CN102163698A - 回收装置及应用其的成膜设备 - Google Patents
回收装置及应用其的成膜设备 Download PDFInfo
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- CN102163698A CN102163698A CN2011100096710A CN201110009671A CN102163698A CN 102163698 A CN102163698 A CN 102163698A CN 2011100096710 A CN2011100096710 A CN 2011100096710A CN 201110009671 A CN201110009671 A CN 201110009671A CN 102163698 A CN102163698 A CN 102163698A
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- 239000007788 liquid Substances 0.000 claims description 42
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- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
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- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW099142880A TWI496329B (zh) | 2010-12-08 | 2010-12-08 | 回收裝置及應用其之成膜設備 |
TW099142880 | 2010-12-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102163698A true CN102163698A (zh) | 2011-08-24 |
CN102163698B CN102163698B (zh) | 2013-12-11 |
Family
ID=44464788
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2011100096710A Active CN102163698B (zh) | 2010-12-08 | 2011-01-11 | 回收装置及应用其的成膜设备 |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN102163698B (zh) |
TW (1) | TWI496329B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020020181A1 (zh) * | 2018-07-23 | 2020-01-30 | 北京铂阳顶荣光伏科技有限公司 | 输送装置及具有该输送装置的成像检测设备 |
WO2022127189A1 (zh) * | 2020-12-15 | 2022-06-23 | 中国华能集团清洁能源技术研究院有限公司 | 一种真空蒸镀用基片辅助降温系统及工作方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10195641A (ja) * | 1997-01-09 | 1998-07-28 | Ulvac Japan Ltd | 有機薄膜形成装置 |
JP2004259634A (ja) * | 2003-02-27 | 2004-09-16 | Nippon Seiki Co Ltd | 有機elパネルの製造方法、及びその有機elパネルの製造方法で用いられる有機層製膜装置 |
CN1896848A (zh) * | 2005-07-14 | 2007-01-17 | 精工爱普生株式会社 | 制造取向膜的制造装置、液晶装置以及电子设备 |
JP2009114517A (ja) * | 2007-11-08 | 2009-05-28 | Seiko Epson Corp | 蒸着装置、蒸着方法、および有機el装置の製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0521422A (ja) * | 1991-07-11 | 1993-01-29 | Matsushita Giken Kk | 有機物蒸着装置 |
JP2003045650A (ja) * | 2001-07-17 | 2003-02-14 | Kiko Kenji Kagi Kofun Yugenkoshi | 有機el素子の製造装置 |
-
2010
- 2010-12-08 TW TW099142880A patent/TWI496329B/zh active
-
2011
- 2011-01-11 CN CN2011100096710A patent/CN102163698B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10195641A (ja) * | 1997-01-09 | 1998-07-28 | Ulvac Japan Ltd | 有機薄膜形成装置 |
JP2004259634A (ja) * | 2003-02-27 | 2004-09-16 | Nippon Seiki Co Ltd | 有機elパネルの製造方法、及びその有機elパネルの製造方法で用いられる有機層製膜装置 |
CN1896848A (zh) * | 2005-07-14 | 2007-01-17 | 精工爱普生株式会社 | 制造取向膜的制造装置、液晶装置以及电子设备 |
JP2009114517A (ja) * | 2007-11-08 | 2009-05-28 | Seiko Epson Corp | 蒸着装置、蒸着方法、および有機el装置の製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020020181A1 (zh) * | 2018-07-23 | 2020-01-30 | 北京铂阳顶荣光伏科技有限公司 | 输送装置及具有该输送装置的成像检测设备 |
WO2022127189A1 (zh) * | 2020-12-15 | 2022-06-23 | 中国华能集团清洁能源技术研究院有限公司 | 一种真空蒸镀用基片辅助降温系统及工作方法 |
Also Published As
Publication number | Publication date |
---|---|
TW201225369A (en) | 2012-06-16 |
CN102163698B (zh) | 2013-12-11 |
TWI496329B (zh) | 2015-08-11 |
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TR01 | Transfer of patent right |
Effective date of registration: 20220701 Address after: Tokyo Patentee after: Taishikang Co.,Ltd. Address before: Taiwan, Hsinchu, China Science Industry Park, Hsinchu Road, force two, No. 1 Patentee before: AU OPTRONICS Corp. |
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Effective date of registration: 20230918 Address after: No. 999 Xialian Road, Neicuo Town, Xiang'an District, Xiamen City, Fujian Province Patentee after: Xiamen Tianma Display Technology Co.,Ltd. Address before: Tokyo Patentee before: Taishikang Co.,Ltd. |
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