CN103709993B - Self-sharpening diamond abrasive material and preparation method thereof - Google Patents
Self-sharpening diamond abrasive material and preparation method thereof Download PDFInfo
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- 239000010432 diamond Substances 0.000 title claims abstract description 105
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 105
- 239000003082 abrasive agent Substances 0.000 title claims abstract description 52
- 238000002360 preparation method Methods 0.000 title claims description 19
- 239000002994 raw material Substances 0.000 claims abstract description 56
- 239000000843 powder Substances 0.000 claims abstract description 22
- 239000002245 particle Substances 0.000 claims abstract description 19
- 239000011230 binding agent Substances 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 238000000227 grinding Methods 0.000 claims abstract description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000005520 cutting process Methods 0.000 claims abstract description 6
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000000956 alloy Substances 0.000 claims abstract description 4
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 4
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 4
- 239000010941 cobalt Substances 0.000 claims abstract description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052742 iron Inorganic materials 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 11
- 230000001590 oxidative effect Effects 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 238000009413 insulation Methods 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 238000003763 carbonization Methods 0.000 claims description 6
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 6
- 238000007517 polishing process Methods 0.000 claims description 4
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 3
- 239000003112 inhibitor Substances 0.000 claims description 3
- 230000001788 irregular Effects 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 239000011572 manganese Substances 0.000 claims description 3
- RTWNYYOXLSILQN-UHFFFAOYSA-N methanediamine Chemical compound NCN RTWNYYOXLSILQN-UHFFFAOYSA-N 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 230000001629 suppression Effects 0.000 claims description 3
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims 1
- 238000005498 polishing Methods 0.000 abstract description 4
- 229910052594 sapphire Inorganic materials 0.000 abstract description 4
- 239000010980 sapphire Substances 0.000 abstract description 4
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 abstract 1
- ZETYUTMSJWMKNQ-UHFFFAOYSA-N n,n',n'-trimethylhexane-1,6-diamine Chemical compound CNCCCCCCN(C)C ZETYUTMSJWMKNQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000005304 optical glass Substances 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 abstract 1
- 238000000034 method Methods 0.000 description 9
- 239000006061 abrasive grain Substances 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 241000579895 Chlorostilbon Species 0.000 description 1
- 241000948242 Notropis atherinoides Species 0.000 description 1
- 244000137852 Petrea volubilis Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000010976 emerald Substances 0.000 description 1
- 229910052876 emerald Inorganic materials 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 229910001751 gemstone Inorganic materials 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The invention discloses a self-sharpening diamond abrasive material. The self-sharpening diamond abrasive material comprises the following raw materials by weight: 75-85% of a diamond abrasive materail, 13-20% of metal powder and 2-5% of a binding agent. The particle size of the diamond abrasive material is 0.5 [mu]m-100 [mu]m; the metal powder comprises iron, cobalt, manganese, or a mixture thereof, or an alloy; and the binding agent comprises diethylenetriamine, 1,3-cyclohexanebis(methylamine), trimethylhexamethylenediamine, or a mixture thereof or one of the above. The self-sharpening diamond abrasive material is rough in surface and has more grinding surface angles. When particles are suffering from stress, frangibility causes the particles broken, so that novel sharp cutting edge is generated and the self-sharpening property is better. The self-sharpening diamond abrasive material is particularly suitable for ultrafine grinding and polishing of magnetic heads, hard disks, optical glasses and sapphire wafers.
Description
Technical field
The present invention relates to a kind of diamond abrasive, be specifically related to a kind of self-sharpening diamond abrasive material and preparation method thereof.
Background technology
Diadust is a kind of meticulous super hard abrasive.Normally with submillimeter level diamond single crystal for raw material, through broken, shaping and a series of physical chemistry process, it is regular to make particle shape, meets the abrasive material of certain particle size distribution.It is super hard abrasive highest the most accurate in the world at present, is widely used in the every field such as machinery, electronics, metallurgy, building and national defence.It is usually used in processing hard and fragile material and the high workpiece of precision prescribed.Such as: the ball road of bearing, wolfram varbide and diamond die, various ceramic member, precision die, silicon chip, optical mirror slip, chip, various magneticsubstance components and parts, ruby, sapphire, emerald shiner, emerald, various diamond and stone bearing, various gauge.It both can have been made loose abrasive and use, and can be made into again lapping paste, abrasive sheet, precise abrasive plate, honing stone, polishing fluid, polycrystalline diamond composite sheet and sand paper and used.
