CN102348777A - 非晶碳氢氮化物(a-CN:Hx)膜的成膜方法、有机EL器件及其制造方法 - Google Patents

非晶碳氢氮化物(a-CN:Hx)膜的成膜方法、有机EL器件及其制造方法 Download PDF

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Publication number
CN102348777A
CN102348777A CN2010800118272A CN201080011827A CN102348777A CN 102348777 A CN102348777 A CN 102348777A CN 2010800118272 A CN2010800118272 A CN 2010800118272A CN 201080011827 A CN201080011827 A CN 201080011827A CN 102348777 A CN102348777 A CN 102348777A
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CN
China
Prior art keywords
film
gas
layer
plasma
nitride
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Pending
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CN2010800118272A
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English (en)
Chinese (zh)
Inventor
石川拓
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN102348777A publication Critical patent/CN102348777A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Chemical Vapour Deposition (AREA)
  • Luminescent Compositions (AREA)
CN2010800118272A 2009-03-13 2010-03-11 非晶碳氢氮化物(a-CN:Hx)膜的成膜方法、有机EL器件及其制造方法 Pending CN102348777A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009061175A JP2010219112A (ja) 2009-03-13 2009-03-13 アモルファスハイドロカーボンナイトライド（ａ−ＣＮ：Ｈｘ）膜の成膜方法、有機ＥＬデバイスおよびその製造方法
JP2009-061175 2009-03-13
PCT/JP2010/054120 WO2010104152A1 (ja) 2009-03-13 2010-03-11 アモルファスハイドロカーボンナイトライド（ａ－ＣＮ：Ｈｘ）膜の成膜方法、有機ＥＬデバイスおよびその製造方法

Publications (1)

Publication Number Publication Date
CN102348777A true CN102348777A (zh) 2012-02-08

Family

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Family Applications (1)

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CN2010800118272A Pending CN102348777A (zh) 2009-03-13 2010-03-11 非晶碳氢氮化物(a-CN:Hx)膜的成膜方法、有机EL器件及其制造方法

Country Status (5)

Country Link
JP (1) JP2010219112A (ko)
KR (1) KR101284671B1 (ko)
CN (1) CN102348777A (ko)
TW (1) TW201105819A (ko)
WO (1) WO2010104152A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105529239A (zh) * 2016-03-07 2016-04-27 京东方科技集团股份有限公司 一种干法刻蚀装置及方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8962454B2 (en) * 2010-11-04 2015-02-24 Tokyo Electron Limited Method of depositing dielectric films using microwave plasma
JP5941653B2 (ja) 2011-02-24 2016-06-29 東京エレクトロン株式会社 シリコン窒化膜の成膜方法及びシリコン窒化膜の成膜装置
JP2013191494A (ja) * 2012-03-15 2013-09-26 Tokyo Electron Ltd 有機電子デバイス、有機電子デバイスの製造方法、プラズマ処理装置
KR102065686B1 (ko) 2017-12-05 2020-01-13 인하대학교 산학협력단 그래피틱 카본 나이트라이드의 제조방법, 그래피틱 카본 나이트라이드-폴리스티렌 복합체의 제조방법 및 그래피틱 카본 나이트라이드-폴리스티렌 복합체를 포함하는 oled 소자

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2020400A1 (en) * 2006-05-22 2009-02-04 Kabushiki Kaisha Toyota Chuo Kenkyusho Amorphous carbon film, method for forming amorphous carbon film, electroconductive member comprising amorphous carbon film, and separator for fuel battery
WO2009028485A1 (ja) * 2007-08-31 2009-03-05 Tokyo Electron Limited 有機電子デバイス、有機電子デバイスの製造方法、有機電子デバイスの製造装置、基板処理システム、保護膜の構造体、および制御プログラムが記憶された記憶媒体

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006352000A (ja) * 2005-06-20 2006-12-28 Canon Inc 有機発光素子
JP5041713B2 (ja) * 2006-03-13 2012-10-03 東京エレクトロン株式会社 エッチング方法およびエッチング装置、ならびにコンピュータ読取可能な記憶媒体

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2020400A1 (en) * 2006-05-22 2009-02-04 Kabushiki Kaisha Toyota Chuo Kenkyusho Amorphous carbon film, method for forming amorphous carbon film, electroconductive member comprising amorphous carbon film, and separator for fuel battery
WO2009028485A1 (ja) * 2007-08-31 2009-03-05 Tokyo Electron Limited 有機電子デバイス、有機電子デバイスの製造方法、有機電子デバイスの製造装置、基板処理システム、保護膜の構造体、および制御プログラムが記憶された記憶媒体

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
STEPHEN MUHL等: "A review of the preparation of carbon nitride films", 《DIAMOND AND RELATED MATERIALS》, vol. 8, 31 December 1999 (1999-12-31), pages 1809 - 1830 *
YUTA IWANO等: "Study of Amorphous Carbon Nitride Films Aiming at White Light Emitting Devices", 《JAPANESE JOURNAL OF APPLIED PHYSICS》, vol. 47, no. 10, 17 October 2008 (2008-10-17), pages 7842 - 7844, XP 001520241, DOI: doi:10.1143/JJAP.47.7842 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105529239A (zh) * 2016-03-07 2016-04-27 京东方科技集团股份有限公司 一种干法刻蚀装置及方法

Also Published As

Publication number Publication date
TW201105819A (en) 2011-02-16
KR101284671B1 (ko) 2013-07-16
WO2010104152A1 (ja) 2010-09-16
KR20110138373A (ko) 2011-12-27
JP2010219112A (ja) 2010-09-30

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Application publication date: 20120208