CN102261985A - Optical system wave aberration calibration apparatus and calibration method of using apparatus to test error - Google Patents
Optical system wave aberration calibration apparatus and calibration method of using apparatus to test error Download PDFInfo
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Abstract
An optical system wave aberration calibration apparatus and a calibration method of using the apparatus to test an error relate to the optical measurement technology field. The current optical system can not evaluate whether the test error satisfies a detection precision requirement before detecting an optical element and the current optical system can not select an appropriate phase shifting algorithm to process collected data. The above problems can be solved by using the invention. The method comprises the following steps: a light splitting system emits two beams of common-optical-path orthogonal-line polarized lights and after being emitted by a polarization splitting prism, the polarized lights are coupled to a reference fiber through a coupling lens; two spherical waves diffracted by the reference fiber perform interference and an interferogram can be acquired; a photoelectric detector is used to collect the interferogram and to transmit to a computer; piezoelectric ceramics are used to carry out phase shifting and the photoelectric detector collects the interferogram several times; a thirteen step phase shifting algorithm is used to carry out data processing analysis so as to obtain the test error. By using the invention, ultrahigh precision testing of the optical system wave aberration can be realized.
Description
Technical field
The present invention relates to field of optical measuring technologies, be specifically related to a kind of caliberating device of optical system wavefront aberration and the scaling method of this device to test error.
Background technology
The extreme ultraviolet lithography is the photoetching technique of future generation that is based upon on the conventional optical lithography basis, and it has inherited the development result of present optical lithography to greatest extent.The operation wavelength of extreme ultraviolet photolithographic is the extreme ultraviolet waveband of 13～14nm, all with traditional optical lithography great difference is arranged at aspects such as light source technology, optical system, extreme ultraviolet multilayer technique, reflective masks technology, superhigh precision control technology, resist technology, optical element processing/detection techniques.As the requirement of light projection photoetching objective lens in order to realize that photoetching resolution and critical dimension are controlled of one of litho machine core cell system, the RMS wave aberration of optical system should be less than λ/20.High-precision optical system like this just needs more high-precision test device, the advanced at present U.S. Zygo and the correlation interferometer product of Wyko company generally all adopt the standard spherical mirror head to produce the reference sphere ground roll, but because influences such as optics processing and assembling, the aberration that causes the reference sphere ground roll is all greater than λ/50, can't further reduce, this has just directly caused the accuracy of detection of current interferometer can only reach λ/20-λ/50 (λ=632.8nm), can not satisfy the detection requirement of extreme ultraviolet photolithographic projection objective system wave aberration far away.
Therefore, the reference sphere ground roll of searching superhigh precision just becomes the key issue place of improving the pick-up unit measuring accuracy.
Raymond N.Smart and J.Strong have invented point-diffraction interferometer in 1972, the spherical wave of the approximate ideal that it produces by the aperture diffraction has been eliminated the influence of conventional interferometer reference wave surface error as the reference ripple, has improved accuracy of detection greatly.Along with improving constantly that optical detection requires, point-diffraction interferometer shows its advantage just day by day, and is widely used in during high-precision optical detects, for the high Precision Detection of extreme ultraviolet photolithographic projection objective system wave aberration provides possibility.
Though point-diffraction interferometer has solved the problem of reference sphere ground roll, the nonlinearity erron of some error sources that exist in the point-diffraction interferometer such as the unstable error of light source, photodetector, the quantization error of photodetector, environmental error etc. are still limiting the accuracy of detection of interferometer.
People such as Bruning had proposed the movable phase interfere art in 1974, and he is incorporated into the locking phase Detection Techniques in the Communication Theory in the optical interferometry technology, is a great development in the area of computer aided interfere measurement technique.Its principle is to introduce orderly displacement between the phase differential of two coherent lights of interferometer, and corresponding mobile is also made in the position of interference fringe when reference light path (or phase place) changes.In this process, with photodetector interferogram is sampled, obtain the digital signal that computing machine can be handled through the image pick-up card digitizing, try to achieve PHASE DISTRIBUTION according to certain mathematical model according to intensity variations by computing machine at last.The advantage of movable phase interfere art is to calculate simply, speed is fast, precision is high, and gordian technique is to handle the data of measuring by Computer Analysis, thus the phase value that acquisition is surveyed.
In order to realize that optical detection develops to superhigh precision, the combination of point-diffraction interferometer and movable phase interfere art is an inexorable trend beyond doubt.
A kind of phase shift point-diffraction interferometer is by the object plane aperture plate, transmission grating, image planes aperture plate and photodetector are formed, produce desirable spherical wave after the measured optical unit or system's convergence by the aperture diffraction on the object plane aperture plate, through transmission grating generation diffraction, and on the image planes aperture plate, form some orders of diffraction, make+1 grade (or 0 grade) diffraction light produce the ideal ball ground roll as reference light by an aperture diffraction on the image planes aperture plate, 0 grade (or+1 grade) as test light, other orders of diffraction are inferior is blocked by the opaque section of image planes aperture plate diffraction light through window on the image planes aperture plate.Test light and reference light form interference fringe on photodetector, realized phase shift by horizontal mobile transmission grating, adopt the phase shift algorithm that striped is analyzed, and have improved measuring accuracy.
Another kind of phase shift point-diffraction interferometer places transmission grating before the object plane aperture plate, and the object plane aperture plate contains aperture and a bigger window, and 0 order diffraction light produces desirable spherical wave through small holes, and+1 order diffraction light directly passes through window.Two-beam is after tested optical element or system, be focused on the image planes aperture plate, here 0 order diffraction light process window is as test light, + 1 order diffraction light through the small holes diffraction as reference light, this phase shift point-diffraction interferometer two-beam is all only through an aperture filtering, a kind of point-diffraction interferometer has improved the light intensity of reference light relatively, has improved fringe contrast simultaneously.
Gary E.Sommargren was at patent US6909 in 2005,510 B2 " Application of the phase shifting diffraction interferometer for measuring convex mirrors and negative lenses " adopt the end face of two flexible fibre cores to replace aperture to constitute two optical fiber point-diffraction interferometers, the light of measuring fiber outgoing shines on the reference optical fiber end face by tested optical element, the diffracted wave of reflection back and reference optical fiber outgoing is interfered, on photodetector, form interference fringe through imaging len, pick-up unit has been introduced phase shift in optical system for testing, final two optical fiber phase shift point diffraction interferometers have been realized the high Precision Detection to convex lens and negative lens.
Yet, above-mentioned existing wave aberration pick-up unit can't can't estimate its test error before detection optical element or system and whether the phase shift algorithm satisfies the accuracy of detection requirement, this just might cause the out of true of testing result, thereby has brought difficulty for the detection that realizes superhigh precision.
Summary of the invention
The present invention can't estimate the problem whether its test error satisfies the accuracy of detection requirement and select suitable phase shift algorithm that the data of gathering are handled for solving existing optical system before the detection optical element, the scaling method of a kind of optical system wavefront aberration caliberating device and this device to test error is provided.
Optical system wavefront aberration caliberating device, this device comprise beam splitting system, coupled lens, reference optical fiber, electronic Polarization Controller, photodetector, computing machine; Described beam splitting system comprises laser instrument, neutral density filter, 1/2nd wave plates, polarization splitting prism, first quarter-wave plate, second quarter-wave plate, first prism of corner cube, second prism of corner cube, first plane mirror and second plane mirror; The light beam of described laser emitting is behind neutral density filter, 1/2nd wave plates and polarization splitting prism, the linearly polarized light that is divided into two bundle quadratures, behind first quarter-wave plate and first prism of corner cube of the first bunch polarized light through the horizontal direction of polarization splitting prism, reflex to polarization splitting prism through first plane mirror; Behind second quarter-wave plate and second prism of corner cube of the second polarization of light light through the polarization splitting prism vertical direction, reflex to polarization splitting prism through second plane mirror, the light beam of described polarization splitting prism outgoing is coupled in the reference optical fiber through coupled lens, the interferogram that the polarization state of electronic Polarization Controller control bundle, photodetector receive reference optical fiber end face reflection light beam is received by computing machine.
The scaling method of optical system wavefront aberration caliberating device test error, this method is finished by following steps:
Step 1, beam splitting system outgoing two bundles altogether the orhtogonal linear polarizaiton light of light path through the polarization splitting prism outgoing after the overcoupling Lens Coupling in reference optical fiber, two spherical waves of described reference optical fiber diffraction interfere, and obtain interferogram;
Described 13 step phase shift algorithms are:
Principle of work of the present invention: the present invention is for to judge whether the test suite of optical system wavefront aberration satisfies accuracy requirement, test error is demarcated, by analyzing the interferogram of two spherical waves that the direct diffraction of same optical fiber comes out, calibrate the test error that causes by the detector error in the optical system wavefront aberration pick-up unit, and judge whether it satisfies the accuracy of detection requirement, finally select and satisfy the detector that accuracy of detection requires; Adopt different phase shift Algorithm Analysis multi-frame interferometry figure, the interferogram data are handled thereby select that test error is suppressed 13 stronger step algorithms of ability.Finally can realize the superhigh precision of optical system wavefront aberration is detected by selecting suitable test suite and phase shift algorithm.
Beneficial effect of the present invention: the present invention utilizes Computer Processing to calibrate because the measuring error that the detector error is introduced satisfies the test suite that accuracy of detection requires thereby can select.The collection multi-frame interferometry is desired to make money or profit and is carried out data processing with 13 step phase shift algorithms, finally can realize the superhigh precision of optical system wavefront aberration is detected.
Description of drawings
Fig. 1 is the synoptic diagram of optical system wavefront aberration caliberating device of the present invention;
Among the figure: 1, laser instrument, 2, neutral density filter, 3,1/2nd wave plates, 4, polarization splitting prism, 5, first quarter-wave plate, 6, second quarter-wave plate, 7, first prism of corner cube, 8, second prism of corner cube, 9, piezoelectric ceramics, 10, first plane mirror, 11, second plane mirror, 12, coupled lens, 13, reference optical fiber, 14, electronic Polarization Controller, 15, photodetector, 16, computing machine.
Embodiment
Embodiment one, in conjunction with Fig. 1 present embodiment is described, optical system wavefront aberration caliberating device, this device comprise beam splitting system, coupled lens 12, reference optical fiber 13, electronic Polarization Controller 14, photodetector 15, computing machine 16; It is characterized in that described beam splitting system comprises laser instrument 1, neutral density filter 2,1/2nd wave plates 3, polarization splitting prism 4, first quarter-wave plate 5, second quarter-wave plate 6, first prism of corner cube 7, second prism of corner cube 8, first plane mirror 10 and second plane mirror 11; The light beam of described laser instrument 1 outgoing is behind neutral density filter 2,1/2nd wave plates 3 and polarization splitting prism 4, the linearly polarized light that is divided into two bundle quadratures, behind first quarter-wave plate 5 and first prism of corner cube 7 of the first bunch polarized light through the horizontal direction of polarization splitting prism 4, reflex to polarization splitting prism 4 through first plane mirror 10; Behind second quarter-wave plate 6 and second prism of corner cube 8 of the second polarization of light light through polarization splitting prism 4 vertical direction, reflex to polarization splitting prism 4 through second plane mirror 11, the light beam of described polarization splitting prism 4 outgoing is coupled in the reference optical fiber 13 through coupled lens 12, the polarization state of electronic Polarization Controller 14 control bundle, the interferogram that photodetector 15 receives reference optical fiber 13 end face reflection light beams is received by computing machine 16.
Behind first quarter-wave plate 5 and first prism of corner cube 7 of the described first bunch polarized light of present embodiment through the horizontal direction of polarization splitting prism 4, change of polarized direction 90 degree of the first bunch polarized light.
Behind second quarter-wave plate 6 and second prism of corner cube 8 of the described second bunch polarized light of present embodiment through polarization splitting prism 4 vertical direction, change of polarized direction 90 degree of the second bunch polarized light.
The described beam splitting system of present embodiment also comprises piezoelectric ceramics 9, adopts piezoelectric ceramics 9 to move second prism of corner cube 8 and realizes that step-length is the phase shift of pi/2.
The scaling method of embodiment two, optical system wavefront aberration caliberating device test error, this method is finished by following steps:
After overcoupling lens 12 are coupled in the reference optical fiber, two spherical waves of described reference optical fiber 13 diffraction interfere the orhtogonal linear polarizaiton light of step 1, the common light path of beam splitting system outgoing two bundles, obtain interferogram through polarization splitting prism 4 outgoing;
Described 13 step phase shift algorithms are:
The test error that the described test error of present embodiment causes for the detector error.
