CN107652899B - Diamond liquid for polishing ceramic sapphire and manufacturing method thereof - Google Patents
Diamond liquid for polishing ceramic sapphire and manufacturing method thereof Download PDFInfo
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- CN107652899B CN107652899B CN201710968757.3A CN201710968757A CN107652899B CN 107652899 B CN107652899 B CN 107652899B CN 201710968757 A CN201710968757 A CN 201710968757A CN 107652899 B CN107652899 B CN 107652899B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a diamond liquid for polishing ceramic sapphire and a manufacturing method thereof, wherein the manufacturing method comprises the following steps: (1) carrying out surface treatment on the diamond single crystal micro powder to obtain treated diamond single crystal micro powder; (2) preparing the treated diamond single crystal micro powder into balls, and screening and shaping to obtain diamond balls; (3) and mixing the diamond balls with additives, and uniformly dispersing to obtain the diamond liquid for polishing the ceramic sapphire. The diamond liquid for polishing has large cutting force, high self-sharpening property and continuous grinding force, and is particularly suitable for polishing ceramic sapphire.
Description
Technical Field
The invention belongs to the field of grinding materials, and particularly relates to a diamond liquid for polishing ceramic sapphire and a manufacturing method thereof.
Background
With the development of material science, the hardness of materials used in the 3C technical field is higher and higher, the materials used for products such as sapphire substrates, sapphire glass, ceramic mobile phone rear covers, ceramic fingerprint identification sheets and tempered glass are all made of materials with Mohs hardness of 9, and grinding tools are often needed to grind and polish the surfaces of the products in the production process.
The abrasive is one of the main materials for manufacturing the grinding tool and is one of the most important factors influencing the quality of the grinding tool, the common abrasive has low hardness and is not suitable for the grinding and polishing operation of products with high hardness, and in this case, special abrasives with large cutting force, high self-sharpening performance and continuous grinding force are used, for example: a diamond abrasive material.
At present, polycrystalline diamond grinding fluid is generally prepared by adopting a detonation PCD method, and the method adopts an explosion method, so that the process is complex in danger, low in yield and troublesome in grading. Therefore, it is important to develop a polishing liquid having a high cutting force, a high self-sharpening property and a continuous polishing force.
Disclosure of Invention
The invention provides a diamond liquid for polishing ceramic sapphire and a manufacturing method thereof.
A method for manufacturing diamond liquid for polishing ceramic sapphire comprises the following steps:
(1) carrying out surface treatment on the diamond single crystal micro powder to obtain treated diamond single crystal micro powder;
(2) preparing the treated diamond single crystal micro powder into balls, and screening and shaping to obtain diamond balls;
(3) and mixing the diamond balls with additives, and uniformly dispersing to obtain the diamond liquid for polishing the ceramic sapphire.
Preferably, in step (1), the surface treatment method is as follows: and cleaning the diamond with purified water, and then drying to obtain the treated diamond single crystal micro powder.
Preferably, in the step (2), the preparation method of the diamond ball is as follows: mixing diamond single crystal micro powder, pure water and an adhesive, uniformly dispersing, then spray-drying to prepare a sphere, and aging the sphere at high temperature to obtain the spherical diamond stacked abrasive.
Preferably, the mass ratio of the diamond single crystal micro powder to the adhesive is about 3: 2.
Preferably, the adhesive is at least one of solid glass microspheres, starch, cellulose and PVA, and further preferably, the adhesive is solid glass microspheres and PVA 1788.
Preferably, in the step (3), the additives are BYK-348 and BYK-017.
The invention also provides diamond liquid for polishing the ceramic sapphire, which is prepared by the preparation method.
Compared with the prior art, the invention has the beneficial effects that:
(1) the diamond liquid for polishing the ceramic sapphire has the advantages of large cutting force, high self-sharpening property and continuous grinding force, has better grinding effect, and is particularly suitable for polishing the ceramic sapphire.
(2) The manufacturing method of the spherical diamond stacked abrasive is convenient to operate, has little pollution to the environment and has better industrial application value.
Detailed Description
Example 1
(1) And cleaning the diamond monocrystal micropowder by using pure water, and then drying to obtain the treated diamond monocrystal micropowder.
(2) Mixing 900g of diamond, 600g of first adhesive O50-20-215 and 1000ml of pure water at room temperature, fully stirring and uniformly dispersing, stirring at a low speed, slowly adding 300g of 10% concentration second adhesive solution PVA1788, then carrying out spray drying at an inlet temperature of 190 ℃ and an outlet temperature of 110 ℃ to prepare a sphere, and aging at 400-600 ℃ to obtain the spherical diamond stacked abrasive;
(3) and mixing the diamond ball with additives BYK-348 and BYK-017, and uniformly dispersing to obtain the diamond liquid for polishing the ceramic sapphire.
