CN102270565A - Substrate processing device - Google Patents
Substrate processing device Download PDFInfo
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- CN102270565A CN102270565A CN2011101585790A CN201110158579A CN102270565A CN 102270565 A CN102270565 A CN 102270565A CN 2011101585790 A CN2011101585790 A CN 2011101585790A CN 201110158579 A CN201110158579 A CN 201110158579A CN 102270565 A CN102270565 A CN 102270565A
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- lid
- carrying room
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
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- Condensed Matter Physics & Semiconductors (AREA)
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- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a substrate processing device capable of inhibiting the macrotype of the device and the increasing of occupation area. A plurality of processing chambers (30) for the vacuum treatment of substrates are arranged at the periphery of a vacuum conveying chamber (13) maintained to be in a vacuum environment. The processing chamber (30) is configured to be capable of opening or closing the upper opening of a vessel main body (31) via a cover body (32). A cover body opening and closing mechanism (6) is arranged to be moved along the periphery of the vacuum conveying chamber (13). The cover body (32) is equipped with a holding part (5). The cover body (32) is lifted from the processing chamber (30) by enabling the cover body of the cover body opening and closing mechanism (6) to be lifted at the opening or closing position.
Description
Technical field
The present invention relates to a kind of substrate board treatment that connects a plurality of process chambers that are used for treatment substrate at the vacuum carrying room.
Background technology
Known for example have, in the manufacturing process of FPD (Flat Panel Display), around the vacuum carrying room, a plurality of process chambers are set,, between vacuum carrying room and process chamber, carry out the substrate board treatment of the handing-over of substrates such as glass substrate by being arranged at the carrying arm in the carrying room.As the processing of the substrate as handled object being carried out with above-mentioned process chamber, processing such as the etching of can giving an example out, ashing (ashing), film forming.
For example, above-mentioned process chamber is made of the container body of mounting substrate and upper opening and the lid that can open and close the peristome of this container body, in the maintenance of its maintenance in carrying out process chamber, lid, lid can be taken out from container body.Gas tip that supply with to handle gas is set on lid, as the upkeep operation of lid one of, the exchange etc. of the parts of gas tip is arranged.
On-off action about this lid in patent documentation 1 has proposed a kind of scheme.In this structure, the switching mechanism that is arranged at the lid of each process chamber in utilization makes lid after the container body rising, makes lid slide into deviation position from container body.Then, after making lid decline, make the lid counter-rotating.In this gimmick, by make lid along with slide towards the direction of the conveyance direction quadrature of the substrate of process chamber, can reduce the area that the on-off action of lid needs.
Yet, because the FPD substrate is large substrate, so process chamber also forms the size on one side of plan view shape, for example is respectively the large-scale square tube type container of 3m, 3.5m.Therefore, in the structure in the mechanism that all needs to open and close lid at each process chamber and make lid counter-rotating and space, if the increase process chamber then be difficult to guarantee the space of lid of reversing, if be intended to guarantee the space, worry that then device further maximizes.In addition, owing to all be provided with the switching mechanism of lid,, can cause that then the manufacturing cost of device goes up if process chamber increases at each process chamber.
Patent documentation 1: TOHKEMY 2007-67218 communique (with reference to Fig. 1, Figure 19)
Summary of the invention
The present invention is based on above-mentioned thing and forms, and its purpose is to provide a kind of and connects the substrate board treatment of a plurality of process chambers that are used for treatment substrate at the vacuum carrying room, the maximization of restraining device, suppresses the technology of the increase of floor space.
Thus, substrate board treatment of the present invention is characterised in that to possess: the vacuum carrying room, and it is provided with substrate transferring mechanism, and is maintained vacuum environment; Preparatory vacuum chamber, its side with this vacuum carrying room is connected; The a plurality of process chambers that are used for treatment substrate, they and are provided with lid for to be connected with the side of above-mentioned vacuum carrying room and to be disposed at circumferentially mutually in the mode of circumferentially separating with above-mentioned preparatory vacuum chamber on each container body; Guide member, it is set to the circumferential extension along above-mentioned vacuum carrying room; Moving body, it is directed along this guide member; The lid maintaining body, its mode with the top that moves through above-mentioned process chamber by this moving body is arranged at this moving body, keeps lid also to make this lid lifting, so that with respect to said vesse main body mounting or dismounting lid; Drive division, it is used to make above-mentioned moving body to move along the guide sections part.
In addition, also can constitute: above-mentioned lid is provided with in horizontal expansion, be formed with the maintained portion that the fastener in space divides below being included in, above-mentioned lid maintaining body is provided with maintaining part, this maintaining part moves the space that enters the lower side that above-mentioned fastener divides on one side along the guide sections part on one side, rises afterwards and from lower side above-mentioned fastener is divided to push away and lift lid.
Further, the guide sections part also can constitute to be possessed: inboard guide member, and it is arranged on the above-mentioned vacuum carrying room or is arranged between above-mentioned vacuum carrying room and the process chamber; The guided outside parts, it is arranged on respect to above-mentioned process chamber and a side opposite with above-mentioned vacuum carrying room.
Further, also can constitute: the plan view shape of above-mentioned vacuum carrying room forms polygon, other sides being used to except the foreign side's side at above-mentioned vacuum carrying room in the middle of the side of above-mentioned vacuum carrying room to guarantee the side of maintenance area connect above-mentioned preparatory vacuum chamber and process chamber respectively.At this moment, in above-mentioned maintenance area, also can be provided with the lid reversing device that maintenance joins next lid and this lid is reversed from above-mentioned lid maintaining body.Further, also can constitute: above-mentioned vacuum carrying room has six sides, connects an above-mentioned preparatory vacuum chamber and four process chambers in above-mentioned side.
