CN102210031B - 用于制造光电子半导体芯片的方法和光电子半导体芯片 - Google Patents
用于制造光电子半导体芯片的方法和光电子半导体芯片 Download PDFInfo
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- CN102210031B CN102210031B CN200980144749.0A CN200980144749A CN102210031B CN 102210031 B CN102210031 B CN 102210031B CN 200980144749 A CN200980144749 A CN 200980144749A CN 102210031 B CN102210031 B CN 102210031B
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- doped
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- semiconductor
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
- H10H20/8252—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN characterised by the dopants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/816—Bodies having carrier transport control structures, e.g. highly-doped semiconductor layers or current-blocking structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
Landscapes
- Led Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008056371.4 | 2008-11-07 | ||
| DE102008056371A DE102008056371A1 (de) | 2008-11-07 | 2008-11-07 | Verfahren zur Herstellung eines optoelektronischen Halbleiterchips und optoelektronischer Halbleiterchip |
| PCT/DE2009/001415 WO2010051786A1 (de) | 2008-11-07 | 2009-10-12 | Verfahren zur herstellung eines optoelektronischen halbleiterchips und optoelektronischer halbleiterchip |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102210031A CN102210031A (zh) | 2011-10-05 |
| CN102210031B true CN102210031B (zh) | 2015-07-01 |
Family
ID=41667176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200980144749.0A Active CN102210031B (zh) | 2008-11-07 | 2009-10-12 | 用于制造光电子半导体芯片的方法和光电子半导体芯片 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8598596B2 (https=) |
| EP (1) | EP2342762A1 (https=) |
| JP (1) | JP5951993B2 (https=) |
| KR (1) | KR20110088545A (https=) |
| CN (1) | CN102210031B (https=) |
| DE (1) | DE102008056371A1 (https=) |
| TW (1) | TW201027806A (https=) |
| WO (1) | WO2010051786A1 (https=) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9431585B2 (en) | 2010-09-29 | 2016-08-30 | Koninklijke Philips Electronics N.V. | Wavelength converted light emitting device |
| TWI456790B (zh) * | 2012-09-28 | 2014-10-11 | Phostek Inc | 發光二極體裝置 |
| US9379259B2 (en) * | 2012-11-05 | 2016-06-28 | International Business Machines Corporation | Double layered transparent conductive oxide for reduced schottky barrier in photovoltaic devices |
| CN103184034B (zh) * | 2013-01-04 | 2014-08-20 | 北京阳光溢彩科技有限公司 | 生态环保型粉尘抑制剂 |
| JP6051901B2 (ja) * | 2013-02-05 | 2016-12-27 | 豊田合成株式会社 | p型III 族窒化物半導体の製造方法 |
| US20140353578A1 (en) * | 2013-06-04 | 2014-12-04 | Epistar Corporation | Light-emitting device |
| KR102227981B1 (ko) * | 2013-06-20 | 2021-03-16 | 삼성전자주식회사 | 단일 광자 소자, 단일 광자 방출 전달 장치, 단일 광자 소자의 제조 및 동작 방법 |
| JP6459948B2 (ja) * | 2015-12-15 | 2019-01-30 | 株式会社Sumco | 半導体エピタキシャルウェーハの製造方法および固体撮像素子の製造方法 |
| EP3459117B1 (en) | 2016-05-20 | 2021-04-14 | Lumileds LLC | Method of forming a p-type layer for a light emitting device |
| US10541352B2 (en) | 2016-10-28 | 2020-01-21 | Lumileds Llc | Methods for growing light emitting devices under ultra-violet illumination |
| CN110168752B (zh) * | 2016-10-28 | 2022-02-22 | 亮锐有限责任公司 | 用于在紫外照射下生长发光器件的方法 |
| US10439103B2 (en) | 2017-05-25 | 2019-10-08 | Showa Denko K. K. | Light-emitting diode and method for manufacturing tunnel junction layer |
| JP7122119B2 (ja) * | 2017-05-25 | 2022-08-19 | 昭和電工光半導体株式会社 | 発光ダイオード |
| WO2019152611A1 (en) * | 2018-02-02 | 2019-08-08 | Cornell University | Platforms enabled by buried tunnel junction for integrated photonic and electronic systems |