In recent years, along with the develop rapidly of external new and high technology, the electricity demands of field to diamond abrasive such as material, all kinds of jewel, fine ceramics, opticglass, sealing member grow with each passing day, especially more and more higher to the quality requirements of diamond abrasive.Traditional diamond abrasive is single crystal structure, and particle surface is comparatively level and smooth, and hardness has directivity, and relevant with its crystal habit, subsurface defect and crystallographic dimension, cracked along cleavage surface when being subject to external impacts simultaneously, can produce very dark scuffing to institute's finished surface.
Polycrystalline diamond (micro mist) normally utilizes unique directional blasting method transformed by graphite and obtain, its granule crystal structure is very similar to natural Carbonado, by unsaturated link(age) in conjunction with polycrystalline structure, there is good toughness and self-sharpening, at polishing process, coarse particles can be broken into less particle, can avoid causing scuffing to workpiece surface, both ensure that workpiece surface quality, turn improve grinding cutting force efficiency, the superiority of its uniqueness is demonstrated in the product processing that some high quality requires, there is the advantage of high-wearing feature and long service life, be both cost of manufacture higher, tens times of normal diamond abrasive material. and mostly be nano level, content of graphite is many, scavenging process is complicated.
Summary of the invention
For the problems of the prior art, the invention provides a kind of self-sharpening diamond abrasive material and preparation method thereof, this kind of method production efficiency is high, the self-sharpening diamond abrasive material of preparation has and only has very high intensity and hardness, traditional diamond abrasive self-sharpening can also be overcome poor, the easy shortcoming producing scuffing, is specially adapted to the ultraprecise grinding of sapphire wafer and the polishing of magnetic head, hard disk, opticglass and LED industry.
The object of the present invention is achieved like this:
A kind of self-sharpening diamond abrasive material, is made up of the raw material of following weight per-cent: diamond abrasive raw material is: 75 ~ 85%. metal-powder raw materials are: 13 ~ 20%, and binding agent raw material is: 2 ~ 5%;
Described diamond abrasive granularity is: 0.5um ~ 100um; Metal-powder: iron, cobalt, manganese or their mixture or alloy. binding agent is: diethylenetriamine, 1,3-diaminomethyl cyclohexane, trimethylammonium six methylenediamine or their mixture or wherein a kind of;
The preparation method of described a kind of self-sharpening diamond abrasive material, concrete preparation method is as follows:
(1) prepare burden: weigh self-sharpening diamond abrasive material raw material by following weight ratio: diamond abrasive raw material is: 75 ~ 85%. metal-powder raw materials are: 13 ~ 20%, and binding agent raw material is: 2 ~ 5%;
(2) batch mixing: the raw material that step (1) takes is mixed;
(3) sinter: material step (2) obtained loads in crucible, puts into tube furnace together with crucible, and suction to 10
-3pa; Then be incubated 1 ~ 8 hour under being heated to the condition of 505 ~ 645 DEG C, after insulation terminates, be cooled to room temperature.
(4) purifying treatment: the non-diamond carbon of the vertical material oxidizing acid removing products therefrom particle surface that step (3) is obtained. namely obtain this product self-sharpening diamond abrasive material;
The median size of described self-sharpening diamond abrasive material is: 0.5um ~ 100um;
Described oxidizing acid is the mixture of any one or any two in sulfuric acid, nitric acid and perchloric acid;
Described self-sharpening diamond abrasive material shape is irregular, and median size is 2um ~ 50um;
According to the preparation method of above-mentioned self-sharpening diamond abrasive material, the particle surface of described self-sharpening diamond abrasive material has very large self-sharpening and toughness, automatically can peel off in good time and manifest the cutting edge made new advances in grinding and polishing process. both ensure that the high precision of processing, high-level efficiency also can not scratch workpiece;
The present invention adopts the effect of metal-powder to be: add metal-powder as suppression diamond abrasive by the inhibitor of excessive carbonization, it suitably can reduce the carbonization amount of diamond abrasive, thus makes diamond surface roughen.
positive beneficial effect:the self-sharpening diamond abrasive material that the present invention obtains, surface irregularity, have more grinding surface angle, when particle meets with stresses, its fragility causes granules decrepitate, thus produce new sharp cutting edge, self-sharpening is better, is specially adapted to the ultraprecise grinding of sapphire wafer and the polishing of magnetic head, hard disk, opticglass and LED industry.
Embodiment
below in conjunction with specific embodiment, the present invention is described further:
A kind of self-sharpening diamond abrasive material, is made up of the raw material of following weight per-cent: diamond abrasive raw material is: 75 ~ 85%. metal-powder raw materials are: 13 ~ 20%, and binding agent raw material is: 2 ~ 5%;
Described diamond abrasive granularity is: 0.5um ~ 100um; Metal-powder: iron, cobalt, manganese or their mixture or alloy. binding agent is: diethylenetriamine, 1,3-diaminomethyl cyclohexane, trimethylammonium six methylenediamine or their mixture or wherein a kind of;
The preparation method of described a kind of self-sharpening diamond abrasive material, concrete preparation method is as follows:
(1) prepare burden: weigh self-sharpening diamond abrasive material raw material by following weight ratio: diamond abrasive raw material is: 75 ~ 85%. metal-powder raw materials are: 13 ~ 20%, and binding agent raw material is: 2 ~ 5%;
(2) batch mixing: the raw material that step (1) takes is mixed;
(3) sinter: material step (2) obtained loads in crucible, puts into tube furnace together with crucible, and suction to 10
-3pa; Then be incubated 1 ~ 8 hour under being heated to the condition of 505 ~ 645 DEG C, after insulation terminates, be cooled to room temperature.
(4) purifying treatment: the non-diamond carbon of the vertical material oxidizing acid removing products therefrom particle surface that step (3) is obtained. namely obtain this product self-sharpening diamond abrasive material;
The median size of described self-sharpening diamond abrasive material is: 0.5um ~ 100um;
Described oxidizing acid is the mixture of any one or any two in sulfuric acid, nitric acid and perchloric acid;
Described self-sharpening diamond abrasive material shape is irregular, and median size is 0.5um ~ 50um;
According to the preparation method of above-mentioned self-sharpening diamond abrasive material, the particle surface of described self-sharpening diamond abrasive material has very large self-sharpening and toughness, automatically can peel off in good time and manifest the cutting edge made new advances in grinding and polishing process. both ensure that the high precision of processing, high-level efficiency also can not scratch workpiece;
The present invention adopts the effect of metal-powder to be: add metal-powder as suppression diamond abrasive by the inhibitor of excessive carbonization, it suitably can reduce the carbonization amount of diamond abrasive, thus makes diamond surface roughen.
embodiment 1
(1) prepare burden: get diamond abrasive granularity intermediate value and be 7 microns and do starting material. weigh the raw material of self-sharpening diamond abrasive material by following weight ratio: the raw material of diamond abrasive is: 75%. metal-powder raw material is: 20%, and binding agent raw material is: 5%;
(2) batch mixing: the raw material that step (1) takes is mixed;
(3) sinter: material step (2) obtained loads in crucible, puts into tube furnace together with crucible, and suction to 10
-3pa; Then be incubated 1 hour under being heated to the condition of 505 DEG C, after insulation terminates, be cooled to room temperature.
(4) purifying treatment: the non-diamond carbon of the vertical material oxidizing acid removing products therefrom particle surface that step (3) is obtained. namely obtain this product self-sharpening diamond abrasive material;
The self-sharpening diamond abrasive grain intermediate value obtained by aforesaid method is 6.5 microns.
embodiment 2
(1) prepare burden: get diamond abrasive granularity intermediate value and be 15 microns and do starting material. weigh the raw material of self-sharpening diamond abrasive material by following weight ratio: the raw material of diamond abrasive is: 85%. metal-powder raw material is: 13%, and binding agent raw material is: 2%;
(2) batch mixing: the raw material that step (1) takes is mixed;
(3) sinter: material step (2) obtained loads in crucible, puts into tube furnace together with crucible, and suction to 10
-3pa; Then be incubated 2.5 hours under being heated to the condition of 530 DEG C, after insulation terminates, be cooled to room temperature.
(4) purifying treatment: the non-diamond carbon of the vertical material oxidizing acid removing products therefrom particle surface that step (3) is obtained. namely obtain this product self-sharpening diamond abrasive material;
The self-sharpening diamond abrasive grain intermediate value obtained by aforesaid method is 14 microns.
embodiment 3
(1) prepare burden: get diamond abrasive granularity intermediate value and be 40 microns and do starting material. weigh the raw material of self-sharpening diamond abrasive material by following weight ratio: the raw material of diamond abrasive is: 80%. metal-powder raw material is: 15%, and binding agent raw material is: 5%;
(2) batch mixing: the raw material that step (1) takes is mixed;
(3) sinter: material step (2) obtained loads in crucible, puts into tube furnace together with crucible, and suction to 10
-3pa; Then be incubated 5 hours under being heated to the condition of 560 DEG C, after insulation terminates, be cooled to room temperature.
(4) purifying treatment: the non-diamond carbon of the vertical material oxidizing acid removing products therefrom particle surface that step (3) is obtained. namely obtain this product self-sharpening diamond abrasive material;
The self-sharpening diamond abrasive grain intermediate value obtained by aforesaid method is 25 microns.
embodiment 4
(1) prepare burden: get diamond abrasive granularity intermediate value and be 70 microns and do starting material. weigh the raw material of self-sharpening diamond abrasive material by following weight ratio: the raw material of diamond abrasive is: 82%. metal-powder raw material is: 15%, and binding agent raw material is: 3%;
(2) batch mixing: the raw material that step (1) takes is mixed;
(3) sinter: material step (2) obtained loads in crucible, puts into tube furnace together with crucible, and suction to 10
-3pa; Then be incubated 7 hours under being heated to the condition of 600 DEG C, after insulation terminates, be cooled to room temperature.
(4) purifying treatment: the non-diamond carbon of the vertical material oxidizing acid removing products therefrom particle surface that step (3) is obtained. namely obtain this product self-sharpening diamond abrasive material;
The self-sharpening diamond abrasive grain intermediate value obtained by aforesaid method is 40 microns.
embodiment 5
(1) prepare burden: get diamond abrasive granularity intermediate value and be 100 microns and do starting material. weigh the raw material of self-sharpening diamond abrasive material by following weight ratio: the raw material of diamond abrasive is: 83%. metal-powder raw material is: 13%, and binding agent raw material is: 4%;
(2) batch mixing: the raw material that step (1) takes is mixed;
(3) sinter: material step (2) obtained loads in crucible, puts into tube furnace together with crucible, and suction to 10
-3pa; Then be incubated 8 hours under being heated to the condition of 645 DEG C, after insulation terminates, be cooled to room temperature.
(4) purifying treatment: the non-diamond carbon of the vertical material oxidizing acid removing products therefrom particle surface that step (3) is obtained. namely obtain this product self-sharpening diamond abrasive material;
The self-sharpening diamond abrasive grain intermediate value obtained by aforesaid method is 50 microns.
In technical solution of the present invention, varigrained diamond abrasive treatment temp is different, generally the treatment temp that more carefully needs of granularity is lower, the treatment time needed is also shorter, therefore producing varigrained product processing condition used to be not quite similar, wherein raw material diamond abrasive material, is the diamond abrasive with natural or synthetic, granularity is: 0.5um ~ 50um, and in production process, vacuum tightness generally will reach 10
-3pa, if vacuum tightness is too low, causes reaction wayward.
Above embodiment is only for illustration of the preferred embodiment of the present invention; but the present invention is not limited to above-mentioned embodiment; in the ken that described exercising ordinary skill possesses; the any amendment done within the spirit and principles in the present invention, equivalent to substitute and improvement etc., it all should be encompassed within the technical scheme scope of request of the present invention protection.
Claims (7)
1. a self-sharpening diamond abrasive material, is characterized in that, is made up of the raw material of following weight per-cent: diamond abrasive raw material is: 75 ~ 85%, and metal-powder raw material is: 13 ~ 20%, and binding agent raw material is: 2 ~ 5%; Described diamond abrasive granularity is: 0.5um ~ 100um; Metal-powder raw material comprises iron, cobalt, manganese or their mixture or alloy; Binding agent comprises: diethylenetriamine, 1,3-diaminomethyl hexanaphthene, trimethylammonium six methylenediamine or their mixture or wherein a kind of.
2. the preparation method of a kind of self-sharpening diamond abrasive material as claimed in claim 1, it is characterized in that its preparation method, concrete preparation method is as follows:
(1) prepare burden: weigh self-sharpening diamond abrasive material raw material by following weight ratio: diamond abrasive raw material is: 75 ~ 85%, and metal-powder raw material is: 13 ~ 20%, and binding agent raw material is: 2 ~ 5%;
(2) batch mixing: the raw material that step (1) takes is mixed;
(3) sinter: material step (2) obtained loads in crucible, puts into tube furnace together with crucible, and suction to 10
-3pa; Then be incubated 1 ~ 8 hour under being heated to the condition of 505 ~ 645 DEG C, after insulation terminates, be cooled to room temperature;
(4) purifying treatment: the non-diamond carbon of the vertical material oxidizing acid removing products therefrom particle surface that step (3) is obtained. namely obtain product self-sharpening diamond abrasive material.