According to the present invention,, keep the lid maintaining body of lid mounting or dismounting (switching) to change jointly thereby be used in respect to a plurality of process chambers of configuration around the vacuum carrying room.And, because this lid maintaining body can be constituted along the mode that the upper area that is arranged in process chamber of process chamber moves, so when the mounting or dismounting of lid, do not need the horizontal space of vacuum processing chamber.Therefore, maximization that can restraining device suppresses to be provided with the increase of area (floor space).
Description of drawings
Fig. 1 is the stereogram of the execution mode of expression substrate board treatment involved in the present invention.
Fig. 2 is the cross-sectional vertical view of the inside of expression aforesaid substrate processing unit.
Fig. 3 is the profile of an example that expression is arranged at the process chamber of aforesaid substrate processing unit.
Fig. 4 is the vertical view of the part of expression aforesaid substrate processing unit.
Fig. 5 is the end view of the part of expression aforesaid substrate processing unit.
Fig. 6 is the end view of the part of expression aforesaid substrate processing unit.
Fig. 7 is the end view that is used to illustrate the effect of aforesaid substrate processing unit.
Fig. 8 is the end view that is used to illustrate the effect of aforesaid substrate processing unit.
Fig. 9 is the vertical view of other execution modes of expression aforesaid substrate processing unit.
Figure 10 is the end view of other execution modes of expression aforesaid substrate processing unit.
Figure 11 is the end view of further other execution modes of expression aforesaid substrate processing unit.
Description of reference numerals: S:FPD substrate; 13: carrying room; 30: process chamber; 31: container body; 32: lid; 4: the lid reversing device; 5: maintained portion; 50: the fastener branch; 6: cover body opening/closing mechanism; 62,91: inner track; 63,92: outer side track; 67A, 67B: wheel; 68A, 68B: mobile motor; 7: the lid maintaining part; 70: horizontal component.
Embodiment
Below, in the execution mode at substrate board treatment of the present invention, the situation that the FPD substrate is handled is described.As the processing of carrying out, for example etch processes.Fig. 1 is the stereogram of the general survey of this substrate board treatment 1 of expression, and Fig. 2 is the cross-sectional vertical view of the inside of this substrate board treatment 1 of expression.1A, 1B are used for mounting is taken in carriage C1, the C2 of a plurality of FPD substrates (hereinafter referred to as " substrate ") S from the outside carriage mounting portion among the figure.For example, these carriage mountings 1A of portion, 1B constitute and utilize elevating mechanism 11 shears C1, C2, can take in untreatment base S1 at a side carriage C1, take in the substrate S2 that has handled at the opposing party's carriage C2.
In addition, in the inboard of the carriage mounting 1A of portion, 1B, be provided with load lock (the load lock chamber) 12 and the vacuum carrying room 13 that form preparatory vacuum chamber.In addition, between the carriage mounting 1A of portion, 1B, the substrate transferring unit 21 that is used for carrying out the handing-over of substrate S between above-mentioned 2 carriage C1, C2 and load lock 12 is set at supporting station 14.For example, this substrate transferring unit 21 possesses: the base station 23 of these arms 22 is freely supported in the free and rotation of 2 arms 22 of upper and lower settings and advance and retreat.Above-mentioned load lock 12 constitutes its environment can be switched between vacuum environment and atmospheric pressure environment, and as shown in Figure 2, the inside of load lock 12 is equipped with the buffer frame 15 that is used for supporting substrates S.16 is locator (positioner) in the accompanying drawing.
The plan view shape of above-mentioned vacuum carrying room 13 constitutes polygon-shaped, regular hexagon shape for example, be equipped with a plurality of process chambers 30 in the side of vacuum carrying room 13, a plurality of process chambers 30 are to be connected the side of vacuum carrying room 13 and to be disposed at circumferential mutually in the mode of circumferentially separating with above-mentioned load lock 12.In this embodiment, be connected with 4 process chambers 30 respectively airtightly in the side corresponding with 4 limits in the vacuum carrying room 13.
In addition, with the corresponding side of a side on all the other 2 limits of vacuum carrying room 13, be connected with above-mentioned load lock 12 airtightly, foreign side's side of the side corresponding with the opposing party guarantees to have maintenance area M, M is provided with lid reversing device 4 in this maintenance area.In this embodiment, load lock 12 is set up in mutual opposed mode with lid reversing device 4.
Above-mentioned vacuum carrying room 13 constitutes and is maintained vacuum environment, as shown in Figure 2, is equipped with substrate transferring mechanism 25 in the inside of vacuum carrying room 13.And, utilize this substrate transferring mechanism 25, can be between above-mentioned load lock 12 and 4 process chambers 30 conveyance substrate S.
And, seal airtightly between above-mentioned load lock 12 and the vacuum carrying room 13, between vacuum carrying room 13 and process chamber 30 and the peristome that is communicated with load lock 12 and the atmospheric environment in the outside, and be situated between to be inserted with respectively and constitute gate valve to be opened/closed (gate valve) GV.
Then, with reference to Fig. 3, above-mentioned process chamber 30 is carried out simple explanation.For example, this process chamber 30 possesses: plan view shape constitutes the quadrangle shape, and at the container body 31 of top plate portion opening; And the top board peristome lid 32 of being arranged to open and close this container body 31.Above-mentioned lid 32 constitutes and utilizes cover body opening/closing mechanism 6 described later free with respect to container body 31 mounting or dismounting.For example, aforesaid substrate S is on one side for 2.2m, another side are the square substrate of the size about 2.5m, is that 3m, another side are the size about 3.5m one side above-mentioned process chamber 30 is set to horizontal profile.