| JP7149486B2 (ja) | 2020-04-21 | 2022-10-07 | 日亜化学工業株式会社 | 発光素子の製造方法 |
| JP7607286B2 (ja) * | 2021-09-10 | 2024-12-27 | ウシオ電機株式会社 | 窒化物半導体発光素子 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020056566A (ko) * | 2000-12-29 | 2002-07-10 | 조장연 | 질화 갈륨계 반도체 박막의 피형 활성화 방법 |
| KR100748709B1 (ko) * | 2006-09-18 | 2007-08-13 | 서울옵토디바이스주식회사 | 발광 소자 및 그 제조 방법 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5306662A (en) | 1991-11-08 | 1994-04-26 | Nichia Chemical Industries, Ltd. | Method of manufacturing P-type compound semiconductor |
| TW329058B (en) | 1997-03-20 | 1998-04-01 | Ind Tech Res Inst | Manufacturing method for P type gallium nitride |
| JPH11126758A (ja) | 1997-10-24 | 1999-05-11 | Pioneer Electron Corp | 半導体素子製造方法 |
| JP2001044209A (ja) | 1999-07-27 | 2001-02-16 | Furukawa Electric Co Ltd:The | GaN系半導体装置の製造方法 |
| JP2002319703A (ja) * | 2001-04-20 | 2002-10-31 | Ricoh Co Ltd | 半導体装置およびその作製方法 |
| DE10152922B4 (de) * | 2001-10-26 | 2010-05-12 | Osram Opto Semiconductors Gmbh | Nitrid-basierendes Halbleiterbauelement |
| TW517403B (en) * | 2002-01-10 | 2003-01-11 | Epitech Technology Corp | Nitride light emitting diode and manufacturing method for the same |
| TW540170B (en) * | 2002-07-08 | 2003-07-01 | Arima Optoelectronics Corp | Ohmic contact structure of semiconductor light emitting device and its manufacturing method |
| JP2004128189A (ja) * | 2002-10-02 | 2004-04-22 | Sanyo Electric Co Ltd | 窒化ガリウム系化合物半導体の製造方法 |
| KR100580752B1 (ko) * | 2004-12-23 | 2006-05-15 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
| KR100662191B1 (ko) * | 2004-12-23 | 2006-12-27 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
| JP5360789B2 (ja) | 2006-07-06 | 2013-12-04 | 独立行政法人産業技術総合研究所 | p型酸化亜鉛薄膜及びその作製方法 |
| JP4827706B2 (ja) * | 2006-12-04 | 2011-11-30 | シャープ株式会社 | 窒化物半導体発光素子 |
| DE102007019079A1 (de) * | 2007-01-26 | 2008-07-31 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines optoelektronischen Halbleiterchips und optoelektronischer Halbleiterchip |
-
2008
- 2008-11-07 DE DE102008056371A patent/DE102008056371A1/de not_active Ceased
-
2009
- 2009-10-12 US US13/128,050 patent/US8598596B2/en active Active
- 2009-10-12 WO PCT/DE2009/001415 patent/WO2010051786A1/de not_active Ceased
- 2009-10-12 KR KR1020117012745A patent/KR20110088545A/ko not_active Ceased
- 2009-10-12 CN CN200980144749.0A patent/CN102210031B/zh active Active
- 2009-10-12 JP JP2011535002A patent/JP5951993B2/ja not_active Expired - Fee Related
- 2009-10-12 EP EP09765005A patent/EP2342762A1/de not_active Withdrawn
- 2009-11-04 TW TW098137382A patent/TW201027806A/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020056566A (ko) * | 2000-12-29 | 2002-07-10 | 조장연 | 질화 갈륨계 반도체 박막의 피형 활성화 방법 |
| KR100748709B1 (ko) * | 2006-09-18 | 2007-08-13 | 서울옵토디바이스주식회사 | 발광 소자 및 그 제조 방법 |
Non-Patent Citations (2)
| Title |
|---|
| Influence of low-energy electron beam irradiation on defects in activated Mg-doped GaN;Gelhausen.O, et.al.;《Applied Physics Letters》;20021111;第81卷(第20期);203-207 * |
| Pulsed excimer laser annealing of Mg-doped cubic GaN;Xu D, et. al.;《 Journal of crystal growth》;20000115;第209卷(第1期);3747-3749 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012508458A (ja) | 2012-04-05 |
| JP5951993B2 (ja) | 2016-07-13 |
| WO2010051786A1 (de) | 2010-05-14 |
| US20110278641A1 (en) | 2011-11-17 |
| DE102008056371A1 (de) | 2010-05-12 |
| TW201027806A (en) | 2010-07-16 |
| EP2342762A1 (de) | 2011-07-13 |
| KR20110088545A (ko) | 2011-08-03 |
| US8598596B2 (en) | 2013-12-03 |
| CN102210031A (zh) | 2011-10-05 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |