CN102212334B - Coarse grinding fluid for sapphire substrate and preparation method thereof - Google Patents

Coarse grinding fluid for sapphire substrate and preparation method thereof Download PDF

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Publication number
CN102212334B
CN102212334B CN 201110097782 CN201110097782A CN102212334B CN 102212334 B CN102212334 B CN 102212334B CN 201110097782 CN201110097782 CN 201110097782 CN 201110097782 A CN201110097782 A CN 201110097782A CN 102212334 B CN102212334 B CN 102212334B
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sapphire substrate
suspension
substrate sheet
rust
ratio
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CN 201110097782
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Chinese (zh)
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CN102212334A (en )
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景旭斌
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浙江露笑光电有限公司
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Abstract

本发明公开了一种蓝宝石衬底片粗磨研磨液,由碳化硼、水和悬浮液组成,碳化硼、水和悬浮液的重量比=2∶4∶1,所述悬浮液由分散剂、悬浮剂和防锈剂组成,分散剂、悬浮剂和防锈剂的重量比=2∶5∶1,所述分散剂为高分子有机醇,所述悬浮剂为高分子化合物,所述防锈剂为碱。 The present invention discloses a sapphire substrate sheet coarse polishing liquid, boron carbide, and the aqueous suspension composition, the weight of boron carbide, the ratio of water and the suspension = 2:4:1, said suspension by a dispersant, a suspension and anti-rust agent composition, by weight of a dispersing agent, suspending agent and rust = 2:5:1 ratio, the dispersing agent is a polymeric organic alcohols, said suspending agent is a polymer compound, a rust inhibitor It is a base. 本发明由于采用了上述技术方案,所得研磨液成本低,稳定性好,大大提高加工效率,使得晶片平整度大为提高。 The present invention adopts the above technical solution, the resulting polishing liquid is low cost, good stability, greatly improve the processing efficiency, so that the flatness of the wafer is greatly improved.

Description

蓝宝石衬底片粗磨研磨液及其配制方法 Coarse polishing liquid sapphire substrate sheet and its preparation method

技术领域 FIELD

[0001] 本发明涉及一种蓝宝石衬底片粗磨研磨液及其配制方法。 [0001] The present invention relates to a sapphire substrate sheet coarse polishing liquid and its preparation method.

背景技术 Background technique

[0002] 双面减薄是蓝宝石衬底片加工工序的第一步,也是至关重要的一步,双面减薄的厚度、TTV、背面粗糙度直接影响后序的加工质量。 [0002] Double-sided thinning the sapphire substrate is the first step of the film processing step, is a crucial step, duplex reduced thickness, of TTV, backside roughness quality processing sequence directly after impact. 通常双面研磨采用氧化铝或金刚石粉进行研磨,这两种材质不利于蓝宝石平整度要求,而且成本高昂。 Usually double-side polishing using an alumina or diamond powder is ground, these two materials not conducive sapphire flatness requirements, and costly.

发明内容 SUMMARY

[0003] 本发明所要解决的技术问题是提供一种蓝宝石衬底片粗磨研磨液及其配制方法,所得研磨液成本低,稳定性好。 [0003] The present invention solves the technical problem of providing a sapphire substrate sheet coarse polishing liquid and its preparation method, the resulting polishing liquid is low cost, good stability.

[0004] 为解决上述技术问题,本发明采用如下技术方案:蓝宝石衬底片粗磨研磨液,由碳化硼、水和悬浮液组成,碳化硼、水和悬浮液的重量比=2: 4: 1,所述悬浮液由分散剂、悬浮剂和防锈剂组成,分散剂、悬浮剂和防锈剂的重量比=2: 5: 1,所述分散剂为高分子有机醇,所述悬浮剂为高分子化合物,所述防锈剂为碱。 [0004] To solve the above problems, the present invention adopts the following technical solution: a sapphire substrate sheet coarse polishing liquid, boron carbide, and the aqueous suspension composition, the weight of boron carbide, and aqueous suspensions ratio = 2: 4: 1 the suspension of the dispersant, suspending agent and anti-rust composition, by weight of dispersants, suspending agents and corrosion inhibitors ratio = 2: 5: 1, the dispersant is a polymeric organic alcohols, said suspending agent the polymer compound as the rust inhibitor is a base.

[0005] 作为优选,所述高分子有机醇为乙二醇。 [0005] Advantageously, the polymeric organic alcohol is ethylene glycol.

[0006] 作为优选,所述高分子化合物为硬脂酸。 [0006] Advantageously, said polymer compound is stearic acid.

[0007] 作为优选,所述碱为氢氧化钠。 [0007] Advantageously, the base is sodium hydroxide.

[0008] 蓝宝石衬底片粗磨研磨液的配制方法,包括以下步骤:a、按照权利要求1所述配比称取原料混合;b、将步骤a所得液体用100目过滤网过滤;c、将步骤b所得液体用超声波振荡仪振荡15分钟。 [0008] The sapphire substrate sheet coarse polishing solution preparation method, comprising the steps of: a, according to claim 1 ratio of mixed raw materials weighed; B, step a resulting liquid was filtered through a 100 mesh filter; C, the step b The resulting solution is shaken by an ultrasonic shaker for 15 minutes.

[0009] 作为优选,所述超声波振荡仪的频率为28khz,功率为300w。 [0009] Advantageously, the ultrasonic oscillation frequency is 28khz instrument, the power of 300w.

[0010] 本发明由于采用了上述技术方案,所得研磨液成本低,稳定性好,大大提高加工效率,使得晶片平整度大为提高。 [0010] The present invention adopts the above technical solution, the resulting polishing liquid is low cost, good stability, greatly improve the processing efficiency, so that the flatness of the wafer is greatly improved.

具体实施方式 detailed description

[0011] 蓝宝石衬底片粗磨研磨液,由碳化硼、水和悬浮液组成,碳化硼、水和悬浮液的重量比=2: 4: 1,所述悬浮液由乙二醇、硬脂酸和氢氧化钠组成,乙二醇、硬脂酸和氢氧化钠的重量比=2: 5:1。 [0011] sapphire substrate sheet coarse polishing liquid, boron carbide, and the aqueous suspension composition, boron carbide, by weight of water and the suspension ratio = 2: 4: 1, said suspension from ethylene glycol stearate, and sodium hydroxide composition, weight of ethylene glycol, stearic acid and sodium hydroxide ratio = 2: 5: 1. 其中,碳化硼采用型号F240的碳化硼。 Among them, the use of boron carbide in the F240 model.

[0012] 蓝宝石衬底片粗磨研磨液的配制方法,包括以下步骤:a、按照权利要求1所述配比称取原料混合山、将步骤a所得液体用100目过滤网过滤;c、将步骤b所得液体用超声波振荡仪振荡15分钟。 [0012] sapphire substrate sheet coarse polishing solution preparation method, comprising the steps of: a, according to claim 1 ratio of mixed raw materials were weighed Hill, step a resulting liquid was filtered through a 100 mesh filter; C, step b The resulting solution is shaken by an ultrasonic shaker for 15 minutes. 所述超声波振荡仪的频率为28khz,功率为300w。 The frequency of the ultrasonic oscillation analyzer 28khz, power of 300w.

[0013] 采用本发明碳化硼研磨液加工出的产品,整盘厚度精确到目标厚度±lum,表面平整度TTV ( 2um,背面无划伤,背面粗糙度0.8〜1.2um。 [0013] The polishing liquid of the present invention, boron carbide processed products, the entire thickness of the disk to a target thickness precision ± lum, surface flatness TTV (2um, abaxially scratches, backside roughness 0.8~1.2um.

Claims (4)

  1. 1.蓝宝石衬底片粗磨研磨液,其特征在于:由碳化硼、水和悬浮液组成,碳化硼、水和悬浮液的重量比=2:4:1,所述悬浮液由分散剂、悬浮剂和防锈剂组成,分散剂、悬浮剂和防锈剂的重量比=2:5:1,所述分散剂为乙二醇,所述悬浮剂为硬脂酸,所述防锈剂为碱。 1. coarse polishing liquid sapphire substrate sheet, wherein: boron carbide, and the aqueous suspension composition, the weight of boron carbide, and aqueous suspensions ratio = 2: 4: 1, said suspension by a dispersant, a suspension and anti-rust agent composition, by weight of a dispersing agent, suspending agent and rust ratio = 2: 5: 1, the dispersing agent is a glycol, the suspending agent is stearic acid, the rust inhibitor is base.
  2. 2.根据权利要求1所述蓝宝石衬底片粗磨研磨液,其特征在于:所述碱为氢氧化钠。 2. The sapphire substrate sheet 1 coarse polishing liquid according to claim, wherein: said base is sodium hydroxide.
  3. 3.根据权利要求1所述蓝宝石衬底片粗磨研磨液的配制方法,其特征在于:包括以下步骤:a、按照权利要求1所述配比称取原料混合;b、将步骤a所得液体用100目过滤网过滤;c、将步骤b所得液体用超声波振荡仪振荡15分钟。 3. The sapphire substrate sheet according to claim 1 coarse polishing solution preparation method, characterized by: comprising the steps of: a, according to claim 1, said mixing ratio of the raw materials; B, step a resulting liquid was 100 mesh filter filtration; c, step b resulting solution is shaken by an ultrasonic shaker for 15 minutes.
  4. 4.根据权利要求3所述蓝宝石衬底片粗磨研磨液的配制方法,其特征在于:所述超声波振荡仪的频率为28kHz,功率为300W。 According to claim 3 of the sapphire substrate sheet preparation method of claim coarse polishing liquid, wherein: the frequency of the ultrasonic oscillation analyzer to 28kHz, power is 300W.
CN 201110097782 2011-04-19 2011-04-19 Coarse grinding fluid for sapphire substrate and preparation method thereof CN102212334B (en)

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CN104669105B (en) * 2013-11-26 2017-12-29 浙江汇锋塑胶科技有限公司 Sapphire one kind of double-side polishing method for a touch panel
CN105538131A (en) * 2015-12-02 2016-05-04 珠海东精大电子科技有限公司 Sapphire diaphragm machining process
CN105482715A (en) * 2015-12-02 2016-04-13 珠海东精大电子科技有限公司 Sapphire grinding liquid, and preparation method and use method thereof
CN105505231A (en) * 2016-02-24 2016-04-20 湖南皓志科技股份有限公司 Efficient boron carbide grinding fluid and method for preparing same
CN106497515A (en) * 2016-10-25 2017-03-15 河南醒狮供应链管理有限公司 Carbide ultrahard material for grinding sapphire wafer
CN107057641A (en) * 2016-12-31 2017-08-18 东莞市淦宏信息科技有限公司 Special grinding fluid for synthetic sapphire camera lens

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US20050211950A1 (en) * 2004-03-24 2005-09-29 Cabot Microelectronics Corporation Chemical-mechanical polishing composition and method for using the same
CN100478412C (en) * 2007-02-06 2009-04-15 中国科学院上海微系统与信息技术研究所 Chemical mechanical polishing pulp for sapphire substrate underlay

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