In the inside of said vesse main body 31, on the bottom surface of container body 31,, dispose the mounting table 33 that is used for mounting substrate S via insulating element 33a.And container body 31 is connected with the vacuum exhaust unit that is for example formed by vacuum pump 34 via exhaust line 34a.In addition, in process chamber 30 above, with mounting table 33 opposed modes, as the gas supply part 35 of the shower nozzle that forms upper electrode to be set up by the mode that is supported at the outstanding support 36a in the inside of lid 32.36b is an insulating element among the figure, and 35a is the gas squit hole, and 37a is a gas supply pipe, and 37 is gas supply system, and 38a is a feeder rod used therein, and 38b is integrator (matching box), and 38 is high frequency electric source.
In such process chamber 30, by applying High frequency power to gas supply part 35, be formed with the plasma of handling gas in the space of the upper side of substrate S from high frequency voltage 38, carry out etch processes thus to substrate S.In addition, in the figure beyond Fig. 3, integrator 38b, high frequency electric source 38 and gas supply system 37 etc. are omitted for the ease of diagram.
Simple explanation is carried out in the processing action of substrate S herein.At first, utilize substrate transferring unit 21, substrate S1 is moved into load lock 12 from the side's that takes in untreatment base S1 carriage C1.In load lock 12, utilize buffer frame 15 to keep substrate S1, after the arm 22 of substrate transferring unit 21 is kept out of the way, discharge the gas in the load lock 12, with inner pressure relief till the specified vacuum degree.After vacuum attraction finishes, utilize locator 16 to carry out the contraposition of substrate S1.
Afterwards, open the gate valve GV between load lock 12 and the vacuum carrying room 13, utilize substrate transferring mechanism 25 to collect substrate S1, close above-mentioned gate valve GV.Then, open the gate valve GV between vacuum carrying room 13 and the predetermined process chamber 30, utilize substrate transferring mechanism 25 that aforesaid substrate S1 is moved into this process chamber 30, close above-mentioned gate valve GV.
And, in process chamber 30, as mentioned above, form plasma by the space on substrate S1, carry out etch processes to this substrate S1.After this etch processes finishes, the substrate S2 that utilizes substrate transferring mechanism 25 to collect to have handled, conveyance is to load lock 12, and then, aforesaid substrate S2 is by conveyance unit 21, the carriage C2 that is used to treatment substrate by conveyance.Thus, the processing of one piece of substrate is through with, and all substrate S1 that are equipped on the carriage C1 that untreatment base uses are carried out this processing.
Then, process chamber 30 is further detailed.Shown in Fig. 1～5, be provided with maintained portion 5 in the upper face center of above-mentioned lid 32.Fig. 5 is the end view of observing from the A-A line side of Fig. 2.Above-mentioned maintained portion 5 is made of a pair of hook parts 51,51 that dispose back to ground mutually.Each vertical component of these hook parts 51,51 is parallel to one side of the vacuum carrying room 13 that connects this process chamber 30, with respect to being configured with symmetry and the mode that is separated from each other with the central portion of the lid 32 of the direction of above-mentioned one side quadrature.Each horizontal component of hook parts 51,51 stretches out mutually on the contrary, forms the fastener that is kept by aftermentioned lid maintaining body 7 and divides 50.4 process chambers 30 constitute identical shape mutually in this embodiment, manage the upper surface of the lid 32 of chamber 30 throughout, are formed with identical shaped maintained portion 5 respectively in identical position mutually.
Further, in this substrate board treatment, engage and be used to open and close the cover body opening/closing mechanism 6 of lid 32 with above-mentioned maintained portion 5, the mode that moves with the periphery along above-mentioned vacuum carrying room 13 is set up.This cover body opening/closing apparatus 6 possesses a moving body of type shape 61.And this substrate board treatment possesses the guide member that is provided with in the mode along the circumferential extension of above-mentioned vacuum carrying room 13, and above-mentioned moving body 61 is constituted as on one side and is directed along this guide member, move on one side.In this embodiment, be provided with the inner track 62 that forms inboard guide member, according to being provided with the outer side track 63 that forms the guided outside parts across the opposed at certain intervals mode of chambers 30 with this inner track 62 at the upper surface of vacuum carrying room 13.Herein, as shown in Figure 5, process chamber 30, vacuum carrying room 13 are respectively by supporting station 30a, 13a supporting, and the pillar 63a that guided outside track 63 is provided with by devices spaced apart around vacuum carrying room 13 supports.
In this embodiment, because the plan view shape of vacuum carrying room 13 is the regular hexagon shape, so above-mentioned inner track 62 and outer side track 63 are set to respectively:, remove the concentric circles in the zone that faces load lock 12 with respect to the center of vacuum carrying room 13.Thus, the process chamber 30 that above-mentioned cover body opening/closing mechanism 6 is provided with respect to 4 sides at vacuum carrying room 13 moves with identical position relation mutually.
Above-mentioned inner track 62 is arranged at the periphery near zone of the upper surface of vacuum carrying room 13, and the upper surface at the vacuum carrying room 13 of the medial region of inner track 62 is provided with the peristome 17 of safeguarding usefulness.This peristome 17 has lid, is closed usually so that the inside of vacuum carrying room 13 is remained vacuum.When safeguarding,, peristome 17 is constituted bigger than this substrate transferring mechanism 25 can take out the mode of the substrate transferring structure 25 in the vacuum carrying room 13 from this peristome 17.
Above-mentioned moving body 61 constitutes that one is distolateral to be directed along above-mentioned inner track 62, and another is distolateral to be directed along above-mentioned outer side track 63.In this embodiment, as Fig. 1 and shown in Figure 5, moving body 61 possesses: the horizontal part 64 that flatly extends towards foreign side from vacuum carrying room 13, the inboard foot 65 that extends towards lower side towards the inner track 62 that is arranged at vacuum carrying room 13 from this horizontal part 64 and the outside foot 66 that extends to the lower side from the outer side track 63 of horizontal part 64 towards the outside that is arranged at process chamber 30.
A plurality of wheel 67A are arranged at the lower end side of above-mentioned inboard foot 65 along the moving direction of cover body opening/closing mechanism 6, and these wheels 67A constitutes by medial movement motor 68A and driven.And a plurality of wheel 67B are arranged at the lower end side of above-mentioned outside foot 66 along above-mentioned moving direction, and these wheels 67B is constituted as by outer side shifting motor 68B and is driven.As shown in Figure 6, in this embodiment, be provided with 2 wheels as wheel 67A and wheel 67B.These medial movement motor 68A and outer side shifting motor 68B are by the mode controlling and driving that moves along the periphery of vacuum carrying room 13 on one side of the opened and closed positions of the lid separately 32 by chambers 30 on one side with cover body opening/closing mechanism 6.In this embodiment, by wheel 67A, 67B and mobile motor 68A, 68B, above-mentioned moving body 61 constituted be used for the drive division that moves along the guide sections part.
And, this substrate board treatment 1 is arranged at this moving body 61 in order to the mode that moves process above above-mentioned process chamber 30 with above-mentioned moving body 61, for with respect to said vesse main body 31 mounting or dismounting lids 32, and be provided with the lid maintaining body 7 that keeps lid 32 and make lid 32 liftings.This lid maintaining body 7 possesses maintaining part 70, and this maintaining part 70 moves along above-mentioned guide rail 6 on one side, Yi Bian enter into the space that above-mentioned fastener divides 50 lower side, rises afterwards and divides 50 up to push away from lower side and to lift lid 32 above-mentioned fastener.This maintaining part 70 is formed by a pair of hook parts 71,71 that dispose relatively mutually.Each vertical component of these hook parts 71,71 divides the parallel and mode that be positioned at the outside of these hook parts 51,51 of the hook parts 51,51 of opened and closed positions and maintained portion 5 in space of 50 lower side to be configured to enter into fastener with respect to maintaining part 70.And each horizontal component 70a of hook parts 71,71 constitutes in the mode of inwards stretching out mutually.
These hook parts 71,71 freely are set up by jack mechanism 72,72 liftings that form elevating mechanism.This jack mechanism 72 possesses: carve the lifting shaft 73 be provided with ridge and be formed with the screw portion main body 74 of the ridge that screws togather with this lifting shaft 73 at inner face, be connected with the upper end of hook parts 71,71 in the lower end of lifting shaft 73 respectively.75 is lift motor among the figure, and 76 is reductor, and 2 screw portion main bodys 74 utilize shaft joint 77 to be connected with lift motor 75 via common reductor 76.78 is the supporting station of screw portion main body 74, lift motor 75 and reductor 76 among the figure.In such jack mechanism 72, if make 74 rotations of screw portion main body by lift motor 75 via reductor 76, shaft joint 77, then according to direction of rotation, lifting shaft 73 carries out lifting in the inside of screw portion main body 74 along not shown guide.78a, 64a are the peristomes that is formed at supporting station 78, horizontal part 64 respectively among Fig. 5.
Like this, when cover body opening/closing mechanism 6 is in above-mentioned opened and closed positions, the horizontal component 70a of lid maintaining body 7 divides the down position of 50 lower side, and by above-mentioned fastener being divided 50 push away up from lower side that lifting freely constitutes between the lifting position of lifting lid 32 at the fastener in maintained portion 5.
In addition, cover body opening/closing mechanism 6 forms, if lid maintaining body 7 is being under the state of above-mentioned down position, cover body opening/closing mechanism 6 is moved around vacuum carrying room 13, then cover body opening/closing mechanism 6 does not move with the maintained portion 5 of process chamber 30 with interfering, with respect to the opened and closed positions of chambers 30, the fastener that the horizontal component 70a of lid maintaining body 7 is positioned at maintained portion 5 divides 50 lower side.
Thus, manage throughout in the opened and closed positions of chamber 30, if lid maintaining body 7 is risen, then fastener divides 50 to be lifted by lid maintaining body 7, thereby opens lid 32.In addition, cover body opening/closing mechanism 6 keeps in above-mentioned lifting position under the state of lid 32, and lid 32 moves in the mode of top of process chamber 30 through other.Therefore, above-mentioned lifting position is set at, the height that can not move with other the mode of interference such as maintained portion 5 of process chamber 30 with the lid 32 that is lifted.
At the lid 32 that is kept by lid maintaining body 7, descend by make lid maintaining body 7 in above-mentioned opened and closed positions, join in container body 31 in the mode of the peristome of blocking container body 31.And cover body opening/closing structure 6 restarts to move till lid maintaining body 7 is dropped to above-mentioned down position further from this delivery position afterwards.