Example 2
(1) And cleaning the diamond single crystal micro powder by using pure water, and then drying to obtain the treated diamond single crystal micro powder.
(2) Mixing 900g of diamond, 600g of first adhesive O50-20-215 and 1000ml of pure water at room temperature, fully stirring and uniformly dispersing, stirring at a low speed, slowly adding 30g of starch, spray-drying at 190 ℃ of inlet temperature and 110 ℃ of outlet temperature to prepare a sphere, and aging at 400-600 ℃ to obtain the spherical diamond stacked abrasive;
(3) and mixing the diamond ball with additives BYK-348 and BYK-017, and uniformly dispersing to obtain the diamond liquid for polishing the ceramic sapphire.
Example 3
(1) And cleaning the diamond single crystal micro powder by using pure water, and then drying to obtain the treated diamond single crystal micro powder.
(2) Mixing 900g of diamond, 600g of first adhesive O50-20-215 and 1000ml of pure water at room temperature, fully stirring and uniformly dispersing, stirring at a low speed, slowly adding 30g of cellulose, then performing spray drying at 190 ℃ of inlet temperature and 110 ℃ of outlet temperature to prepare a sphere, and aging at 400-600 ℃ to obtain the spherical diamond stacked abrasive;
(3) and mixing the diamond balls with additives BYK-333 and GPE-20, and uniformly dispersing to obtain the diamond liquid for polishing the ceramic sapphire.
Test example 1
The diamond liquid for polishing ceramic sapphire obtained in examples 1 to 3 and a commercially available PCD polishing liquid having the same concentration and particle size were subjected to a polishing test using sapphire as a polishing object. The grinding test was carried out on a flat grinder using a copper grinding plate of phi 460mm, the liquid being applied by pneumatically pressurizing the liquid through a liquid-jet tube. Grinding technological parameters are as follows: the rotation speed of the grinding disc is 80r/min, the grinding pressure is 20.68kPa, the liquid adding speed is 5mL/min, the grinding time is 10min, the removal rate v and the surface roughness Ra of the grinding process are respectively obtained, and the results are shown in Table 1.
The removal rate is calculated as follows: using thickness measuring instrument to measure average thickness delta of 5 points on initial sapphire substrate on marble platform with flatness of 0 grade 1 And an average thickness delta of 5 points on the sapphire substrate after grinding 2 The thickness of the workpiece is measured in μm, the polishing time is measured in t, the polishing time is measured in min, and the material removal rate is ν ═ δ 1 -δ 2 ) The unit is μm/min.
The surface roughness Ra was calculated as follows: the surface roughness value Ra of the sapphire substrate was measured using a model SJ-210 roughness meter, 3 points were selected at the center position and at the circumferential position 2cm from the center, respectively, and the total of the measurements was 4 times, and then the average value thereof was taken as the surface roughness value Ra of the sapphire.
TABLE 1 polishing Properties of examples 1 to 3 and commercially available polishing slurries
| Example 1 | Example 2 | Example 3 | Commercially available grinding fluid | |
| Removal Rate v (μm/min) | 1.65 | 1.57 | 1.54 | 1.30 |
| Surface roughness value Ra (nm) | 9 | 13 | 16 | 20 |
As can be seen from the results in table 1, the PCD abrasive of the present invention has a better removal rate and a smaller surface roughness than the PCD abrasive of the same concentration and particle size.
Test example 2
The diamond liquid for polishing ceramic sapphire obtained in examples 1 to 3 and a commercially available PCD polishing liquid having the same concentration and particle size were subjected to a polishing test using sapphire as a polishing object. The grinding test was carried out on a flat grinder using a copper grinding disk of phi 460mm, with 5mL of liquid added at a time. Grinding technological parameters are as follows: the rotational speed of the grinding disk was 80r/min, the grinding pressure was 20.68kPa, and the grinding time was 10min, and the removal rate ν and the surface roughness Ra of the grinding process were obtained, respectively, and the results are shown in Table 2.
TABLE 2 polishing Properties of examples 1 to 3 and commercially available polishing slurries
| Example 1 | Example 2 | Example 3 | Commercially available grinding fluid | |
| Removal Rate v (μm/min) | 1.60 | 1.41 | 1.39 | 0.89 |
| Surface roughness value Ra (nm) | 12 | 16 | 18 | 30 |
As can be seen from the results of table 2, when a shortage of the abrasive liquid was added at one time, the removal rate and the surface roughness of the abrasive liquid formed by the abrasive material of the present invention still had better effects, and thus it was seen that the abrasive material of the present invention had better self-sharpening properties.
Claims (4)
1. A method for manufacturing diamond liquid for polishing ceramic sapphire is characterized by comprising the following steps:
(1) carrying out surface treatment on the diamond single crystal micro powder to obtain treated diamond single crystal micro powder;
(2) preparing the treated diamond single crystal micro powder into balls, and screening and shaping to obtain diamond balls;
in the step (2), the preparation method of the diamond ball comprises the following steps: mixing diamond single crystal micro powder with an adhesive, uniformly dispersing, then carrying out spray drying to prepare a sphere, and carrying out high-temperature aging on the sphere to obtain the spherical diamond stacked abrasive;
the mass ratio of the diamond single crystal micro powder to the adhesive is 1: 9-9: 1;
the adhesive is at least one of solid glass microspheres, starch, cellulose and PVA;
(3) and mixing the diamond balls with additives, and uniformly dispersing to obtain the diamond liquid for polishing the ceramic sapphire.
2. The method for producing a diamond liquid for polishing ceramic sapphire according to claim 1, wherein in step (1), the surface treatment method is as follows: and cleaning the diamond with purified water, and then drying to obtain the treated diamond single crystal micro powder.
3. The method of claim 1, wherein in step (3), the additives are a dispersing agent and an antifoaming agent.
4. A diamond liquid for polishing ceramic sapphire, which is produced by the production method according to any one of claims 1 to 3.
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| CN201710968757.3A CN107652899B (en) | 2017-10-18 | 2017-10-18 | Diamond liquid for polishing ceramic sapphire and manufacturing method thereof |
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| CN201710968757.3A CN107652899B (en) | 2017-10-18 | 2017-10-18 | Diamond liquid for polishing ceramic sapphire and manufacturing method thereof |
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| CN107652899A CN107652899A (en) | 2018-02-02 |
| CN107652899B true CN107652899B (en) | 2022-09-02 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114214033B (en) * | 2021-12-08 | 2023-06-27 | 绍兴自远磨具有限公司 | Magnetic abrasive for workpiece grinding and preparation process thereof |
| CN114736654A (en) * | 2022-04-28 | 2022-07-12 | 浙江奥首材料科技有限公司 | Spherical abrasive, preparation method and application thereof, and sapphire grinding fluid containing spherical abrasive |
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| CN103709993A (en) * | 2013-12-11 | 2014-04-09 | 祝世连 | Self-sharpening diamond abrasive material and preparation method thereof |
| CN104854024A (en) * | 2012-12-12 | 2015-08-19 | 六号元素磨料股份有限公司 | Diamond grains, method for making same and mixture comprising same |
| CN105856078A (en) * | 2016-04-19 | 2016-08-17 | 南京航空航天大学 | Preparation method and use of self-sharpening sintered abrasive material |
| CN106318219A (en) * | 2015-06-29 | 2017-01-11 | 蓝思科技股份有限公司 | Diamond grinding fluid dedicated for sapphire polishing and preparation method thereof |
| CN106378717A (en) * | 2016-09-28 | 2017-02-08 | 南京航空航天大学 | Production method and application of multicrystal diamond tablet |
| CN106425825A (en) * | 2016-09-28 | 2017-02-22 | 南京航空航天大学 | New grinding and polishing method for super hard and brittle workpiece |
| CN107043882A (en) * | 2017-03-17 | 2017-08-15 | 昆明理工大学 | A kind of preparation method of diamond composite |
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- 2017-10-18 CN CN201710968757.3A patent/CN107652899B/en active Active
Patent Citations (7)
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| CN104854024A (en) * | 2012-12-12 | 2015-08-19 | 六号元素磨料股份有限公司 | Diamond grains, method for making same and mixture comprising same |
| CN103709993A (en) * | 2013-12-11 | 2014-04-09 | 祝世连 | Self-sharpening diamond abrasive material and preparation method thereof |
| CN106318219A (en) * | 2015-06-29 | 2017-01-11 | 蓝思科技股份有限公司 | Diamond grinding fluid dedicated for sapphire polishing and preparation method thereof |
| CN105856078A (en) * | 2016-04-19 | 2016-08-17 | 南京航空航天大学 | Preparation method and use of self-sharpening sintered abrasive material |
| CN106378717A (en) * | 2016-09-28 | 2017-02-08 | 南京航空航天大学 | Production method and application of multicrystal diamond tablet |
| CN106425825A (en) * | 2016-09-28 | 2017-02-22 | 南京航空航天大学 | New grinding and polishing method for super hard and brittle workpiece |
| CN107043882A (en) * | 2017-03-17 | 2017-08-15 | 昆明理工大学 | A kind of preparation method of diamond composite |
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