The polarization state that described electronic Polarization Controller 14 controls two bundles of present embodiment are total to the light path light beam is identical.
Described two bundles of present embodiment orhtogonal linear polarizaiton light common process coupled lens 12 after polarization splitting prism 4 outgoing of light path altogether are coupled to the reference optical fiber 13, the polarization state that employing is added in the 14 pairs of two-beams of electronic Polarization Controller on the reference optical fiber 13 is controlled and is made its unanimity, two spherical waves that come out from reference optical fiber 13 diffraction interfere, utilize photodetector 15 to gather interferogram, send into computing machine 16 and carry out data processing and analysis according to the phase shift algorithm, obtain the test error that causes by the detector error, if test error satisfies the requirement of optical system wavefront aberration accuracy of detection, can detect normally so, if do not meet the demands, can reselect the more detector of dominance energy so, repeated test is satisfied the test suite that accuracy of detection requires up to finally selecting;
In said process, can and regulate electronic Polarization Controller 14 and adjust the relative intensity of two-beam by rotation 1/2nd wave plates 3 to reach best fringe contrast, introduced insensitive first prism of corner cube 7 of Run-out error and second prism of corner cube 8, adjust the optical path difference of two-beam by moving first prism of corner cube 7, move second prism of corner cube 8 by piezoelectric ceramics 9 and realize that step-length is the phase shift of pi/2, make measurement result to second prism of corner cube 8 traversing insensitive in the phase shift process by introducing second plane mirror 11, realize the common light path of two-beam by introducing first plane mirror 10.Owing to there is not tested element, thereby measurement result only is to have introduced test error by the detector error, and whether the test error that utilizes this process evaluation detector error to cause meets accuracy requirement, thereby determines qualified test suite.The final realization detected the superhigh precision of optical system wavefront aberration.
Claims (7)
1. optical system wavefront aberration caliberating device, this device comprises beam splitting system, coupled lens (12), reference optical fiber (13), electronic Polarization Controller (14), photodetector (15), computing machine (16); It is characterized in that described beam splitting system comprises laser instrument (1), neutral density filter (2), 1/2nd wave plates (3), polarization splitting prism (4), first quarter-wave plate (5), second quarter-wave plate (6), first prism of corner cube (7), second prism of corner cube (8), first plane mirror (10) and second plane mirror (11); The light beam of described laser instrument (1) outgoing is behind neutral density filter (2), 1/2nd wave plates (3) and polarization splitting prism (4), the linearly polarized light that is divided into two bundle quadratures, behind first quarter-wave plate (5) and first prism of corner cube (7) of the first bunch polarized light through the horizontal direction of polarization splitting prism (4), reflex to polarization splitting prism (4) through first plane mirror (10); Behind second quarter-wave plate (6) and second prism of corner cube (8) of the second polarization of light light through polarization splitting prism (4) vertical direction, reflex to polarization splitting prism (4) through second plane mirror (11), the light beam of described polarization splitting prism (4) outgoing is coupled in the reference optical fiber (13) through coupled lens (12), the polarization state of electronic Polarization Controller (14) control bundle, the interferogram that photodetector (15) receives reference optical fiber (13) end face reflection light beam is received by computing machine (16).
2. optical system wavefront aberration caliberating device according to claim 1, it is characterized in that, behind first quarter-wave plate (5) and first prism of corner cube (7) of the described first bunch polarized light through the horizontal direction of polarization splitting prism (4), its change of polarized direction 90 degree.
3. optical system wavefront aberration caliberating device according to claim 1, it is characterized in that, behind second quarter-wave plate (6) and second prism of corner cube (8) of the described second bunch polarized light through first polarization splitting prism (4) vertical direction, its change of polarized direction 90 degree.
4. optical system wavefront aberration caliberating device according to claim 1 is characterized in that, described beam splitting system also comprises piezoelectric ceramics (9), adopts piezoelectric ceramics (9) to move second prism of corner cube (8) and realizes that step-length is the phase shift of pi/2.