In addition, when process chamber 30 was the structure that is clipped between inner track 62 and the outer side track 63, the size of process chamber 30 also can constitute in mutual different mode.In this case, with cover body opening/closing mechanism 6 during along vacuum carrying room 13 circumferential mobile, when lid maintaining body 7 is in above-mentioned down position, this lid maintaining body 7 is not interfered with the maintained portion 5 of chambers 30, make cover body opening/closing mechanism 6 be positioned at the opened and closed positions of chambers 30, when being 7 risings of lid maintaining body,, constitute the maintained portion 5 and the cover body opening/closing mechanism 6 of chambers 30 in the mode that maintained portion 5 is lifted.If such structure, then when lid maintaining body 7 is disposed at above-mentioned down position, by cover body opening/closing mechanism 6, do not interfere with the maintained portion 5 of all process chamber 30, the periphery of cover body opening/closing mechanism 6 along vacuum carrying room 13 can be moved, can carry out the switching of the lid 32 of all process chambers 30.
Above-mentioned lid reversing device 4 constitutes, maintenance is from the lid 32 of above-mentioned lid maintaining body 7 handing-over and make it counter-rotating, for example, as Fig. 1 and shown in Figure 8, possess framework 41 that keeps lid 32 and the rotary driving part 42 that makes these framework 41 rotations along the rotating shaft of level.This rotary driving part 42 possesses CD-ROM drive motor 43, reductor 44 and bearing 45, and these are supported by supporting station 46.Above-mentioned framework 41 constitutes, and keeps the cover body opening/closing mechanism 6 of lid 32 to move to lid mounting position, when lid 32 is descended, keep this lid 32 around.
Further, in the above-described embodiment, the upper side position of lid reversing device 4 is the position of readiness of cover body opening/closing mechanism 6.And, in this embodiment, because vacuum carrying room 13 is clipped in the middle, be provided with lid reversing device 4 with load lock 12 opposed positions, so between load lock 12 and lid reversing device 4, be respectively arranged with 2 process chambers 30 in the both sides of lid reversing device 4.Therefore, for the cheap property that illustrates, will describe towards the direction of load lock 12 direction of advance from lid reversing device 4 as cover body opening/closing mechanism 6.
In the above-described embodiment, as Fig. 4 and shown in Figure 5, be provided with detection at each process chamber 30 and be used to make cover body opening/closing mechanism 6 to stop at the position transducer of the stop position of opened and closed positions.In this embodiment, above-mentioned position transducer forms by the light sensing, and for example, illuminating part is arranged at the outer surface of process chamber 30, and light accepting part is arranged at the position corresponding with above-mentioned illuminating part of the foreign side of outer side track 62.
For example, optical sensor is prepared the 1st optical sensor 81 and the 2nd optical sensor 82 in each chambers 30.When cover body opening/closing mechanism 6 was positioned at above-mentioned opened and closed positions, the 1st optical sensor 81 was arranged at the position of optical axis L of one distolateral (front side) blocking optical sensor 81 of moving body 61 of the direction of advance of cover body opening/closing mechanism 6.In addition, the 2nd optical sensor 82 be arranged at cover body opening/closing mechanism 6 direction of advance the 1st optical sensor 81 in face of side.81A, 82A are illuminating part in the accompanying drawing, and 81B, 82B are light accepting part.These detection signals from optical sensor 81,82 constitute, and are output at control part 100 described later, based on this detection signal, export deceleration instruction, halt instruction to mobile motor 68A, the 68B of cover body opening/closing mechanism 6 in control part 100.
For example be provided with the control part 100 that constitutes by electronic computer at this substrate board treatment.This control part 100 possesses the data processing division that is made of program, memory, CPU, enroll order (each step) to said procedure, this enrolls order and carries control signal from control part 100 to process chamber 30, conveyer, cover body opening/closing mechanism 6 etc., carry out the pre-arranged procedure, implement thus the processing of substrate the S for example on-off action, the counter-rotating action of lid 32 of etch processes, lid 32.This program is incorporated in electronic computer memory media for example floppy disk, CD, hard disk, MO memory portions such as (photomagneto disks), is installed in control part 100.
In addition, in control part 100, based on instruction from the operator, the position of readiness of cover body opening/closing mechanism 6 from the upper side of lid reversing device 4 moved towards the process chamber 30 that is intended to open lid 32, to keep the cover body opening/closing mechanism 6 of lid 32 to move to above-mentioned position of readiness, cover body opening/closing mechanism 6 mountings will be exported to mobile motor 68A, 68B, lift motor 65 in the instruction of lid reversing device 4 and so on.
Herein, in control part 100, though to utilizing the encoder of above-mentioned mobile motor 68A, 68B, can hold to some extent general stop position when the opened and closed positions of each lid 32 that cover body opening/closing mechanism 6 is stopped at process chamber 30, mobile motor 68A, 68B, but in this embodiment, based on the detected value of above-mentioned optical sensor 8, cover body opening/closing mechanism 6 can be stopped at above-mentioned opened and closed positions accurately.
For example, when cover body opening/closing mechanism 6 was positioned at above-mentioned position of readiness, above-mentioned optical sensor 81,82 was in the state of the ON that the optical axis of the optical axis of the 1st optical sensor 81 and the 2nd optical sensor 82 do not interdicted, and this ON signal is to control part 100 outputs.And, cover body opening/closing mechanism 6 is moving to from position of readiness when being intended to open and close the process chamber 30 of lid 32, at first the optical axis of the 2nd optical sensor 82 is moved above-mentioned one distolateral blocking of body 61, thereby forms the OFF state, so export the OFF signals from the 2nd optical sensor 82 to control part 100.In control part 100, based on this OFF signal, export deceleration instruction, thereby cover body opening/closing mechanism 6 underspeeds thus mobile lentamente to mobile motor 68A, the 68B of cover body opening/closing mechanism 6.