3. the preparation method of a kind of self-sharpening diamond abrasive material according to claim 2, is characterized in that: the median size of described self-sharpening diamond abrasive material is: 0.5um ~ 100um.
4. the preparation method of a kind of self-sharpening diamond abrasive material according to claim 2, is characterized in that: described oxidizing acid is the mixture of any one or any two in sulfuric acid, nitric acid and perchloric acid.
5. the preparation method of a kind of self-sharpening diamond abrasive material according to claim 2, is characterized in that: described self-sharpening diamond abrasive material shape is irregular, and median size is 0.5um ~ 50um.
6. the preparation method of a kind of self-sharpening diamond abrasive material according to claim 2, it is characterized in that: the particle surface of described self-sharpening diamond abrasive material has very large self-sharpening and toughness, automatically can peel off in grinding and polishing process in good time and manifest the cutting edge made new advances, both having ensure that the high precision of processing, high-level efficiency also can not scratch workpiece.
7. the preparation method of a kind of self-sharpening diamond abrasive material according to claim 2, it is characterized in that: the present invention adopts the effect of metal-powder to be: add metal-powder as suppression diamond abrasive by the inhibitor of excessive carbonization, it suitably can reduce the carbonization amount of diamond abrasive, thus makes diamond surface roughen.
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CN104028171A (en) * | 2014-06-23 | 2014-09-10 | 大连理工大学 | Detonation preparation method for alumina-adhered diamond nano composite particle material |
WO2016054816A1 (en) * | 2014-10-11 | 2016-04-14 | 河南飞孟金刚石工业有限公司 | Preparation method of rough-surface diamond granule |
CN105368398A (en) * | 2015-12-28 | 2016-03-02 | 祝世连 | Novel diamond abrasive material for LED sapphire substrate processing and preparation method of novel diamond abrasive material |
CN107473768B (en) * | 2017-08-10 | 2020-04-14 | 中南钻石有限公司 | Diamond surface roughening treatment method |
CN107652899B (en) * | 2017-10-18 | 2022-09-02 | 绍兴自远磨具有限公司 | Diamond liquid for polishing ceramic sapphire and manufacturing method thereof |
CN108795383A (en) * | 2018-06-05 | 2018-11-13 | 燕山大学 | A kind of preparation method improving diamond self-sharpening |
CN110295361B (en) * | 2019-06-25 | 2021-07-23 | 郑州航空工业管理学院 | Preparation method of multi-edge diamond abrasive particles |
CN111808572B (en) * | 2020-07-14 | 2021-04-27 | 南京航空航天大学 | Self-sharpening mixed particle size aggregate abrasive and preparation method thereof |
CN113717691A (en) * | 2021-08-31 | 2021-11-30 | 昆山捷纳电子材料有限公司 | Preparation method and application of polyethylene polyamine modified diamond composite abrasive particles |
CN115785906A (en) * | 2022-10-31 | 2023-03-14 | 南京航空航天大学 | Bonding method magnetic abrasive material with adjustable self-sharpening property and preparation method thereof |
CN116162442A (en) * | 2022-12-26 | 2023-05-26 | 河南省惠丰金刚石有限公司 | Preparation method of self-sharpening agglomerated abrasive |
CN116218469A (en) * | 2022-12-26 | 2023-06-06 | 河南省惠丰金刚石有限公司 | Self-sharpening agglomerated abrasive |
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IE47393B1 (en) * | 1977-09-12 | 1984-03-07 | De Beers Ind Diamond | Abrasive materials |
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CN101280683B (en) * | 2008-05-27 | 2011-03-23 | 中南大学 | Coal excavating mining pick inlaid with diamond and manufacturing process thereof |
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Effective date of registration: 20200207 Address after: 466700 west side of the third industrial road, north side of Tengda Road, Huaiyang industrial agglomeration zone, Zhoukou City, Henan Province Patentee after: Henan Xin Hong abrasive materials Co., Ltd. Address before: 450000 No. 1, building 19, Building 29, No. 10, south two road, Zhengzhou economic and Technological Development Zone, Henan, China Patentee before: Zhu Shilian |