5. the scaling method of optical system wavefront aberration caliberating device test error is characterized in that, this method is finished by following steps:
Step 1, beam splitting system outgoing two bundles altogether the orhtogonal linear polarizaiton light of light path through polarization splitting prism (4) outgoing after overcoupling lens (12) be coupled in the reference optical fiber (13), two spherical waves of described reference optical fiber (13) diffraction interfere, and obtain interferogram;
Step 2, the interferogram that step 1 is obtained are sent to computing machine (16) after adopting photodetector (15) to gather, and adopt piezoelectric ceramics (9) to carry out phase shift, and described photodetector (15) is gathered repeatedly interferogram; Adopt 13 step phase shift algorithms to carry out Data Management Analysis, obtain test error;
Described 13 step phase shift algorithms are:
6. the scaling method of optical system wavefront aberration caliberating device test error according to claim 5 is characterized in that, the test error that described test error causes for the detector error.
7. the scaling method of optical system wavefront aberration caliberating device test error according to claim 5 is characterized in that, the polarization state that described electronic Polarization Controller control two bundles are total to the light path light beam is identical.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN103076090A (en) * | 2013-01-22 | 2013-05-01 | 李剑平 | Laser interferometer optical path difference location method and system |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5317144A (en) * | 1989-08-29 | 1994-05-31 | Asahi Kogaku Kogyo Kabushiki Kaisha | Wave front aberration measuring apparatus having means for adjusting position of collimator lens |
| JPH11304641A (en) * | 1998-04-23 | 1999-11-05 | Canon Inc | Method and apparatus for measurement of wave front aberration |
| DE69717575T2 (en) * | 1996-09-20 | 2004-01-08 | Nikon Corp. | Methods and devices for measuring the deviation of a surface |
| JP2004273482A (en) * | 2003-03-05 | 2004-09-30 | Canon Inc | Equipment for measuring aberration, method for adjusting optical system |
| CN101609266A (en) * | 2009-07-20 | 2009-12-23 | 北京理工大学 | A kind of field measurement apparatus of wave aberration of photo-etching machine projection objective |
| CN101655670A (en) * | 2009-09-22 | 2010-02-24 | 北京理工大学 | On-line detection device with function of calibrating systematic error for wave aberration of projection objective of photoetching machine |
| CN101813894A (en) * | 2010-04-16 | 2010-08-25 | 北京理工大学 | On-line detection device of wave aberration of projection lens of lithography machine with precision calibration function |
-
2011
- 2011-06-13 CN CN 201110157897 patent/CN102261985B/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5317144A (en) * | 1989-08-29 | 1994-05-31 | Asahi Kogaku Kogyo Kabushiki Kaisha | Wave front aberration measuring apparatus having means for adjusting position of collimator lens |
| DE69717575T2 (en) * | 1996-09-20 | 2004-01-08 | Nikon Corp. | Methods and devices for measuring the deviation of a surface |
| JPH11304641A (en) * | 1998-04-23 | 1999-11-05 | Canon Inc | Method and apparatus for measurement of wave front aberration |
| JP2004273482A (en) * | 2003-03-05 | 2004-09-30 | Canon Inc | Equipment for measuring aberration, method for adjusting optical system |
| CN101609266A (en) * | 2009-07-20 | 2009-12-23 | 北京理工大学 | A kind of field measurement apparatus of wave aberration of photo-etching machine projection objective |
| CN101655670A (en) * | 2009-09-22 | 2010-02-24 | 北京理工大学 | On-line detection device with function of calibrating systematic error for wave aberration of projection objective of photoetching machine |
| CN101813894A (en) * | 2010-04-16 | 2010-08-25 | 北京理工大学 | On-line detection device of wave aberration of projection lens of lithography machine with precision calibration function |
Non-Patent Citations (3)
| Title |
|---|
| 刘景峰等: "移相式点衍射干涉仪的几个关键技术", 《仪器仪表学报》, vol. 28, no. 4, 30 April 2007 (2007-04-30), pages 179 - 182 * |
| 张海涛: "基于光学设计软件的相移点衍射干涉仪建模", 《中国光学与应用光学》, vol. 3, no. 6, 31 December 2010 (2010-12-31), pages 616 - 622 * |
| 邢廷文等: "193nm移相点衍射干涉仪的测量误差分析", 《光电工程》, vol. 36, no. 2, 28 February 2009 (2009-02-28), pages 67 - 72 * |
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