And,, then export the OFF signals to control part 100 from the 1st optical sensor 81 if the optical axis of the 1st optical sensor 81 is moved above-mentioned one distolateral blocking of body 61 and forms the OFF state.In control part 100, based on this OFF signal, export halt instruction to mobile motor 68A, the 68B of cover body opening/closing mechanism 6, cover body opening/closing mechanism 6 is stopped.Thus, the cover body opening/closing mechanism 6 above-mentioned opened and closed positions that can correctly manage chamber 30 throughout stops.
In such substrate board treatment 1, under normal conditions, be under the holding state at the position of readiness that makes cover body opening/closing mechanism 6 at the upper side of lid reversing device 4, substrate S is carried out above-mentioned etch processes.And, when the safeguarding of lid 32, process chamber 30, when open lid 32, lid maintaining body 7 is positioned under the state of down position, cover body opening/closing mechanism 6 is moved towards the process chamber 30 that forms object from position of readiness.At this moment, at position of readiness and form under the situation of the process chamber 30 that has other between the process chamber 30 of above-mentioned object, the fastener of the horizontal component 70a of lid maintaining body 7 by the maintained portion 5 of this process chamber 30 divides 50 lower side to advance.
And, in above-mentioned method, cover body opening/closing mechanism 6 is stopped in the opened and closed positions of the process chamber 30 that forms above-mentioned object, (with reference to Fig. 7 (a)).In this opened and closed positions, as mentioned above, the horizontal component 70a of the lid maintaining body 7 of cover body opening/closing mechanism 6, the fastener that is positioned at the maintained portion 5 of the process chamber 30 that forms above-mentioned object divides 50 lower side.Then, shown in Fig. 7 (b), rise, divide 50 mode, lift lid 32 from this process chamber 30 up to push away fastener at horizontal component 70a by making lid maintaining body 7.
Like this, keep under the state of lid 32 at cover body opening/closing mechanism 6, cover body opening/closing mechanism 6 moves towards above-mentioned lid reversing device 4.Then, shown in Fig. 8 (a), stop, thereby descend at framework 41 handing-over lids 32 from this mounting position in the lid mounting position of the upper side of this lid reversing device 4.And, lid maintaining body 7 further drops to down position, the fastener that makes the horizontal component 70a of lid maintaining body 7 be positioned at the maintained portion 5 of lid 32 divides 50 lower side, makes cover body opening/closing mechanism 6 move to not the position of interfering with the counter-rotating action of lid 32 then.
In addition, shown in Fig. 8 (b), in lid reversing device 4, keeping by rotary driving part 42, making this framework 41 under the state of lid 32, making lid 32 counter-rotatings around horizontal rotational shaft by framework 41.The inside of lid 32 is equipped with gas supply part 35 etc., with lid 32 counter-rotatings, safeguards under this gas supply part 35 state up.
In addition, can cover body opening/closing mechanism 6 be moved towards the process chamber 30 that forms object from position of readiness in that lid maintaining body 7 is positioned under the state of lifting position.In this case, in face of the opened and closed positions of the process chamber 30 that forms object, make after lid maintaining body 7 drops to down position, cover body opening/closing mechanism 6 is moved to opened and closed positions.
In the above-described embodiment, so that cover body opening/closing mechanism 6 is provided with along the mode that the periphery of vacuum carrying room 13 moves, and by being arranged at the lid maintaining body 7 of this cover body opening/closing mechanism 6, the mode of lifting respectively with the lid 32 with a plurality of process chambers 30 constitutes.And, because this lid maintaining body 7 is constituted in the mode along the upper area of the mobile process chamber 30 of the arrangement of process chamber 30, so the horizontal space of process chamber 30 when not needing the mounting or dismounting of lid 32.Therefore maximization that can restraining device suppresses to be provided with the increase of area (floor space).
In addition, owing to can utilize the lid 32 of all process chambers 30 of common cover body opening/closing mechanism 6 mounting or dismounting,, can realize the miniaturization of process chamber 30 so compare with the structure that the switching mechanism of lid 32 is set at each process chamber 30, maximization that can restraining device suppresses the increase of floor space.
Further, because cover body opening/closing mechanism 6 is arranged at the upper side of process chamber 30, so can realize miniaturization with comparing on every side in the structure that cover body opening/closing mechanism is set of process chamber 30.In addition owing to respect to a plurality of process chambers 30 common cover body opening/closing mechanism 6 is set and gets final product, so also be favourable to manufacturing cost.Further, need be in the maintenance area that each process chamber 30 is guaranteed lid 32 owing to can guarantee common maintenance area at a plurality of process chambers 30, thus from this viewpoint also can restraining device maximization.
Further, cover body opening/closing mechanism 6 is being constituted under the situation of type shape, one of cover body opening/closing mechanism 6 distolaterally moves along inner track 62, and another is distolateral to move along outer side track 63.Therefore, disperseed owing to load, so can move the lid 32 that is lifted with stable status by lid maintaining body 7.As mentioned above, because process chamber 30 is suitable large-scale, lid 32 also is the weight about 10000kg, so move with the state of scatteredload, advantage is very big.
Further, cover body opening/closing mechanism 6 is provided with respectively with process chamber 30, can be provided with the identical back of the structure of process chamber 30, vacuum carrying room 13 about inner track 62, outer side track 63.Therefore, can cooperate and be provided with the value height with substrate board treatment in the past.
