CN102346156A - 测定选择性催化还原脱硝催化剂活性组分含量的方法 - Google Patents
测定选择性催化还原脱硝催化剂活性组分含量的方法 Download PDFInfo
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- CN102346156A CN102346156A CN2011101744369A CN201110174436A CN102346156A CN 102346156 A CN102346156 A CN 102346156A CN 2011101744369 A CN2011101744369 A CN 2011101744369A CN 201110174436 A CN201110174436 A CN 201110174436A CN 102346156 A CN102346156 A CN 102346156A
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- 238000000034 method Methods 0.000 title claims abstract description 29
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- 230000004907 flux Effects 0.000 claims description 12
- 230000004927 fusion Effects 0.000 claims description 11
- 238000005303 weighing Methods 0.000 claims description 11
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 10
- 230000000694 effects Effects 0.000 claims description 10
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- 239000011159 matrix material Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 6
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 229910052744 lithium Inorganic materials 0.000 claims description 6
- 238000006467 substitution reaction Methods 0.000 claims description 5
- 239000006184 cosolvent Substances 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 abstract description 18
- 238000005259 measurement Methods 0.000 abstract description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 2
- 238000002844 melting Methods 0.000 abstract 1
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- 238000005516 engineering process Methods 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical class [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- WKXHZKXPFJNBIY-UHFFFAOYSA-N titanium tungsten vanadium Chemical compound [Ti][W][V] WKXHZKXPFJNBIY-UHFFFAOYSA-N 0.000 description 2
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
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Abstract
Description
单位/g | D1 | D2 | D3 | D4 | D5 | D6 | D7 |
C | 0.000 | 0.230 | 0.750 | 1.500 | 2.250 | 3.695 | 4.435 |
WO3 | 0.493 | 0.690 | 0.900 | 1.100 | 1.300 | 1.350 | 1.500 |
TiO2 | 7.007 | 6.580 | 5.850 | 4.900 | 3.950 | 2.455 | 1.565 |
基质 | 2.500 | 2.500 | 2.500 | 2.500 | 2.500 | 2.500 | 2.500 |
单位/% | D1 | D2 | D3 | D4 | D5 | D6 | D7 |
V2O5 | 0.00 | 0.46 | 1.51 | 3.00 | 4.50 | 7.39 | 8.87 |
WO3 | 4.93 | 6.90 | 9.00 | 11.00 | 13.00 | 13.50 | 15.00 |
样品 | V-Kβ射线强度/kcps | W-Lα射线强度/kcps |
E4 | 6.00 | 466.50 |
Z1 | 5.80 | 450.41 |
测试样Z1修正后V2O5的X射线强度 | 5.79 |
测试样Z1修正后WO3的X射线强度 | 450.10 |
样品 | V-Kβ射线强度/kcps | W-Lα射线强度/kcps |
E2 | 1.77 | 310.29 |
Z2 | 1.81 | 320.54 |
测试样Z2修正后V2O5的X射线强度 | 1.82 |
测试样Z2修正后WO3的X射线强度 | 310.18 |
样品 | V-Kβ射线强度/kcps | W-Lα射线强度/kcps |
E5 | 8.76 | 531.16 |
Z3 | 10.60 | 550.02 |
测试样Z3修正后V2O5的X射线强度 | 10.57 |
测试样Z3修正后WO3的X射线强度 | 549.11 |
Claims (2)
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CN 201110174436 CN102346156B (zh) | 2011-06-24 | 2011-06-24 | 测定选择性催化还原脱硝催化剂活性组分含量的方法 |
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CN102346156A true CN102346156A (zh) | 2012-02-08 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103018215A (zh) * | 2012-11-05 | 2013-04-03 | 广东电网公司电力科学研究院 | 一种测定火电厂scr催化剂活性组分含量的装置和方法 |
CN105136832A (zh) * | 2015-09-09 | 2015-12-09 | 重庆长安工业(集团)有限责任公司 | 金属氧化物催化剂中TiO2、V2O5、WO3检测方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0623817A1 (en) * | 1993-04-23 | 1994-11-09 | Shimadzu Corporation | Local analysis of a specimen in an x-ray fluorescence spectrometer |
JP2006071311A (ja) * | 2004-08-31 | 2006-03-16 | Rigaku Industrial Co | 蛍光x線分析装置およびそれに用いるプログラム |
CN101059456A (zh) * | 2007-05-31 | 2007-10-24 | 中国铝业股份有限公司 | 一种x射线荧光光谱法测定氟化铝中元素的方法 |
CN102072912A (zh) * | 2009-11-05 | 2011-05-25 | 株式会社堀场制作所 | 浓度测量方法和荧光x射线分析装置 |
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2011
- 2011-06-24 CN CN 201110174436 patent/CN102346156B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0623817A1 (en) * | 1993-04-23 | 1994-11-09 | Shimadzu Corporation | Local analysis of a specimen in an x-ray fluorescence spectrometer |
JP2006071311A (ja) * | 2004-08-31 | 2006-03-16 | Rigaku Industrial Co | 蛍光x線分析装置およびそれに用いるプログラム |
CN101059456A (zh) * | 2007-05-31 | 2007-10-24 | 中国铝业股份有限公司 | 一种x射线荧光光谱法测定氟化铝中元素的方法 |
CN102072912A (zh) * | 2009-11-05 | 2011-05-25 | 株式会社堀场制作所 | 浓度测量方法和荧光x射线分析装置 |
Non-Patent Citations (1)
Title |
---|
陈斌等: "X射线荧光光谱法测定催化剂涂层中钯、铑的含量", 《化学工业与工程技术》 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103018215A (zh) * | 2012-11-05 | 2013-04-03 | 广东电网公司电力科学研究院 | 一种测定火电厂scr催化剂活性组分含量的装置和方法 |
CN105136832A (zh) * | 2015-09-09 | 2015-12-09 | 重庆长安工业(集团)有限责任公司 | 金属氧化物催化剂中TiO2、V2O5、WO3检测方法 |
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