股份有限公司 | 半导体集成电路中的波导以及电磁波屏蔽 |
Also Published As
Publication number | Publication date |
---|---|
CN102479750B (zh) | 2015-12-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11830838B2 (en) | Conductive barrier direct hybrid bonding | |
US11244916B2 (en) | Low temperature bonded structures | |
US9502350B1 (en) | Interconnect scaling method including forming dielectric layer over subtractively etched first conductive layer and forming second conductive material on dielectric layer | |
CN102832165B (zh) | 经过改进的用于双镶嵌工艺的间隙填充方法 | |
US8697493B2 (en) | Bonding surfaces for direct bonding of semiconductor structures | |
CN100442474C (zh) | 制造半导体器件的方法 | |
US10304818B2 (en) | Method of manufacturing semiconductor devices having conductive plugs with varying widths | |
TWI466258B (zh) | 電性通透連接及其形成方法 | |
CN107230660B (zh) | 半导体装置的制造方法 | |
US20200144107A1 (en) | Method of forming barrier free contact for metal interconnects | |
TWI451544B (zh) | 平坦化矽貫孔之方法 | |
US10978388B2 (en) | Skip via for metal interconnects | |
US20220037202A1 (en) | Method of forming interconnect structure | |
US8956974B2 (en) | Devices, systems, and methods related to planarizing semiconductor devices after forming openings | |
US8779589B2 (en) | Liner layers for metal interconnects | |
CN218333793U (zh) | 半导体结构及半导体装置 | |
US20070049008A1 (en) | Method for forming a capping layer on a semiconductor device | |
CN102479750B (zh) | 一种化学机械平坦化的方法 | |
CN103681608A (zh) | 铝互连装置 | |
CN107851554A (zh) | 用于改善非平面表面的cmp耐刮擦性的方法 | |
KR20090024854A (ko) | 반도체 소자의 금속배선 및 그 형성방법 | |
CN108231599A (zh) | 改善晶片表面平坦均匀性的方法 | |
US20220310527A1 (en) | Semiconductor devices and methods of manufacture | |
CN117995797A (zh) | 集成电路及其制备方法、三维集成电路、电子设备 | |
TW202339279A (zh) | 半導體結構及其形成方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: No. 3, North Tu Cheng West Road, Chaoyang District, Beijing Co-patentee after: BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd. Patentee after: Institute of Microelectronics, Chinese Academy of Sciences Address before: No. 3, North Tu Cheng West Road, Chaoyang District, Beijing Co-patentee before: BEIJING NMC Co.,Ltd. Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |
|
CP01 | Change in the name or title of a patent holder | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190225 Address after: 100176 Beijing Daxing District Beijing economic and Technological Development Zone Wenchang Road 8 Patentee after: BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd. Address before: No. 3, North Tu Cheng West Road, Chaoyang District, Beijing Co-patentee before: BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd. Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |
|
TR01 | Transfer of patent right |