Further, cover body opening/closing mechanism 6 along the periphery freedom of movement of vacuum carrying room 13 be set up, be usually located at the standby zone different with process chamber 30.Therefore,, near the gate valve GV between process chamber 30 and the vacuum carrying room 13, there is not barrier yet, do not hinder maintenance even if this cover body opening/closing mechanism 6 is set.In addition, by inner track 62 being arranged near the periphery of vacuum carrying room 13 space that can guarantee to form above-mentioned peristome 17 at the top plate portion of vacuum carrying room 13.Therefore, also has following advantage: where necessary, the substrate transferring mechanism 25 of vacuum carrying room 13 is taken out from this peristome 17, can safeguard.
In this embodiment,, also can inner track 62 be set in the support plate inboard, this support plate be arranged on the top board of vacuum carrying room 13 though inner track 62 can be set directly on the top board of vacuum carrying room 13.In such structure, have and can make inner track 62 in other zone, be arranged at the advantage of vacuum carrying room 13 and so on then.In addition, the pillar of supporting inner track 62 can be set on the top board of vacuum carrying room 13 also, inner track 62 is set on pillar.
Then, in conjunction with Fig. 9～Figure 11, other execution mode of the present invention is described.The difference of this execution mode and above-mentioned execution mode is: the inner track 91 that will form inboard guide member is arranged between process chamber 30 and the vacuum carrying room 13, and then inner track 91 and outer side track 92 is arranged at the full week of vacuum carrying room 13.By inner track 91 and outer side track 92 being arranged at the full week of vacuum carrying room 13, for example be set at the lid that possesses with the same maintained portion of the maintained portion 5 of process chamber 30 by the top with load lock 12, the switching of the lid of load lock 12 also can be undertaken by cover body opening/closing mechanism 6.
The upper side of the gate valve GV of above-mentioned inner track 91 between process chamber 30 and vacuum carrying room 13 is set to concentric circles with respect to the center of vacuum carrying room 13.And by the pillar 93 that is arranged at the zone that does not have gate valve GV, the mode that supports for inner track 91 constitutes.And outer side track 92 is in process chamber 30 and opposite side vacuum carrying room 13, is concentric circles with respect to the center of vacuum carrying room 13, is set up with the state that is supported by pillar 94.
Example shown in Figure 10, constitute inner track 91 and outer side track 92 are arranged at the position lower than the upper surface of process chamber 30, example shown in Figure 11 constitutes inner track 91 and outer side track 92 is arranged at the position higher than the upper surface of process chamber 30.Structure about other is identical with above-mentioned execution mode.
In these examples, therefore identical with above-mentioned execution mode because cover body opening/closing mechanism 6 moves the periphery along vacuum carrying room 13 on inner track 91 and the outer side track 92, maximization that can restraining device suppresses the increase of floor space.In addition, inner track 91 can be arranged at all of vacuum carrying room 13 on every side by being arranged at the upper side of gate valve GV.Therefore, cover body opening/closing mechanism 6 can be around moving, so be easy to move control around vacuum carrying room 13.
In addition, with above-mentioned execution mode in the same manner because cover body opening/closing mechanism 6 is constituted a type shape, so can be under the state of scatteredload, so that lid 32 stable status move, inner track 91, outer side track 92, cover body opening/closing mechanism 6 can be in substrate board treatment settings in the past.Further, because inner track 91 is arranged at the outside of vacuum carrying room 13,, be convenient to safeguard so can form above-mentioned peristome 17 at the top plate portion of vacuum carrying room 13.
More than, inner track also can constitute, and under the state that is supported by the pillar on every side that is arranged at vacuum carrying room 13, is arranged at the top board of vacuum carrying room 13.In addition, is under the situation of lightweight at process chamber 30 for the weight of small-sized grade, lid 32, cover body opening/closing mechanism 6 is not limited to a type shape, constitute from vacuum carrying room 13 sides or with the either party of the opposite side of vacuum carrying room 13 and extend to process chamber 30, also can constitute only by one-sided supporting.In this case, guide member be arranged at vacuum carrying room 13 sides or with the either party of the opposite side of vacuum carrying room 13.
In addition, also a plurality of cover body opening/closing mechanisms 6 can be provided with in the mode that moves along common guide member.Further, the plan view shape of vacuum carrying room 13 is not limited to the regular polygon shape, is not limited to the situation that a plurality of process chambers constitute identical mutually shape.In addition, the number of the process chamber 30 that is connected with vacuum carrying room 13 can be plural any number, and the lid reversing device 4 of lid 32 may not be set.Further, under the situation that lid reversing device 4 is set, can suitably select the arrangement of process chamber on every side 30 with the lid reversing device 4 of vacuum carrying room 13.Further, being used to drive division that moving body is moved along guide member, also can be the slide block that moves along guide member by motor.Further, the elevating mechanism of lifting lid maintaining body 7 can constitute, and in the upper end of hook parts 71a, 71a movable body is set, and is formed with the lifting shaft rotation of ridge at this movable body, thereby above-mentioned movable body is risen along lifting shaft.
In addition, the maintained portion 5 that is arranged at lid 32 is the structure that supplies lid maintaining body 7 liftings and lift maintained portion 5, and the shape of maintained portion 5 is not limited thereto, and also can be arranged at the side of lid 32.In addition, lid 32 may not be provided with maintained portion 5, also can magnet be set in the lower end of lid maintaining body 7, keeps lid to lift by this magnet sorption.
Claims (6)
1. substrate board treatment is characterized in that possessing:
The vacuum carrying room, it is provided with substrate transferring mechanism, and is maintained vacuum environment;
Preparatory vacuum chamber, its side with this vacuum carrying room is connected;
The a plurality of process chambers that are used for treatment substrate, they to be being connected with the side of described vacuum carrying room and being disposed at mutually circumferentially in the mode of circumferentially separating with described preparatory vacuum chamber, and on each container body lid are set;
Guide member, it is set to the circumferential extension along described vacuum carrying room;
Moving body, it is directed along this guide member;
The lid maintaining body, it is arranged at this moving body in the mode that moves the top of passing through described process chamber by this moving body, keeps lid and makes this lid lifting, so that with respect to described container body mounting or dismounting lid;
Drive division, it is used to make described moving body to move along described guide member.
2. substrate board treatment according to claim 1 is characterized in that,
Described lid is provided with in horizontal expansion, be formed with the maintained portion that the fastener in space divides below being included in,
Described lid maintaining body is provided with maintaining part, and this maintaining part moves the space that enters the lower side that described fastener divides along described guide member on one side on one side, rises afterwards and from lower side described fastener branch is pushed away and lift lid.
3. substrate board treatment according to claim 1 and 2 is characterized in that,
Described guide member possesses:
Inboard guide member, it is arranged on the described vacuum carrying room or is arranged between described vacuum carrying room and the process chamber;
The guided outside parts, it is arranged on respect to described process chamber and a side opposite with described vacuum carrying room.
4. according to each described substrate board treatment in the claim 1 to 3, it is characterized in that,
The plan view shape of described vacuum carrying room forms polygon,
Other sides being used to except the foreign side's side at described vacuum carrying room in the middle of the side of described vacuum carrying room to guarantee the side of maintenance area connect described preparatory vacuum chamber and process chamber respectively.
5. substrate board treatment according to claim 4 is characterized in that,
Be provided with the lid reversing device that maintenance joins next lid and this lid is reversed from described lid maintaining body in described maintenance area.
6. substrate board treatment according to claim 4 is characterized in that,
Described vacuum carrying room has six sides, connects a described preparatory vacuum chamber and four process chambers in described side.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-130153 | 2010-06-07 | ||
| JP2010130153 | 2010-06-07 | ||
| JP2010-133091 | 2010-06-10 | ||
| JP2010133091A JP5488227B2 (en) | 2010-06-07 | 2010-06-10 | Substrate processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102270565A true CN102270565A (en) | 2011-12-07 |
| CN102270565B CN102270565B (en) | 2014-03-12 |
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|---|---|---|---|
| CN201110158579.0A Expired - Fee Related CN102270565B (en) | 2010-06-07 | 2011-06-07 | Substrate processing device |
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| KR (1) | KR101258350B1 (en) |
| CN (1) | CN102270565B (en) |
Cited By (3)
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| CN110060925A (en) * | 2014-03-28 | 2019-07-26 | 株式会社斯库林集团 | Substrate processing method using same |
| CN110177422A (en) * | 2018-02-21 | 2019-08-27 | 克里斯托夫-赫伯特·迪纳 | Low-voltage plasma body cavity and its manufacturing method and low pressure plasma equipment |
| CN110299301A (en) * | 2018-03-23 | 2019-10-01 | 北京北方华创微电子装备有限公司 | Cap-opening mechanism for multi-cavity transmitting device |
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| CN1608318A (en) * | 2001-12-25 | 2005-04-20 | 东京毅力科创株式会社 | Processed body carrying device, and processing system with carrying device |
| CN2795158Y (en) * | 2002-04-12 | 2006-07-12 | 东京毅力科创株式会社 | Port structure in semiconductor processing device |
| CN101048327A (en) * | 2004-10-25 | 2007-10-03 | 东京毅力科创株式会社 | Carrying system, substrate treating device, and carrying method |
| JP2009164213A (en) * | 2007-12-28 | 2009-07-23 | Tokyo Electron Ltd | Vacuum processing apparatus and vacuum processing method, and storage medium |
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- 2011-06-07 CN CN201110158579.0A patent/CN102270565B/en not_active Expired - Fee Related
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| TW480592B (en) * | 1999-12-22 | 2002-03-21 | Tokyo Electron Ltd | Vacuum processing apparatus for semiconductor process |
| CN1608318A (en) * | 2001-12-25 | 2005-04-20 | 东京毅力科创株式会社 | Processed body carrying device, and processing system with carrying device |
| CN2795158Y (en) * | 2002-04-12 | 2006-07-12 | 东京毅力科创株式会社 | Port structure in semiconductor processing device |
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| CN110060925A (en) * | 2014-03-28 | 2019-07-26 | 株式会社斯库林集团 | Substrate processing method using same |
| CN110060925B (en) * | 2014-03-28 | 2023-02-17 | 株式会社斯库林集团 | Substrate processing method |
| CN110177422A (en) * | 2018-02-21 | 2019-08-27 | 克里斯托夫-赫伯特·迪纳 | Low-voltage plasma body cavity and its manufacturing method and low pressure plasma equipment |
| US11532465B2 (en) | 2018-02-21 | 2022-12-20 | Christof-Herbert Diener | Low-pressure plasma chamber, low-pressure plasma installation and method for producing a low-pressure plasma chamber |
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| CN110299301B (en) * | 2018-03-23 | 2021-11-16 | 北京北方华创微电子装备有限公司 | Uncapping mechanism for multi-cavity transmission device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101258350B1 (en) | 2013-04-30 |
| CN102270565B (en) | 2014-03-12 |
| KR20110134283A (en) | 2011-12-14 |
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